公开(公告)号：US10607849B2

公开(公告)日：2020-03-31

申请号：US16015376

申请日：2018-06-22

Applicant: Tokyo Electron Limited

Inventor： Hideaki Sato ,  Takashi Nagai ,  Hiromi Hara

IPC: H01L21/311 ,  H01L21/67 ,  H01L21/66 ,  B24B37/005

Abstract: Disclosed is a substrate liquid processing apparatus that includes: a liquid processing unit that performs a liquid processing on a film formed on a surface of a substrate with an etching liquid; an etching liquid supply unit that supplies an etching liquid to the liquid processing unit; and a controller that controls the etching liquid supply unit. The controller is configured to perform a control such that an etching liquid in a state of having a relatively low etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit, and then, an etching liquid in a state of having a relatively high etching rate for the film is supplied from the etching liquid supply unit to the liquid processing unit so that the substrate is etched in the liquid processing unit.

公开(公告)号：US20150221530A1

公开(公告)日：2015-08-06

申请号：US14608718

申请日：2015-01-29

Applicant: Tokyo Electron Limited

Inventor： Hiromi Hara ,  Hideaki Sato ,  Takahiro Kawazu ,  Takashi Nagai

IPC: H01L21/67 ,  B08B3/08 ,  H01L21/02

CPC classification number: H01L21/67023 ,  B08B3/08 ,  H01L21/02052 ,  H01L21/67017 ,  H01L21/67028 ,  H01L21/67057 ,  H01L21/67086

Abstract: Disclosed is a method for performing a liquid processing on a substrate using an aqueous solution of a chemical agent at a predetermined concentration as a processing liquid. The method includes: storing the processing liquid in a processing liquid storage unit; and supplying an aqueous solution of the chemical agent at a different concentration from the concentration of the processing liquid to the processing liquid storage unit, discharging the processing liquid from the processing liquid storage unit so as to update the processing liquid stored in the processing liquid storage unit. The aqueous solution in a predetermined amount is supplied to the processing liquid storage unit, and the processing liquid is discharged from the processing liquid storage unit, the processing liquid containing the chemical agent in the same amount as the amount of the chemical agent contained in the aqueous solution supplied to the processing liquid storage unit.

Abstract translation: 公开了使用预定浓度的化学试剂的水溶液作为处理液在基板上进行液体处理的方法。 该方法包括：将处理液体储存在处理液体存储单元中; 并将不同浓度的化学试剂的水溶液从处理液的浓度供给到处理液储存单元，将处理液从处理液储存单元排出，以便更新储存在处理液储存器中的处理液 单元。 预定量的水溶液被供给到处理液储存单元，并且处理液从处理液储存单元排出，含有化学试剂的处理液的量与所含的化学试剂的量相同 提供给处理液体储存单元的水溶液。

公开(公告)号：US11410861B2

公开(公告)日：2022-08-09

申请号：US15895106

申请日：2018-02-13

Applicant: Tokyo Electron Limited

Inventor： Takashi Nagai ,  Hideaki Sato ,  Junichi Kitano ,  Kenji Goto

IPC: H01L21/67 ,  H01L21/311

Abstract: A substrate liquid processing apparatus includes a processing tub 34 which is configured to store therein a processing liquid and in which a processing of a substrate is performed by immersing the substrate in the stored processing liquid; a circulation line 50 connected to the processing tub; a pump 51 provided at the circulation line and configured to generate a flow of the processing liquid flowing out from the processing tub and returning back to the processing tub after passing through the circulation line; and a heater 52 provided at the circulation line and configured to heat the processing liquid. At least two temperature sensors 81 to 83 are provided at different positions within a circulation system including the processing tub and the circulation line. Controllers 90 and 100 control a heat generation amount of the heater based on detection temperatures of the at least two temperature sensors.

公开(公告)号：US11062922B2

公开(公告)日：2021-07-13

申请号：US15905941

申请日：2018-02-27

Applicant: Tokyo Electron Limited

Inventor： Takashi Nagai ,  Hideaki Sato ,  Hiromi Hara ,  Hiroshi Yoshida ,  Tsukasa Hirayama

IPC: H01L21/67 ,  G08B21/18

Abstract: A substrate liquid processing apparatus includes a processing tub 34A which is configured to store therein a processing liquid in a boiling state and in which a processing of a substrate 8 is performed by immersing the substrate in the stored processing liquid; a concentration sensor 55B configured to detect a concentration of a chemical liquid component contained in the processing liquid; a concentration control unit 7 (40, 41) configured to control the concentration of the chemical liquid component to a set concentration by adding the chemical liquid component or a diluting solution to the processing liquid based on a detection concentration of the concentration sensor; a head pressure sensor 86B configured to detect a head pressure of the processing liquid within the processing tub; and a concentration set value correction unit 7 configured to correct, based on a detection value of the head pressure sensor, the set concentration.

公开(公告)号：US10985035B2

公开(公告)日：2021-04-20

申请号：US14608718

申请日：2015-01-29

Applicant: Tokyo Electron Limited

Inventor： Hiromi Hara ,  Hideaki Sato ,  Takahiro Kawazu ,  Takashi Nagai

IPC: H01L21/67 ,  B08B3/08 ,  H01L21/02

Abstract: Disclosed is a method for performing a liquid processing on a substrate using an aqueous solution of a chemical agent at a predetermined concentration as a processing liquid. The method includes: storing the processing liquid in a processing liquid storage unit; and supplying an aqueous solution of the chemical agent at a different concentration from the concentration of the processing liquid to the processing liquid storage unit, discharging the processing liquid from the processing liquid storage unit so as to update the processing liquid stored in the processing liquid storage unit. The aqueous solution in a predetermined amount is supplied to the processing liquid storage unit, and the processing liquid is discharged from the processing liquid storage unit, the processing liquid containing the chemical agent in the same amount as the amount of the chemical agent contained in the aqueous solution supplied to the processing liquid storage unit.

公开(公告)号：US20190080938A1

公开(公告)日：2019-03-14

申请号：US16126106

申请日：2018-09-10

Applicant: Tokyo Electron Limited

Inventor： Takahiro Kawazu ,  Takafumi Tsuchiya ,  Hideaki Sato ,  Hidemasa Aratake ,  Osamu Kuroda ,  Takashi Nagai ,  Jiro Harada

IPC: H01L21/67 ,  G05B19/418

Abstract: A substrate liquid processing apparatus A1 includes a processing liquid storage unit 38 configured to store a processing liquid therein; a processing liquid drain unit 41 configured to drain the processing liquid from the processing liquid storage unit 38; and a control unit 7. The control unit 7 performs a first control in a constant concentration mode in which a concentration of the processing liquid in the processing liquid storage unit 38 is regulated to a predetermined set concentration and a second control in a concentration changing mode in which the concentration of the processing liquid is changed. In the second control, a set concentration after concentration change is compared with a set concentration before the concentration change, and when the set concentration after the concentration change is lower, the control unit controls the processing liquid drain unit 41 to start draining of the processing liquid.