Method for fabricating EUVL mask
    11.
    发明授权
    Method for fabricating EUVL mask 有权
    EUVL面膜的制作方法

    公开(公告)号:US07927769B2

    公开(公告)日:2011-04-19

    申请号:US12380872

    申请日:2009-03-03

    CPC classification number: G03F1/24 B82Y10/00 B82Y40/00 G03F1/80

    Abstract: A method for fabricating an extreme ultraviolet lithography (EUVL) mask. In an etching step, at least a part of an absorption layer of an EUVL mask is etched by allowing a charged particle to irradiate the absorption layer under feed of a halogenated xenon gas. In an oxidant feed step, an oxidant is fed to the absorption layer after the etching step to form an oxidized layer at a side surface of the absorption layer that is not etched during the etching step.

    Abstract translation: 一种用于制造极紫外光刻(EUVL)掩模的方法。 在蚀刻步骤中,通过使带电粒子在卤化氙气的供给下照射吸收层,对EUVL掩模的吸收层的至少一部分进行蚀刻。 在氧化剂进料步骤中,在蚀刻步骤之后,将氧化剂进料到吸收层,以在蚀刻步骤期间未被蚀刻的吸收层的侧表面上形成氧化层。

    X-ray analyzer
    12.
    发明授权
    X-ray analyzer 有权
    X射线分析仪

    公开(公告)号:US07910888B2

    公开(公告)日:2011-03-22

    申请号:US12343364

    申请日:2008-12-23

    CPC classification number: G01T1/1606

    Abstract: Provided is an X-ray analyzer capable of significantly suppressing an influence of an external magnetic field on a transition edge sensor (TES). The X-ray analyzer includes: a TES (7) for detecting energy of a received X-ray as a temperature change and outputting the temperature change as a current signal; a superconducting magnetic shield (8) which contains the TES (7) and enters a superconducting state; and a room temperature magnetic shield (9) which covers the superconducting magnetic shield (8) and performs external magnetic field shielding until the superconducting magnetic shield (8) enters the superconducting state, in which the superconducting magnetic shield (8) and the room temperature magnetic shield (9) are concentrically arranged to have a cylindrical shape.

    Abstract translation: 提供能够显着抑制外部磁场对过渡边缘传感器(TES)的影响的X射线分析装置。 X射线分析仪包括:TES(7),用于检测接收到的X射线的能量作为温度变化,并输出温度变化作为电流信号; 包含TES(7)并进入超导状态的超导磁屏蔽(8); 和覆盖超导磁屏蔽(8)的室温磁屏蔽(9),并执行外部磁场屏蔽,直到超导磁屏蔽(8)进入超导状态,其中超导磁屏蔽(8)和室温 磁屏蔽(9)同心地布置成具有圆柱形形状。

    Method of observing and method of working diamond stylus for working of atomic force microscope
    13.
    发明授权
    Method of observing and method of working diamond stylus for working of atomic force microscope 失效
    使用原子力显微镜工作的钻石笔的观察方法和方法

    公开(公告)号:US07804067B2

    公开(公告)日:2010-09-28

    申请号:US11951768

    申请日:2007-12-06

    Applicant: Osamu Takaoka

    Inventor: Osamu Takaoka

    CPC classification number: G01N23/2251 G01Q60/38 H01J2237/2583 H01J2237/28

    Abstract: When a characterization of a tip of a diamond stylus for working is needed, the tip of the diamond stylus for working used is observed by a high resolution scanning electron microscope of a high acceleration voltage under a steam atmosphere. When the tip of the diamond stylus for working is worn or when a shape of the tip of the stylus needs to be changed, the tip of the diamond stylus for working is worked by selectively irradiating an electron beam only to a necessary region by increasing an amount of steam and an amount of a current of the electron beam. When a working chip is strongly adhered to the diamond stylus for working and needs to be removed, the electron beam is selectively irradiated only to the working chip adhered to the tip of the diamond stylus for working to be removed under a xenon fluoride atmosphere.

