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11.发明申请公开(公告)号：US20080053151A1
公开(公告)日：2008-03-06
申请号：US11897406
申请日：2007-08-30
Applicant: Tatsuhiro Sato
Inventor： Tatsuhiro Sato
CPC classification number: C03C1/00 , C03B19/063 , C03B32/005 , C03B2201/12 , C03B2201/20 , C03B2201/24 , C03B2201/36 , C03C3/06 , C03C3/112 , C03C4/20 , C03C2201/12 , C03C2201/23 , C03C2201/24 , C03C2201/26 , C03C2201/32 , C03C2201/3411 , C03C2201/3435 , C03C2201/36
Abstract: A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO2 particles. It is made form natural occurring quartz or it is fabricated synthetically. The “quartz powder” may be doped. The compounding ratio of the total amount (M1) of the aforementioned first elements and the total amount (M2) of the aforementioned second elements as the ratio of the number of atoms (M1)/(M2) is preferably from 0.1 to 20. Al as well as the aforementioned doped elements is preferably included in a mixed quartz powder of this invention.
Abstract translation: 混合石英粉含有0.1〜20质量％的石英粉和2种以上的掺杂元素。 上述掺杂元素包括选自N，C和F的第一掺杂元素和选自Mg，Ca，Sr，Ba，Sc，Y，Ti，Zr，Hf的第二掺杂元素， 镧系元素和锕系元素。 “石英粉”是结晶石英的粉末，或是玻璃状SiO 2颗粒的粉末。 它由天然石英制成，或者由合成制成。 可以掺杂“石英粉”。 上述第一元素的总量（M1）与上述第二元素的总量（M2）的配位比优选为0.1〜20。作为原子数（M1）/（M2）的比例，优选为0.1〜20。 以及上述掺杂元素优选包括在本发明的混合石英粉末中。
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公开(公告)号：US20010044370A1
公开(公告)日：2001-11-22
申请号：US09886764
申请日：2001-06-21
Inventor： Richard H. Crane , Laura O. De Angelis , William L. Haynes , Ronald L. Stewart
IPC: C03C003/095
CPC classification number: C03C4/085 , C03C3/06 , C03C3/095 , C03C2201/10 , C03C2201/3423 , C03C2201/3435 , C03C2201/36 , G02B5/208 , H01J61/302 , H01J61/40 , H01K1/32
Abstract: The present invention is directed at a family of glasses capable of absorbing UV radiation and filtering yellow light in the visible region of the spectrum, the family of glasses having a composition consisting essentially, in terms of weight percent on the oxide basis, of: 55-95.7% SiO2, 0-28% B2O3, 0.5-18% Al2O3, 0-4% SrO, 0-13% BaO, 0-13% CaO, 0-8% MgO, 0-7.5% Na2O, 0-9.5% K2O, 0-1.5% Li2O, 0-1.5% Sb2O3, 0.4-4.5% Nd2O3, and 0.1-1% CeO2. Glasses of the present invention are capable of employment as envelopes for tungsten-halogen lamps and other high temperature light sources, as well as sealed-beam incandescent headlights. Also, the glasses can be used as for other applications where high contrast and enhanced visible properties of transmitted or reflected visible light can be a benefit, such as opthalmic glass, computer screens with enhanced contrast properties, or glass hosts for lasers.
Abstract translation: 本发明涉及能够吸收紫外辐射并过滤光谱可见光区域中的黄光的玻璃系列，具有以氧化物为基准的基本上以重量百分数计的组成的玻璃系列为：55 -95.7％SiO 2，0-28％B 2 O 3，0.5-18％Al 2 O 3，0-4％SrO，0-13％BaO，0-13％CaO，0-8％MgO，0-7.5％Na 2 O，0-9.5 ％K2O，0-1.5％Li2O，0-1.5％Sb2O3，0.4-4.5％Nd2O3和0.1-1％CeO2。 本发明的玻璃能够用作钨卤素灯和其他高温光源以及密封束白炽灯的信封。 此外，眼镜可以用于其他应用，其中透射或反射的可见光的高对比度和增强的可见性可以是有益的，例如眼镜玻璃，具有增强的对比度性质的计算机屏幕或用于激光的玻璃主机。
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公开(公告)号：US4123229A
公开(公告)日：1978-10-31
申请号：US803649
申请日：1977-06-06
Applicant: Justice N. Carman
Inventor： Justice N. Carman
CPC classification number: C01B33/182 , B01J19/02 , C01B33/12 , C03B17/04 , C03C3/06 , B01J2219/0209 , C01P2006/80 , C03C2201/32 , C03C2201/3435 , C03C2201/42 , C03C2203/00 , Y02P20/142
Abstract: Method and apparatus for making vitreous silica of high purity including producing a melt of liquid silicon in a first chamber, mixing the liquid silicon with carbon dioxide in an upper zone of a second chamber to produce silicon monoxide, mixing the silicon monoxide with oxygen in a lower zone of the second chamber producing silicon dioxide in gaseous form, condensing the silicon dioxide on the wall of the second chamber, and withdrawing the resultant tube of vitreous silica from the lower end of the second chamber. The apparatus is lined with silica to prevent introduction of impurities. The liquid silicon is produced by mixing hydrogen and trichlorosilane.
