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    DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME
    11.
    发明申请
    DISPLAY DEVICE AND METHOD OF FABRICATING THE SAME 有权
    显示装置及其制造方法

    公开(公告)号：US20150187802A1

    公开(公告)日：2015-07-02

    申请号：US14451251

    申请日：2014-08-04

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jung-Soo Lee ,  Jung suk Bang ,  JeongMin Park ,  Jinho Ju

    IPC: H01L27/12 ,  H01L21/3105 ,  H01L21/311

    CPC classification number: H01L27/1288 ,  H01L21/31144 ,  H01L27/124 ,  H01L27/1248 ,  H01L29/78633

    Abstract: A display device and method of fabricating the same are disclosed. In one aspect, the display device includes a substrate, a black matrix formed over the substrate, and a transparent electrode formed over the substrate. The black matrix and the transparent electrode have first and second areas, respectively. The sum of the first and second areas is substantially equal to the surface area of the substrate.

    Abstract translation: 公开了一种显示装置及其制造方法。 一方面，显示装置包括基板，形成在基板上的黑矩阵，以及形成在基板上的透明电极。 黑矩阵和透明电极分别具有第一和第二区域。 第一和第二区域的总和基本上等于衬底的表面积。

    MASK FOR EXPOSURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING DISPLAY PANEL USING THE MASK
    12.
    发明申请
    MASK FOR EXPOSURE, METHOD OF FABRICATING THE SAME, AND METHOD OF FABRICATING DISPLAY PANEL USING THE MASK 审中-公开
    曝光掩模，其制造方法以及使用掩模制作显示面板的方法

    公开(公告)号：US20150064857A1

    公开(公告)日：2015-03-05

    申请号：US14224284

    申请日：2014-03-25

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： MIN KANG ,  Hyunjoo Lee ,  Bong-Yeon Kim ,  DongEon Lee ,  Yong Son ,  Junhyuk Woo ,  Jinho Ju

    IPC: G03F1/26 ,  H01L21/033 ,  H01L27/12

    CPC classification number: G03F1/26 ,  G03F1/32 ,  H01L27/1288

    Abstract: A mask for etching a target layer includes a mask substrate. A phase inversion layer is disposed to correspond to a non-etched area of a pattern target layer. The phase inversion layer is configured to generate inverted light by inverting a phase of incident light and to transmit the inverted light to the non-etched area of a pattern target layer. An inversion offset part is disposed in a center part of the phase inversion layer. The inversion offset part is configured to generate offset light causing destructive interference with the inverted light in the non-etched area and to provide the offset light to the non-etched area.

    Abstract translation: 用于蚀刻目标层的掩模包括掩模基板。 相位反转层设置成对应于图案目标层的未蚀刻区域。 相位反转层被配置为通过反射入射光的相位并将反射的光传输到图案目标层的未蚀刻区域来产生反相光。 反转偏移部分设置在相位反转层的中心部分。 反转偏移部分被配置为产生偏移光，其对非蚀刻区域中的反射光产生相消干涉并且向非蚀刻区域提供偏移光。

    DISPLAY DEVICE
    15.
    发明申请
    DISPLAY DEVICE 审中-公开

    公开(公告)号：US20190237521A1

    公开(公告)日：2019-08-01

    申请号：US16215462

    申请日：2018-12-10

    Applicant: Samsung Display Co., Ltd.

    Inventor： Jinho Ju

    IPC: H01L27/32 ,  H01L51/52 ,  G06K9/00

    CPC classification number: H01L27/3234 ,  G06K9/0004 ,  H01L27/14678 ,  H01L27/323 ,  H01L27/3244 ,  H01L51/5253 ,  H01L51/5281 ,  H01L51/5284

    Abstract: A display device includes: a substrate on which a plurality of sub-pixels are arranged; a light-emitting device including a light-emitting layer in each of the plurality of sub-pixels; a thin film encapsulation layer covering the light-emitting layer in each of the plurality of sub-pixels; a black matrix around the plurality of sub-pixels; and an optical sensor on the substrate, the optical sensor including a sensing portion for sensing light emitted from a light source, wherein the black matrix has a plurality of openings, through which light emitted from the light source passes, in a path through which the light is received by the sensing portion via an input object which is in contact with the substrate.

