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公开(公告)号:US5838096A
公开(公告)日:1998-11-17
申请号:US679727
申请日:1996-07-12
CPC分类号: H01J1/15
摘要: A cathode includes a hairpin type filament made of a refractory metal such as W, Mo or Re; a single crystal needle, made of a refractory metal such as W, Mo or Re joined to the filament; and a reservoir formed by applying a slurry of a powder of a metal or metal compound and an organic solvent containing nitrocellulose in the vicinity of a junction between the single crystal needle and the filament. The powder for a reservoir is made of a metal lower than the single crystal needle in a work function or electron affinity, such as Ti, Zr, Hf, Y, Th, Sc or Se, or a compound thereof.
摘要翻译: 阴极包括由难熔金属如W,Mo或Re制成的发夹型长丝; 由诸如W,Mo或Re的难熔金属制成的单晶针连接到灯丝上; 以及通过在单晶针和丝之间的接合处附近施加金属或金属化合物的粉末和含有硝化纤维素的有机溶剂的浆料形成的储存器。 用于储存器的粉末以比单晶针低的金属,例如Ti,Zr,Hf,Y,Th,Sc或Se或它们的化合物在功函数或电子亲和力下制成。
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公开(公告)号:US5160884A
公开(公告)日:1992-11-03
申请号:US647423
申请日:1991-01-29
IPC分类号: G01R31/302 , G01Q30/04 , G01R31/305 , H01J37/28
CPC分类号: G01R31/305
摘要: A charged particle beam device radiates a primary charged particle beam of pulse form on a surface of a specimen, once in each clock period, in synchronism with a clock signal that determines an operating period of an internal operating signal of the specimen. A secondary electron or a reflected electron is detected after it is emitted from the surface of the specimen when the primary charged particle beam of pulse form is irradiated. Each detected signal pulse which is generated from the detecting means once in each period of said clock is sampled at two or more positions in a range including the peak value, and data which correspond to the sum or the averaged value calculated from the sampling values of a plurality of the positions are formed. An internal operating signal waveform of said specimen is displayed by using the data, and therefore the internal operating signal waveform of the specimen can be observed and measured with high measuring accuracy and with high efficiency.
摘要翻译: 带电粒子束装置在每个时钟周期内,与确定样本的内部操作信号的操作周期的时钟信号同步地,在试样的表面上辐射脉冲形式的初级带电粒子束。 当照射脉冲形式的初级带电粒子束后,从样品表面发射二次电子或反射电子。 在所述时钟的每个周期中从检测装置产生的每个检测到的信号脉冲在包括峰值的范围内的两个或更多个位置被采样,并且对应于从根据 形成多个位置。 通过使用该数据显示所述样本的内部操作信号波形,因此可以以高测量精度和高效率观察和测量样本的内部操作信号波形。
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公开(公告)号:US4868394A
公开(公告)日:1989-09-19
申请号:US248378
申请日:1988-09-23
IPC分类号: H01J43/24 , G01Q30/02 , G01Q90/00 , G01R31/305 , H01J37/244
CPC分类号: H01J37/244 , G01R31/305 , H01J2237/24435 , H01J2237/24465 , H01J2237/2448 , H01J2237/2449 , H01J2237/24507 , H01J2237/24564
摘要: A charged particle detector comprises a micro-channel plate for detecting charged particles secondarily generated from a specimen irradiated with a narrowly defined beam of charged particles, a signal outputting circuit for transmitting therein a signal detected by the micro-channel plate and then outputting the signal, and a processing circuit for simultaneously outputting signals of secondary charged particles generated from the specimen at the same instant of time. Preferably, the processing circuit is constructed by a vortex-shaped electrode or the combination of concentric electrode segments and delaying elements.
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14.
公开(公告)号:US07232996B2
公开(公告)日:2007-06-19
申请号:US11319279
申请日:2005-12-29
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: H01J37/28
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译: 通过提供新颖的检查方法和采用这种新方法的检测装置,本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置,该方法能够提高扫描样本的速度 作为半导体晶片。 本发明提供的检验新颖方法包括以下步骤:产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子,并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。
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15.
