利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

64 条记录 (耗时 0.026 秒)

    Composite charged particle beam apparatus, method of processing a sample and method of preparing a sample for a transmission electron microscope using the same
    15.
    发明授权
    Composite charged particle beam apparatus, method of processing a sample and method of preparing a sample for a transmission electron microscope using the same 有权
    复合带电粒子束装置，处理样品的方法和使用该样品的透射电子显微镜制备样品的方法

    公开(公告)号：US07973280B2

    公开(公告)日：2011-07-05

    申请号：US12378138

    申请日：2009-02-11

    申请人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

    发明人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

    IPC分类号： G01N23/00 ,  H01J27/00

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

    摘要翻译： 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

    Composite charged particle beam apparatus, method of processing a sample and method of preparing a sample for a transmission electron microscope using the same
    16.
    发明申请
    Composite charged particle beam apparatus, method of processing a sample and method of preparing a sample for a transmission electron microscope using the same 有权
    复合带电粒子束装置，处理样品的方法和使用该样品的透射电子显微镜制备样品的方法

    公开(公告)号：US20090206254A1

    公开(公告)日：2009-08-20

    申请号：US12378138

    申请日：2009-02-11

    申请人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

    发明人： Haruo Takahashi ,  Yutaka Ikku ,  Yo Yamamoto ,  Kouji Iwasaki

    IPC分类号： G01N23/00 ,  A61N5/00

    CPC分类号： H01J37/3056 ,  G01N1/286 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J37/3005 ,  H01J37/3045 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： An apparatus is provided that precisely conduct ion beam etching to a sample having the properties of which easily change by electron beam irradiation with no loss of ease of operation and throughput. An apparatus includes an ion beam lens barrel and an electron beam lens barrel, which can observe or measure the conditions of a sample with an electron beam in the process of etching with an ion beam, wherein first, an observation image is obtained that includes the entire process area formed by secondary signals generated by an electron beam, secondly, an irradiation permit area and an irradiation inhibit area are defined in the observation image, and thirdly, electron beam irradiation is restricted only to the irradiation permit area.

    摘要翻译： 提供了一种设备，其精确地将离子束蚀刻导入具有易于通过电子束照射而改变的性质的样品，而不会损失操作容易性和生产量。 一种装置包括离子束透镜镜筒和电子束透镜镜筒，其可以在用离子束蚀刻的过程中观察或测量具有电子束的样品的条件，其中首先获得包括 在观察图像中定义由电子束产生的二次信号形成的整个处理区域，其次，照射许可区域和照射禁止区域，第三，电子束照射仅限于照射许可区域。

    Charged particle beam apparatus
    17.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号：US07442942B2

    公开(公告)日：2008-10-28

    申请号：US11509520

    申请日：2006-08-24

    申请人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    发明人： Haruo Takahashi ,  Toshiaki Fujii ,  Yutaka Ikku ,  Kouji Iwasaki ,  Yo Yamamoto

    IPC分类号： H01J37/20

    CPC分类号： H01J37/304 ,  G01N1/32 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.

    摘要翻译： 为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到 切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制 意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角 切片样品为期望值。

    Fluorescent X-ray spectroscope
    18.
    发明授权
    Fluorescent X-ray spectroscope 失效
    荧光X射线分光镜

    公开(公告)号：US6154517A

    公开(公告)日：2000-11-28

    申请号：US64332

    申请日：1998-04-22

    申请人： Haruo Takahashi

    发明人： Haruo Takahashi

    IPC分类号： G01J3/02 ,  G01N23/223 ,  G01N22/223

    CPC分类号： G01N23/223 ,  G01N2223/076

    摘要： Display is made of the spectrums of the fluorescent X-rays by using the ordinate axis as representing the square root of a fluorescent X-ray intensity and using the abscissa axis as representing the energy of the fluorescent X-rays.

    摘要翻译： 通过使用纵轴表示荧光X射线强度的平方根并使用横坐标轴表示荧光X射线的能量，显示荧光X射线的光谱。

    High-voltage generating circuit
    19.
    发明授权
    High-voltage generating circuit 失效
    高压发生电路

    公开(公告)号：US6005435A

    公开(公告)日：1999-12-21

    申请号：US995726

    申请日：1997-12-22

    申请人： Yasunobu Saida ,  Nobuaki Imamura ,  Yasuhiko Toda ,  Haruo Takahashi ,  Masaru Omura ,  Hisashi Takiguchi

    发明人： Yasunobu Saida ,  Nobuaki Imamura ,  Yasuhiko Toda ,  Haruo Takahashi ,  Masaru Omura ,  Hisashi Takiguchi

    IPC分类号： H04N5/68 ,  H02M3/28 ,  H04N3/185 ,  H04N3/26 ,  G05F1/10

    CPC分类号： H04N3/185

    摘要： A high-voltage generating circuit includes a high-voltage production circuit, a high-voltage detecting circuit, and a control circuit. The high-voltage detecting circuit has a high-voltage circuit section to which a voltage of 1 kV to several tens of kilovolts is applied and a low-voltage circuit section to which a voltage of several tens of volts is applied. In the high-voltage circuit section, a parallel circuit formed of a first voltage-dividing resistor and a part of a second voltage-dividing resistor and a speed-up capacitor, and another parallel circuit formed of the remaining part of the second voltage-dividing resistor and a third voltage-dividing resistor and another speed-up capacitor are connected in series to form a two-stage parallel circuit.

    摘要翻译： 高压发生电路包括高压生产电路，高压检测电路和控制电路。 高电压检测电路具有施加1kV至几十千伏的电压的高压电路部分和施加几十伏的电压的低压电路部分。 在高电压电路部分中，由第一分压电阻器和第二分压电阻器的一部分和加速电容器构成的并联电路，以及由第二电压分压电阻器的剩余部分形成的另一并联电路， 分压电阻器和第三分压电阻器和另一加速电容器串联连接以形成两级并联电路。