    Display panel and method of manufacturing the same
    17.
    发明授权
    Display panel and method of manufacturing the same 有权
    显示面板及其制造方法

    公开(公告)号：US09431437B2

    公开(公告)日：2016-08-30

    申请号：US14188959

    申请日：2014-02-25

    Applicant: Samsung Display Co., Ltd.

    Inventor： Yang-Ho Jung ,  SeungBo Shim ,  Jinho Ju ,  Junhong Park

    IPC: H01L21/00 ,  H01L27/12

    CPC classification number: H01L27/1288

    Abstract: A display panel includes a gate electrode and a gate line on a substrate, a gate insulating layer and an active layer sequentially on the gate electrode and the gate line, a planarization layer which is on the substrate and compensates for a step difference between the substrate, and the gate electrode and the gate line, respectively, source and drain electrodes on the active layer overlapping the gate electrode and spaced apart from each other, a data line on the active layer and crossing the gate line, a protective layer which covers the planarization layer, the source and drain electrodes, and the data line, a contact hole defined in the planarization layer and partially exposing the drain electrode, and a pixel electrode on the protective layer and electrically connected to the drain electrode through the contact hole.

    Abstract translation: 显示面板包括在基板上的栅极电极和栅极线，栅极绝缘层和有源层，顺序地在栅极电极和栅极线上，平坦化层，其位于基板上，并补偿基板之间的台阶差 ，栅极电极和栅极线分别与有源层上的源电极和漏电极重叠在栅电极上并彼此间隔开，有源层上的数据线并与栅极线交叉，保护层覆盖 平坦化层，源极和漏极以及数据线，界定在平坦化层中并部分地暴露漏电极的接触孔以及保护层上的像素电极，并通过接触孔电连接到漏电极。

    PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME
    18.
    发明申请
    PHASE SHIFT MASK AND METHOD OF FORMING PATTERNS USING THE SAME 有权
    相移片掩模和使用其形成图案的方法

    公开(公告)号：US20150293438A1

    公开(公告)日：2015-10-15

    申请号：US14604459

    申请日：2015-01-23

    Applicant: SAMSUNG DISPLAY CO., LTD.

    Inventor： DongEon Lee ,  Min Kang ,  Bong Yeon Kim ,  Yong Son ,  Junhyuk Woo ,  Hyunjoo Lee ,  Jinho Ju

    IPC: G03F1/26

    CPC classification number: G03F1/30 ,  G03F1/26 ,  G03F7/2002 ,  G03F7/2008 ,  G03F7/70191 ,  G03F7/70283 ,  G03F9/7003 ,  G03F9/7007

    Abstract: A method of forming a pattern includes: preparing a target substrate including a photoresist layer on a base substrate; aligning a phase shift mask to the target substrate, the phase shift mask including a mask substrate comparted into a first region including a first sub region and second sub regions at sides of the first sub region, and second regions at sides of the first region, the phase shift mask including a phase shift layer on the mask substrate corresponding to the first region; fully exposing the photoresist layer at the first sub region and the second regions by utilizing the phase shift mask; and removing the photoresist layer at the first sub region and the second regions to form first and second photoresist patterns corresponding to the second sub regions. Transmittance of the phase shift layer is selected to fully expose the photoresist layer in the first sub region.

