公开(公告)号：US20060066248A1

公开(公告)日：2006-03-30

申请号：US11162824

申请日：2005-09-23

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: H01J7/24

CPC classification number: C23C14/354 ,  H01J37/32082 ,  H01J37/32137 ,  H01J37/32165 ,  H01J37/32431 ,  H01J37/32623 ,  H01J37/3405 ,  H01J37/3408

Abstract: A high current density plasma generator includes a chamber that contains a feed gas. An anode is positioned in the chamber. A cathode assembly is position adjacent to the anode inside the chamber. A power supply having an output is electrically connected between the anode and the cathode assembly. The power supply generates at the output an oscillating voltage that produces a plasma from the feed gas. At least one of an amplitude, frequency, rise time, and fall time of the oscillatory voltage is chosen to increase an ionization rate of the feed gas.

Abstract translation: 高电流密度等离子体发生器包括含有进料气体的室。 阳极位于腔室中。 阴极组件位于室内阳极附近。 具有输出的电源电连接在阳极和阴极组件之间。 电源在输出端产生产生来自进料气体的等离子体的振荡电压。 选择振荡电压的幅度，频率，上升时间和下降时间中的至少一个以增加进料气体的电离速率。

公开(公告)号：US20050211543A1

公开(公告)日：2005-09-29

申请号：US11130315

申请日：2005-05-16

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34 ,  B01J19/08 ,  B01J19/12

CPC classification number: H01J37/3405 ,  C23C14/34 ,  C23C14/35 ,  H01J37/3244

Abstract: Methods and apparatus for generating uniformly-distributed plasma are described. A plasma generator according to the invention includes a cathode assembly that is positioned adjacent to an anode and forming a gap there between. A gas source supplies a volume of feed gas and/or a volume of excited atoms to the gap between the cathode assembly and the anode. A power supply generates an electric field across the gap between the cathode assembly and the anode. The electric field ionizes the volume of feed gas and/or the volume of excited atoms that is supplied to the gap, thereby creating a plasma in the gap.

公开(公告)号：US20150315697A1

公开(公告)日：2015-11-05

申请号：US14800198

申请日：2015-07-15

Applicant: Roman Chistyakov ,  Bassam Hanna Abraham

Inventor： Roman Chistyakov ,  Bassam Hanna Abraham

IPC: C23C14/34 ,  C23C14/35

CPC classification number: C23C14/3414 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/564 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.

Abstract translation: 等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 包括至少两个固态开关并具有电连接在阳极和阴极组件之间的输出的脉冲电源产生电压微脉冲。 使用包括产生强电离等离子体的振幅和频率的电压振荡的电压波形来产生电压微脉冲的脉冲宽度和占空比。

公开(公告)号：US09123508B2

公开(公告)日：2015-09-01

申请号：US13010762

申请日：2011-01-20

Applicant: Roman Chistyakov ,  Bassam Hanna Abraham

Inventor： Roman Chistyakov ,  Bassam Hanna Abraham

IPC: H05H1/24 ,  H05H1/46 ,  H01J7/24 ,  H01J37/32 ,  H01J37/34

CPC classification number: C23C14/3414 ,  C23C14/3485 ,  C23C14/35 ,  C23C14/564 ,  H01J37/32009 ,  H01J37/32018 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. A pulsed power supply comprising at least two solid state switches and having an output that is electrically connected between the anode and the cathode assembly generates voltage micropulses. A pulse width and a duty cycle of the voltage micropulses are generated using a voltage waveform comprising voltage oscillation having amplitudes and frequencies that generate a strongly ionized plasma.

Abstract translation: 等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 包括至少两个固态开关并具有电连接在阳极和阴极组件之间的输出的脉冲电源产生电压微脉冲。 使用包括产生强电离等离子体的振幅和频率的电压振荡的电压波形来产生电压微脉冲的脉冲宽度和占空比。

公开(公告)号：US08125155B2

公开(公告)日：2012-02-28

申请号：US12870388

申请日：2010-08-27

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: H05B31/26

CPC classification number: H01J37/3408 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3455

Abstract: Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply generates a multi-stage voltage pulse that includes a low-power stage with a first peak voltage having a magnitude and a rise time that is sufficient to generate a weakly-ionized plasma from the feed gas. The multi-stage voltage pulse also includes a transient stage with a second peak voltage having a magnitude and a rise time that is sufficient to shift an electron energy distribution in the weakly-ionized plasma to higher energies that increase an ionization rate which results in a rapid increase in electron density and a formation of a strongly-ionized plasma.

