公开(公告)号：US20040012838A1

公开(公告)日：2004-01-22

申请号：US10305631

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers

IPC: G02B026/00

CPC classification number: B82Y30/00

Abstract: A projection system, a spatial light modulator, and a method for forming a MEMS device are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light blocking layer that is preferably a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light blocking layer can be formed as a pattern, such as a grid or strips for blocking light from entering gaps between adjacent micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成MEMS器件的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，其中一个衬底是透光衬底，并且在透光衬底上设置优选为光吸收层的遮光层，以选择性地阻挡光通过衬底。 光阻挡层可以形成为图案，例如用于阻挡光进入相邻微镜之间的间隙的栅格或条带。

公开(公告)号：US20020105729A1

公开(公告)日：2002-08-08

申请号：US10044451

申请日：2002-01-11

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Peter W. Richards ,  Andrew G. Huibers ,  Gregory R. Muir

IPC: G02B027/14

CPC classification number: H04N9/3114 ,  G02B26/008

Abstract: A color wheel is disclosed that has at least one segment that occupies, for a given radius, a percentage of the circumference of the wheel at that radius, which percentage varies continuously or in multiple steps from a radially inward point to a radially outer point on the wheel. In one embodiment, the color wheel has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the transitions from one filter segment to the next is curved or stepped. A color wheel also is disclosed that has a plurality of filter segments adjacent each other around the circumference of the wheel, wherein at least one of the segments is a higher brightness segment than the others and has sides facing adjacent filter segments that do not lie on the radius of the wheel. A projection system is also disclosed that has a light source, a unique color wheel, a spatial light modulator, and projection optics.

Abstract translation: 公开了一种色轮，其具有至少一个段，对于给定的半径占据在该半径处的轮的圆周的百分比，该百分比从径向内部点到径向外部点连续地或以多个步长 车轮。 在一个实施例中，色轮具有围绕轮的圆周彼此相邻的多个过滤器段，其中从一个过滤器段到下一个的过渡段中的至少一个是弯曲的或阶梯的。 还公开了一种色轮，其具有围绕车轮圆周彼此相邻的多个过滤器段，其中至少一个段是比其它段更高的亮度段，并且具有面向相邻过滤段的侧面，其不位于 轮的半径。 还公开了一种具有光源，独特色轮，空间光调制器和投影光学器件的投影系统。

公开(公告)号：US20040100677A1

公开(公告)日：2004-05-27

申请号：US10305536

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers ,  Satyadev R. Patel

IPC: G02B026/00

CPC classification number: G02B26/0833 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  H01L24/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01041 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/10329 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00

Abstract: A projection system, a spatial light modulator, and a method for forming a micromirror array such as for a projection display are disclosed. The spatial light modulator can have two substrates bonded together with one of the substrates comprising a micro-mirror array. The two substrates can be bonded at the wafer level after depositing a getter material and/or solid or liquid lubricant on one or both of the wafers if desired. In one embodiment of the invention, one of the substrates is a light transmissive substrate and a light absorbing layer is provided on the light transmissive substrate to selectively block light from passing through the substrate. The light absorbing layer can form a pattern, such as a frame around an array of micro-mirrors.

Abstract translation: 公开了投影系统，空间光调制器和用于形成诸如投影显示器的微镜阵列的方法。 空间光调制器可以具有与包括微镜阵列的基板之一粘合在一起的两个基板。 如果需要，在沉积吸气剂材料和/或固体或液体润滑剂在一个或两个晶片上之后，两个基底可以在晶片层上结合。 在本发明的一个实施例中，一个基板是透光基板，并且在透光基板上设置光吸收层，以选择性地阻挡光通过基板。 光吸收层可以形成图案，例如围绕微镜阵列的框架。

公开(公告)号：US20030073302A1

公开(公告)日：2003-04-17

申请号：US10270465

申请日：2002-10-11

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers

IPC: H01L021/4763

CPC classification number: B81C1/00801 ,  B81C1/00095 ,  B81C1/00476 ,  B81C99/0065 ,  B81C2201/0138 ,  B81C2201/117 ,  H01L21/7682

Abstract: Processes are disclosed for forming integrated circuit devices where multilayered structures are formed having between layers a removable silicon material. The layers adjacent the removable silicon can be either conducting or insulating or both. After forming one or more layers with the removable silicon therebetween, the silicon is removed so as to provide for an air-gap dielectric. In one embodiment, adjacent layers are copper. Between the copper and removable silicon can be a barrier layer, such as a transition metal-silicon-nitride layer. In a preferred embodiment, the removable silicon is removed with a gas phase interhalogen or noble gas halide.

