Process for manufacturing a praseodymium oxide- and manganese
oxide-containing baseplate for use in field emission displays
    11.
    发明授权
    Process for manufacturing a praseodymium oxide- and manganese oxide-containing baseplate for use in field emission displays 失效
    制造用于场致发射显示器的氧化镨和含锰氧化物的基板的方法

    公开(公告)号:US5776540A

    公开(公告)日:1998-07-07

    申请号:US777797

    申请日:1996-12-31

    CPC classification number: H01J3/022 H01J29/863 H01J2329/00

    Abstract: A process for manufacturing a conductive and light-absorbing baseplate for use in a field emission display is disclosed. A surface of the baseplate is coated with a praseodymium oxide- and manganese oxide-containing layer having a resistivity that does not exceed 1.times.10.sup.5 .OMEGA.-cm. The coating may be placed on the baseplate by radiofrequency sputtering, laser ablation, plasma deposition or the like. Suitable praseodymium sources include praseodymium acetate, praseodymium oxalate and Pr(THd).sub.3, while suitable manganese sources include MnO.sub.2 and MnCO.sub.3.

    Abstract translation: 公开了一种制造用于场发射显示器的导电和吸光基板的方法。 基板的表面涂覆有电阻率不超过1×10 5欧姆 - 厘米的含氧化镨和含氧化锰的层。 可以通过射频溅射,激光烧蚀,等离子体沉积等将涂层放置在基板上。 合适的镨源包括乙酸镨,草酸镨和Pr(THd)3,而合适的锰源包括MnO2和MnCO3。

    Method and apparatus for applying highly viscous liquid to substrate
    14.
    发明授权
    Method and apparatus for applying highly viscous liquid to substrate 失效
    将高粘度液体施加于基材的方法和装置

    公开(公告)号:US06613148B1

    公开(公告)日:2003-09-02

    申请号:US09370665

    申请日:1999-08-09

    CPC classification number: B05C9/02 B05D1/265

    Abstract: A method for coating flat substrates with a liquid, the method comprising: pressurizing liquid within a coat head wherein the liquid has a viscosity of at least thirty centipoises; forming a meniscus of liquid at an orifice in the coat head; contacting the meniscus of the liquid to the substrate; and moving the meniscus relative to the substrate. A system for coating a flat substrate with liquid, the system comprising: a coat head filled with liquid by capillary action, wherein the viscosity of the liquid is at least thirty centipoises; a pressurizer of the liquid that forms a meniscus at an orifice in the coat head; a contacter of the meniscus to the substrate; and a mover of the meniscus relative to the substrate. A system for coating a flat substrate with liquid, the system comprising: a coat head filled with liquid, wherein the viscosity of the liquid is at least thirty centipoises; a pressurizer of the liquid that forms a meniscus at an orifice of the coat head; a contacter of the meniscus to the substrate; a mover of the meniscus relative to the substrate; a regulator of liquid pressure at the base of the coat head; and a replenisher of liquid that replenishes liquid taken from the coat head with liquid in a reservoir.

    Abstract translation: 一种用液体涂覆平面基板的方法,所述方法包括:对涂覆头内的液体加压,其中所述液体具有至少三十厘泊的粘度; 在涂层头部的孔口处形成液体弯月面; 使液体的弯液面与基底接触; 并且相对于基底移动弯月面。 一种用于用液体涂覆平坦基底的系统,所述系统包括:通过毛细管作用填充液体的涂层头,其中所述液体的粘度为至少三十厘泊; 液体的加压器,其在涂覆头部的孔口处形成弯液面; 弯液面与底物的连接; 和相对于基底的弯液面的移动体。 一种用液体涂覆平坦基材的系统,该系统包括:填充有液体的涂层头,其中液体的粘度至少为30厘泊; 液体的加压器,其在涂覆头的孔口处形成弯液面; 弯液面与底物的连接; 弯液面相对于基底的移动器; 在头盖底部的液压调节器; 以及液体补充液,其用液体在储存器中补充从涂层头部取出的液体。