Abstract translation: 公开了用于产生强电离等离子体的方法和装置。 根据一个实施例的强电离等离子体发生器包括用于限制进料气体的室。 阳极和阴极组件位于室内。 脉冲电源电连接在阳极和阴极组件之间。 脉冲电源产生多级电压脉冲，其包括具有第一峰值电压的低功率级，其具有足以产生来自进料气体的弱离子化等离子体的大小和上升时间。 多级电压脉冲还包括具有第二峰值电压的瞬态级，其具有足以将弱离子化等离子体中的电子能量分布移位到增加电离速率的较高能量的幅度和上升时间，这导致电离率 电子密度的快速增加和强电离等离子体的形成。

公开(公告)号：US07811421B2

公开(公告)日：2010-10-12

申请号：US11183463

申请日：2005-07-18

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C14/35

CPC classification number: C23C14/354 ,  C23C14/228 ,  C23C14/3414 ,  C23C14/3485 ,  C23C14/3492 ,  C23C14/35 ,  C23C14/542 ,  H01J37/3266 ,  H01J37/32697 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3429 ,  H01J37/3455 ,  H01J37/3467 ,  H01J37/3476 ,  H01L21/02266

Abstract: Methods and apparatus for high-deposition sputtering are described. A sputtering source includes an anode and a cathode assembly that is positioned adjacent to the anode. The cathode assembly includes a sputtering target. An ionization source generates a weakly-ionized plasma proximate to the anode and the cathode assembly. A power supply produces an electric field between the anode and the cathode assembly that creates a strongly-ionized plasma from the weakly-ionized plasma. The strongly-ionized plasma includes a first plurality of ions that impact the sputtering target to generate sufficient thermal energy in the sputtering target to cause a sputtering yield of the sputtering target to be non-linearly related to a temperature of the sputtering target.

Abstract translation: 描述了用于高沉积溅射的方法和装置。 溅射源包括邻近阳极定位的阳极和阴极组件。 阴极组件包括溅射靶。 电离源产生靠近阳极和阴极组件的弱离子化等离子体。 电源在阳极和阴极组件之间产生电场，从而产生来自弱离子化等离子体的强电离等离子体。 强电离等离子体包括冲击溅射靶的第一多个离子，以在溅射靶中产生足够的热能，使得溅射靶的溅射产率与溅射靶的温度非线性相关。

公开(公告)号：US07663319B2

公开(公告)日：2010-02-16

申请号：US11738491

申请日：2007-04-22

Applicant: Roman Chistyakov ,  Bassam Hanna Abraham

Inventor： Roman Chistyakov ,  Bassam Hanna Abraham

IPC: H01J7/24

CPC classification number: H01J37/32045 ,  H01J37/32009 ,  H01J37/3405 ,  H01J37/3408 ,  H01J37/3444 ,  H01J2237/0206

Abstract: A strongly-ionized plasma generator includes a chamber for confining a feed gas. An anode is positioned inside the chamber. A cathode assembly is positioned adjacent to the anode inside the chamber. An output of a pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply comprising solid state switches that are controlled by micropulses generated by drivers. At least one of a pulse width and a duty cycle of the micropulses is varied so that the power supply generates a multi-step voltage waveform at the output having a low-power stage including a peak voltage and a rise time that is sufficient to generate a plasma from the feed gas and a transient stage including a peak voltage and a rise time that is sufficient to generate a more strongly-ionized plasma.

Abstract translation: 强离子化等离子体发生器包括用于限制进料气体的室。 阳极位于室内。 阴极组件邻近室内的阳极定位。 脉冲电源的输出电连接在阳极和阴极组件之间。 脉冲电源包括由驱动器产生的微脉冲控制的固态开关。 微脉冲的脉冲宽度和占空比中的至少一个被改变，使得电源在具有包括峰值电压和足够产生的峰值电压和上升时间的低功率级的输出端产生多级电压波形 来自进料气体的等离子体和包括足以产生更强电离等离子体的峰值电压和上升时间的瞬态级。

公开(公告)号：US20060279223A1

公开(公告)日：2006-12-14

申请号：US11465574

申请日：2006-08-18

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: H01J7/24

CPC classification number: H01J37/3408 ,  C23C14/35 ,  H01J37/3266 ,  H01J37/3455

Abstract: Methods and apparatus for generating strongly-ionized plasmas are disclosed. A strongly-ionized plasma generator according to one embodiment includes a chamber for confining a feed gas. An anode and a cathode assembly are positioned inside the chamber. A pulsed power supply is electrically connected between the anode and the cathode assembly. The pulsed power supply generates a multi-stage voltage pulse that includes a low-power stage with a first peak voltage having a magnitude and a rise time that is sufficient to generate a weakly-ionized plasma from the feed gas. The multi-stage voltage pulse also includes a transient stage with a second peak voltage having a magnitude and a rise time that is sufficient to shift an electron energy distribution in the weakly-ionized plasma to higher energies that increase an ionization rate which results in a rapid increase in electron density and a formation of a strongly-ionized plasma.

