NON-VOLATILE MEMORY WITH DOUBLE CAPA IMPLANT
    11.
    发明申请

    公开(公告)号:US20200035304A1

    公开(公告)日:2020-01-30

    申请号:US16048524

    申请日:2018-07-30

    Abstract: An EEPROM includes a floating gate transistor having a source region, a channel region and a drain region. A first capa implant zone on a drain-side of the floating gate transistor has a first dopant concentration level. A second capa implant zone in the first capa implant zone adjacent the drain region has a second dopant concentration level that is greater than the first dopant concentration level. A gate oxide region insulates the floating gate electrode from the channel region, first capa implant zone and second capa implant zone. A thickness of the gate oxide region is thinner at the second capa implant zone than at the channel region and first capa implant zone.

    LATCH DEVICE, IN PARTICULAR FOR ROW DECODING AND COLUMN DECODING OF AN EEPROM MEMORY PLANE

    公开(公告)号:US20230402102A1

    公开(公告)日:2023-12-14

    申请号:US18324850

    申请日:2023-05-26

    CPC classification number: G11C16/12 G11C16/30 G11C16/08

    Abstract: The latch device includes an RS type latch flip-flop capable of being supplied between a first supply voltage and a second supply voltage which is lower than the first supply voltage and having first and second flip-flop inputs and a flip-flop output connected to the output terminal. A control module positions the latch flip-flop in a set state or in a reset state when the first supply voltage has a first value which is lower than the low voltage then, the latch flip-flop being positioned, confers the high voltage on the first supply voltage and the low voltage on the second supply voltage and outputs and maintains the high voltage or the low voltage on the flip-flop output while avoiding outputting a prohibited logic state at the two flip-flop inputs.

    NON-VOLATILE MEMORY
    14.
    发明申请

    公开(公告)号:US20220123119A1

    公开(公告)日:2022-04-21

    申请号:US17504198

    申请日:2021-10-18

    Abstract: A memory transistor for a non-volatile memory cell includes a source region and a drain region implanted in a semiconductor substrate. The source region is spaced from the drain region. A double gate region for the memory transistor extends at least partly in depth in the semiconductor substrate between the source region and the drain region and further extends beyond this source region and this drain region. The memory cell further includes a selection transistor having a gate region that partially extends over the double gate region for the memory transistor.

    TEST CIRCUIT
    15.
    发明申请

    公开(公告)号:US20220107356A1

    公开(公告)日:2022-04-07

    申请号:US17468377

    申请日:2021-09-07

    Abstract: A test circuit and a method for testing an integrated circuit are provided. The integrated circuit includes a test circuit. The test circuit includes a conductive track extending over at least a portion of the periphery of the integrated circuit, at least one component and an activation circuit adapted to deviating an input data signal into the conductive track during a test mode, and to transmitting the input data signal to the at least one component during a normal operating mode.

    MOS TRANSISTORS IN PARALLEL
    18.
    发明申请

    公开(公告)号:US20190057963A1

    公开(公告)日:2019-02-21

    申请号:US16053304

    申请日:2018-08-02

    Abstract: An electronic chip is provided that includes a plurality of first transistors electrically coupled to one another in parallel. A plurality of first isolating trenches is included in the electronic chip, and the first transistors are separated from one another by the first isolating trenches. Each of the first isolation trenches has a depth and a maximum width, and the depth depends on, or is a function of, the maximum width.

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