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11.发明申请公开(公告)号：US20200292403A1
公开(公告)日：2020-09-17
申请号：US16806628
申请日：2020-03-02
Applicant: Tokyo Electron Limited
Inventor： Risako MATSUDA , Norihiko AMIKURA , Kazuyuki MIURA , Keita SHOUJI
Abstract: In a substrate processing system according to an exemplary embodiment, gas supply units are configured to supply gases to chambers through first gas flow channels thereof, respectively. Chamber pressure sensors are configured to measure pressures in the chambers. A second gas flow channel is connected to the first gas flow channel of each of the gas supply units. A reference pressure sensor is configured to measure a pressure in the second gas flow channel. In a method according to an exemplary embodiment, each of the chamber pressure sensors is calibrated by using a measurement value thereof and a measurement value of the reference pressure sensor which are obtained in a state where pressures in a corresponding chamber, the first gas flow channel of a corresponding gas supply unit, and the second gas flow channel are maintained.
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公开(公告)号：US20190301912A1
公开(公告)日：2019-10-03
申请号：US16361410
申请日：2019-03-22
Applicant: TOKYO ELECTRON LIMITED
Inventor： Risako MIYOSHI , Norihiko AMIKURA , Kazuyuki MIURA , Hiroshi YAZAKI , Yasuhiro SHOJI
Abstract: A substrate processing system according to an exemplary embodiment includes a substrate processing apparatus and a measurement apparatus. The substrate processing apparatus includes a gas supply unit. The gas supply unit includes a flow rate controller and a secondary valve. The secondary valve is connected to a secondary side of the flow rate controller. The secondary valve is opened when a voltage is output from a first controller of the substrate processing system through a wiring. The measurement apparatus measures the flow rate of the gas output from the flow rate controller according to the instruction from the first controller. The measurement apparatus includes a second controller. The measurement apparatus includes a relay provided on the wiring. The second controller is configured to control the relay.
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公开(公告)号：US20190138033A1
公开(公告)日：2019-05-09
申请号：US16180047
申请日：2018-11-05
Applicant: TOKYO ELECTRON LIMITED
Inventor： Atsushi SAWACHI , Norihiko AMIKURA
Abstract: A gas supply system includes a first flow channel connected to a first gas source of a first gas, formed inside a ceiling or a sidewall of the treatment container, and communicating with the treatment space through a plurality of first gas discharge holes, a second flow channel connected to a second gas source of a second gas, formed inside the ceiling or the sidewall of the treatment container, and communicating with the treatment space through a plurality of second gas discharge holes, and a plurality of first diaphragm valves, wherein each of the first diaphragm valves is provided between the first flow channel and the first gas discharge hole to correspond to the first gas discharge hole.
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公开(公告)号：US20180180509A1
公开(公告)日：2018-06-28
申请号：US15739027
申请日：2016-07-15
Applicant: TOKYO ELECTRON LIMITED
Inventor： Atsushi SAWACHI , Norihiko AMIKURA
Abstract: Leaks in valves provided in a plurality of pipes connected to a plurality of gas sources are inspected. In a method of an embodiment, a first valve provided in a first pipe connected to a gas source is closed, and a second valve provided in a first pipe on a downstream side of the first valve is opened. A pressure increase is detected by a pressure gauge on a downstream side of the first pipe. In addition, the first valve is opened, and the second valve is closed. A pressure increase is detected by a pressure gauge on a downstream side of the first pipe.
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公开(公告)号：US20250073916A1
公开(公告)日：2025-03-06
申请号：US18949966
申请日：2024-11-15
Applicant: Tokyo Electron Limited
Inventor： Norihiko AMIKURA
Abstract: Provided is a maintenance device for assisting an exchange of a transfer robot mounted on a transfer module, the maintenance device comprising: a carriage; a housing having an upper opening and a lower opening, wherein the housing is disposed above the carriage; a first lifting unit mounted on the carriage and configured to raise and lower the housing between a first upper position and a first lower position, wherein the housing is connected to the transfer module when the housing is at the first upper position; a lower shutter configured to open and close the lower opening; a support unit configured to support the transfer robot; and a second lifting unit configured to raise and lower the support unit between a second upper position within the housing and a second lower position below the housing when the housing is at the first upper position.
