公开(公告)号：US20100187099A1

公开(公告)日：2010-07-29

申请号：US12677684

申请日：2008-11-25

申请人： Yutaka Wada

发明人： Yutaka Wada

IPC分类号： G11B5/62 ,  G11B7/00 ,  C23C14/34

CPC分类号： G11B7/2437 ,  G11B7/2433 ,  G11B7/2578 ,  G11B2007/24304 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/2432 ,  G11B2007/24324 ,  G11B2007/25708 ,  G11B2007/2571 ,  G11B2007/25713 ,  G11B2007/25715 ,  Y10T428/21

摘要： A write-once optical recording medium includes an inorganic recording layer and a protective layer provided on at least one surface of the inorganic recording layer. This protective layer contains indium oxide and tin oxide as main components.

摘要翻译： 一次写入光记录介质包括无机记录层和设置在无机记录层的至少一个表面上的保护层。 该保护层含有氧化铟和氧化锡作为主要成分。

公开(公告)号：US20100081361A1

公开(公告)日：2010-04-01

申请号：US12566224

申请日：2009-09-24

申请人： Akira Fukuda ,  Yoshihiro Mochizuki ,  Yutaka Wada ,  Yoichi Shiokawa ,  Hirokuni Hiyama

发明人： Akira Fukuda ,  Yoshihiro Mochizuki ,  Yutaka Wada ,  Yoichi Shiokawa ,  Hirokuni Hiyama

IPC分类号： B24B53/02 ,  B24B1/00 ,  B24B53/12

CPC分类号： B24B53/017

摘要： A method of dressing a polishing member with a diamond dresser having diamond particles arranged on a surface thereof is provided. The method includes determining dressing conditions by performing a simulation of a distribution of a sliding distance of the diamond dresser on a surface of the polishing member, and dressing the polishing member with the diamond dresser under the dressing conditions determined. The simulation includes calculation of the sliding distance corrected in accordance with a depth of the diamond particles thrusting into the polishing member.

摘要翻译： 提供了一种用金刚石修整器修整抛光构件的方法，其具有布置在其表面上的金刚石颗粒。 该方法包括通过对抛光构件的表面上的金刚石修整器的滑动距离的分布进行模拟来确定修整条件，以及在确定的修整条件下用金刚石修整器修整抛光构件。 模拟包括根据推入抛光构件的金刚石颗粒的深度校正的滑动距离的计算。

公开(公告)号：US07214122B2

公开(公告)日：2007-05-08

申请号：US11274112

申请日：2005-11-16

申请人： Kazuto Hirokawa ,  Shunsuke Nakai ,  Shinrou Ohta ,  Yutaka Wada ,  Yoichi Kobayashi

发明人： Kazuto Hirokawa ,  Shunsuke Nakai ,  Shinrou Ohta ,  Yutaka Wada ,  Yoichi Kobayashi

IPC分类号： B24B49/00

CPC分类号： B24B37/205 ,  B24B37/013 ,  B24B49/12 ,  H01L21/30625

摘要： A substrate polishing apparatus is used to polish a surface of a substrate such as a semiconductor wafer to a flat mirror finish. The substrate polishing apparatus has a polishing table and a polishing pad mounted on the polishing table for polishing a semiconductor substrate. The polishing pad has a through hole formed therein. The substrate polishing apparatus also has a light emission and reception device for emitting measurement light through the through hole formed in the polishing pad to the semiconductor substrate and receiving reflected light from the semiconductor substrate so as to measure a film on the semiconductor substrate. The light emission and reception device is disposed in the polishing table. The substrate polishing apparatus includes a supply passage for supplying a fluid to a path of the measurement light. The supply passage has an outlet portion detachably mounted on the polishing table. The substrate polishing apparatus also includes a protection cover mounted on the polishing table and fitted into the through hole when the polishing pad is attached to the polishing table.

