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11.发明申请公开(公告)号：US20170017151A1
公开(公告)日：2017-01-19
申请号：US15124409
申请日：2015-02-19
Applicant: Shibaura Mechatronics Corporation
Inventor： Daisuke Matsushima , Kensuke Demura , Masafumi Suzuki , Satoshi Nakamura
CPC classification number: G03F1/82 , B08B7/0035 , G03F1/24
Abstract: A reflective mask cleaning apparatus according to an embodiment comprises a first supply section configured to supply a first solution containing at least one of an organic solvent and a surfactant to a ruthenium-containing capping layer provided in a reflective mask; and a second supply section configured to supply at least one of a reducing solution and an oxygen-free solution to the capping layer.A reflective mask cleaning apparatus according to an alternative embodiment comprises a third supply section configured to supply a plasma product produced from a reducing gas to a ruthenium-containing capping layer provided in a reflective mask; and a second supply section configured to supply at least one of a reducing solution and an oxygen-free solution to the capping layer.
Abstract translation: 根据替代实施例的反射掩模清洁装置包括第三供应部分，其构造成将由还原气体产生的等离子体产物供应到设置在反射掩模中的含钌覆盖层; 以及第二供给部，其构造成向所述封盖层供给还原溶液和无氧溶液中的至少一种。
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公开(公告)号：US12138671B2
公开(公告)日：2024-11-12
申请号：US17181227
申请日：2021-02-22
Applicant: Shibaura Mechatronics Corporation
Inventor： Minami Nakamura , Daisuke Matsushima , Kensuke Demura
Abstract: According to one embodiment, a substrate treatment device includes a placement stand configured to rotate a substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a liquid supplier configured to supply a liquid on a surface of the substrate opposite to the placement stand side, a detector configured to detect a state of the liquid on the surface of the substrate, and a controller controlling at least one of a rotation speed of the substrate, a flow rate of the cooling gas, or a supply amount of the liquid. The controller sets the liquid on the surface of the substrate to be in a supercooled state, obtains a temperature of the liquid in the supercooled state at a start of freezing, and is configured to calculate a removal ratio of a contamination.
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公开(公告)号：US12097541B2
公开(公告)日：2024-09-24
申请号：US17469876
申请日：2021-09-09
Applicant: SHIBAURA MECHATRONICS CORPORATION
Inventor： Kensuke Demura , Daisuke Matsushima , Masaya Kamiya
IPC: B08B3/10 , B08B3/04 , B08B7/00 , B08B13/00 , H01L21/687
CPC classification number: B08B3/10 , B08B3/041 , B08B7/0092 , B08B13/00 , H01L21/6875
Abstract: A substrate processing apparatus according to an embodiment of the present disclosure includes a stage having a substantially disc-shaped form and including a hole in a center thereof; a roller that contacts a side surface of the stage and rotates the stage; a first liquid nozzle that supplies a first liquid to a first surface of the substrate; a first driver that moves a position of the first liquid nozzle; a second liquid nozzle that supplies a second liquid from the hole of the stage to a second surface of the substrate; a second driver that moves a position of the second liquid nozzle; a cooling nozzle that supplies a cooling gas from the hole of the stage to the second surface; a third driver that moves a position of the cooling nozzle; and a controller that controls the first driver, the second driver, and the third driver.
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Patent Agency Ranking
公开(公告)号：US10773425B2
公开(公告)日：2020-09-15
申请号：US15860044
申请日：2018-01-02
Inventor： Kensuke Demura , Satoshi Nakamura , Daisuke Matsushima , Masayuki Hatano , Hiroyuki Kashiwagi
Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.
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公开(公告)号：US20180117795A1
公开(公告)日：2018-05-03
申请号：US15860044
申请日：2018-01-02
Inventor： Kensuke DEMURA , Satoshi Nakamura , Daisuke Matsushima , Masayuki Hatano , Hiroyuki Kashiwagi
Abstract: According to one embodiment, an imprint template manufacturing apparatus includes: a supply head that supplies a liquid-repellent material in liquid form to a template having a convex portion where a concavo-convex pattern is formed on a stage; a moving mechanism that moves the stage and the supply head relatively in a direction along the stage; a controller that controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least a side surface of the convex portion so as to avoid the concavo-convex pattern; and a cleaning unit that supplies a liquid to the template coated with the liquid-repellent material. The liquid-repellent material contains a liquid-repellent component and a non-liquid-repellent component that react with the surface of the template, and a volatile solvent that dissolves the liquid-repellent component. The liquid is a fluorine-based volatile solvent that dissolves the non-liquid-repellent component.