    Abstract translation: 形成图案的方法包括：在基底基板上制备包括光致抗蚀剂层的目标基板; 将相移掩模对准目标衬底，所述相移掩模包括掩模衬底，所述掩模衬底分别包括在所述第一子区域的侧面处包括第一子区域和第二子区域的第一区域，以及所述第一区域的侧面处的第二区域， 所述相移掩模包括对应于所述第一区域的所述掩模基板上的相移层; 通过利用相移掩模使第一子区和第二区的光致抗蚀剂层完全曝光; 以及去除所述第一子区域和所述第二区域处的所述光致抗蚀剂层，以形成对应于所述第二子区域的第一和第二光致抗蚀剂图案。 选择相移层的透射率以完全暴露第一子区域中的光致抗蚀剂层。

    DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
    19.
    发明申请
    DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME 有权
    显示装置及其制造方法

    公开(公告)号：US20150198853A1

    公开(公告)日：2015-07-16

    申请号：US14572091

    申请日：2014-12-16

    Applicant: Samsung Display Co., Ltd.

    Inventor： Joonyong Park ,  Hyang-Shik Kong ,  Kyungseop Kim ,  Changoh Jeong ,  Hoon Kang ,  Jinho Ju

    IPC: G02F1/1362 ,  H01L27/12 ,  G02F1/1368

    CPC classification number: H01L27/1259 ,  G02F1/133502 ,  G02F1/1362 ,  H01L27/124

    Abstract: A display apparatus includes a first substrate to be exposed to external light; a second substrate opposing the first substrate; a gate line arranged over the first substrate such that the gate line is located between the first and second substrates; and an anti-reflective layer. The anti-reflective layer is arranged between the first substrate and the gate line. The anti-reflective layer includes an organic layer and an inorganic layer, and the organic layer includes a light absorber configured to absorb light. The inorganic layer overlaps with the organic layer and has a refractive index smaller than that of the gate line.

    Abstract translation: 一种显示装置，包括：暴露于外部光的第一基板; 与所述第一基板相对的第二基板; 栅极线，布置在第一基板上，使得栅极线位于第一和第二基板之间; 和抗反射层。 抗反射层设置在第一基板和栅极线之间。 抗反射层包括有机层和无机层，有机层包括吸收光的光吸收体。 无机层与有机层重叠，折射率小于栅极线的折射率。

    Photoresist composition and method of manufacturing display device using same
    20.
    发明授权
    Photoresist composition and method of manufacturing display device using same 有权
    光刻胶组合物及使用其的显示装置的制造方法

    公开(公告)号：US08927189B2

    公开(公告)日：2015-01-06

    申请号：US13961458

    申请日：2013-08-07

    Applicant: Samsung Display Co., Ltd.

    Inventor： Gwui-Hyun Park ,  Pil Soon Hong ,  Jinho Ju ,  Taegyun Kim ,  Jin-Su Byun ,  Dong Min Kim ,  Seung Ki Kim ,  Doo Youn Lee

    IPC: G03F7/023 ,  G03F7/30 ,  H01L21/312 ,  G03F7/008 ,  G03F7/20

    CPC classification number: G03F7/0085 ,  G03F7/0007 ,  G03F7/0048 ,  G03F7/022 ,  G03F7/0236 ,  G03F7/20 ,  G03F7/30 ,  H01L21/312

    Abstract: A photoresist composition including a binder resin including a novolac resin represented by Chemical Formula 1, a diazide photosensitive initiator, and a solvent including a base solvent and an auxiliary solvent, wherein the base solvent includes propylene glycol monomethyl ether acetate, and the auxiliary solvent includes dimethyl-2-methylglutarate and ethyl beta-ethoxypropionate, wherein in Chemical Formula 1, R1 to R9 are each independently a hydrogen atom or an alkyl group, “a” is an integer number from 0 through 10, “b” is an integer number from 0 through 100, and “c” is an integer number from 1 through 10.

    Abstract translation: 一种光致抗蚀剂组合物，其包含粘合剂树脂，其包含由化学式1表示的酚醛清漆树脂，二叠氮基感光引发剂和包含碱溶剂和辅助溶剂的溶剂，其中所述基础溶剂包括丙二醇单甲醚乙酸酯，并且所述辅助溶剂包括 二甲基-2-甲基戊二酸酯和β-乙氧基丙酸乙酯，其中在化学式1中，R 1至R 9各自独立地为氢原子或烷基，“a”为0至10的整数，“b”为整数 从0到100，“c”是从1到10的整数。

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