    Abstract translation: 当需要用于工作的金刚石触针的尖端的表征时,用于工作的金刚石触针的尖端通过高蒸汽气氛下的高加速电压的高分辨率扫描电子显微镜观察。 当用于工作的金刚石触针的尖端被磨损时或者当需要改变触笔尖端的形状时,通过选择性地将电子束照射到所需区域来加工用于加工的金刚石触针的尖端, 蒸汽量和电子束的电流量。 当工作芯片牢固地粘附到用于工作的金刚石触针并且需要去除时,电子束被选择性地仅照射到粘附到金刚石触针的尖端的工作芯片上,以在氙氟化物气氛下去除。

    Working method by focused ion beam and focused ion beam working apparatus
    14.
    发明授权
    Working method by focused ion beam and focused ion beam working apparatus 有权
    聚焦离子束和聚焦离子束加工装置的工作方法

    公开(公告)号:US07750318B2

    公开(公告)日:2010-07-06

    申请号:US11918171

    申请日:2006-04-17

    Inventor: Tomokazu Kozakai

    Abstract: A first working process performs a deposition working or an etching working to a workpiece by face-irradiating a focused ion beam to the workpiece, and a second working process then performs a deposition working or an etching working to the workpiece by edge-irradiating a focused ion beam to an edge of the workpiece. During the first working process, the deposition working or the etching working is performed to add the missing portion or remove the excess portion to a point slightly short of the edge boundary of the workpiece, i.e., to a point that is less than the irradiation width of the focused ion beam. The remaining missing portion or the remaining excess portion is eliminated in the second working process by edge-irradiating the focused ion beam to the edge of the workpiece.

    Abstract translation: 第一工作过程通过将聚焦离子束面向工件进行对工件的沉积加工或蚀刻加工,然后第二工作过程通过边缘照射聚焦来对工件进行沉积加工或蚀刻加工 离子束到工件的边缘。 在第一工作过程中,执行沉积工作或蚀刻加工以增加缺失部分或将多余部分移除到略短于工件边缘边界的点,即小于照射宽度 的聚焦离子束。 通过将聚焦离子束边缘照射到工件的边缘,在第二工作过程中消除剩余的缺损部分或剩余的多余部分。

    X-ray tube and X-ray analysis apparatus
    15.
    发明授权
    X-ray tube and X-ray analysis apparatus 失效
    X射线管和X射线分析仪

    公开(公告)号:US07627088B2

    公开(公告)日:2009-12-01

    申请号:US12175743

    申请日:2008-07-18

    Abstract: A vacuumed enclosure has a window formed of an X-ray transmissive material. The vacuumed enclosure encloses an electron beam source for generating an electron beam and a target which, irradiated by the electron beam, generates a primary X-ray. The target is smaller in the outer dimension than the window and located on the center of the window such that it irradiates, through the window, the primary X-ray onto a sample located outside. The vacuumed enclosure further encloses an X-ray detector located such that it can detect a fluorescent X-ray and a scattered X-ray coming from the sample through the window. The X-ray detector generates a signal representative of energy information of the fluorescent X-ray and the scattered X-ray. The vacuumed enclosure further encloses a thermally and electrically conductive metal extending through the target across the widow.

    Abstract translation: 抽真空的外壳具有由X射线透射材料形成的窗口。 抽真空的外壳包围用于产生电子束的电子束源和由电子束照射的目标产生主X射线。 目标在外部尺寸上比窗口更小并且位于窗口的中心,使得其通过窗口将初级X射线照射到位于外部的样品上。 抽真空的外壳还包围一个X射线检测器,其位置使得它能够通过窗口检测来自样品的荧光X射线和散射的X射线。 X射线检测器产生表示荧光X射线和散射X射线的能量信息的信号。 被抽真空的外壳进一步封闭一个导电导电的金属,穿过该寡母延伸穿过目标。

    X-ray analysis apparatus and X-ray analysis method
    16.
    发明授权
    X-ray analysis apparatus and X-ray analysis method 有权
    X射线分析仪和X射线分析法

