公开(公告)号：US06942811B2

公开(公告)日：2005-09-13

申请号：US09954864

申请日：2001-09-17

Applicant: Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

Inventor： Satyadev R. Patel ,  Gregory P. Schaadt ,  Douglas B. MacDonald ,  Hongqin Shi

IPC: B44C1/22 ,  B81B3/00 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  C23F1/08 ,  C23F1/12

CPC classification number: B81B3/00 ,  B81B2201/045 ,  B81C1/00476 ,  B81C1/00531 ,  B81C1/00595 ,  B81C99/0025 ,  B81C2201/0138 ,  B82Y30/00 ,  H01L21/3065 ,  H01L21/3081 ,  H01L21/32135

Abstract: The etching of a sacrificial silicon portion in a microstructure such as a microelectromechanical structure by the use of etchant gases that are noble gas fluorides or halogen fluorides is performed with greater selectivity toward the silicon portion relative to other portions of the microstructure by slowing the etch rate. The etch rate is preferably 30 um/hr or less, and can be 3 um/hr or even less. The selectivity is also improved by the addition of non-etchant gaseous additives to the etchant gas. Preferably the non-etchant gaseous additives that have a molar-averaged formula weight that is below that of molecular nitrogen offer significant advantages over gaseous additives of higher formula weights by causing completion of the etch in a shorter period of time while still achieving the same improvement in selectivity. The etch process is also enhanced by the ability to accurately determine the end point of the removal step. A vapor phase etchant is used to remove a material that has been deposited on a substrate, with or without other deposited structure thereon. By creating an impedance at the exit of an etching chamber (or downstream thereof), as the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. Also, the etch selectivity can be improved by doping the sacrificial material.

Abstract translation: 通过使用作为惰性气体氟化物或卤素氟化物的蚀刻剂气体在诸如微机电结构的微结构中蚀刻牺牲硅部分，相对于微结构的其它部分，通过减慢蚀刻速率对硅部分具有更大的选择性 。 蚀刻速率优选为30um / hr或更小，并且可以为3um / hr或甚至更小。 通过向蚀刻剂气体中添加非蚀刻剂气体添加剂也提高了选择性。 优选地，具有低于分子氮的摩尔平均配方重量的非蚀刻剂气态添加剂相对于具有较高配方重量的气体添加剂提供了显着的优点，通过在更短的时间段内完成蚀刻，同时仍然实现相同的改进 选择性。 通过精确确定去除步骤的终点的能力也可以增强蚀刻工艺。 气相蚀刻剂用于去除已经沉积在基底上的材料，其上具有或不具有其它沉积结构。 通过在蚀刻室（或其下游）的出口处产生阻抗，当气相蚀刻剂从蚀刻室通过时，监测蚀刻反应的气态产物，并且可以确定去除过程的终点。 气相蚀刻工艺可以流过，流过和脉冲的组合，或再循环回蚀刻室。 此外，通过掺杂牺牲材料可以改善蚀刻选择性。

公开(公告)号：US20050074919A1

公开(公告)日：2005-04-07

申请号：US10167361

申请日：2002-06-11

Applicant: Satayadev Patel ,  Andrew Huibers ,  Steve Chiang ,  Robert Duboc ,  Thomas Grobelny ,  Hung Chen ,  Dietrich Dehlinger ,  Peter Richards ,  Hongqin Shi ,  Anthony Sun

Inventor： Satayadev Patel ,  Andrew Huibers ,  Steve Chiang ,  Robert Duboc ,  Thomas Grobelny ,  Hung Chen ,  Dietrich Dehlinger ,  Peter Richards ,  Hongqin Shi ,  Anthony Sun

IPC: B81B3/00 ,  B81B7/00 ,  B81C1/00 ,  B81C3/00 ,  B81C99/00 ,  G02B26/08 ,  H01L21/301 ,  H01L21/60 ,  H01L23/02 ,  H01L23/22 ,  H01L23/24 ,  H01L21/44

CPC classification number: B81B7/0077 ,  B81B2201/042 ,  B81C1/00269 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  G02B26/0841 ,  H01L24/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/1461 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device is disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micromirror array. The two substrates can be bonded at the wafer level after depositing a getter material andlor solid or liquid lubricant on one or both of the wafers. The wafers can be bonded together hermetically if desired, and the pressure between the two substrates can be below atmosphere.