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公开(公告)号：US20180047559A1
公开(公告)日：2018-02-15
申请号：US15671529
申请日：2017-08-08
Applicant: Shibaura Mechatronics Corporation
Inventor： Masaya Kamiya , Kensuke Demura , Daisuke Matsushima , Haruka Nakano , Ivan Petrov Ganachev
CPC classification number: H01L21/02052 , B08B3/10 , B08B7/0092 , G03F7/40 , G03F7/422 , H01L21/02057 , H01L21/67051 , H01L21/67109 , H01L21/67248 , H01L21/67253 , H01L21/68764 , H01L22/12
Abstract: A substrate treatment device according to an embodiment includes a placement portion on which a substrate is placed and rotated, a liquid supply portion which supplies a liquid to a surface on an opposite side to the placement portion of the substrate, a cooling portion which supplies a cooling gas to a surface on a side of the placement portion of the substrate, and a control portion which controls at least one of a rotation speed of the substrate, a supply amount of the liquid, and a flow rate of the cooling gas. The control portion brings the liquid present on a surface of the substrate into a supercooled state and causes at least a part of the liquid brought into the supercooled state to freeze.
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公开(公告)号：US20180015497A1
公开(公告)日：2018-01-18
申请号：US15717435
申请日：2017-09-27
Inventor： Satoshi Nakamura , Kensuke Demura , Daisuke Matsushima , Masayuki Hatano , Hiroyuki Kashiwagi
Abstract: According to one embodiment, an imprint template manufacturing apparatus includes a stage, a supply head, a moving mechanism, and a controller. The stage supports a template that includes a base having a main surface, and a convex portion provided on the main surface and having an end surface on a side opposite to the main surface. A concavo-convex pattern to be pressed against a liquid material to be transferred is formed on the end surface. The supply head supplies a liquid-repellent material in a liquid form to the template on the stage. The moving mechanism moves the stage and the supply head relative to each other in a direction along the stage. The controller controls the supply head and the moving mechanism such that the supply head applies the liquid-repellent material to at least the side surface of the convex portion so as to avoid the concavo-convex pattern.
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公开(公告)号：US09586391B2
公开(公告)日：2017-03-07
申请号：US14859627
申请日：2015-09-21
Applicant: Shibaura Mechatronics Corporation
Inventor： Konosuke Hayashi , Daisuke Matsushima
IPC: B32B41/00 , B23K20/02 , B23K20/233 , B23K20/24 , B23K20/26 , H01L21/67 , B32B37/10 , B32B37/18 , B32B37/00
CPC classification number: B32B41/00 , B23K20/02 , B23K20/233 , B23K20/24 , B23K20/26 , B23K2101/40 , B32B37/003 , B32B37/10 , B32B37/18 , B32B2309/72 , B32B2313/00 , B32B2315/08 , B32B2457/14 , H01L21/67092
Abstract: A bonding apparatus includes a substrate holder holding the second substrate; a pusher pushing a back surface of the second substrate; a substrate support unit including a support talon supporting a circumferential edge portion of the first substrate to oppose the second substrate with a prescribed spacing between the second substrate and the circumferential edge portion of the first substrate; and a controller controlling a lifting/lowering operation of the pusher. The pusher pushes one prescribed point of the back surface of the second substrate, the one prescribed point corresponding to a position where a distance between a bonding surface of the first substrate and a bonding surface of the second substrate is shorter than a distance from the circumferential edge portion of the bonding surface of the first substrate to the bonding surface of the second substrate.
Abstract translation: 接合装置包括保持第二基板的基板保持件; 推动第二基板的后表面的推动器; 基板支撑单元，其包括支撑爪，所述支撑爪支撑所述第一基板的周缘部分，以在所述第二基板与所述第一基板的周缘部之间以规定的间隔与所述第二基板相对; 以及控制推动器的升降操作的控制器。 推动器推动第二基板的背面的一个规定点，对应于第一基板的接合面和第二基板的接合面之间的距离比距离周向的距离短的位置的一个规定点 第一基板的接合表面的边缘部分到第二基板的接合表面。
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