公开(公告)号：US07714995B2

公开(公告)日：2010-05-11

申请号：US11681129

申请日：2007-03-01

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01N21/00

CPC classification number: G01N21/9501 ,  G01B11/0616 ,  G01B11/303 ,  G01B11/306 ,  G01N21/95607

Abstract: A material independent profiler system and method for measuring a slope on the surface of an object such as a thin film disk, a silicon wafer, or a glass substrate is disclosed. In one embodiment, the system comprises an electromagnetic energy source to generate a beam of electromagnetic energy, a polarizer to polarize the beam of electromagnetic energy into a first component having a first polarization orientation and a second component having a second polarization orientation, a radiation targeting assembly to direct the first component onto the surface in a first direction and a first plane of orientation, direct the second component onto the surface in a second direction and a second plane of orientation, wherein the second direction is opposite the first direction, a radiation detector assembly to generate a first signal from a portion of the first component reflected from the surface, generate a second signal from a portion of the second component reflected from the surface, and a processor to generate a surface measurement from the first signal and the second signal.

Abstract translation: 公开了一种用于测量诸如薄膜盘，硅晶片或玻璃基板的物体表面上的斜率的材料独立的轮廓仪系统和方法。 在一个实施例中，系统包括产生电磁能束的电磁能源，将电磁能束偏振成具有第一极化取向的第一部件和具有第二极化取向的第二部件的偏振器， 组件，以将第一组分沿第一方向和第一取向平面引导到表面上，将第二组分沿第二方向和第二取向平面引导到表面上，其中第二方向与第一方向相反，辐射 检测器组件以从所述表面反射的所述第一分量的一部分产生第一信号，从所述表面反射的所述第二分量的一部分产生第二信号，以及处理器，用于从所述第一信号和所述第二信号产生表面测量值 信号。

公开(公告)号：US07688435B2

公开(公告)日：2010-03-30

申请号：US11485798

申请日：2006-07-13

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01N21/00

CPC classification number: G01N21/47 ,  G01B11/306 ,  G01N21/9501

Abstract: Scratches, pits and particles which are smaller or larger than the beam size may be measured and identified by a single and dual multiple beam techniques. In one embodiment, this the invention uses a pair of orthogonally oriented white light beams, one in the radial and one in the circumferential direction. The scattered light from the radial and circumferential beams allows the detection and classification of particles, pits and scratches. In other embodiments, single beam techniques are used to classify radial and circumferential defects.

Abstract translation: 小于或大于光束尺寸的划痕，凹坑和颗粒可以通过单和双重多光束技术来测量和识别。 在一个实施例中，本发明使用一对正交定向的白光束，一个在径向上，一个在圆周方向上。 来自径向和圆周光束的散射光允许检测和分类颗粒，凹坑和划痕。 在其他实施例中，使用单光束技术对径向和周向缺陷进行分类。

公开(公告)号：US07286229B1

公开(公告)日：2007-10-23

申请号：US11220045

申请日：2005-09-06

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01J4/00

CPC classification number: G01N21/21 ,  G01B11/0641 ,  G01B11/303 ,  G01N21/8422 ,  G01N21/9501 ,  G01N21/9503 ,  G01N2021/218

Abstract: In one embodiment a system to detect multi-domain regions in the soft under layer of a perpendicular magnetic media comprises a radiation targeting assembly to target a polarized radiation beam onto a surface of a substrate covered by the soft under layer of a perpendicular magnetic media, a radiation collecting assembly that collects radiation reflected from the surface, a processor coupled to the first radiation collecting assembly, and a memory module coupled to the processor. The memory module comprises logic instructions which, when executed by the processor, configure the processor to record signal values from radiation reflected by the radiation beam at different positions on the surface and analyze the signal values to detect a region of multiple magnetic domains in the soft under layer of a perpendicular magnetic media.

Abstract translation: 在一个实施例中，用于检测垂直磁介质的软底层中的多畴区域的系统包括辐射瞄准组件，以将偏振辐射束对准到由垂直磁性介质的软底层覆盖的衬底的表面上， 收集从表面反射的辐射的辐射收集组件，耦合到第一辐射收集组件的处理器以及耦合到处理器的存储器模块。 所述存储器模块包括逻辑指令，所述逻辑指令在由所述处理器执行时将所述辐射束反射的辐射的信号值配置在所述表面上的不同位置处，并且分析所述信号值以检测所述软的多个磁畴的区域 垂直磁性介质下层。

