摘要:
A multi-component polymer rubber comprising (A) 15 to 60 mole % of an .alpha.,.beta.-unsaturated nitrile, (B) 10 to 75 mole % of a conjugated diene, and (C) 2 to 55 mole % of a fluoroalkyl acrylate or methacrylate or a fluorine-containing .alpha.-olefin, and having a glass transition temperature (T.sub.g) of -50.degree. C. to -20.degree. C., the percentages of the components (A), (B) and (C) being based on the total sum of moles of the components (A), (B) and (C). Said multi-component polymer rubber is excellent in sour gasoline resistance and alcohol-containing gasoline resistance.
摘要:
Highly-pure graphite oxide, graphene oxide, or graphene is mass-produced. Graphite is oxidized by an oxidizer, so that a graphite oxide solution is obtained, and electrodialysis is performed on the graphite oxide solution to remove aqueous ions, whereby the purity of graphite oxide is increased. Graphene oxide manufactured using the graphite oxide is mixed with powder, and the mixture is reduced, whereby graphene exhibiting conductive properties is yielded and the powder can be bonded. Such graphene can be used instead of a conduction auxiliary agent or a binder of a variety of batteries.
摘要:
A highly integrated DRAM is provided. A bit line is formed over a first insulator, a second insulator is formed over the bit line, third insulators which are in a stripe shape and the like are formed over the second insulator, and a semiconductor region and a gate insulator are formed to cover one of the third insulators. The bit line is connected to the semiconductor region through first contact plugs. Then, a conductive film is formed and subjected to anisotropic etching to form word lines at side surfaces of the third insulators, and a second contact plug is formed to be connected to a capacitor at a top of the one of the third insulators. By synchronizing the word lines, electric charge is accumulated or released through the capacitor. With such a structure, the area of a memory cell can be 4F2.
摘要:
It is an object to reduce power consumption of a 2Tr1C type semiconductor memory device. The absolute value of the threshold voltage of a reading transistor is made larger than a fluctuation range of a data potential of a bit line (or the fluctuation range of the data potential of the bit line is made smaller than the absolute value of the threshold voltage of the reading transistor), whereby the potential of a source line can be fixed, a fluctuation in a potential of a writing word line can be made smaller, and a potential of a reading word line is fluctuated only at the time of reading. Further, a gate of such a transistor the absolute value of the threshold voltage of which is large is formed using a material having a high work function, such as indium nitride.
摘要:
In a memory element including a pair of inverters, a capacitor which holds data, and a switching element which controls accumulating and releasing of electric charge of the capacitor are provided. For example, one electrode of the capacitor is connected to a first node, which is an input or output terminal of one of the pair of inverters, and the other electrode of the capacitor is connected to one electrode the switching element. The other electrode of the switching element is connected to a second node, which is the output or input terminal of the one of the pair of inverters. With such a connection structure, the absolute value of the potential difference between the first node and the second node at the time of data restoring can be large enough, whereby errors at the time of data restoring can be reduced.
摘要:
A capacitor that has an electrode of an n-type semiconductor that is provided in contact with one surface of a dielectric, has a work function of 5.0 eV or higher, preferably 5.5 eV or higher, and includes nitrogen and at least one of indium, tin, and zinc. Since the electrode has a high work function, the dielectric can have a high potential barrier, and thus even when the dielectric is as thin as 10 nm or less, a sufficient insulating property can be maintained. In particular, a striking effect can be obtained when the dielectric is formed of a high-k material.
摘要:
It is an object to reduce power consumption of a 2Tr1C type semiconductor memory device. The absolute value of the threshold voltage of a reading transistor is made larger than a fluctuation range of a data potential of a bit line (or the fluctuation range of the data potential of the bit line is made smaller than the absolute value of the threshold voltage of the reading transistor), whereby the potential of a source line can be fixed, a fluctuation in a potential of a writing word line can be made smaller, and a potential of a reading word line is fluctuated only at the time of reading. Further, a gate of such a transistor the absolute value of the threshold voltage of which is large is formed using a material having a high work function, such as indium nitride.
摘要:
Using thin film transistors (TFTs), an active matrix circuit, a driver circuit for driving the active matrix circuit or the like are formed on one substrate. Circuits such as a central processing unit (CPU) and a memory, necessary to drive an electric device, are formed using single crystalline semiconductor integrated circuit chips. After the semiconductor integrated circuit chips are adhered to the substrate, the chips are connected with wirings formed on the substrate by a chip on glass (COG) method, a wire bonding method or the like, to manufacture the electric device having a liquid crystal display (LCD) on one substrate.
摘要:
In a semiconductor memory device, one electrode of a capacitor is connected to a bit line, and the other electrode of the capacitor is connected to a drain of a cell transistor. A source of the cell transistor is connected to a source line. When a stack capacitor, for example, is used in this structure, one electrode of the capacitor is used as part of the bit line. An impurity region formed on the semiconductor substrate or a wiring parallel to a word line can be used as the source line; thus, the structure of a DRAM is simplified.
摘要:
Provided is a field-effect transistor (FET) having small off-state current, which is used in a miniaturized semiconductor integrated circuit. The field-effect transistor includes a thin oxide semiconductor which is formed substantially perpendicular to an insulating surface and has a thickness of greater than or equal to 1 nm and less than or equal to 30 nm, a gate insulating film formed to cover the oxide semiconductor, and a strip-like gate which is formed to cover the gate insulating film and has a width of greater than or equal to 10 nm and less than or equal to 100 nm. In this structure, three surfaces of the thin oxide semiconductor are covered with the gate, so that electrons injected from a source or a drain can be effectively removed, and most of the space between the source and the drain can be a depletion region; thus, off-state current can be reduced.