Abstract translation: 公开了投影系统，空间光调制器和用于形成MEMS器件的方法。 空间光调制器可以具有与包括微镜阵列的基板中的一个结合在一起的两个基板。 在一个或两个晶片上沉积吸气材料和固体或液体润滑剂之后，两个基底可以在晶片级结合。 如果需要，晶片可以密封在一起，并且两个基板之间的压力可以低于大气。

公开(公告)号：US20040012838A1

公开(公告)日：2004-01-22

申请号：US10305631

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers

IPC: G02B026/00

CPC classification number: B82Y30/00

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light blocking layer that is preferably a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light blocking layer can be formed as a pattern, such as a grid or strips for blocking light from entering gaps between adjacent micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成MEMS器件的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，其中一个衬底是透光衬底，并且在透光衬底上设置优选为光吸收层的遮光层，以选择性地阻挡光通过衬底。 光阻挡层可以形成为图案，例如用于阻挡光进入相邻微镜之间的间隙的栅格或条带。

公开(公告)号：US20020105729A1

公开(公告)日：2002-08-08

申请号：US10044451

申请日：2002-01-11

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Peter W. Richards ,  Andrew G. Huibers ,  Gregory R. Muir

IPC: G02B027/14

CPC classification number: H04N9/3114 ,  G02B26/008

Abstract: A color wheel is disclosed that has at least one segment that occupies, for a given radius, a percentage of the circumference of the wheel at that radius, which percentage varies continuously or in multiple steps from a radially inward point to a radially outer point on the wheel. In one embodiment, the color wheel has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the transitions from one filter segment to the next is curved or stepped. A color wheel also is disclosed that has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the segments is a higher brightness segment than the others and has sides facing adjacent filter segments that do not lie on the radius of the wheel. A projection system is also disclosed that has a light source, a unique color wheel, a spatial light modulator, and projection optics.

Abstract translation: 公开了一种色轮，其具有至少一个段，对于给定的半径占据在该半径处的轮的圆周的百分比，该百分比从径向内部点到径向外部点连续地或以多个步长 车轮。 在一个实施例中，色轮具有围绕轮的圆周彼此相邻的多个过滤器段，其中从一个过滤器段到下一个的过渡段中的至少一个是弯曲的或阶梯的。 还公开了一种色轮，其具有围绕车轮圆周彼此相邻的多个过滤器段，其中至少一个段是比其它段更高的亮度段，并且具有面向相邻过滤段的侧面，其不位于 轮的半径。 还公开了一种具有光源，独特色轮，空间光调制器和投影光学器件的投影系统。

公开(公告)号：US5835256A

公开(公告)日：1998-11-10

申请号：US665380

申请日：1996-06-18

Applicant: Andrew Huibers

Inventor： Andrew Huibers

IPC: G02B26/08 ,  G02B26/00

CPC classification number: G02B26/0841

Abstract: A spatial light modulator, comprised of an upper and a lower substrate. One or more electrostatically deflectable mirrors are suspended by torsion hinges from an optically transmissive upper substrate. The upper substrate is held above the lower substrate containing electronic circuitry. In operation, individual mirrors are selectively deflected and serve to spatially modulate light that is incident to, and then reflected back through, the upper substrate. An aperture layer is built into the upper substrate to enable light to reach only the flat mirror surfaces.

Abstract translation: 由上基板和下基板构成的空间光调制器。 一个或多个静电偏转反射镜通过扭转铰链从光学透射上基板悬挂。 上基板保持在包含电子电路的下基板上。 在操作中，单独的反射镜被选择性地偏转并且用于空间调制入射到上基板上并随后被上反射回的光。 在上基板中内置一个孔层，以使光仅能够到达平面镜表面。

公开(公告)号：US07113322B2

公开(公告)日：2006-09-26

申请号：US10947005

申请日：2004-09-21

Applicant: Satyadev Patel

Inventor： Satyadev Patel

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: The micromirror device of the present invention comprises a reflective deflectable mirror plate and an addressing electrode provided for deflecting the mirror plate, wherein the addressing electrode is displaced along a direction perpendicular to the length of the hinge such that a portion of the addressing electrode is extended beyond the mirror plate.