Abstract translation: 公开了用于产生强电离等离子体的方法和装置。 根据一个实施例的强电离等离子体发生器包括用于限制进料气体的室。 阳极和阴极组件位于室内。 脉冲电源电连接在阳极和阴极组件之间。 脉冲电源产生多级电压脉冲，其包括具有第一峰值电压的低功率级，其具有足以产生来自进料气体的弱离子化等离子体的大小和上升时间。 多级电压脉冲还包括具有第二峰值电压的瞬态级，其具有足以将弱离子化等离子体中的电子能量分布移位到增加电离速率的较高能量的幅度和上升时间，这导致电离率 电子密度的快速增加和强电离等离子体的形成。

公开(公告)号：US07147759B2

公开(公告)日：2006-12-12

申请号：US10065277

申请日：2002-09-30

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C14/35

CPC classification number: H01J37/32082 ,  C23C14/35 ,  H01J37/3408

Abstract: Magnetically enhanced sputtering methods and apparatus are described. A magnetically enhanced sputtering source according to the present invention includes an anode and a cathode assembly having a target that is positioned adjacent to the anode. An ionization source generates a weakly-ionized plasma proximate to the anode and the cathode assembly. A magnet is positioned to generate a magnetic field proximate to the weakly-ionized plasma. The magnetic field substantially traps electrons in the weakly-ionized plasma proximate to the sputtering target. A power supply produces an electric field in a gap between the anode and the cathode assembly. The electric field generates excited atoms in the weakly ionized plasma and generates secondary electrons from the sputtering target. The secondary electrons ionize the excited atoms, thereby creating a strongly-ionized plasma having ions that impact a surface of the sputtering target to generate sputtering flux.

Abstract translation: 描述了磁性增强的溅射方法和装置。 根据本发明的磁增强溅射源包括阳极和阴极组件，其具有邻近阳极定位的靶。 电离源产生靠近阳极和阴极组件的弱离子化等离子体。 定位磁体以产生靠近弱电离等离子体的磁场。 磁场基本上俘获靠近溅射靶的弱离子化等离子体中的电子。 电源在阳极和阴极组件之间的间隙中产生电场。 电场在弱电离等离子体中产生激发原子，并从溅射靶产生二次电子。 二次电子使激发的原子电离，从而产生具有冲击溅射靶的表面以产生溅射通量的离子的强电离等离子体。

公开(公告)号：US06903511B2

公开(公告)日：2005-06-07

申请号：US10249774

申请日：2003-05-06

Applicant: Roman Chistyakov

Inventor： Roman Chistyakov

IPC: C23C14/34 ,  C23C14/35 ,  H01J37/32 ,  H01J37/34 ,  H01J7/24 ,  C23C14/00

CPC classification number: H01J37/3405 ,  C23C14/34 ,  C23C14/35 ,  H01J37/3244

Abstract: Methods and apparatus for generating uniformly-distributed plasma are described. A plasma generator according to the invention includes a cathode assembly that is positioned adjacent to an anode and forming a gap there between. A gas source supplies a volume of feed gas and/or a volume of excited atoms to the gap between the cathode assembly and the anode. A power supply generates an electric field across the gap between the cathode assembly and the anode. The electric field ionizes the volume of feed gas and/or the volume of excited atoms that is supplied to the gap, thereby creating a plasma in the gap.

Abstract translation: 描述了产生均匀分布的等离子体的方法和装置。 根据本发明的等离子体发生器包括阴极组件，其被定位成与阳极相邻并在其间形成间隙。 气体源向阴极组件和阳极之间的间隙提供一定体积的进料气体和/或一定体积的激发原子。 电源在阴极组件和阳极之间的间隙上产生电场。 电场使进料气体的体积和/或被提供给间隙的激发原子的体积电离，从而在间隙中产生等离子体。