    公开(公告)号:US07623627B2

    公开(公告)日:2009-11-24

    申请号:US12369062

    申请日:2009-02-11

    Applicant: Yoshiki Matoba

    Inventor: Yoshiki Matoba

    CPC classification number: G01N23/223 G01N2223/076

    Abstract: Provided are an X-ray analysis apparatus and an X-ray analysis method, in which a measurer can judge an area incapable of being analyzed in a sample with a concave-convex portion. The X-ray analysis apparatus includes: an X-ray tubular bulb for irradiating an arbitrary irradiation point located on the sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray radiated from the sample and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray; a narrow-range illumination mechanism and a wide-range illumination mechanism for emitting an illumination light to the sample to illuminate the sample; and a narrow-range observation mechanism and a wide-range observation mechanism for obtaining an illumination image of the sample, which is illuminated with the illumination light, as image data, in which the narrow-range observation mechanism and the wide-range observation mechanism include a narrow-range oblique illumination section and a wide-range oblique illumination section, respectively, in which an optical axis of the illumination light at a time of the illuminating is set toward the irradiation point in the same direction as a direction linking the irradiation point with the X-ray detector at a time of the detecting.

    Abstract translation: 提供了一种X射线分析装置和X射线分析方法,其中测量器可以判断在具有凹凸部分的样品中不能分析的区域。 X射线分析装置包括:X射线管状灯泡,用于用辐射束照射位于样品上的任意照射点; 用于检测从样本辐射的特征X射线和散射X射线的X射线检测器,并输出包含关于特征X射线和散射X射线的能量信息的信号; 窄范围照明机构和用于向样品发射照明光以照射样品的宽范围照明机构; 以及用于获得被照明光照射的样本的照明图像的窄范围观察机构和宽范围观察机构作为图像数据,其中窄范围观察机构和广范围观察机构 包括窄范围倾斜照明部分和宽范围倾斜照明部分,其中在照射时将照明时的照明光的光轴设置成与照射的方向相同的方向 在检测时与X射线检测器指向。

    Superconducting X-ray detector and X-ray analysis apparatus using the same
    17.
    发明授权
    Superconducting X-ray detector and X-ray analysis apparatus using the same 有权
    超导X射线检测器和使用其的X射线分析仪器

    公开(公告)号:US07589323B2

    公开(公告)日:2009-09-15

    申请号:US11794288

    申请日:2006-01-24

    CPC classification number: G01N23/00 G01T1/006 H01L39/10

    Abstract: To provide a superconducting X-ray detector capable of carrying out a measurement by a high energy resolution by restraining a reduction in a sensitivity by a self magnetic field. A superconducting X-ray detector comprising a temperature detector 6 for detecting a temperature change by heat generated when an X-ray is absorbed, and a heat link 3 for controlling a heat flow amount of escaping the generated heat to a support board i, wherein the temperature detector 6 comprises a heat conducting multilayer thin film, the superconducting X-ray detector is constituted by a structure of providing a superconductor layer 4 above the heat link 3 and providing an insulating member 2 between the superconductor layer 4 and the temperature detector 6, the superconductor layer 4 and the temperature detector 6 are connected by a superconducting wiring 7 and uses materials by which superconducting transition temperatures of the superconductor layer 4 and the superconducting wiring 7 are higher than a superconducting transition temperature of the temperature detector 6.

    Abstract translation: 提供能够通过抑制自磁场的灵敏度降低而能够通过高能量分辨率进行测量的超导X射线检测器。 一种超导X射线检测器,包括:温度检测器6,用于通过吸收X射线时产生的热量来检测温度变化;以及热连接件3,其用于控制​​将所产生的热量排出到支撑板i上的热流量,其中 温度检测器6包括导热多层薄膜,超导X射线检测器由在超导体层3和温度检测器6之间提供绝热构件2的结构构成, ,超导体层4和温度检测器6通过超导布线7连接,并且使用超导体层4和超导布线7的超导转变温度高于温度检测器6的超导转变温度的材料。

