公开(公告)号：US6037717A

公开(公告)日：2000-03-14

申请号：US225159

申请日：1999-01-04

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： H01J27/08 ,  H01J37/08

CPC分类号： H01J27/143 ,  H01J2237/08

摘要： A cold-cathode ion source with a closed-loop ion-emitting slit which is provided with means for generating a cyclically-variable, e.g., alternating or pulsating electric or magnetic field in an anode-cathode space. These means may be made in the form of an alternating-voltage generator which generates alternating voltage on one of the cathode parts that form the ion-emitting slit, whereas the other slit-forming part is grounded. The alternating voltage deviates the ion beam in the slit with the same frequency of the alternating voltage. In accordance with another embodiment, the aforementioned means may be an electromagnetic coil which generates a magnetic field which passes through the ion-emitting slit, thus acting on the condition of the spatial-charge formation and, hence, on concentration of ions in the ion beam. The cold-cathode ion source may be of any type, i.e., with the ion beam emitted in the direction perpendicular to the direction of drift of electrons in the ion-emitting slit or with the direction of emission of the beam which coincides with the direction of electron drift.

摘要翻译： 具有闭环离子发射狭缝的冷阴极离子源，其设置有用于在阳极 - 阴极空间中产生可循环变化的例如交变或脉动电场或磁场的装置。 这些装置可以以交流电压发生器的形式制成，其在形成离子发射狭缝的阴极部分之一上产生交流电压，而另一个狭缝形成部分接地。 交变电压以相同的交流电压频率使狭缝中的离子束偏离。 根据另一实施例，上述装置可以是产生穿过离子发射狭缝的磁场的电磁线圈，因此作用于空间电荷形成的条件，并因此作用于离子的离子浓度 光束。 冷阴极离子源可以是任何类型的，即离子束沿垂直于离子发射狭缝中的电子漂移方向的方向发射，或者与辐射方向一致的方向发射 的电子漂移。

公开(公告)号：US20070231393A1

公开(公告)日：2007-10-04

申请号：US11596820

申请日：2005-05-19

申请人： James Ritter ,  Armin Ebner ,  Charles Holland

发明人： James Ritter ,  Armin Ebner ,  Charles Holland

IPC分类号： A61K47/02 ,  A61M37/00 ,  A61N2/00

CPC分类号： A61M37/0069 ,  A61K9/0009 ,  A61K9/5115 ,  A61K31/198 ,  A61K41/00 ,  A61N2/002 ,  A61N2/004 ,  A61N2/02 ,  A61N2/06 ,  C07C229/64

摘要： Disclosed are methods of positioning a magnetic drug carrier particle within the body of a subject comprising placing an article within the body of the subject or external to the body of a subject; inserting a magnetic drug carrier particle into the body of the subject, and applying an external magnetic field to the article, thereby causing the magnetic drug carrier particle to be attracted to the article. Also disclosed are articles, systems, and kits that can be used in the disclosed methods.

摘要翻译： 公开了将磁性药物载体颗粒定位在受试者体内的方法，包括将物品放置在受试者的身体内或受试者的身体外部; 将磁性药物载体颗粒插入到受试者的身体内，并向该物品施加外部磁场，从而使该药物载体颗粒被物品吸引。 还公开了可以在所公开的方法中使用的制品，系统和试剂盒。

公开(公告)号：US20050032641A1

公开(公告)日：2005-02-10

申请号：US10894301

申请日：2004-07-19

申请人： Ragaiy Zidan ,  James Ritter ,  Armin Ebner ,  Jun Wang ,  Charles Holland

发明人： Ragaiy Zidan ,  James Ritter ,  Armin Ebner ,  Jun Wang ,  Charles Holland

IPC分类号： B01J20/00 ,  C01B3/00 ,  F17C11/00

CPC分类号： B82Y30/00 ,  C01B3/0021 ,  C01B3/0031 ,  C01B3/0078 ,  F17C11/005 ,  Y02E60/321 ,  Y02E60/325 ,  Y02E60/327

摘要： A hydrogen storage material having improved hydrogen absorbtion and desorption kinetics is provided by adding graphite to a complex hydride such as a metal-doped alanate, i.e., NaAlH4. The incorporation of graphite into the complex hydride significantly enhances the rate of hydrogen absorbtion and desorption and lowers the desorption temperature needed to release stored hydrogen.