公开(公告)号：US07274445B1

公开(公告)日：2007-09-25

申请号：US11078462

申请日：2005-03-11

Applicant: Steven W. Meeks

Inventor： Steven W. Meeks

IPC: G01N21/00 ,  G01B27/40

CPC classification number: G01N21/958 ,  G01N21/9501 ,  G01N2021/8967

Abstract: A problem in the inspection of transparent wafers and disks is the detection of top surface particles. More precisely, it is being able to assign a scattering site as being due to a particle at the top or bottom surface of a transparent wafer. A method of the present invention is to use an elliptical mirror, with a pinhole at its top focus, together with a focused beam. The focused beam will diverge as it passes through the transparent wafer and as a result any particle on the bottom surface will see a lower optical intensity and will appear weaker than a top surface particle. The suppression of scattered light from the bottom surface occurs because the source of the scattered light (the bottom surface) is far from the bottom foci of the elliptical mirror. This means that the light from the bottom surface, which arrives inside the ellipsoid, will be out of focus at the top foci of the ellipsoid and as a result very little light from the bottom surface will pass through the pinhole at the top foci of the elliptical mirror. This reduction of light from the bottom surface can be further improved by making the pinhole diameter to be substantially less than the thickness of the transparent wafer.

Abstract translation: 检查透明晶片和盘片的问题是检测顶表面颗粒。 更准确地说，它能够将散射位置分配为由于在透明晶片的顶表面或底表面处的颗粒。 本发明的一种方法是使用椭圆镜与其聚焦光束一起在其顶焦点处具有针孔。 聚焦光束在透过透明晶片时会发散，因此底面上的任何颗粒将会看到较低的光学强度，并且会比顶表面颗粒显得更弱。 由于散射光源（底面）远离椭圆镜的底部焦点，因此抑制来自底面的散射光。 这意味着来自底面的光到达椭圆体的内部将会在椭圆顶部的焦点处失焦，因此来自底面的很少的光将穿过位于椭圆体的顶部焦点处的针孔 椭圆镜。 通过使针孔直径基本上小于透明晶片的厚度，可以进一步提高来自底面的光的这种减少。

公开(公告)号：US07110097B2

公开(公告)日：2006-09-19

申请号：US11268214

申请日：2005-11-07

Applicant: Steven W. Meeks ,  Rusmin Kudinar

Inventor： Steven W. Meeks ,  Rusmin Kudinar

IPC: G01N21/00

CPC classification number: G01B11/0616 ,  G01N21/211 ,  G01N21/94 ,  G01N21/9501 ,  H01L22/12

Abstract: A system and method for measuring defects, film thickness, contamination, particles and height of a thin film disk or a silicon wafer.

公开(公告)号：US06956658B2

公开(公告)日：2005-10-18

申请号：US10660984

申请日：2003-09-12

Applicant: Steven W. Meeks ,  Rusmin Kudinar

Inventor： Steven W. Meeks ,  Rusmin Kudinar

IPC: G01B11/06 ,  G01B11/30 ,  G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  G11B5/84

CPC classification number: G01B11/303 ,  G01B11/065 ,  G01N21/211

Abstract: A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

Abstract translation: 用于以基本上不是薄膜的布鲁斯特角的角度执行磁性成像，光学轮廓和测量润滑剂厚度和降解，碳磨损，碳厚度和薄膜磁盘和硅晶片的表面粗糙度的系统和方法（ 碳）保护罩。 该系统和方法涉及一种聚焦的光，其偏振可以在P或S之间切换，偏振以一定角度入射到薄膜磁盘的表面。 这产生可以测量的反射和散射光，以确定与盘的表面相关的各种值和性质，包括识别用于确定点磁性的反射光中的克尔效应。 此外，本发明可以标识所识别的缺陷的位置。

公开(公告)号：US06930765B2

公开(公告)日：2005-08-16

申请号：US10126154

申请日：2002-04-19

Applicant: Steven W. Meeks ,  Hung P. Nguyen

Inventor： Steven W. Meeks ,  Hung P. Nguyen

IPC: G01B11/06 ,  H01L21/66 ,  G01N21/88

CPC classification number: G01B11/0616 ,  G01B11/306 ,  H01L22/12

Abstract: A combined optical profiler, ellipsometer, reflectometer and scatterometer is described which is configured to have user selectable spot sizes. An attached computer allows the user to select via software the desired spot size on the substrate.