摘要翻译： 基板抛光装置用于将诸如半导体晶片的基板的表面抛光到平面镜面。 基板研磨装置具有安装在研磨台上的用于研磨半导体基板的研磨台和研磨垫。 抛光垫在其中形成有通孔。 基板研磨装置还具有发光和接收装置，用于通过形成在抛光垫中的通孔将测量光发射到半导体衬底并接收来自半导体衬底的反射光，以测量半导体衬底上的膜。 发光和接收装置设置在抛光台中。 衬底抛光装置包括用于将流体供应到测量光的路径的供给通道。 供给通道具有可拆卸地安装在抛光台上的出口部分。 衬底抛光装置还包括安装在抛光台上并当抛光垫附接到抛光台时装配到通孔中的保护盖。

公开(公告)号：US07173884B2

公开(公告)日：2007-02-06

申请号：US10482424

申请日：2002-05-14

申请人： Yutaka Wada ,  Hiroshi Nakayama

发明人： Yutaka Wada ,  Hiroshi Nakayama

IPC分类号： G11B11/00 ,  B32B3/02

CPC分类号： G11B11/10586 ,  G11B7/00

摘要： A first dielectric layer 3, a multilayer magnetic film 10 in which a first magnetic layer 4 having perpendicular magnetic anisotropy at room temperature, a second magnetic layer 5 having inplane magnetic anisotropy at room temperature, and a third magnetic layer 6 having perpendicular magnetic anisotropy at room temperature are sequentially laminated, a second dielectric layer 7, a reflective layer 8, and a protective layer 9 are sequentially laminated onto one principal plane of a disk substrate 2 on which a land and a groove exist, thereby forming a magnetooptic disk 1. Saturation magnetization of the second magnetic layer 5 is set to a range from 8.80×10−2 to 1.76×10−1 Wb/m2. A gas pressure upon film creation of the second magnetic layer is set to a range from 0.6 to 3.0 Pa. A content ratio of Co in the third magnetic layer 6 is set to a range from 15 to 17 atom %.

摘要翻译： 第一电介质层3，其中在室温下具有垂直磁各向异性的第一磁性层4，室温下具有平面磁各向异性的第二磁性层5和具有垂直磁各向异性的第三磁性层6的多层磁性膜10 依次层压室温，第二电介质层7，反射层8和保护层9依次层叠在其上存在焊盘和凹槽的盘基板2的一个主平面上，从而形成磁光盘1。 第二磁性层5的饱和磁化强度设定在8.80×10 -2至1.76×10 -1 Wb / m 2范围内。 将第二磁性层成膜时的气体压力设定为0.6〜3.0Pa的范围，将第三磁性层6中的Co含量比设定为15〜17原子％。

公开(公告)号：US20050094548A1

公开(公告)日：2005-05-05

申请号：US10973444

申请日：2004-10-27

申请人： Yutaka Wada ,  Masatsugu Suwabe ,  Toshihiro Akimori ,  Junko Shimada ,  Keiji Oya ,  Koichi Shigeno ,  Toru Yano

发明人： Yutaka Wada ,  Masatsugu Suwabe ,  Toshihiro Akimori ,  Junko Shimada ,  Keiji Oya ,  Koichi Shigeno ,  Toru Yano

IPC分类号： B41M5/26 ,  G11B7/0045 ,  G11B7/24 ,  G11B7/244 ,  G11B7/247

CPC分类号： G11B7/00455 ,  G11B7/246 ,  G11B7/2472 ,  G11B7/2533 ,  G11B7/2534 ,  G11B7/259 ,  G11B2007/24612 ,  Y10T428/21

摘要： An optical recording medium comprises a transmission substrate and a recording layer formed on the transmission substrate, the recording layer containing at least a dye material expressed by a general formula shown at the following chemical formula (in the chemical formula 1, R1 represents alkyl group having carbon numbers 1 to 4, R2, R3 represent alkyl group having carbon numbers 1 to 4, benzyl group or groups combined to form 3 to 6 rings, Y1 and Y2 independently represent organic groups and X represent ClO4, BF4, PF6, SbF6) and a dye material expressed by a general formula represented by the following chemical formula 2(in the chemical formula 2, R1 and R2 represent alkyl groups having carbon numbers 1 to 4, benzyl groups or groups combined to form 3 to 6 rings, Y1, Y2 independently represent organic groups and X represent ClO4, BF4, PF6, SbF6): In a write once type optical recording medium such as DVD−R and DVD+R, satisfactory recording characteristics can be obtained from low-speed recording to high-speed recording.