Abstract translation: 本发明的微反射镜装置包括反射偏转镜板和用于偏转镜板的寻址电极，其中寻址电极沿垂直于铰链长度的方向移位，使得寻址电极的一部分延伸 超越镜面板。

公开(公告)号：US07057674B2

公开(公告)日：2006-06-06

申请号：US10044451

申请日：2002-01-11

Applicant: Peter W. Richards ,  Andrew G. Huibers ,  Gregory R. Muir

Inventor： Peter W. Richards ,  Andrew G. Huibers ,  Gregory R. Muir

IPC: H04N9/12

CPC classification number: H04N9/3114 ,  G02B26/008

Abstract: A color wheel is disclosed that has at least one segment that occupies, for a given radius, a percentage of the circumference of the wheel at that radius, which percentage varies continuously or in multiple steps from a radially inward point to a radially outer point on the wheel. In one embodiment, the color wheel has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the transitions from one filter segment to the next is curved or stepped.A color wheel also is disclosed that has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the segments is a higher brightness segment than the others and has sides facing adjacent filter segments that do not lie on the radius of the wheel. A projection system is also disclosed that has a light source, a unique color wheel, a spatial light modulator, and projection optics.

公开(公告)号：US07057251B2

公开(公告)日：2006-06-06

申请号：US10198389

申请日：2002-07-17

Applicant: Jason S. Reid

Inventor： Jason S. Reid

IPC: H01L31/0232

CPC classification number: B81B3/0078 ,  B81B2201/045 ,  B81B2203/0118

Abstract: Micromechanical devices are provided that are capable of movement due to a flexible portion. The micromechanical device can have a flexible portion formed of an oxide of preferably an element from groups 3A to 6A of the periodic table (preferably from the first two rows of these groups) and a late transition metal (preferably from groups 8B or 1B of the periodic table). The micromechanical devices can be any device, particularly MEMS sensors or actuators preferably having a flexible portion such as an accelerometer, DC relay or RF switch, optical cross connect or optical switch, or a micromirror part of an array for direct view and projection displays. The flexible portion is preferably formed by sputtering a target having a group 8B or 1B element and a selected group 3A to 6A element, namely B, Al, In, Si, Ge, Sn, or Pb. The target can have other major constituents or impurities (e.g. additional group 3A to 6A element(s)). The target is reactively sputtered in a oxygen ambient so as to result in a sputtered hinge. It is possible to form both stiff and/or flexible portions of the micromechanical device in this way.

公开(公告)号：US07057246B2

公开(公告)日：2006-06-06

申请号：US09910537

申请日：2001-07-20

Applicant: Jason S. Reid

Inventor： Jason S. Reid

IPC: H01L29/82

CPC classification number: B81B3/0078 ,  B81B2201/045 ,  B81B2203/0118 ,  H01G5/18 ,  H01G5/40

Abstract: Micromechanical devices are provided that are capable of movement due to a flexible portion. The micromechanical device can have a flexible portion formed of a nitride of preferably an element from groups 3A to 6A of the periodic table (preferably from the first two rows of these groups) and a late transition metal (preferably from groups 8B or 1B of the periodic table). The micromechanical devices can be any device, particularly MEMS sensors or actuators preferably having a flexible portion such as an accelerometer, DC relay or RF switch, optical cross connect or optical switch, or a micromirror part of an array for direct view and projection displays. The flexible portion is preferably formed by sputtering a target having a group 8B or 1B element and a group 3A to 6A element. The target can have other major constituents or impurities (e.g. additional group 3A to 6A element(s)). The target is reactively sputtered in a nitrogen ambient so as to result in a sputtered hinge. It is possible to form both stiff and/or flexible portions of the micromechanical device in this way.

公开(公告)号：US07042622B2

公开(公告)日：2006-05-09

申请号：US10698563

申请日：2003-10-30

Applicant: Andrew Huibers ,  Satyadev Patel

Inventor： Andrew Huibers ,  Satyadev Patel

IPC: G02B26/00

CPC classification number: G02B26/0841

Abstract: A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.