-
公开(公告)号：US5576829A
公开(公告)日：1996-11-19
申请号：US430266
申请日：1995-04-28
申请人： Naomasa Shiraishi , Nobutaka Magome
发明人： Naomasa Shiraishi , Nobutaka Magome
CPC分类号： G03F7/70283 , G01N21/88 , G03F1/30 , G03F1/84 , G03F7/70591 , G03F7/70641
摘要： A system for inspecting a phase-shifted photolithographic mask. This inspection system includes an illumination optical system for illuminating a mask, an imaging optical system for focusing an image of a pattern to be inspected on the mask, and detecting means for detecting the image of the inspection pattern whereby in accordance with one form, the amount of phase shift (.pi.+.delta.) is determined in accordance with the light quantity ratio between the images of phase-shifter deposited portions and phase-shifter non-deposited portions of the inspection pattern in a defocus condition. In accordance with another form, the direction of incidnece of an illuminating light on the mask is changed in such a manner that of the light transmitted through the inspection pattern the other beams than the 0-order diffracted beam and either one of the .+-.first-order diffracted beams are intercepted at a Fourier transform plane within the imageing optical system or alternatively the 0-order diffracted beam and either one of the .+-.first-order diffracted beams are passed through the Fourier transform plane within the imaging optical system at positions which are symmetric with the optical axis of the imaging optical system, and the amount of phase shift (.pi.+.delta.) of the phase shifters is determined in accordance with the amount of shift (.DELTA.x) within the imaging plane of the pattern image (interference pattern) detected.
摘要翻译： 用于检查相移光刻掩模的系统。 该检查系统包括用于照射掩模的照明光学系统，用于将要检查的图案的图像聚焦在掩模上的成像光学系统，以及用于检测检查图案的图像的检测装置，根据一种形式， 根据在散焦条件下的移相器沉积部分的图像和检查图案的移相器非沉积部分之间的光量比来确定相移量（pi + delta）。 根据另一种形式，掩模上的照明光的入射方向以通过检查图案透射的光的方式改变，而不是0级衍射光束的其它光束，并且+/- 一级衍射光束在成像光学系统内的傅立叶变换平面处截取，或者替代地，0级衍射光束，并且+/-一级衍射光束中的任一个通过成像光学系统内的傅立叶变换平面 在与成像光学系统的光轴对称的位置处，并且根据图案的成像平面内的偏移量（DELTA x）来确定移相器的相移量（pi + delta） 检测到图像（干涉图案）。
-
公开(公告)号：US6132908A
公开(公告)日：2000-10-17
申请号：US978014
申请日：1997-11-25
CPC分类号： G03F1/32 , G03F1/26 , G03F1/29 , G03F7/70433
摘要： A photo mask for a lithography process enables the formation of high contrast image and facilitates manufacturing. The photo mask includes a transparent portion for an illumination light and a half-transparent part having a predetermined transmittance for the illumination light. These transparent and half-transparent portions are so constructed that a phase of a transmitted light beam from the half-transparent portion has a phase difference of 2 n.pi. or (2 n+1).pi. radian relative to a light beam passed through a transparent portion. Another type of photo mask includes transparent portion for the illumination light and a light shielding portion against the illumination light. At least a part of the shielding portion has a multilayer construction. An edge at least portion of the shielding portion has a different transmittance for the illumination light then a central portion surrounded by the edge portion.
摘要翻译： 用于光刻工艺的光掩模能够形成高对比度图像并且便于制造。 光掩模包括用于照明光的透明部分和具有用于照明光的预定透射率的半透明部分。 这些透明和半透明部分被构造成使得来自半透明部分的透射光束的相位相对于通过透明的光束具有2n pi或（2n + 1）pi弧度的相位差 一部分。 另一种类型的光掩模包括用于照明光的透明部分和抵抗照明光的遮光部分。 屏蔽部分的至少一部分具有多层结构。 屏蔽部分的至少一部分的边缘对于照明光具有不同的透射率，然后是由边缘部分包围的中心部分。
-
公开(公告)号：US5483311A
公开(公告)日：1996-01-09
申请号：US249988
申请日：1994-05-27
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70333 , G03F7/70358 , G03F7/7055 , G03F7/70725 , G03F7/70858
摘要： In a projection exposure apparatus wherein a stage is moved in the direction of optic axis when a mask formed with a predetermined pattern is projected by a shutter onto a photosensitive substrate placed on the stage through a projection optical system, the operations of control means for the shutter and control means for the stage are interlocked with each other on the basis of the operational characteristic of the shutter and the operational characteristics (particularly the speed characteristic) of the stage so that the distribution of the existence probability with respect to movement of the photosensitive substrate from the opening operation starting point of time till the closing operation completing point of time of the shutter, with respect to the direction of the optic axis, may assume substantially equal maximum values at at least two locations in the direction of the optic axis.