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Patent Agency Ranking
公开(公告)号：US20240309966A1
公开(公告)日：2024-09-19
申请号：US18672479
申请日：2024-05-23
Applicant: Tokyo Electron Limited
Inventor： Norihiko AMIKURA , Masatomo KITA
CPC classification number: F16K31/423 , F16K51/02
Abstract: A gate valve opens and closes a first opening of a first chamber in a vacuum processing apparatus. The gate valve includes a valve element configured to open and close the first opening; a drive configured to move the valve element so that the valve element takes at least a closing position, where the valve element closes the first opening, and an opening position, where the valve element opens the first opening, a first gas line and a second gas line; and a first switching valve that connects one of the first gas line and the second gas line to the drive. The drive moves the valve element from the opening position to the closing position by pressure of gas supplied from the first gas line or the second gas line, and holds the valve element at the closing position by pressure of gas supplied from the second gas line.
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公开(公告)号：US20240030011A1
公开(公告)日：2024-01-25
申请号：US18224639
申请日：2023-07-21
Applicant: Tokyo Electron Limited
Inventor： Toshiaki TOYOMAKI , Norihiko AMIKURA , Seiichi KAISE , Masatomo KITA
CPC classification number: H01J37/32733 , B65G47/90 , H01J37/32091
Abstract: This substrate transfer system is provided with: a load-lock module; an atmospheric transfer module having a first sidewall, a second sidewall and a third sidewall, the first sidewall extending along a first direction and connected to the load-lock module, the second sidewall extending along a second direction perpendicular to the first direction, the third sidewall being disposed on an opposite side of the second sidewall; a first load port extending outward from the second sidewall along the first direction; and a second load port extending outward from the third sidewall along the first direction.
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公开(公告)号：US20230375371A1
公开(公告)日：2023-11-23
申请号：US18319172
申请日：2023-05-17
Applicant: Tokyo Electron Limited
Inventor： Takayuki HATANAKA , Kimihiro YOKOYAMA , Norihiko AMIKURA
IPC: G01D5/241 , H01L21/687 , G01B7/14
CPC classification number: G01D5/2417 , H01L21/68707 , G01B7/14
Abstract: A measuring system according to an exemplary embodiment acquires a measurement value indicating electrostatic capacitance between a measuring device and a transport fork for transporting the measuring device. The transport fork includes a target electrode. The measuring device includes a first sensor provided on a base board. The first sensor includes a central electrode and peripheral electrodes. The central electrode acquires electrostatic capacitance for reflecting a distance with the target electrode. The peripheral electrodes are disposed around the central electrode to acquire electrostatic capacitance for reflecting an amount of deviation in a horizontal direction with respect to the target electrode of the transport fork.
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公开(公告)号：US20220130651A1
公开(公告)日：2022-04-28
申请号：US17507956
申请日：2021-10-22
Applicant: Tokyo Electron Limited
Inventor： Norihiko AMIKURA , Makoto SAEGUSA , Jun HIROSE
IPC: H01J37/32
Abstract: There is provided a system for processing a substrate under a depressurized environment. The system comprises: a processing chamber configured to perform desired processing on a substrate; a transfer chamber having a transfer mechanism configured to import or export the substrate into or from the processing chamber; and a controller configured to control a processing process in the processing chamber. The transfer mechanism comprises: a fork configured to hold the substrate on an upper surface; and a sensor provided in the fork and configured to measure an internal state of the processing chamber. The controller is configured to control the processing process in the processing chamber on the basis of the internal state of the processing chamber measured by the sensor.
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公开(公告)号：US20220068689A1
公开(公告)日：2022-03-03
申请号：US17462197
申请日：2021-08-31
Applicant: TOKYO ELECTRON LIMITED
Inventor： Norihiko AMIKURA , Masatomo KITA
IPC: H01L21/68 , H01L21/677 , G01S17/48 , H01L21/66
Abstract: A transfer apparatus includes a transfer arm, an irradiator, a light receiver, and a controller. The transfer arm transfers the member. The irradiator irradiates light obliquely onto a passage area, through which the member passes, when the member is transferred by the transfer arm. The light receiver receives the light, which is irradiated from the irradiator and reflected from the member, when the member passes through the passage area. The controller determines whether the member has passed through the passage area according to whether the light irradiated from the irradiator is received by the light receiver.
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