Abstract translation: 描述了组合的光学轮廓仪，椭偏仪，反射计和散射仪，其被配置为具有用户可选择的光斑尺寸。 连接的计算机允许用户通过软件选择基板上所需的光斑尺寸。

公开(公告)号：US5539213A

公开(公告)日：1996-07-23

申请号：US379419

申请日：1995-01-27

Applicant: Steven W. Meeks ,  Thao A. Nguyen ,  Fior D. Sargent

Inventor： Steven W. Meeks ,  Thao A. Nguyen ,  Fior D. Sargent

IPC: G01B11/22 ,  G11B5/82 ,  G11B5/84 ,  G11B33/10 ,  G01N21/86

CPC classification number: G01B11/22 ,  G11B33/10 ,  G11B5/8404 ,  G11B5/82

Abstract: An analyzing laser system determines a physical characteristic of a repetitive texture pattern formed on a substrate surface. In one embodiment the system uses diffracted laser light to compute the average height of texturing bumps on a substrate surface. A laser beam is directed to the substrate surface and overlaps a group of individual marks or bumps formed in a repetitive pattern. A scanning linear photodector array receives light diffracted from the surface. The digitized output of the array is the angular distribution of diffracted light intensities. In the preferred embodiment for determining the average height of laser-induced bumps formed on a specular magnetic recording disk substrate, the angular positions of the first and second diffraction peaks or rings are determined and the intensities are integrated around those diffraction peaks or rings. These position and integrated intensity values are then compared to position and integrated intensity values for bumps of known height on calibration disk substrates. If the individual marks or bumps making up the repetitive pattern are also symmetrical then the angular distribution of diffracted light intensities is the square of the absolute value of the Fourier transform of the cross sectional profile of the bumps. Mathematical operations, including an inverse Fourier transform, are then performed on the digitized array output to yield the average cross sectional shape of the bumps illuminated by the analyzing laser.

Abstract translation: 分析激光系统确定在衬底表面上形成的重复纹理图案的物理特性。 在一个实施例中，系统使用衍射激光来计算衬底表面上的纹理凸起的平均高度。 激光束被引导到基板表面并与重复形式形成的一组单独的标记或凸起重叠。 扫描线性光电二极管阵列接收从表面衍射的光。 阵列的数字化输出是衍射光强度的角分布。 在用于确定形成在镜面磁记录盘基板上的激光诱发凸块的平均高度的优选实施例中，确定第一和第二衍射峰或环的角位置，并且在这些衍射峰或环周围集成强度。 然后将这些位置和积分强度值与校准盘基底上的已知高度凸起的位置和积分强度值进行比较。 如果构成重复图案的单个标记或凸块也是对称的，则衍射光强度的角度分布是凸块的横截面轮廓的傅里叶变换的绝对值的平方。 然后在数字化阵列输出上执行包括逆傅里叶变换的数学运算，以产生由分析激光器照亮的凸块的平均截面形状。

公开(公告)号：US08896825B2

公开(公告)日：2014-11-25

申请号：US13757154

申请日：2013-02-01

Applicant: Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

IPC: G01N21/00 ,  G02B26/12 ,  G02B26/10 ,  G01N21/01

CPC classification number: G01N21/01 ,  G01N21/55 ,  G02B26/10 ,  G02B26/125

Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second lens, a field stop, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. The first lens focuses scattered radiation from the sample to generate multiple scan lines at a first focal plane. The field stop is positioned at the first focal plane to block one or more scan lines at the first focal plane. The scan line not blocked by the field stop propagates to the second lens. The second lens de-scans the scan line and generates a point of scattered radiation at a second focal plane where the detector input is located.

Abstract translation: 光学检查器包括辐射源，时变光束反射器，远心扫描透镜，第一和第二透镜，场停止和检测器。 辐射源用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。 第一透镜聚焦来自样品的散射辐射，以在第一焦平面处产生多条扫描线。 场停止件位于第一焦平面处以阻挡在第一焦平面处的一个或多个扫描线。 不被场停止阻挡的扫描线传播到第二个镜头。 第二透镜扫描扫描线并在检测器输入所位于的第二焦平面处产生散射辐射点。

公开(公告)号：US20140307255A1

公开(公告)日：2014-10-16

申请号：US13861383

申请日：2013-04-12

Applicant: Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

Inventor： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

IPC: G01N21/958

CPC classification number: G01N21/958 ,  G01N21/896 ,  G01N2021/8967

Abstract: An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second waveplate, a polarizing beam splitter, a first detector, a focusing lens, a blocker, and a second detector. The radiating source irradiates the first waveplate generating circularly polarized source beam that irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. Reflected radiation from a sample is directed to the second waveplate generating linearly polarized beam that irradiates the polarizing beam splitter which directs a portion of the reflected radiation to the first detector. Scattered radiation from the sample is directed by the focusing lens to the second detector. Contemporaneous measurements by the first and second detectors are compared to differentiate.

Abstract translation: 光学检查器包括辐射源，时变光束反射器，远心扫描透镜，第一和第二波片，偏振分束器，第一检测器，聚焦透镜，阻挡器和第二检测器。 辐射源照射产生圆偏振源光束的第一波片，其用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。 来自样品的反射辐射被引导到产生线偏振光束的第二波片，该线偏振光束照射偏振分束器，其将一部分反射辐射引导到第一检测器。 来自样品的散射辐射由聚焦透镜引导到第二检测器。 将第一和第二检测器的同期测量值进行比较。