    X-ray analysis apparatus and X-ray analysis method
    18.
    发明授权
    X-ray analysis apparatus and X-ray analysis method 失效
    X射线分析仪和X射线分析法

    公开(公告)号:US07587025B2

    公开(公告)日:2009-09-08

    申请号:US11972337

    申请日:2008-01-10

    CPC classification number: G01N23/223 G01N2223/076

    Abstract: In an X-ray analysis apparatus and an X-ray analysis method, a quantitative analysis is stably performed by stably behaving an X-ray source. There are possessed an X-ray tubular bulb irradiating a primary X-ray to a sample, a primary X-ray adjustment mechanism capable of adjusting an intensity of the primary X-ray, an X-ray detector detecting a characteristic X-ray radiated from the sample, thereby outputting a signal including energy informations of the characteristic X-ray and a scattered X-ray, an analyzer analyzing the above signal, and an incident X-ray adjustment mechanism disposed between the sample and the X-ray detector, and capable of adjusting a total intensity of the characteristic X-ray and the scattered x-ray, which are entered to the X-ray detector.

    Abstract translation: 在X射线分析装置和X射线分析方法中,通过稳定地进行X射线源的稳定地进行定量分析。 具有照射原始X射线的X射线管状灯管,能够调整主X射线强度的主X射线调整机构,检测特征X射线的X射线检测器 从样品输出包括特征X射线和散射X射线的能量信息的信号,分析上述信号的分析仪和设置在样品和X射线检测器之间的入射X射线调节机构, 并且能够调整输入到X射线检测器的特征X射线和散射X射线的总强度。

    Method of approaching probe and apparatus for realizing the same
    19.
    发明授权
    Method of approaching probe and apparatus for realizing the same 有权
    接近探头的方法及其实现方法

    公开(公告)号:US07511269B2

    公开(公告)日:2009-03-31

    申请号:US11208830

    申请日:2005-08-22

    Inventor: Masanao Munekane

    Abstract: A method of approaching a probe to a target position on a sample mounted on a sample stage tilted at a preselected tilt angle about a tilt axis of the sample stage. A distance between the tip of the probe and the target position of the sample is observed with a charged particle beam microscope while approaching the tip of the probe to the target position on the sample. The probe is moved in a direction so that on a display of the charged particle beam microscope, the tip of the probe and the tip of a shadow of the probe on the sample coincide at the target position on the sample.

    Abstract translation: 将探针接近安装在样品台上的样品上的目标位置的方法,其以围绕样品台的倾斜轴线的预选倾斜角度倾斜。 使用带电粒子束显微镜观察探针的尖端与样品的目标位置之间的距离,同时将探针的尖端接近样品的目标位置。 探针沿一个方向移动,使得在带电粒子束显微镜的显示器上,探针的尖端和样品上的探针阴影的尖端与样品上的目标位置重合。

    Thermal analysis apparatus
    20.
    发明授权
    Thermal analysis apparatus 失效
    热分析仪

    公开(公告)号:US07500779B2

    公开(公告)日:2009-03-10

    申请号:US11705669

    申请日:2007-02-13

    CPC classification number: G01N25/00 G01G1/00 G01N5/00

    Abstract: A thermal analysis apparatus possesses has a cylindrical furnace tube axially inserted in a cylindrical heating furnace, and a pair of sample holders extending axially inside the furnace tube. The furnace tube is supported by two axially spaced groups of butting members, each group having three or more butting members that are disposed in circumferentially spaced-apart relationship on the outside of the furnace tube and that butt against the furnace tube to restrain positional deviation thereof in a radial direction while permitting expansion and contraction thereof in the axial direction during heating of the furnace tube by the heating furnace.

    Abstract translation: 热分析装置具有轴向插入圆柱形加热炉中的圆柱形炉管和在炉管内轴向延伸的一对样品保持器。 炉管由两个轴向隔开的对接构件支撑,每组具有三个或更多个对接构件,其在炉管的外侧上以周向隔开的关系设置,并且与炉管对接以限制其位置偏差 同时在通过加热炉加热炉管的同时允许其沿轴向的膨胀和收缩。

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