Loadlock apparatus and substrate processing apparatus including the same

    公开(公告)号:US12264747B2

    公开(公告)日:2025-04-01

    申请号:US17724214

    申请日:2022-04-19

    Abstract: A loadlock apparatus includes a loadlock chamber including a first opening and a second opening separated in a vertical direction; a first slit valve including a first valve plate configured to move between a first open position where the first opening is open and a first closed position where the first opening is closed, the first open position being a position moved downward from the first closed position; and a second slit valve including a second valve plate configured to move between a second open position where the second opening is open and a second closed position where the second opening is closed, the second open position being a position moved upward from the second closed position.

    SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS
    14.
    发明公开

    公开(公告)号:US20230230865A1

    公开(公告)日:2023-07-20

    申请号:US18062285

    申请日:2022-12-06

    Abstract: A semiconductor substrate processing apparatus includes a substrate transfer module including a chamber having an internal space extending in a first direction within the chamber, at least one pair of first load ports at opposite sides of the chamber, to face in a second direction intersecting the first direction, and configured to rotate and move a substrate carrier, a load lock at a rear surface of the chamber, and a robot arm configured to move in the first direction in the internal space of the chamber, a transfer chamber connected to the load lock of the substrate transfer module, a plurality of processing chambers connected to the transfer chamber, and a transfer arm inside the transfer chamber, and configured to unload the semiconductor substrate from the load lock and to load the semiconductor substrate into at least one of the plurality of processing chambers.

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