摘要:
In the present invention provides, in order to obtain a desired focal depth t in a range a of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ≤ α × M 2 × t - K × λ a θ In the above formula, parameters are defined as follows. λ: the wavelength of laser light θ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula θ=sin−1 (NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, K=1 M: the magnification of imaging optical system t: required focal depth α: acceptable increased amount of beam diameter
摘要:
An exposure image is accurately projected. An exposure apparatus includes a light source for emitting exposure light, a DMD, which includes a plurality of two-dimensionally-arranged pixel portions, and a telecentric optical system for collimating principal rays of the exposure light. The telecentric optical system is positioned in an optical path of the exposure light that enters the DMD. The DMD performs, based on an image signal, spatial light modulation on exposure light, which has been emitted from the light source, and that has entered the plurality of pixel portions, for each of the plurality of pixel portions.
摘要:
An exposure apparatus includes a light source for emitting exposure light, a spatial light modulation means for performing spatial light modulation, based on an image signal, on the exposure light, an imaging means for forming an image on a photosensitive material with the exposure light on which spatial light modulation has been performed, and a focus adjustment means for adjusting focus by changing the optical path length of the modulated exposure light when an image is formed on the photosensitive material with the spatially modulated exposure light. The imaging means forms an image with the spatially modulated exposure light only by a substantially rectangular region of the imaging means including the central portion of the imaging means.
摘要:
In the present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a DMD is placed satisfies the following relational formula. D W ≤ α × M 2 × t - K × λ a θ In the above formula, parameters are defined as follows. λ: the wavelength of laser light θ: the angle of beam outputted from an illumination light source that is derived by a numerical aperture (NA) of optical fiber according to the following formula θ=sin−1(NA) D: the width of beam outputted from the illumination light source W: the beam width at the position where the DMD is placed (at the irradiated surface) a: the size of one pixel on the DMD K: a coefficient determined by beam characteristics, K=1 M: the magnification of imaging optical system t: required focal depth α: acceptable increased amount of beam diameter
摘要:
An optical fiber of a bundled fiber light source is an optical fiber whose core diameter is uniform but whose emission end cladding diameter is smaller than an incidence end cladding diameter thereof, and a light emission region thereof is made smaller. An angle of luminous flux from this higher luminance bundled fiber light source, which passes through a lens system and is incident on a DMD, is smaller, i.e., an illumination NA is made smaller. Thus, an angle of flux which is incident on a surface that is to be exposed is smaller. That is, a minute image formation beam can be obtained without increasing the image formation NA, focal depth is lengthen.
摘要:
The invention provides a stereolithographic resin composition including a photo-curable component, a resin having a function of causing a reversible, quick sol-gel phase transition based on temperature change, and a filler, and a stereolithographic method using the resin composition.
摘要:
The present invention provides, in order to obtain a desired focal depth t in a range α of an acceptable increased amount of beam diameter, an exposure head is designed so that the ratio D/W of an output beam width D to a beam width W at the position where a digital micromirror device (DMD) is placed satisfies the following formula: D W ≤ α × M 2 × t - K × λ a θ .
摘要:
In an exposure apparatus of the invention, for a spatial light modulator, each of a plurality of pixel portions fewer than the total number of the pixel portions is controlled with a control signal generated according to exposure information. Namely, a part of the pixel portions is controlled without controlling a whole of the pixel portions on the substrate. Thus, the number of pixels in the pixel portions is decreased, and transfer time of the control signal becomes short. This enables modulation speed of the laser beam to be increased and the high-speed exposure to be performed. An incorporated laser light source, in which the laser beams are incorporated and struck on the optical fiber, is preferable to the laser device. By adopting the incorporated laser light source, high brightness and high output can be obtained, and it is preferable to the exposure of the spatial light modulator. Since the fiber array is obtained with few optical fibers, it is low cost. Since the number of optical fibers is few, the light-emitting region is further decreased when the optical fibers are arrayed.
摘要:
In a laser-diode-pumped solid state laser, a solid laser crystal is pumped by a pumping laser beam emitted from a laser diode and a harmonic of light emitted from the pumped solid laser crystal is caused to make laser oscillation by a resonator structure containing therein a nonlinear optical crystal. The electric current to be poured into the laser diode is controlled so that the pumping laser beam emitted from the laser diode is kept at an output level at which the pumping laser beam cannot cause the harmonic of light emitted from the solid laser crystal to make laser oscillation though pumping the solid laser crystal.
摘要:
A laser annealer has a laser light source with at least one GaN-type semiconductor laser and is configured so as to form emission points that emit laser beams having a wavelength of 350 to 450 nm, and a scanning device for scanning an annealing surface with the laser beams. The laser annealer may have a spatial light modulator for modulating the laser beams, and in which pixel portions whose light modulating states change in accordance with control signals are arranged on a substrate. The invention is applied to a laser thin-film forming apparatus. The apparatus has a laser source that has at least one semiconductor laser and is configured so as to form emission points, and an optical system for focusing laser beams into a single beam in the width direction of a substrate.