Abstract:
A method for fabricating an extreme ultraviolet lithography (EUVL) mask. In an etching step, at least a part of an absorption layer of an EUVL mask is etched by allowing a charged particle to irradiate the absorption layer under feed of a halogenated xenon gas. In an oxidant feed step, an oxidant is fed to the absorption layer after the etching step to form an oxidized layer at a side surface of the absorption layer that is not etched during the etching step.
Abstract:
Provided is an X-ray analyzer capable of significantly suppressing an influence of an external magnetic field on a transition edge sensor (TES). The X-ray analyzer includes: a TES (7) for detecting energy of a received X-ray as a temperature change and outputting the temperature change as a current signal; a superconducting magnetic shield (8) which contains the TES (7) and enters a superconducting state; and a room temperature magnetic shield (9) which covers the superconducting magnetic shield (8) and performs external magnetic field shielding until the superconducting magnetic shield (8) enters the superconducting state, in which the superconducting magnetic shield (8) and the room temperature magnetic shield (9) are concentrically arranged to have a cylindrical shape.
Abstract:
When a characterization of a tip of a diamond stylus for working is needed, the tip of the diamond stylus for working used is observed by a high resolution scanning electron microscope of a high acceleration voltage under a steam atmosphere. When the tip of the diamond stylus for working is worn or when a shape of the tip of the stylus needs to be changed, the tip of the diamond stylus for working is worked by selectively irradiating an electron beam only to a necessary region by increasing an amount of steam and an amount of a current of the electron beam. When a working chip is strongly adhered to the diamond stylus for working and needs to be removed, the electron beam is selectively irradiated only to the working chip adhered to the tip of the diamond stylus for working to be removed under a xenon fluoride atmosphere.
Abstract:
A first working process performs a deposition working or an etching working to a workpiece by face-irradiating a focused ion beam to the workpiece, and a second working process then performs a deposition working or an etching working to the workpiece by edge-irradiating a focused ion beam to an edge of the workpiece. During the first working process, the deposition working or the etching working is performed to add the missing portion or remove the excess portion to a point slightly short of the edge boundary of the workpiece, i.e., to a point that is less than the irradiation width of the focused ion beam. The remaining missing portion or the remaining excess portion is eliminated in the second working process by edge-irradiating the focused ion beam to the edge of the workpiece.
Abstract:
A vacuumed enclosure has a window formed of an X-ray transmissive material. The vacuumed enclosure encloses an electron beam source for generating an electron beam and a target which, irradiated by the electron beam, generates a primary X-ray. The target is smaller in the outer dimension than the window and located on the center of the window such that it irradiates, through the window, the primary X-ray onto a sample located outside. The vacuumed enclosure further encloses an X-ray detector located such that it can detect a fluorescent X-ray and a scattered X-ray coming from the sample through the window. The X-ray detector generates a signal representative of energy information of the fluorescent X-ray and the scattered X-ray. The vacuumed enclosure further encloses a thermally and electrically conductive metal extending through the target across the widow.
Abstract:
Provided are an X-ray analysis apparatus and an X-ray analysis method, in which a measurer can judge an area incapable of being analyzed in a sample with a concave-convex portion. The X-ray analysis apparatus includes: an X-ray tubular bulb for irradiating an arbitrary irradiation point located on the sample with a radiation beam; an X-ray detector for detecting a characteristic X-ray and a scattered X-ray radiated from the sample and outputting a signal containing energy information on the characteristic X-ray and the scattered X-ray; a narrow-range illumination mechanism and a wide-range illumination mechanism for emitting an illumination light to the sample to illuminate the sample; and a narrow-range observation mechanism and a wide-range observation mechanism for obtaining an illumination image of the sample, which is illuminated with the illumination light, as image data, in which the narrow-range observation mechanism and the wide-range observation mechanism include a narrow-range oblique illumination section and a wide-range oblique illumination section, respectively, in which an optical axis of the illumination light at a time of the illuminating is set toward the irradiation point in the same direction as a direction linking the irradiation point with the X-ray detector at a time of the detecting.
Abstract:
To provide a superconducting X-ray detector capable of carrying out a measurement by a high energy resolution by restraining a reduction in a sensitivity by a self magnetic field. A superconducting X-ray detector comprising a temperature detector 6 for detecting a temperature change by heat generated when an X-ray is absorbed, and a heat link 3 for controlling a heat flow amount of escaping the generated heat to a support board i, wherein the temperature detector 6 comprises a heat conducting multilayer thin film, the superconducting X-ray detector is constituted by a structure of providing a superconductor layer 4 above the heat link 3 and providing an insulating member 2 between the superconductor layer 4 and the temperature detector 6, the superconductor layer 4 and the temperature detector 6 are connected by a superconducting wiring 7 and uses materials by which superconducting transition temperatures of the superconductor layer 4 and the superconducting wiring 7 are higher than a superconducting transition temperature of the temperature detector 6.
Abstract:
In an X-ray analysis apparatus and an X-ray analysis method, a quantitative analysis is stably performed by stably behaving an X-ray source. There are possessed an X-ray tubular bulb irradiating a primary X-ray to a sample, a primary X-ray adjustment mechanism capable of adjusting an intensity of the primary X-ray, an X-ray detector detecting a characteristic X-ray radiated from the sample, thereby outputting a signal including energy informations of the characteristic X-ray and a scattered X-ray, an analyzer analyzing the above signal, and an incident X-ray adjustment mechanism disposed between the sample and the X-ray detector, and capable of adjusting a total intensity of the characteristic X-ray and the scattered x-ray, which are entered to the X-ray detector.
Abstract:
A method of approaching a probe to a target position on a sample mounted on a sample stage tilted at a preselected tilt angle about a tilt axis of the sample stage. A distance between the tip of the probe and the target position of the sample is observed with a charged particle beam microscope while approaching the tip of the probe to the target position on the sample. The probe is moved in a direction so that on a display of the charged particle beam microscope, the tip of the probe and the tip of a shadow of the probe on the sample coincide at the target position on the sample.
Abstract:
A thermal analysis apparatus possesses has a cylindrical furnace tube axially inserted in a cylindrical heating furnace, and a pair of sample holders extending axially inside the furnace tube. The furnace tube is supported by two axially spaced groups of butting members, each group having three or more butting members that are disposed in circumferentially spaced-apart relationship on the outside of the furnace tube and that butt against the furnace tube to restrain positional deviation thereof in a radial direction while permitting expansion and contraction thereof in the axial direction during heating of the furnace tube by the heating furnace.