摘要翻译： 在投影曝光装置中，当通过投影光学系统将形成有预定图案的掩模通过快门投影到放置在平台上的感光基板上时，台沿光轴方向移动的投影曝光装置中， 基于快门的操作特性和舞台的操作特性（特别是速度特性），舞台的快门和控制装置彼此互锁，使得相对于感光体的移动的存在概率的分布 基板从打开操作开始时间到关闭操作完成时间点相对于光轴的方向可以在光轴方向上的至少两个位置处呈现基本相等的最大值。
-
公开(公告)号：US5343270A
公开(公告)日：1994-08-30
申请号：US986630
申请日：1992-12-07
CPC分类号： G03F7/70883 , G03F7/70241 , G03F7/70333 , G03F7/70358 , G03F7/7055 , G03F7/70725 , G03F7/70858
摘要： In a projection exposure apparatus wherein a stage is moved in the direction of optic axis when a mask formed with a predetermined pattern is projected by a shutter onto a photosensitive substrate placed on the stage through a projection optical system, the operations of control means for the shutter and control means for the stage are interlocked with each other on the basis of the operational characteristic of the shutter and the operational characteristics (particularly the speed characteristic) of the stage so that the distribution of the existence probability with respect to movement of the photosensitive substrate from the opening operation starting point of time till the closing operation completing point of time of the shutter, with respect to the direction of the optic axis, may assume substantially equal maximum values at at least two locations in the direction of the optic axis.
摘要翻译： 在投影曝光装置中，当通过投影光学系统将形成有预定图案的掩模通过快门投影到放置在平台上的感光基板上时，台沿光轴方向移动的投影曝光装置中， 基于快门的操作特性和舞台的操作特性（特别是速度特性），舞台的快门和控制装置彼此互锁，使得相对于感光体的移动的存在概率的分布 基板从打开操作开始时间到关闭操作完成时间点相对于光轴的方向可以在光轴方向上的至少两个位置处呈现基本相等的最大值。
-
公开(公告)号：US07911582B2
公开(公告)日：2011-03-22
申请号：US12010824
申请日：2008-01-30
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： An exposure apparatus illuminates a pattern with an energy beam and transfers the pattern onto a substrate via a projection optical system. The exposure apparatus includes a substrate stage on which the substrate is mounted and that moves within a two-dimensional plane holding the substrate. A supply mechanism supplies liquid to a space between the projection optical system and the substrate on the substrate stage. A recovery mechanism recovers the liquid and an auxiliary recovery mechanism recovers the liquid which could not be recovered by the recovery mechanism.
摘要翻译： 曝光装置用能量束照射图案，并经由投影光学系统将图案转印到基板上。 曝光装置包括其上安装有基板并且在保持基板的二维平面内移动的基板台。 供给机构将液体供给到基板台上的投影光学系统与基板之间的空间。 回收机构回收液体，辅助回收机构回收回收机构无法回收的液体。
-
公开(公告)号：US20090015816A1
公开(公告)日：2009-01-15
申请号：US12232064
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/58
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
-
公开(公告)号：US07460207B2
公开(公告)日：2008-12-02
申请号：US11147288
申请日：2005-06-08
申请人： Hideo Mizutani , Nobutaka Magome
发明人： Hideo Mizutani , Nobutaka Magome
CPC分类号： G03F7/70341
摘要： An exposure apparatus, wherein an exposure of a substrate (P) is carried out by filling at least a portion of the space between a projection optical system and the substrate (P) with a liquid and projecting an image of a pattern onto the substrate (P) via the projection optical system and the liquid, includes a bubble detector (20) which detects air bubble or bubbles in the liquid between the projection optical system and the substrate (P). Consequently, the exposure apparatus is capable of suppressing deterioration of a pattern image caused by bubbles in the liquid when an exposure is carried out while filling the space between the projection optical system and the substrate with the liquid.
