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11.发明授权TiO2-containing silica glass and optical member for EUV lithography using the same 有权含TiO 2的石英玻璃和使用其的EUV光刻的光学部件公开(公告)号：US08093165B2
公开(公告)日：2012-01-10
申请号：US12869035
申请日：2010-08-26
Applicant: Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
Inventor： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa , Yuko Tachibana
IPC: C03C3/06 , C03B19/06 , C03B37/018 , C03B25/00
CPC classification number: C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。
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12.发明授权TIO2-containing silica glass and optical member for lithography using the same 有权含TiO 2的石英玻璃和使用其的光刻用光学构件公开(公告)号：US08034731B2
公开(公告)日：2011-10-11
申请号：US12862174
申请日：2010-08-24
Applicant: Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
Inventor： Akio Koike , Yasutomi Iwahashi , Shinya Kikugawa
CPC classification number: C03C3/06 , C03B19/1453 , C03B2201/23 , C03B2201/42 , C03C2201/23 , C03C2203/44 , C03C2203/52 , C03C2203/54
Abstract: The present invention is to provide a TiO2—SiO2 glass whose coefficient of linear thermal expansion at the time of irradiating with high EUV energy light becomes substantially zero when used as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass, having a fictive temperature of 1,000° C. or lower, a OH concentration of 600 ppm or higher, a temperature at which the coefficient of linear thermal expansion becomes 0 ppb/° C. of from 40 to 110° C., and an average coefficient of linear thermal expansion in the temperature range of 20 to 100° C., of 50 ppb/° C. or lower.
Abstract translation: 本发明提供一种TiO 2 -SiO 2玻璃，当用作EUVL的曝光工具的光学部件时，其在高EUV能量光照射时的线性热膨胀系数基本为零。 本发明涉及具有1000℃以下的假想温度，600ppm以上的OH浓度，线性热膨胀系数为0ppb /℃的温度的含TiO 2的二氧化硅玻璃。 在20〜100℃的温度范围内的平均线性热膨胀系数为50ppb /℃以下。
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公开(公告)号：US07994083B2
公开(公告)日：2011-08-09
申请号：US11521683
申请日：2006-09-15
Applicant: Brian Lee Harper , Kenneth Edward Hrdina , John Edward LaSala
Inventor： Brian Lee Harper , Kenneth Edward Hrdina , John Edward LaSala
CPC classification number: C03C3/06 , C03B19/1453 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03C2201/21 , C03C2201/23 , C03C2203/54 , G03F7/708 , Y10S501/905
Abstract: Disclosed are methods for hydrogen loading silica glass and silica glass comprising loaded H2. The methods can lead to H2 gradient in the glass material. Alternatively, the method may involve the use of varying H2 partial pressure of H2 in the atmosphere. Both can result in expedited hydrogen loading process.
Abstract translation: 公开了负载二氧化硅玻璃和含有负载H2的石英玻璃的氢的方法。 这些方法可能导致玻璃材料中的H2梯度。 或者，该方法可以涉及在大气中使用H 2的变化的H 2分压。 两者都可以产生加速氢气加载过程。
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14.发明授权Synthetic silica material with low fluence-dependent-transmission and method of making the same 有权合成二氧化硅材料，具有低通量依赖性传输和制作相同的方法公开(公告)号：US07928026B2
公开(公告)日：2011-04-19
申请号：US11261005
申请日：2005-10-28
Applicant: Dana Craig Bookbinder , Kenneth Edward Hrdina , Glenn Eric Kohnke , Lisa Anne Moore , Susan Lee Schiefelbein , Charlene Marie Smith , Ulrich W H Neukirch
Inventor： Dana Craig Bookbinder , Kenneth Edward Hrdina , Glenn Eric Kohnke , Lisa Anne Moore , Susan Lee Schiefelbein , Charlene Marie Smith , Ulrich W H Neukirch
CPC classification number: C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/54
Abstract: Disclosed in the application are a synthetic silica glass having low fluence-dependent transmission, particularly at about 193 nm, and a process for making the same. The glass may desirably exhibit a low level of fluorescence at 290 and 390 nm when activated at about 248 nm. The glass may desirably exhibit low level of LIWFD, [SiH*] and/or [ODC].