Abstract translation: 公开了用于形成集成电路器件的工艺，其中多层结构在层之间形成可移除的硅材料。 与可去除的硅相邻的层可以是导电的或绝缘的，也可以是两者。 在其间具有可去除的硅形成一个或多个层之后，去除硅以提供气隙电介质。 在一个实施例中，相邻层是铜。 在铜和可移除的硅之间可以是阻挡层，例如过渡金属 - 氮化硅层。 在优选的实施方案中，用气相卤间或惰性气体卤化物除去可除去的硅。

公开(公告)号：US20030054588A1

公开(公告)日：2003-03-20

申请号：US10005308

申请日：2001-12-03

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Satyadev R. Patel ,  Andrew G. Huibers ,  Steven S. Chiang

IPC: H01L021/44

CPC classification number: B81C1/00214 ,  B81B7/0077 ,  B81B2201/042 ,  B81C1/00333 ,  B81C1/00896 ,  B81C1/00904 ,  B81C2203/0118 ,  B82Y30/00 ,  G02B26/0833 ,  H01L24/97 ,  H01L2224/48091 ,  H01L2224/97 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01018 ,  H01L2924/01019 ,  H01L2924/0102 ,  H01L2924/01023 ,  H01L2924/01027 ,  H01L2924/01033 ,  H01L2924/01039 ,  H01L2924/01049 ,  H01L2924/01054 ,  H01L2924/01058 ,  H01L2924/01072 ,  H01L2924/01074 ,  H01L2924/01077 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04953 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/10329 ,  H01L2924/12036 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15787 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/3025 ,  H01L2924/00014 ,  H01L2224/85 ,  H01L2924/00

Abstract: A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.

公开(公告)号：US20030134449A1

公开(公告)日：2003-07-17

申请号：US10338561

申请日：2003-01-07

Applicant: REFLECTIVITY, INC., a California Corporation

Inventor： Andrew G. Huibers

IPC: H01L021/00

CPC classification number: B81C3/002

Abstract: A method for making a MEMS device comprises forming a plurality of micromechanical elements on a first substrate; forming circuitry and electrodes on a second substrate, the first and second substrates extending in a plane in X and Y directions; aligning the first and second substrates in the X and Y directions and moving the substrates toward each other in a Z direction and bonding the first and second substrates with a gap therebetween in the Z direction to form an assembly; singulating the assembly into assembly portions; and altering the gap for each assembly portion. Another embodiment involves aligning the first and second substrates in the X and Y directions and moving the substrates toward each other in a Z direction and bonding the first and second substrates with a gap therebetween in the Z direction to form an assembly; actuating and testing the micromechanical elements of the assembly; and altering the gap for each assembly. A further embodiment involves aligning the first and second substrates in the X and Y directions and moving the substrates toward each other in a Z direction and bonding the first and second substrates with a gap therebetween in the Z direction to form an assembly; wherein the micromechanical elements are actuated while bonding of the substrates.

Abstract translation: 制造MEMS器件的方法包括在第一衬底上形成多个微机械元件; 在第二基板上形成电路和电极，所述第一和第二基板在X和Y方向上的平面中延伸; 使第一和第二基板沿X方向和Y方向对齐，并且沿Z方向彼此移动基板，并且在Z方向上将第一和第二基板之间的间隙接合以形成组件; 将组件分成组装部分; 并改变每个组装部分的间隙。 另一实施例涉及使第一和第二基板沿X方向和Y方向对准，并使基板沿Z方向彼此相对移动，并且在Z方向上将第一和第二基板之间的间隙接合以形成组件; 启动和测试组件的微机械元件; 并改变每个装配的间隙。 另一实施例涉及在第一和第二基板之间沿X方向和Y方向对准并沿Z方向彼此移动基板，并且在Z方向上将第一和第二基板之间的间隙接合以形成组件; 其中所述微机械元件在所述基板的接合的同时被致动。