Abstract translation: 用于制造高纯度的二氧化硅玻璃的方法和设备，包括在第一室中产生液态硅熔体，在第二室的上部区域中混合液体硅与二氧化碳以产生一氧化硅，将一氧化硅与氧气混合在一起 第二室的下部区域产生气态二氧化硅，将二氧化硅冷凝在第二室的壁上，并从第二室的下端抽出所得到的二氧化硅管。 该装置衬有二氧化硅以防止引入杂质。 液态硅是通过混合氢气和三氯硅烷来生产的。
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Patent Agency Ranking
14.发明授权Component of quartz glass for use in semiconductor manufacture and method for producing the same 有权用于半导体制造的石英玻璃的组分及其制造方法公开(公告)号：US08017536B2
公开(公告)日：2011-09-13
申请号：US12226861
申请日：2007-09-04
Applicant: Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
Inventor： Juergen Weber , Tatsuhiro Sato , Ralf Schneider , Achim Hofmann , Christian Gebauer
CPC classification number: C03C3/06 , C03B19/06 , C03B19/066 , C03B20/00 , C03B2201/07 , C03B2201/075 , C03B2201/24 , C03B2201/34 , C03B2201/36 , C03C4/20 , C03C2201/23 , C03C2201/24 , C03C2201/3411 , C03C2201/3435 , C03C2203/10 , C03C2203/54
Abstract: The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO2 and dopant). Starting from this, to provide a quartz glass component for use in semiconductor manufacture in an environment with etching action, which component is distinguished by both high purity and high resistance to dry etching and avoids known drawbacks caused by co-doping with aluminum oxide, it is suggested according to the invention that the first dopant should be nitrogen and that the mean content of metastable hydroxyl groups of the quartz glass is less than 30 wtppm.
Abstract translation: 本发明从用于半导体制造的石英玻璃的已知组件开始，至少在近表面区域中的该组分表现出第一掺杂剂和第二氧化物掺杂剂的共掺杂，所述第二掺杂剂含有一种或多种稀有金属 - 浓度为0.1-3重量％的矿物金属。 每个（基于SiO 2和掺杂剂的总质量）。 从此开始，为了在具有蚀刻作用的环境中提供用于半导体制造的石英玻璃组分，该组分通过高纯度和高耐干蚀刻性而被区分，并避免了与氧化铝共掺杂引起的已知缺点。 根据本发明建议第一掺杂剂应为氮，并且石英玻璃的亚稳态羟基的平均含量小于30重量ppm。
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公开(公告)号：US4469628A
公开(公告)日：1984-09-04
申请号：US370437
申请日：1982-04-21
Applicant: Catherine J. Simmons , Joseph H. Simmons , Pedro B. Macedo , Theodore A. Litovitz
Inventor： Catherine J. Simmons , Joseph H. Simmons , Pedro B. Macedo , Theodore A. Litovitz
IPC: B01D15/00 , B01J39/02 , B01J39/10 , B01J39/14 , C02F1/42 , G21F9/12 , G21F9/16 , G21F9/30 , C09K3/00 , C09K11/04
CPC classification number: C03C1/002 , B01J39/14 , C03C1/026 , C03C11/005 , C03C21/001 , C03C23/0095 , C03C3/06 , C03C3/061 , C03C3/089 , G21F9/12 , G21F9/305 , C03C2201/10 , C03C2201/20 , C03C2201/23 , C03C2201/3435 , C03C2201/40 , C03C2201/50
Abstract: This invention relates to the immobilization of toxic, e.g., radioactive, materials in a silicate glass or silica gel matrix for extremely long periods of time. Toxic materials, such as radioactive wastes containing radioactive cations, which may be in the form of liquids, or solids dissolved or dispersed in liquids or gases, are incorporated into a glass or silica gel matrix, having alkali metal, Group Ib metal and/or ammonium cations bonded to silicon atoms of said glass or silica gel through divalent oxygen linkages, by a process which involves the ion exchange of said toxic or radioactive cations with said alkali metal, Group Ib metal and/or ammonium cations to bind said toxic or radioactive cations to silicon atoms of said glass or silica gel through said silicon-bonded divalent oxygen linkages. Thereafter, the resulting glass or silica gel now characterized by toxic or radioactive cations bonded to silicon atoms through divalent oxygen linkages can be stored, or packaged in suitable containers, or disposed of as by burial, and/or sintered to collapse the pores thereof.
