Abstract:
A display device includes a substrate including a display region including a plurality of pixels and a non-display region at one side of the display region; at least one transistor on the substrate; a light emitting element connected to the transistor; a thin film encapsulation layer covering the light emitting element; a plurality of light blocking patterns on the thin film encapsulation layer, the plurality of light blocking patterns corresponding to at least a portion of a non-emission region of each pixel, and a planarization layer covering the light blocking patterns; and a touch sensor including a plurality of touch electrodes on the planarization layer. None of the light blocking patterns overlap touch electrodes.
Abstract:
A display device may include a switching composite layer, a first electrode, a pixel defining layer, an emission layer, a second electrode, an encapsulation layer, a light blocking layer, and a touch sensor. The first electrode is positioned on the switching composite layer. The pixel defining layer covers an edge of the first electrode and has a first opening and a second opening that are spaced from each other. The emission layer is positioned inside the first opening. The second electrode covers the switching composite layer, the pixel defining layer, and the emission layer. The encapsulation layer covers the second electrode. The light blocking layer is positioned on the encapsulation layer. The touch sensor is positioned on the light blocking layer and includes a sensing electrode set. A material portion is positioned inside the second opening of the pixel defining layer and overlaps the sensing electrode set.
Abstract:
A method of manufacturing a display device, the method including: forming, on a first surface of a substrate, a gate line and a gate electrode; forming a first dielectric layer on the gate line and the gate electrode; forming a data line, a source electrode and a drain electrode on the first dielectric layer; forming a black matrix layer on the first dielectric layer, the data line, the source electrode, and the drain electrode; radiating ultraviolet light on a second surface of the substrate opposing the first surface, the ultraviolet light developing exposed parts of the black matrix layer to form a black matrix pattern; and etching the first dielectric layer using the black matrix pattern as an etching mask to respectively form a first dielectric pattern on the gate line and a gate dielectric pattern on the gate electrode.
Abstract:
A pattern mask for patterning a thin film includes a transparent or translucent substrate with a plurality of grooves formed thereon having a pitch of about 4.6 μm to about 10.8 μm.
Abstract:
A display device includes a substrate including a display area and a non-display area surrounding the display area, a light emitting structure disposed on the substrate in the display area, a thin film encapsulation layer disposed on the light emitting structure, an optical structure including a first refractive pattern and a second refractive pattern, and a partition wall disposed on the substrate in the non-display area and surrounding the second refractive pattern. The first refractive pattern is disposed on the thin film encapsulation layer, and overlaps the light emitting structure. The second refractive pattern covers the first refractive pattern, has a refractive index smaller than a refractive index of the first refractive pattern, and includes an organic material.
Abstract:
A display device according to an embodiment includes a transistor positioned on a substrate; a first electrode electrically connected to the transistor; an emission layer positioned on the first electrode; a second electrode positioned on the emission layer; and a pattern part spaced apart from the first electrode. The pattern part includes a photosensitive pattern layer made of a photosensitive resin.
Abstract:
An organic light-emitting display device including: a substrate; a pixel electrode on the substrate; a pixel defining film on the pixel electrode and having a first opening at least partially exposing the pixel electrode; an organic light-emitting layer on the exposed portion of the pixel electrode; a common electrode on the organic light-emitting layer and the pixel defining film; an encapsulation layer on the common electrode; a black matrix on the encapsulation layer and having a second opening overlapping the first opening; and a plurality of first sensing lines on the black matrix and surrounding the pixel electrode in a plan view to define a pixel region. At least portions of the first sensing lines defining the pixel region do not overlap the common electrode in the pixel region to reduce the common electrode's influence on the touch sensing lines and improve touch sensitivity.
Abstract:
A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.
Abstract:
A positive photosensitive siloxane resin composition includes a) a siloxane copolymer obtained by performing hydrolysis and condensation polymerization of i) at least one reactive silane represented by the following Chemical Formula 1 and ii) at least one 4-functional reactive silane represented by the following Chemical Formula 2 under a catalyst, the copolymer having a polystyrene-converted weight average molecular weight Mw of 1,000 to 20,000, b) a 1,2-quinonediazide compound, and c) a solvent, (R1)nSi(R2)4-n [Chemical Formula 1] Si(R3)4 [Chemical Formula 2] wherein R1s may each independently be any one of an alkyl group having 1 to 10 carbon atoms and an aryl group having 6 to 15 carbon atoms, R2 may be an alkoxy group having 1 to 4 carbon atoms, phenoxy, or acetoxy, R3s may each independently be any one of an alkoxy group having 1 to 4 carbon atoms, phenoxy, or an acetoxy group, and n may be a natural number of 1 to 3.
Abstract:
An optical mask for forming a pattern is provided. The optical mask includes: a substrate including a light blocking pattern formed on portions of the substrate, wherein the light blocking pattern includes a halftone layer and a light blocking layer formed on the halftone layer, and the halftone layer and the light blocking layer overlap such that at least an edge portion of the halftone layer is exposed. A pitch of the light blocking pattern may about 6 μm, and a transmission ratio of the halftone layer may range from about 10% to about 50%.