公开(公告)号：US12051742B1

公开(公告)日：2024-07-30

申请号：US18577714

申请日：2022-12-29

Applicant: SOUTHEAST UNIVERSITY

Inventor： Long Zhang ,  Weifeng Sun ,  Siyang Liu ,  Jie Ma ,  Peigang Liu ,  Longxing Shi

IPC: H01L29/778 ,  H01L29/10 ,  H01L29/20 ,  H01L29/207 ,  H01L29/66

CPC classification number: H01L29/7787 ,  H01L29/1066 ,  H01L29/2003 ,  H01L29/207 ,  H01L29/66431 ,  H01L29/66462 ,  H01L29/7783

Abstract: An enhancement-mode N-channel and P-channel GaN device integration structure comprises a substrate, wherein an Al—N nucleating layer, an AlGaN buffer layer, a GaN channel layer and an AlGaN barrier layer are sequentially arranged on the substrate, and the AlGaN barrier layer and the GaN channel layer are divided by an isolation layer; a P-channel device is arranged on one side of the isolation layer and comprises a first P-GaN layer, a first GaN isolation layer and a first P+-GaN layer are sequentially arranged on the first P-GaN layer, a first source, a first gate and a first drain are arranged on the first P+-GaN layer, the first gate is inlaid in the first P+-GaN layer, and a gate dielectric layer is arranged between the first gate and the first P+-GaN layer; and an N-channel device is arranged on the other side of the isolation layer.

公开(公告)号：US12027516B1

公开(公告)日：2024-07-02

申请号：US18568277

申请日：2022-12-29

Applicant: SOUTHEAST UNIVERSITY

Inventor： Siyang Liu ,  Sheng Li ,  Chi Zhang ,  Weifeng Sun ,  Mengli Liu ,  Yanfeng Ma ,  Longxing Shi

IPC: H01L29/778 ,  H01L27/06 ,  H01L29/20 ,  H01L49/02

CPC classification number: H01L27/0629 ,  H01L28/20 ,  H01L29/2003 ,  H01L29/7786 ,  H01L29/7787

Abstract: A GaN power semiconductor device integrated with a self-feedback gate control structure comprises a substrate, a buffer layer, a channel layer and a barrier layer. A gate control area is formed by a first metal source electrode, a first P-type GaN cap layer, a first metal gate electrode, a first metal drain electrode, a second P-type GaN cap layer and a second metal gate electrode. An active working area is formed by the first metal source electrode, a third P-type GaN cap layer, a third metal gate electrode, a second metal drain electrode, the second P-type GaN cap layer and a second metal source electrode. The overall gate leaking current of the device is regulated by the gate control area, the integration level is high, the parasitic effect is small, and the charge-storage effect can be effectively relieved, thus improving the threshold stability of the device.

公开(公告)号：US12107167B2

公开(公告)日：2024-10-01

申请号：US17762929

申请日：2021-01-20

Applicant: SOUTHEAST UNIVERSITY

Inventor： Siyang Liu ,  Weifeng Sun ,  Chi Zhang ,  Shuxuan Xin ,  Shen Li ,  Le Qian ,  Chen Ge ,  Longxing Shi

IPC: H01L29/78 ,  H01L29/10 ,  H01L29/778 ,  H01L29/812

CPC classification number: H01L29/7851 ,  H01L29/1095 ,  H01L29/778 ,  H01L29/8122

Abstract: The present invention discloses a high-threshold power semiconductor device and a manufacturing method thereof. The high-threshold power semiconductor device includes, in sequence from bottom to top: a metal drain electrode, a substrate, a buffer layer, and a drift region; further including: a composite column body which is jointly formed by a drift region protrusion, a columnar p-region and a columnar n-region on the drift region, a channel layer, a passivation layer, a dielectric layer, a heavily doped semiconductor layer, a metal gate electrode and a source metal electrode. The composite column body is formed by sequentially depositing a p-type semiconductor layer and an n-type semiconductor layer on the drift region and then etching same. The channel layer and the passivation layer are formed in sequence by deposition. Thus, the above devices are divided into a cell region and a terminal region. The dielectric layer, the heavily doped semiconductor layer, the metal gate electrode and the source metal electrode only exist in the cell region, and the passivation layer of the terminal region extends upwards and is wrapped outside the channel layer. This structure can increase a threshold voltage of the device, improve the blocking characteristics of the device and reduce the size of a gate capacitance.

公开(公告)号：US09240469B2

公开(公告)日：2016-01-19

申请号：US14439715

申请日：2012-12-27

Applicant: SOUTHEAST UNIVERSITY

Inventor： Weifeng Sun ,  Jing Zhu ,  Shen Xu ,  Qinsong Qian ,  Siyang Liu ,  Shengli Lu ,  Longxing Shi

IPC: H01L29/66 ,  H01L29/739 ,  H01L29/06 ,  H01L29/49 ,  H01L29/10 ,  H01L29/08 ,  H01L23/528

CPC classification number: H01L29/7394 ,  H01L23/528 ,  H01L29/0611 ,  H01L29/0696 ,  H01L29/0808 ,  H01L29/0821 ,  H01L29/0847 ,  H01L29/1008 ,  H01L29/4916 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A transverse ultra-thin insulated gate bipolar transistor having current density includes: a P substrate, where the P substrate is provided with a buried oxide layer thereon, the buried oxide layer is provided with an N epitaxial layer thereon, the N epitaxial layer is provided with an N well region and P base region therein, the P base region is provided with a first P contact region and an N source region therein, the N well region is provided with an N buffer region therein, the N well region is provided with a field oxide layer thereon, the N buffer region is provided with a P drain region therein, the N epitaxial layer is provided therein with a P base region array including a P annular base region, the P base region array is located between the N well region and the P base region, the P annular base region is provided with a second P contact region and an N annular source region therein, and the second P contact region is located in the N annular source region. The present invention greatly increases current density of a transverse ultra-thin insulated gate bipolar transistor, thus significantly improving the performance of an intelligent power module.