摘要翻译： 通过向复合氢化物例如掺杂金属的Al Al，即NaAlH 4中加入石墨，提供具有改进的吸氢和解吸动力学的储氢材料。 将石墨掺入复合氢化物中显着提高了吸氢和脱附的速率，并降低了释放储存的氢所需的解吸温度。

公开(公告)号：US6153067A

公开(公告)日：2000-11-28

申请号：US222015

申请日：1998-12-30

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov

IPC分类号： C23C14/35 ,  H01J27/14 ,  H01J37/08 ,  H01J37/34 ,  C23C14/00

CPC分类号： C23C14/228 ,  C23C14/35 ,  H01J27/14 ,  H01J37/08 ,  H01J37/3408

摘要： A method for combined treatment of an object simultaneously with an ion beam and a magnetron plasma consists in that an object, e.g., a semiconductor substrate, is treated with ions of a working gas emitted from an ion-beam source and with particles of a sputterable material directed toward the object in the same direction as the ion beam. The method is carried our by means of an apparatus that comprises a combination of a sputtering magnetron with an ion-beam source. According to several embodiments, the cathode of the ion source is separated into two parts electrically isolated from each other by a closed-loop ion-emitting slit and by isolation pads. The sputterable target is placed either onto the entire cathode or onto part thereof which is charged negatively with respect to another part which is grounded. During the operation of the apparatus, ion beam emitted from the ion source acts as a viral anode with respect to the magnetron target. As a result, the efficiency and versatility of treatment is improved, and the combined apparatus has smaller dimensions and less expensive than an ion source and magnetron used separately.

摘要翻译： 用于与离子束和磁控管等离子体同时处理物体的方法在于，物体（例如半导体衬底）用离子束源发射的工作气体的离子和可溅射的颗粒 在与离子束相同的方向上朝向物体的材料。 该方法通过包括溅射磁控管与离子束源的组合的装置进行。 根据若干实施例，离子源的阴极通过闭环离子发射狭缝和隔离垫彼此分离成两部分。 可溅射靶被放置在整个阴极或其上的部分上，其相对于接地的另一部分是负电荷的。 在装置的操作期间，从离子源发射的离子束相对于磁控管靶充当病毒阳极。 结果，提高了处理的效率和多功能性，并且组合的装置具有比分开使用的离子源和磁控管更小的尺寸和更便宜的成本。

公开(公告)号：US6002208A

公开(公告)日：1999-12-14

申请号：US109684

申请日：1998-07-02

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov

IPC分类号： H01J27/04 ,  H01J27/02

CPC分类号： H01J27/143

摘要： A universal cold-cathode type ion source with a closed-loop electron drifting source and with an ion-beam propagation direction perpendicular to the plane of electron drifting is intended for uniformly treating stationary or moveable objects with such processes as cleaning, activation, polishing, thin-film coating, or etching. The ion source of the invention allows adjustment of beam parameters and configurations and has an ion emitting slit of an adjustable geometry. In one embodiment, the adjustment is carried out by changing the width of the slit by shifting moveable parts of the cathode in the direction perpendicular to the direction of the ion beam. In another embodiment the slit configuration is adjusted by shifting a moveable part of the cathode in the direction of the beam propagation. The invention also provides a method for adjusting the shape and configuration of the ion beam with respect to the object to be treated. The adjustment can be performed during the operation of the ion beam while observing the beam through a sealed transparent window of the vacuum chamber.

摘要翻译： 具有闭环电子漂移源和垂直于电子漂移平面的离子束传播方向的通用冷阴极型离子源旨在用诸如清洁，活化，抛光等工艺均匀地处理静止或可移动的物体， 薄膜涂层或蚀刻。 本发明的离子源允许调节光束参数和构造，并具有可调几何形状的离子发射狭缝。 在一个实施例中，通过在与离子束的方向垂直的方向上移动阴极的可移动部分来改变狭缝的宽度来进行调节。 在另一个实施例中，通过沿着光束传播的方向移动阴极的可移动部分来调节狭缝构型。 本发明还提供了一种用于调节离子束相对于待处理物体的形状和结构的方法。 可以在离子束的操作期间进行调节，同时通过真空室的密封透明窗观察光束。

公开(公告)号：US20050023928A1

公开(公告)日：2005-02-03

申请号：US10633282

申请日：2003-07-31

申请人： Kieran Doherty ,  William Scherzinger ,  David Stout ,  Simon Waddell ,  Shannon Rogers ,  James Ritter ,  Henry Pszczola ,  Shirley Pszczola

发明人： Kieran Doherty ,  William Scherzinger ,  David Stout ,  Simon Waddell ,  Shannon Rogers ,  James Ritter ,  Henry Pszczola ,  Shirley Pszczola

IPC分类号： H02K3/51 ,  H02K3/46

CPC分类号： H02K3/51

摘要： The coil end-turn segments of a generator exciter rotor are retained using an end-turn retention assembly that includes an inner band and an outer band. The inner band is located around at least a portion of each of the end-turn segments and has two ends. The outer peripheral surface of the inner band is tapered such that the thickness of the inner band varies between its ends. The outer band is located around the inner band and also has two ends. The inner peripheral surface of the outer band is tapered in a fashion that is reverse to that of the inner band outer surface, and such that the outer band thickness varies between its ends. By forming oppositely configured tapers in the inner and outer bands, the outer bands will remain in place and not migrate axially away from the lamination core during exciter rotor rotation.