摘要翻译： 一种曝光装置，其中通过用液体填充投影光学系统和基板（P）之间的空间的至少一部分并将图案的图像投影到基板上来进行基板（P）的曝光（ P）通过投影光学系统和液体包括气泡检测器（20），其检测投影光学系统和基板（P）之间的液体中的气泡或气泡。 因此，当用液体填充投影光学系统和基板之间的空间时，曝光装置能够抑制由液体中的气泡引起的图案图像的劣化。
-
公开(公告)号：US20070263196A1
公开(公告)日：2007-11-15
申请号：US11878076
申请日：2007-07-20
申请人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
发明人： Shigeru Hirukawa , Nobutaka Magome , Issey Tanaka
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70341 , G03F7/70716
摘要： A lithographic projection apparatus is arranged to project a pattern from a patterning device onto a substrate through a liquid confined to a space adjacent to the substrate. The apparatus includes a liquid diverter in the space to promote liquid flow across the space.
摘要翻译： 光刻投影装置被布置成通过限定在与基板相邻的空间的液体将图案从图案形成装置投影到基板上。 该装置包括在该空间中的液体转向器，以促进流过空间的液体流动。
-
公开(公告)号：US20070035710A1
公开(公告)日：2007-02-15
申请号：US11583946
申请日：2006-10-20
申请人： Hiroyuki Nagasaka , Nobutaka Magome
发明人： Hiroyuki Nagasaka , Nobutaka Magome
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/709
摘要： A device manufacturing method includes the steps of providing an immersion liquid between a substrate and at least a portion of a projection system of a lithographic projection apparatus, wherein a non-radiation sensitive material is carried by the substrate, the non-radiation sensitive material being at least partially transparent to radiation and being of a different material than the immersion liquid, the non-radiation sensitive material being provided over at least a part of a radiation sensitive layer of the substrate; and projecting a patterned beam of radiation, through the immersion liquid, onto a target portion of the substrate using the projection system.
摘要翻译： 一种器件制造方法，包括以下步骤：在衬底与光刻投影设备的投影系统的至少一部分之间提供浸没液体，其中非辐射敏感材料由衬底承载，非辐射敏感材料为 对辐射至少部分透明并且是与浸没液体不同的材料，所述非辐射敏感材料设置在所述基底的辐射敏感层的至少一部分上; 以及使用所述投影系统将图案化的辐射束通过所述浸没液投射到所述基板的目标部分上。
-
公开(公告)号：US06650421B2
公开(公告)日：2003-11-18
申请号：US09842226
申请日：2001-04-26
申请人： Nobutaka Magome
发明人： Nobutaka Magome
IPC分类号： G01B902
CPC分类号： G03F7/706 , G01M11/0264 , G01M11/0271
摘要： In an interferometer for detecting interference light between light flux passed through an object to be inspected and reference light to be generated from a portion of the light flux passed therethrough, a phase of the interference light is detected with high precision. The light flux passed through the optical system to be inspected forms a spot image on a pinhole formed in a plate. Measuring light from the spot image and the reference-light diffracted out of the light flux from the spot image at the pinhole create interference light which in turn is received by an observation system. An image of interference fringes formed by the interference light is taken with an image pickup element. Further, heterodyne interference light is created by vibrating the plate in the direction intersecting the light flux or in the direction along the light path of the light flux, thereby detecting a phase of each portion of the interference fringes with high precision.
摘要翻译： 在用于检测通过待检测物体的光通量和从通过的光束的一部分产生的参考光之间的干涉光的干涉仪中，以高精度检测干涉光的相位。 通过要检查的光学系统的光通量在形成在板上的针孔上形成斑点图像。 从斑点图像测量光和从针孔处的斑点图像衍射出的光通量的参考光产生干涉光，而干涉光又由观察系统接收。 由摄像元件拍摄由干涉光形成的干涉条纹的图像。 此外，通过在与光束相交的方向或沿着光束的光路的方向振动板来产生外差干涉光，从而以高精度检测干涉条纹的每个部分的相位。
-
-
-
-
-
-
-
-
-
搜索结果
93 条记录 (耗时 0.023 秒)