Abstract translation: 具有电流密度的横向超薄绝缘栅双极晶体管包括：P基板，其中P基板在其上设置有掩埋氧化物层，所述掩埋氧化物层在其上设置有N外延层，提供N外延层 在其中具有N阱区域和P基极区域，P基极区域中设置有第一P接触区域和N源极区域，N阱区域中设置有N个缓冲区域，N阱区域设置有 在其上的场氧化物层，N缓冲区在其中设置有P漏极区，N外延层中设置有包括P环状基极区的P基区阵列，P基区阵列位于N阱之间 区域和P基区域中，P环状基部区域设置有第二P接触区域和N环状源极区域，第二P接触区域位于N环状源极区域中。 本发明大大增加了横向超薄绝缘栅双极晶体管的电流密度，从而显着提高了智能功率模块的性能。

公开(公告)号：US10056313B2

公开(公告)日：2018-08-21

申请号：US15576850

申请日：2016-01-29

Applicant: SOUTHEAST UNIVERSITY

Inventor： Siyang Liu ,  Ning Wang ,  Jiaxing Wei ,  Chao Liu ,  Weifeng Sun ,  Shengli Lu ,  Longxing Shi

IPC: H01L23/367 ,  H01L23/495 ,  H01L23/31 ,  H01L25/16 ,  H01L25/18 ,  H01L23/00

CPC classification number: H01L23/3675 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/367 ,  H01L23/4334 ,  H01L23/49503 ,  H01L23/49537 ,  H01L23/49541 ,  H01L23/49562 ,  H01L23/49568 ,  H01L23/49575 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L25/16 ,  H01L25/18 ,  H01L2224/29139 ,  H01L2224/32245 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48175 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2924/01079 ,  H01L2924/1306 ,  H01L2924/1426 ,  H01L2924/17738 ,  H01L2924/17747 ,  H01L2924/181 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2924/00

Abstract: A power module of a square flat pin-free packaging structure for suppressing the power module from being excessively high in local temperature. The power module includes an insulating resin, a driving chip, a plurality of power chips, and a plurality of metal electrode contacts. The driving chip, the power chips, and the metal electrode contacts are electrically connected through a metal lead according to a predetermined circuit. A plurality of metal heat dissipating disks used for heat dissipation of the power chips and a driving chip lead frame are disposed at the bottom of the insulating resin. A plurality of metal power chip lead frames are disposed on the metal heat dissipating disks, the power chips are disposed on the power chip lead frames, and the drain electrodes of the power chips are electrically connected to the metal heat dissipating disks.

公开(公告)号：US20140306266A1

公开(公告)日：2014-10-16

申请号：US14349632

申请日：2012-10-24

Applicant: SOUTHEAST UNIVERSITY

Inventor： Weifeng Sun ,  Siyang Liu ,  Jing Zhu ,  Qinsong Qian ,  Shen Xu ,  Shengli Lu ,  Longxing Shi

IPC: H01L29/739 ,  H01L27/12 ,  H01L27/06

CPC classification number: H01L29/7394 ,  H01L27/0623 ,  H01L27/1203 ,  H01L29/0638 ,  H01L29/404

Abstract: A high-current, N-type silicon-on-insulator lateral insulated-gate bipolar transistor, including: a P-type substrate, a buried-oxide layer disposed on the P-type substrate, an N-type epitaxial layer disposed on the oxide layer, and an N-type buffer trap region. A P-type body region and an N-type central buffer trap region are disposed inside the N-type epitaxial layer; a P-type drain region is disposed in the buffer trap region; N-type source regions and a P-type body contact region are disposed in the P-type body region; an N-type base region and a P-type emitter region are disposed in the buffer trap region; gate and field oxide layers are disposed on the N-type epitaxial layer; polycrystalline silicon gates are disposed on the gate oxide layers; and a passivation layer and metal layers are disposed on the surface of the symmetrical transistor. P-type emitter region output and current density are improved without increasing the area of the transistor.

Abstract translation: 一种高电流，N型绝缘体上的横向绝缘栅双极晶体管，包括：P型衬底，设置在P型衬底上的掩埋氧化物层，设置在P型衬底上的N型外延层 氧化物层和N型缓冲阱捕获区。 P型体区域和N型中央缓冲区捕获区域设置在N型外延层内部; P型漏极区域设置在缓冲陷阱区域中; N型源极区域和P型体接触区域设置在P型体区域中; N型基极区域和P型发射极区域设置在缓冲陷阱区域中; 栅极和场氧化物层设置在N型外延层上; 多晶硅栅极设置在栅极氧化物层上; 并且钝化层和金属层设置在对称晶体管的表面上。 改善P型发射极区域的输出和电流密度，而不增加晶体管的面积。