Abstract translation: 在本申请中公开了具有低注射度依赖性透射率，特别是约193nm的合成二氧化硅玻璃及其制造方法。 当在约248nm激活时，该玻璃可期望地在290和390nm处表现出低水平的荧光。 玻璃可能期望显示低水平的LIWFD，[SiH *]和/或[ODC]。
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15.发明授权公开(公告)号：US07905932B2
公开(公告)日：2011-03-15
申请号：US11897406
申请日：2007-08-30
Applicant: Tatsuhiro Sato
Inventor： Tatsuhiro Sato
CPC classification number: C03C1/00 , C03B19/063 , C03B32/005 , C03B2201/12 , C03B2201/20 , C03B2201/24 , C03B2201/36 , C03C3/06 , C03C3/112 , C03C4/20 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/3411 , C03C2201/3435 , C03C2201/36
Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.
Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英粉，或是玻璃状SiO 2粉末的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。
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Patent Agency Ranking
公开(公告)号：US20110021339A1
公开(公告)日：2011-01-27
申请号：US12507950
申请日：2009-07-23
Applicant: Susan Lee Schiefelbein , Charlene Marie Smith
Inventor： Susan Lee Schiefelbein , Charlene Marie Smith
CPC classification number: C03C3/06 , C03B32/00 , C03B2201/21 , C03C4/0071 , C03C4/0085 , C03C23/0025 , C03C2201/21 , C03C2201/23 , C03C2203/54
Abstract: A silica glass article, such as a lens in a stepper/scanner system, having saturated induced absorption at wavelengths of less than about 250 nm. Saturated induced absorption is achieved by first removing Si—O defects in the silica glass by forming silicon hydride (SiH) at such defects, and loading the silica glass with hydrogen to react with E′ centers formed by photolysis of SiH in the silica glass article. The silicon hydride is formed by loading the silica glass with molecular hydrogen at temperatures of at least 475° C. After formation of SiH, the silica glass is loaded with additional molecular hydrogen at temperatures of less than 475° C.
Abstract translation: 石英玻璃制品，例如步进/扫描仪系统中的透镜，在小于约250nm的波长处具有饱和诱导吸收。 通过首先通过在这种缺陷处形成硅氢化物（SiH）来除去二氧化硅玻璃中的Si-O缺陷，并将石英玻璃与氢气一起加载到石英玻璃制品中通过SiH光解产生的E'中心反应而实现饱和诱导吸收 。 氢化硅是通过在至少475℃的温度下加载二氧化硅玻璃与分子氢形成的。在形成SiH之后，二氧化硅玻璃在小于475℃的温度下装载另外的分子氢。
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17.发明申请TIO2-CONTAINING SILICA GLASS AND OPTICAL MEMBER FOR EUV LITHOGRAPHY USING THE SAME 有权含氧二氧化硅玻璃和光学成员使用相同的EUV光刻公开(公告)号：US20100323872A1
公开(公告)日：2010-12-23
申请号：US12869035
申请日：2010-08-26
Applicant: Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
Inventor： Akio KOIKE , Yasutomi IWAHASHI , Shinya KIKUGAWA , Yuko TACHIBANA
IPC: C03C3/04
CPC classification number: C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B2201/075 , C03B2201/21 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C3/076 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2201/42 , C03C2203/44 , C03C2203/52 , C03C2203/54 , G03F1/24 , G03F7/70958 , Y02P40/57
Abstract: The present invention provides a TiO2—SiO2 glass in which when used as an optical member for an exposure tool for EUVL, a thermal expansion coefficient is substantially zero at the time of irradiation with high-EUV energy light, and physical properties of a multilayer can be kept over a long period of time by releasing hydrogen from the glass. The present invention relates to a TiO2-containing silica glass having a fictive temperature of 1,100° C. or lower, a hydrogen molecule concentration of 1×1016 molecules/cm3 or more, and a temperature, at which a linear thermal expansion coefficient is 0 ppb/° C., falling within the range of from 40 to 110° C.