摘要翻译： 光记录介质包括传输基板和形成在传输基板上的记录层，该记录层至少含有由以下化学式表示的通式表示的染料材料（化学式1中，R1表示具有 碳数1至4，R2，R3表示碳数为1至4的烷基，苄基或组合形成3至6个环的基团，Y1和Y2独立地表示有机基团，X表示ClO 4 ，BF 4，PF 6，SbF 6）和由以下化学式2表示的通式表示的染料（在 化学式2，R 1和R 2表示碳数为1至4的烷基，苄基或组合形成3至6个环的基团，Y 1，Y 2独立地表示有机基团，X表示ClO 4，BF 在一次写入型光记录媒体中，例如， 作为DVD-R和DVD + R，可以从低速记录到高速记录获得令人满意的记录特性。

公开(公告)号：US20050054267A1

公开(公告)日：2005-03-10

申请号：US10958248

申请日：2004-10-06

申请人： Yutaka Wada ,  Tomohiko Akatsuka ,  Tatsuya Sasaki

发明人： Yutaka Wada ,  Tomohiko Akatsuka ,  Tatsuya Sasaki

IPC分类号： B24B7/22 ,  B24B53/007 ,  B24B53/095 ,  H01L21/3105 ,  B24B49/00

CPC分类号： B24B53/017 ,  B24B7/228 ,  B24B53/095 ,  H01L21/31053

摘要： A wafer is pressed against a fixed abrasive and brought into sliding contact with the fixed abrasive. Thus, the wafer is polished. A surface of the fixed abrasive is dressed so as to generate free abrasive particles thereon. A liquid or a gas, composed of a mixture of liquid or inert gas and pure water or chemical liquid, is ejected onto the surface of the fixed abrasive during or after the dressing process.

摘要翻译： 将晶片压靠固定的磨料并与固定的磨料滑动接触。 因此，晶片被抛光。 修整固定磨料的表面以在其上产生游离的磨料颗粒。 由液体或惰性气体与纯水或化学液体的混合物组成的液体或气体在修整过程中或之后被喷射到固定磨料的表面上。

公开(公告)号：US06454644B1

公开(公告)日：2002-09-24

申请号：US09629440

申请日：2000-07-31

申请人： Hisamitsu Miyazaki ,  Hirokuni Hiyama ,  Yutaka Wada

发明人： Hisamitsu Miyazaki ,  Hirokuni Hiyama ,  Yutaka Wada

IPC分类号： B24D1100

CPC分类号： B24B37/26 ,  B24B37/245 ,  B24D3/32 ,  B24D7/06 ,  B24D18/0009

摘要： A polishing tool uses a fixed abrasive polisher which can perform polishing of an object with good surface accuracy for a long period of time. A mixture of abrasive grains, having an average particle diameter of 0.01 to 2.0 &mgr;m, and comprising at least one of cerium oxide, manganese oxide, titanium oxide, zirconia, silica, and iron oxide, and polyimide resin particles or phenolic resin particles having an average particle diameter of 0.1 to 20 &mgr;m is heated at a temperature of 120 to 250° C. under a pressure of 9,800 to 49,000 kPa (100 to 500 kg/cm2) to mold the mixture into a desired shape. This can provide a polisher 4 having abrasive grains dispersed in a thermosetting resin, and having abrasive grains of 20 to 60% by volume, a binder of 30 to 50% by volume, pores of not more than 40% by volume, and a Rockwell hardness of not less than 30 in terms of the H scale. This polisher is attached to a surface plate by an epoxy adhesive to produce a polishing tool.

摘要翻译： 抛光工具使用固定磨料抛光机，其可以长时间对表面精度进行抛光。 平均粒径为0.01〜2.0μm，并且包含氧化铈，氧化锰，氧化钛，氧化锆，二氧化硅和氧化铁中的至少一种的磨粒的混合物，以及聚酰亚胺树脂粒子或酚醛树脂粒子 将平均粒径为0.1〜20μm的树脂在温度为120〜250℃，压力为9,800〜49000kPa（100〜500kg / cm2）的条件下加热，成型为所需的形状。 这可以提供一种抛光机4，其具有分散在热固性树脂中的磨粒，并且具有20至60体积％的磨料颗粒，30至50体积％的粘合剂，不超过40体积％的孔，以及洛氏 硬度以H比例计不低于30。 该抛光机通过环氧树脂粘合剂附接到表面板以产生抛光工具。