    Attaching spacers in a display device
    15.
    发明授权
    Attaching spacers in a display device 失效
    将间隔件安装在显示设备中

    公开(公告)号:US06491559B1

    公开(公告)日:2002-12-10

    申请号:US09438936

    申请日:1999-11-12

    Abstract: A faceplate in a flat panel display has attachment sites made with a method that includes steps of mixing frit and photoresist to form a mixture, applying the mixture to the substrate, softbaking the substrate and mixture, and exposing and developing the resist to define adhesion sites. Spacers are then attached to the faceplate at the adhesion sites.

    Abstract translation: 平板显示器中的面板具有通过以下方法制造的附接部位,该方法包括混合玻璃料和光致抗蚀剂以形成混合物的步骤,将混合物施加到基材上,软化基材和混合物,以及曝光和显影抗蚀剂以限定粘合位点 。 然后将间隔物附着在粘合部位的面板上。

    Process for preparing a praseodymium-manganese oxide material for use in
field emission displays
    19.
    发明授权
    Process for preparing a praseodymium-manganese oxide material for use in field emission displays 失效
    制备用于场致发射显示器的镨锰氧化物材料的方法

    公开(公告)号:US5759446A

    公开(公告)日:1998-06-02

    申请号:US840084

    申请日:1997-04-09

    CPC classification number: H01J3/022 H01J29/863 H01J2329/00

    Abstract: A conductive, light-absorbing baseplate for use in a field emission display is disclosed. The interior surface of the baseplate is coated with a praseodymium-manganese oxide layer having a resistivity that does not exceed 1.times.10.sup.5 .OMEGA..multidot.cm. A field emission display is also disclosed which comprises the conductive, light-absorbing baseplate, as well as processes for manufacturing the baseplate, field emission display and the conductive, light-absorbing praseodymium-manganese oxide material used to coat the baseplate.

    Abstract translation: 公开了一种用于场发射显示器的导电吸光基板。 基板的内表面涂覆有电阻率不超过1×10 5欧姆×xcm的镨锰氧化物层。 还公开了一种场致发射显示器,其包括导电的吸光基板,以及用于制造用于涂覆基板的基板,场发射显示器和导电的吸光镨锰氧化物材料的工艺。

    Method for adjusting dimensions of photomask features
    20.
    发明授权
    Method for adjusting dimensions of photomask features 失效
    调整光掩模特征尺寸的方法

    公开(公告)号:US07186480B2

    公开(公告)日:2007-03-06

    申请号:US10732608

    申请日:2003-12-10

    Abstract: A method for adjusting one or more dimensions of a photomask subsequent to etching of a defective pattern in the chrome-containing layer thereof is provided. The method includes subjecting the chrome-containing layer of a photomask to a wet etch process utilizing a solution comprising deionized water and ozone. The length of exposure is directly proportional to the degree of adjustment desired. That is, if a small adjustment in one or more dimensions of a photomask is desired, the photomask may be exposed to the deionized water and ozone solution for only a few moments, whereas if a much larger adjustment is necessary, the photomask may be exposed to the solution for several hours. Accordingly, the method of the present invention provides a way in which dimensions of a photomask may be adjusted by a small amount (e.g., a few angstroms) or more severely adjusted, for example, by 20–30 nanometers or more.

    Abstract translation: 提供了在其含铬层中蚀刻缺陷图案之后调整光掩模的一个或多个维度的方法。 该方法包括使用包含去离子水和臭氧的溶液对光掩模的含铬层进行湿式蚀刻工艺。 曝光长度与所需的调整程度成正比。 也就是说,如果希望在光掩模的一个或多个维度上进行小的调整,则光掩模可以仅暴露于去离子水和臭氧溶液只有几分钟,而如果需要大得多的调整,则光掩模可能被暴露 到解决几个小时。 因此,本发明的方法提供了一种方法,其中光掩模的尺寸可以被调整少量(例如几埃)或更严格地调节,例如20-30纳米或更多。

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