Abstract translation: 本发明涉及将硅酸盐玻璃或硅胶基质中的有毒的，例如放射性物质固定在极长时间内。 将含有放射性阳离子的放射性废物（其可以是液体的形式）或溶解或分散在液体或气体中的固体的有毒材料掺入玻璃或硅胶基质中，其具有碱金属，Ib族金属和/或 通过涉及所述有毒或放射性阳离子与所述碱金属，第Ib族金属和/或铵阳离子离子交换以结合所述有毒或放射性的方法的方法，通过二价氧键与所述玻璃或硅胶的硅原子键合的铵阳离子 通过所述硅键合的二价氧键与所述玻璃或硅胶的硅原子的阳离子。 此后，所得到的玻璃或硅胶的特征在于通过二价氧键与硅原子键合的有毒或放射性阳离子，可以储存或包装在合适的容器中，或通过埋置和/或烧结来处理以使其孔隙折叠。
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公开(公告)号：US4272488A
公开(公告)日：1981-06-09
申请号：US075644
申请日：1979-09-14
Applicant: Justice N. Carman
Inventor： Justice N. Carman
CPC classification number: C03C3/06 , C01B33/02 , C03C2201/10 , C03C2201/28 , C03C2201/30 , C03C2201/31 , C03C2201/32 , C03C2201/3435 , C03C2201/42 , C03C2203/00
Abstract: The method and apparatus for producing liquid silicon of high purity and for casting silicon. Hydrogen and a hydrogenated silane in gaseous state are mixed, preferably with a source of a small amount of oxygen, in a heated chamber producing the liquid silicon, with the exhaust gases bubbling out of the melt under a baffle. The chamber for the melt of liquid silicon preferably is lined with silicon dioxide. The liquid silicon may be used in making high purity vitreous silica and may be used in making castings of silicon. In making castings, the liquid silicon is accumulated in a second chamber and is periodically drawn from the second chamber into a third chamber which contains the mold for the casting.
Abstract translation: 用于生产高纯度硅和硅铸造液态硅的方法和装置。 氢气和气态的氢化硅烷在产生液体硅的加热室中混合，优选用少量氧气源，废气在挡板下方从熔体中冒出。 用于液体硅熔体的室优选用二氧化硅衬里。 液硅可用于制造高纯度二氧化硅玻璃，可用于制造硅铸件。 在制造铸件时，液态硅积聚在第二腔室中，并且从第二腔室周期性地拉入包含用于铸造的模具的第三腔室。
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公开(公告)号：US4176166A
公开(公告)日：1979-11-27
申请号：US800191
申请日：1977-05-25
Applicant: Justice N. Carman
Inventor： Justice N. Carman
IPC: C01B33/02
CPC classification number: C01B33/02 , C03C2201/10 , C03C2201/28 , C03C2201/30 , C03C2201/31 , C03C2201/32 , C03C2201/3435 , C03C2201/42 , C03C2203/00
Abstract: The method and apparatus for producing liquid silicon of high purity and for casting silicon. Hydrogen and a hydrogenated silane in gaseous state are mixed, preferably with a source of a small amount of oxygen, in a heated chamber producing the liquid silicon, with the exhaust gases bubbling out of the melt under a baffle. The chamber for the melt of liquid silicon preferably is lined with silicon dioxide. The liquid silicon may be used in making high purity vitreous silica and may be used in making castings of silicon. In making castings, the liquid silicon is accumulated in a second chamber and is periodically drawn from the second chamber into a third chamber which contains the mold for the casting.
Abstract translation: 用于生产高纯度硅和硅铸造液态硅的方法和装置。 氢气和气态的氢化硅烷在产生液体硅的加热室中混合，优选用少量氧气源，废气在挡板下方从熔体中冒出。 用于液体硅熔体的室优选用二氧化硅衬里。 液硅可用于制造高纯度二氧化硅玻璃，可用于制造硅铸件。 在制造铸件时，液态硅积聚在第二腔室中，并且从第二腔室周期性地拉入包含用于铸造的模具的第三腔室。
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公开(公告)号：US4054641A
公开(公告)日：1977-10-18
申请号：US684108
申请日：1976-05-07
Applicant: Justice N. Carman
Inventor： Justice N. Carman
CPC classification number: C01B33/182 , B01J19/02 , C01B33/12 , C03B17/04 , C03C3/06 , B01J2219/0209 , C01P2006/80 , C03C2201/32 , C03C2201/3435 , C03C2201/42 , C03C2203/00 , Y02P20/142
Abstract: Method and apparatus for making vitreous silica of high purity including producing a melt of liquid silicon in a first chamber, mixing the liquid silicon with carbon dioxide in an upper zone of a second chamber to produce silicon monoxide, mixing the silicon monoxide with oxygen in a lower zone of the second chamber producing silicon dioxide in gaseous form, condensing the silicon dioxide on the wall of the second chamber, and withdrawing the resultant tube of vitreous silica from the lower end of the second chamber. The apparatus is lined with silica to prevent introduction of impurities. The liquid silicon is produced by mixing hydrogen and trichlorosilane.
Abstract translation: 用于制造高纯度的二氧化硅玻璃的方法和设备，包括在第一室中产生液态硅熔体，在第二室的上部区域中混合液体硅与二氧化碳以产生一氧化硅，将一氧化硅与氧气混合在一起 第二室的下部区域产生气态二氧化硅，将二氧化硅冷凝在第二室的壁上，并从第二室的下端抽出所得到的二氧化硅管。 该装置衬有二氧化硅以防止引入杂质。 液态硅是通过混合氢气和三氯硅烷来生产的。
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