摘要翻译： 使用包括内带和外带的端匝保持组件来保持发电机励磁机转子的线圈端匝段。 内带位于每个端匝段的至少一部分周围并且具有两端。 内带的外周表面是锥形的，使得内带的厚度在其端部之间变化。 外带位于内带周围，并且还具有两端。 外带的内周面以与内带外表面相反的方式成锥形，并且外带厚度在其端部之间变化。 通过在内部和外部带中形成相对配置的锥形，外部带将保持在适当位置，并且在励磁机转子旋转期间不会轴向地离开层压芯。

公开(公告)号：US06236163B1

公开(公告)日：2001-05-22

申请号：US09420615

申请日：1999-10-18

申请人： Yuri Maishev ,  James Ritter ,  Yuri Terentiev ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Yuri Terentiev ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： H01J724

CPC分类号： H01J27/143 ,  H01J37/08 ,  H01J2237/0825

摘要： A multiple-beam ion-beam assembly consisting of two or more concentrically arranged ring-shaped ion-beam sources having ion-beam slits that emit a plurality of ion beams which overlap on the surface being treated and thus ensure uniformity in distribution of ion currents on the treated surface. Since the ion-beam assembly consists of a plurality of individual source, uniform treatment can be performed on a large surface area. Several embodiments of the invention cover the systems with individual sources adjustable with respect to one another, with an oblique angle of incidence of beams emitted from individual source, and with combination of oblique angles and adjustable sources.

摘要翻译： 由具有离子束狭缝的两个或更多个同心布置的环形离子束源组成的多光束离子束组件，其发射在被处理的表面上重叠的多个离子束，从而确保离子电流的分布均匀 在被处理的表面上。 由于离子束组件由多个单独的源组成，所以可以在大的表面积上进行均匀的处理。 本发明的几个实施例覆盖具有相对于彼此可调节的各个源的系统，具有从各个源发射的光束的倾斜入射角以及倾斜角度和可调节源的组合。

公开(公告)号：US06214183B1

公开(公告)日：2001-04-10

申请号：US09240468

申请日：1999-01-30

申请人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

发明人： Yuri Maishev ,  James Ritter ,  Leonid Velikov ,  Alexander Shkolnik

IPC分类号： C23C1434

CPC分类号： C23C14/3442 ,  C23C14/46 ,  H01J37/3053 ,  H01J37/3408

摘要： A combined ion-source and sputtering magnetron apparatus of the invention comprises a vacuum working chamber that contains a sputtering magnetron, an object to be treated fixed inside the housing of the chamber, and an ion-beam source installed within the working chamber between the object and the sputtering magnetron. In a preferred embodiment, the ion source is a cold-cathode ion source with a closed loop ion-emitting slit and drift of electrons in crossed electric and magnetic fields. The ion source emits the ion beam in the radial inward or outward direction onto the surface of the magnetron target at an oblique angle to the target surface. The bombardment of the target surface with the ion beam generates a large amount of sputtered particles. In addition, the ion bombardment forms a large amount of secondary electrons which are accelerated in the direction away from the target and are held in the crossed electric and magnetic fields of the magnetron target. These electrons ionize molecules of a working gas and forms a plasma. Ions are extracted from the plasma towards the target and sputter its material. This process is maintained in a steady mode. The apparatus is shown in various embodiments including a conveyor treatment.

摘要翻译： 本发明的组合离子源和溅射磁控管装置包括真空工作室，其包含溅射磁控管，待处理物体固定在腔室的壳体内部，以及安装在工件室内的离子束源 和溅射磁控管。 在优选实施例中，离子源是具有闭环离子发射狭缝的冷阴极离子源和交叉电场和磁场中的电子漂移。 离子源以径向向内或向外的方向将离子束以与目标表面成倾斜角度的方式发射到磁控管靶的表面上。 用离子束轰击目标表面产生大量的溅射颗粒。 此外，离子轰击形成大量的二次电子，其在远离靶的方向上加速并保持在磁控管靶的交叉电场和磁场中。 这些电子使工作气体的分子离子化并形成等离子体。 将离子从等离子体中提取到靶并溅射其材料。 该过程保持在稳定模式。 该装置在包括输送机处理的各种实施例中示出。