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公开(公告)号:US20240243104A1
公开(公告)日:2024-07-18
申请号:US18513863
申请日:2023-11-20
Applicant: Samsung Electronics Co., Ltd.
Inventor: Seunghoon Yeon , Seungryong Oh , Junho Lee
IPC: H01L25/065 , H01L23/00 , H01L23/31
CPC classification number: H01L25/0657 , H01L23/3107 , H01L24/13 , H01L24/16 , H01L24/32 , H01L24/73 , H01L2224/1357 , H01L2224/16148 , H01L2224/16227 , H01L2224/32145 , H01L2224/32225 , H01L2224/73204 , H01L2225/06513 , H01L2225/06541 , H01L2924/1431 , H01L2924/1436 , H01L2924/1437 , H01L2924/1438
Abstract: A semiconductor package includes a first semiconductor chip and a second semiconductor chip. The first semiconductor chip includes a plurality of electrode bundles arranged in an array in a first substrate and each having a plurality of through electrodes penetrating the first substrate, a backside insulating layer on a backside surface of the first substrate through which end portions of the through electrodes are exposed, and a plurality of electrode pads respectively provided on the electrode bundles. The backside insulating layer has a first trench formed between the through electrodes of a first electrode bundle. A first electrode pad is disposed on the through electrodes of a first electrode bundle and includes a protruding portion that fills the first trench of the backside insulating layer.
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公开(公告)号:US11990452B2
公开(公告)日:2024-05-21
申请号:US18120587
申请日:2023-03-13
Applicant: Samsung Electronics Co., Ltd.
Inventor: Namhoon Kim , Chajea Jo , Ohguk Kwon , Hyoeun Kim , Seunghoon Yeon
IPC: H01L25/065 , H01L23/00
CPC classification number: H01L25/0657 , H01L24/02 , H01L25/0652 , H01L2224/02372 , H01L2225/06513 , H01L2225/06541 , H01L2225/06586 , H01L2225/06589 , H01L2924/18161
Abstract: A semiconductor package includes a first semiconductor chip comprising a semiconductor substrate and a redistribution pattern on a top surface of the semiconductor substrate, the redistribution pattern having a hole exposing an inner sidewall of the redistribution pattern, a second semiconductor chip on a top surface of the first semiconductor chip, and a bump structure disposed between the first semiconductor chip and the second semiconductor chip. The bump structure is disposed in the hole and is in contact with the inner sidewall of the redistribution pattern.
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公开(公告)号:US11887913B2
公开(公告)日:2024-01-30
申请号:US18066487
申请日:2022-12-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Chajea Jo , Ohguk Kwon , Namhoon Kim , Hyoeun Kim , Seunghoon Yeon
IPC: H01L23/48 , H01L25/065 , H01L21/768 , H01L23/00
CPC classification number: H01L23/481 , H01L21/76898 , H01L23/562 , H01L24/05 , H01L24/13 , H01L25/0652 , H01L2224/05008 , H01L2224/05025 , H01L2224/13026 , H01L2225/06513 , H01L2225/06541 , H01L2225/06586 , H01L2225/06589 , H01L2924/351
Abstract: An integrated circuit device includes a semiconductor substrate, first through-silicon-via (TSV) structures penetrating a first region of the semiconductor substrate and spaced apart from each other by a first pitch, a first individual device between the first TSV structures and spaced apart from the first TSV structures by a distance that is greater than a first keep-off distance, and second TSV structures penetrating a second region of the semiconductor substrate and spaced apart from each other by a second pitch that is less than the first pitch. The second region of the semiconductor device does not include an individual device that is homogeneous with the first individual device and between the second TSV structures.
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公开(公告)号:US11869818B2
公开(公告)日:2024-01-09
申请号:US17733411
申请日:2022-04-29
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyoeun Kim , Yonghoe Cho , Sunkyoung Seo , Seunghoon Yeon , Sanguk Han
CPC classification number: H01L22/32 , G01R27/2605 , G01R31/2818 , H01L22/14 , H01L23/3128 , H01L24/94 , H01L25/0657 , H01L25/50 , H01L2225/06513
Abstract: A chip-stacked semiconductor package includes a first chip including a first detection pad and a second detection pad; a second chip provided on the first chip, the second chip including a third detection pad facing the first detection pad and a fourth detection pad facing the second detection pad; and a first medium provided between the first detection pad and the third detection pad to connect the first detection pad to the third detection pad through the first medium, and a second medium, different from the first medium, provided between the second detection pad and the fourth detection pad to connect the second detection pad to the fourth detection pad through the second medium.
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公开(公告)号:US11569201B2
公开(公告)日:2023-01-31
申请号:US17509750
申请日:2021-10-25
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyoeun Kim , Ji Hwang Kim , Jisun Yang , Seunghoon Yeon , Chajea Jo , Sang-Uk Han
IPC: H01L25/065 , H01L23/00 , H01L23/538
Abstract: A semiconductor package includes a first semiconductor chip, a second semiconductor chip on the first semiconductor chip, a first semiconductor structure and a second semiconductor structure that are on the first semiconductor chip and spaced apart from each other across the second semiconductor chip, and a resin-containing member between the second semiconductor chip and the first semiconductor structure and between the second semiconductor chip and the second semiconductor structure. The semiconductor package may be fabricated at a wafer level.
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公开(公告)号:US11552037B2
公开(公告)日:2023-01-10
申请号:US17193435
申请日:2021-03-05
Applicant: Samsung Electronics Co., Ltd.
Inventor: Namhoon Kim , Seunghoon Yeon , Yonghoe Cho
IPC: H01L23/00
Abstract: Disclosed is a semiconductor package comprising a redistribution substrate, a semiconductor chip on the redistribution substrate and including a chip pad electrically connected to the redistribution substrate, and a conductive terminal on the redistribution substrate. The redistribution substrate includes a first dielectric layer, a first redistribution pattern, a second dielectric layer, a second redistribution pattern, and a first insulative pattern. The first redistribution pattern electrically connects the chip pad and the second redistribution pattern. The first insulative pattern has a first surface in contact with the first redistribution pattern and a second surface in contact with the second redistribution pattern. The second surface is opposite to the first surface. A width at the first surface of the first insulative pattern is the same as or greater than a width at the second surface of the first insulative pattern.
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公开(公告)号:US11545417B2
公开(公告)日:2023-01-03
申请号:US17162418
申请日:2021-01-29
Applicant: Samsung Electronics Co., Ltd.
Inventor: Chajea Jo , Ohguk Kwon , Namhoon Kim , Hyoeun Kim , Seunghoon Yeon
IPC: H01L23/48 , H01L25/065 , H01L21/768 , H01L23/00
Abstract: An integrated circuit device includes a semiconductor substrate, first through-silicon-via (TSV) structures penetrating a first region of the semiconductor substrate and spaced apart from each other by a first pitch, a first individual device between the first TSV structures and spaced apart from the first TSV structures by a distance that is greater than a first keep-off distance, and second TSV structures penetrating a second region of the semiconductor substrate and spaced apart from each other by a second pitch that is less than the first pitch. The second region of the semiconductor device does not include an individual device that is homogeneous with the first individual device and between the second TSV structures.
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