公开(公告)号:US08134125B2
公开(公告)日:2012-03-13
申请号:US12211343
申请日:2008-09-16
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: H01J37/28
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer.The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译: 通过提供新颖的检查方法和采用这种新方法的检测装置,本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置,该方法能够提高扫描样本的速度 作为半导体晶片。 本发明提供的检验新颖方法包括以下步骤:产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子,并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。
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公开(公告)号:US20070215803A1
公开(公告)日:2007-09-20
申请号:US11798239
申请日:2007-05-11
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: G01N23/00
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
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公开(公告)号:US20060151699A1
公开(公告)日:2006-07-13
申请号:US11319279
申请日:2005-12-29
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: G21K7/00
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
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18.
公开(公告)号:US20050205782A1
公开(公告)日:2005-09-22
申请号:US11108877
申请日:2005-04-19
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: G01Q30/02 , G01N23/00 , G01N23/20 , G01N23/225 , G21K1/08 , G21K7/00 , H01J37/22 , H01J37/244 , H01J37/256 , H01J37/28 , H01L21/66
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译: 通过提供新颖的检查方法和采用这种新方法的检测装置,本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置,该方法能够提高扫描样本的速度 作为半导体晶片。 本发明提供的检验新颖方法包括以下步骤:产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子,并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。
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19.
公开(公告)号:US06452178B2
公开(公告)日:2002-09-17
申请号:US09883184
申请日:2001-06-19
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: H01J3728
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The inspection novel method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译: 通过提供新颖的检查方法和采用这种新方法的检测装置,本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置,该方法能够提高扫描样本的速度 作为半导体晶片。本发明提供的检测新颖方法包括以下步骤:产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子,并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。
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20.
公开(公告)号:US06348690B1
公开(公告)日:2002-02-19
申请号:US09131383
申请日:1998-08-07
申请人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
发明人: Yuko Iwabuchi , Hideo Todokoro , Hiroyoshi Mori , Mitsugu Sato , Yasutsugu Usami , Mikio Ichihashi , Satoru Fukuhara , Hiroyuki Shinada , Yutaka Kaneko , Katsuya Sugiyama , Atsuko Takafuji , Hiroshi Toyama
IPC分类号: H01J37256
CPC分类号: H01J37/28 , G01N23/20 , G01N23/2251 , G03F7/7065 , G06T7/001 , G06T2207/10056 , G06T2207/30148 , H01J37/04 , H01J37/20 , H01J37/265 , H01J2237/04756 , H01J2237/20221 , H01J2237/2444 , H01J2237/24592 , H01J2237/2817 , H01J2237/31766
摘要: Problems encountered in the conventional inspection method and the conventional apparatus adopting the method are solved by the present invention using an electron beam by providing a novel inspection method and an inspection apparatus adopting the novel method which are capable of increasing the speed to scan a specimen such as a semiconductor wafer. The novel inspection method provided by the present invention comprises the steps of: generating an electron beam; converging the generated electron beam on a specimen by using an objective lens; scanning the specimen by using the converged electron beam; continuously moving the specimen during scanning; detecting charged particles emanating from the specimen at a location between the specimen and the objective lens and converting the detected charged particles into an electrical signal; storing picture information conveyed by the electrical signal; comparing a picture with another by using the stored picture information; and detecting a defect of the specimen.
摘要翻译: 通过提供新颖的检查方法和采用这种新方法的检测装置,本发明通过使用电子束的本发明解决了常规检查方法中遇到的问题和采用该方法的传统装置,该方法能够提高扫描样本的速度 作为半导体晶片。 本发明提供的新型检验方法包括以下步骤:产生电子束; 通过使用物镜将生成的电子束会聚在样品上; 使用会聚电子束扫描样品; 扫描期间连续移动样品; 检测在样本和物镜之间的位置处从样本发出的带电粒子,并将检测到的带电粒子转换成电信号; 存储由电信号传送的图像信息; 通过使用所存储的图像信息将图像与另一图像进行比较; 并检测样本的缺陷。
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