公开(公告)号：US20020109821A1

公开(公告)日：2002-08-15

申请号：US10052012

申请日：2002-01-16

Applicant: REFLECTIVITY, INC., a California Corporation

Inventor： Andrew G. Huibers ,  Peter W. Richards

IPC: G03B021/14

CPC classification number: H04N9/3114 ,  G02B26/008 ,  G02B26/023

Abstract: A projection system is disclosed that has a light source of multiple wavelengths, a spatial light modulator and projection optics for projecting an image to be viewed by a viewer or to be displayed on a target. Also provided are one or more color sequencing devices which filter the light multiple times. Whether a single or plural color sequencing elements are provided, a single light beam passes at least twice through a sequence of light filters. In one embodiment, two color wheels provide the ability to filter the light multiple times. By changing the physical position or phase of one series of filters relative to another, the brightness and color saturation of the image projected through the projection optics can be changed. The changes in brightness and color saturation can be performed manually by mechanically changing the phase (or position) of the color sequencing device(s) relative to the light beam. Such changes can be performed step-wise of gradually through a continuum of brightness vs. color saturation points.

Abstract translation: 公开了具有多个波长的光源的投影系统，空间光调制器和用于投影由观看者观看或要显示在目标上的图像的投影光学器件。 还提供了一种或多种多次过滤光的颜色排序装置。 是否提供单个或多个颜色排序元件，单个光束通过一系列滤光器至少通过两次。 在一个实施例中，两个色轮提供多次过滤光的能力。 通过改变一系列滤光镜相对于另一系列的物理位置或相位，可以改变通过投影光学器件投影的图像的亮度和色彩饱和度。 亮度和色彩饱和度的变化可以通过机械地改变颜色排序装置相对于光束的相位（或位置）来手动执行。 这样的变化可以逐步地通过连续的亮度与色彩饱和度点逐步地执行。

公开(公告)号：US20040233505A1

公开(公告)日：2004-11-25

申请号：US10346506

申请日：2003-01-15

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers ,  Satyadev R. Patel

IPC: G02B026/00

CPC classification number: G02B26/0841

Abstract: A MEMS device is disclosed comprising: a substrate; a movable micromechanical element movable relative to the substrate; a connector and a hinge for allowing movement of the micromechanical element, wherein the connector is made of a material different than the hinge. In another embodiment of the invention, the connector has a conductivity greater than the hinge. In a further embodiment of the invention, the hinge provides at least 90% of the restoring force to the MEMS device, and the connector provides 10% or less of the restoring force. In a further embodiment of the invention, the connector and the hinge have different spring constants. In a still further embodiment of the invention, the connector experiences a lower strain at maximum deflection of the micromechanical element than the hinge.

Abstract translation: 公开了一种MEMS器件，包括：衬底; 可移动微机械元件，其相对于所述基板移动; 用于允许微机械元件移动的连接器和铰链，其中连接器由不同于铰链的材料制成。 在本发明的另一个实施例中，连接器的导电率大于铰链。 在本发明的另一实施例中，铰链提供至少90％的恢复力到MEMS装置，并且连接器提供10％或更小的恢复力。 在本发明的另一实施例中，连接器和铰链具有不同的弹簧常数。 在本发明的另一个实施例中，连接器在微机械元件的最大偏转处经受比铰链更低的应变。

公开(公告)号：US20040100594A1

公开(公告)日：2004-05-27

申请号：US10305507

申请日：2002-11-26

Applicant: REFLECTIVITY, INC., a California corporation

Inventor： Andrew G. Huibers ,  Peter W. Richards

IPC: G02F001/135

CPC classification number: B82Y30/00 ,  G02B26/0841 ,  H04N5/7458

Abstract: A projection system, a spatial light modulator, and a method for forming micromirrors are disclosed. A substrate comprises circuitry and electrodes for electrostatically deflecting micromirror elements that are disposed within an array of such elements forming the spatial light modulator. In one embodiment, the substrate is a silicon substrate having circuitry and electrodes thereon for electrostatically actuating adjacent micromirror elements, and the substrate is fully or selectively covered with a light absorbing material.

Abstract translation: 公开了投影系统，空间光调制器和用于形成微镜的方法。 衬底包括用于静电偏转微镜元件的电路和电极，微镜元件设置在形成空间光调制器的这种元件的阵列内。 在一个实施例中，衬底是具有电路和电极的硅衬底，用于静电地驱动相邻的微镜元件，并且衬底被完全或选择性地覆盖有光吸收材料。