Abstract translation: 本发明提供了一种TiO 2 -SiO 2玻璃，其中当用作用于EUVL的曝光工具的光学部件时，在高EUV能量光照射时热膨胀系数基本上为零，并且多层罐的物理性能 通过从玻璃中释放氢气，保持很长一段时间。 本发明涉及一种假想温度为1100℃或更低，氢分子浓度为1×1016分/厘米3或更高的含钛二氧化硅玻璃以及线性热膨胀系数为0的温度 ppb /℃，在40〜110℃的范围内。
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18.发明授权公开(公告)号：US07827824B2
公开(公告)日：2010-11-09
申请号：US11896948
申请日：2007-09-06
Applicant: Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
Inventor： Hisatoshi Otsuka , Kazuo Shirota , Osamu Sekizawa
CPC classification number: G03F7/70958 , C03B19/1453 , C03B2201/21 , C03B2201/23 , C03C3/06 , C03C4/0071 , C03C4/0085 , C03C2201/21 , C03C2201/23 , C03C2203/54 , Y02P40/57
Abstract: A synthetic quartz glass substrate having (i) an OH concentration of 1-100 ppm and a hydrogen molecule concentration of 1×1016-1×1019 molecules/cm3, (ii) an in-plane variation of its internal transmission at wavelength 193.4 nm which is up to 0.2%, and (iii) an internal transmission of at least 99.6% at wavelength 193.4 nm is suited for use with excimer lasers.
Abstract translation: （i）OH浓度为1-100ppm，氢分子浓度为1×1016-1×1019分子/ cm3的合成石英玻璃基板，（ii）其波长为193.4nm的内部透光率的面内变化 其高达0.2％，和（iii）在波长193.4nm处的至少99.6％的内部透射率适用于准分子激光器。
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公开(公告)号：US20100261597A1
公开(公告)日：2010-10-14
申请号：US12824923
申请日：2010-06-28
Applicant: Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
Inventor： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
IPC: C03C3/04
CPC classification number: C03B19/1453 , C03B19/1461 , C03B32/00 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C3/06 , C03C2201/12 , C03C2201/23 , C03C2201/40 , C03C2201/42 , C03C2203/40 , C03C2203/46 , C03C2203/54 , Y02P40/57
Abstract: The present invention is to provide a TiO2—SiO2 glass having suitable thermal expansion properties as an optical member of an exposure tool for EUVL. The present invention relates to a TiO2-containing silica glass having a temperature, at which a coefficient of thermal expansion is 0 ppb/° C., falling within the range of 23±4° C. and a temperature width, in which a coefficient of thermal expansion is 0±5 ppb/° C., of 5° C. or more.
Abstract translation: 本发明提供具有合适的热膨胀性能的TiO 2 -SiO 2玻璃作为EUVL用曝光工具的光学部件。 本发明涉及热膨胀系数为0ppb /℃的温度为23±4℃的温度范围的含TiO 2的二氧化硅玻璃，其温度范围为 的热膨胀为0±5ppb /℃，为5℃以上。
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20.发明授权Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder 有权由石英玻璃制成的用于加工半导体晶片的支架和用于制造支架的方法公开(公告)号：US07749930B2
公开(公告)日：2010-07-06
申请号：US11630405
申请日：2006-03-30
Applicant: Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
Inventor： Juergen Weber , Tobias Pogge , Martin Trommer , Bodo Kuehn , Ulrich Kirst , Waltraud Werdecker
CPC classification number: C03C3/06 , C03B19/06 , C03B19/09 , C03B32/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/32 , C03C15/00 , C03C19/00 , C03C23/0025 , C03C23/006 , C03C2201/11 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/32 , C03C2201/50 , C03C2203/54 , C30B25/12 , C30B31/14 , C30B35/00 , Y02P40/57
Abstract: An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.
Abstract translation: 用于具有蚀刻效果的环境中的晶片夹具的理想石英玻璃的特征在于高纯度和高耐干蚀刻性。 为了表明基本满足这些要求的石英玻璃，根据本发明提出，石英玻璃至少在近表面积中掺杂氮，其平均含量小于30重量ppm， 其虚拟温度低于1250℃，在1200℃的温度下其粘度至少为1013dPa·s。制备这种石英玻璃的经济方法包括以下方法步骤：将SiO 2原料熔化得到 将石英玻璃坯料，SiO 2原料或石英玻璃坯料进行脱水处理，将SiO2原料或石英玻璃坯料加热至1050℃〜1850℃的氮化温度， 含有氨的气氛，将石英玻璃坯料的石英玻璃设定为1250℃以下的假想温度的温度处理，以及格式化的石英玻璃坯料的表面处理 在石英玻璃夹具上。
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