公开(公告)号：US06402588B1

公开(公告)日：2002-06-11

申请号：US09300383

申请日：1999-04-27

申请人： Hisanori Matsuo ,  Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa

发明人： Hisanori Matsuo ,  Hirokuni Hiyama ,  Yutaka Wada ,  Kazuto Hirokawa

IPC分类号： B24B4900

CPC分类号： B24B41/068 ,  B24B7/228 ,  B24B37/30 ,  B24B49/04 ,  B24B53/017

摘要： The object of the present invention is to provide a polishing apparatus having a grinding member in a compact design that can provide high efficiency for both polishing and dressing operations, and prevents tilting of the grinding member even if the rotation axis thereof is moved away from the outer periphery of the object. A polishing apparatus for an object, comprises: an object holder for holding an object to be polished, such that a surface of the object to be polished faces upward; a dresser disk holder for holding a dresser disk for dressing, such that a dressing surface thereof faces upward; and a grinding member for polishing the object, and for being dressed by the dresser disk, by pressing and sliding the grinding member relative to the object and the dresser disk. Thereby, the surface to be polished and the dressing surface are arranged so as to be coploanar, and the grinding member having an abrasive surface facing downward, is disposed so as to straddle the surface to be polished of the object and the dressing surface of the dresser disk to perform polishing of the surface to be polished and dressing of the abrasive surface of the grinding member.

摘要翻译： 本发明的目的是提供一种研磨装置，其具有紧凑设计的研磨构件，其可以为抛光和修整操作提供高效率，并且防止研磨构件的倾斜，即使其旋转轴线远离 物体的外围。 一种物体的抛光装置，包括：用于保持被抛光物体的物体保持器，使得待抛光物体的表面朝上; 修整器盘保持器，用于保持修整器盘用于修整，使得其修整面朝上; 以及研磨构件，用于抛光所述物体，并且由所述修整器盘修整，通过相对于所述物体和所述修整器盘压下并滑动所述研磨构件。 由此，被抛光面和修整面被配置成为共面的，并且具有面向下方的研磨面的研磨构件配置成跨越物体的被研磨面和修整面 修整器盘以执行抛光表面的抛光和研磨构件的研磨表面的修整。

公开(公告)号：US06325698B1

公开(公告)日：2001-12-04

申请号：US09387553

申请日：1999-09-01

申请人： Yutaka Wada ,  Hirokuni Hiyama ,  Norio Kimura

发明人： Yutaka Wada ,  Hirokuni Hiyama ,  Norio Kimura

IPC分类号： B24B4900

CPC分类号： B24B37/345 ,  B08B3/08 ,  B24B53/017 ,  H01L21/67051 ,  Y10S134/902

摘要： A method is suitable for cleaning substrates, after polishing, that require a high degree of cleanliness, such as semiconductor wafers, glass substrates, or liquid crystal displays. The method includes polishing a substrate using an abrasive liquid containing abrasive particles, and cleaning a polished surface of the substrate by supplying a cleaning liquid having substantially the same pH as the abrasive liquid or similar pH to the abrasive liquid so that a pH of the abrasive liquid attached to the polished surface of the substrate is not rapidly changed.

摘要翻译： 一种方法适用于清洗需要高度清洁度的基板，如半导体晶片，玻璃基板或液晶显示器。 该方法包括使用含磨料颗粒的磨料液研磨衬底，以及通过向研磨液中提供与磨料液体或类似pH具有基本上相同pH值的清洗液体来清洗衬底的抛光表面，使磨料的pH值 附着于基板抛光面的液体不会迅速变化。

公开(公告)号：US06309477B1

公开(公告)日：2001-10-30

申请号：US09373647

申请日：1999-08-13

申请人： Toshiaki Shimakura ,  Yutaka Wada ,  Takayuki Fukuoka

发明人： Toshiaki Shimakura ,  Yutaka Wada ,  Takayuki Fukuoka

IPC分类号： C23C2207

CPC分类号： C23C22/66 ,  C23C22/08 ,  C23C22/10 ,  C23C22/23 ,  C23C22/50 ,  C23C22/53 ,  C23C22/56 ,  C23C22/60 ,  C23C22/62

摘要： The present invention is relates to pretreatment chemicals metal materials to be painted containing at least one kind of sulfur-containing compounds and at least one of phosphorus ion-containing compounds, and an anticorrosive treatment of metal materials, by the pretreatment chemicals.

摘要翻译： 本发明涉及预处理化学品，其中预处理化学金属材料含有至少一种含硫化合物和至少一种含磷离子的化合物，以及金属材料的防腐蚀处理。