公开(公告)号：US5785754A

公开(公告)日：1998-07-28

申请号：US565593

申请日：1995-11-30

Applicant: Yoshiyuki Yamamoto ,  Keiichiro Tanabe ,  Katsuko Harano ,  Nobuhiro Ota ,  Naoji Fujimori

Inventor： Yoshiyuki Yamamoto ,  Keiichiro Tanabe ,  Katsuko Harano ,  Nobuhiro Ota ,  Naoji Fujimori

IPC: G21K1/10 ,  H01J35/18 ,  H01L23/373 ,  H01L23/473 ,  H01S5/02 ,  H01S5/024 ,  H05H7/00 ,  C30B29/05

CPC classification number: H01J35/18 ,  G21K1/10 ,  H01L23/3732 ,  H01L23/473 ,  H05H7/00 ,  G21K2201/065 ,  H01J2235/122 ,  H01J2235/1262 ,  H01L2924/0002 ,  H01S5/02423 ,  H01S5/02492

Abstract: A substrate, which has a high thermal conductivity material layer having a thermal conductivity of at least 10 W/cm.multidot.K and which has a cooling medium flow path on or in the high thermal conductivity material layer, has a high heat-dissipating property.

Abstract translation: 具有热传导率为至少10W / cm×KK并且在高导热性材料层上或其中具有冷却介质流动路径的高导热性材料层的基板具有高的散热性能。

公开(公告)号：US09513569B2

公开(公告)日：2016-12-06

申请号：US13635851

申请日：2011-03-16

Applicant: Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

Inventor： Franz Dieterich ,  Reza Abhari ,  Andrea Giovannini ,  Vipluv Aga

IPC: G03F7/20 ,  B82Y10/00 ,  G21K1/06

CPC classification number: G03F7/70891 ,  B82Y10/00 ,  G03F7/70175 ,  G21K1/06 ,  G21K2201/061 ,  G21K2201/065

Abstract: An optical collector (15) for collecting extreme ultraviolet radiation or EUV light generated at a central EUV production site comprises a reflective shell (25). To cope with thermal loading of the collector and avoid deformations, the reflective shell (25) is mounted on a support structure (24), such that a cooling channel (29) is established between the back side of the reflective shell (25) and the support structure (24), the thickness of the reflective shell (25) is substantially reduced, such that the convective heat transfer between the back side of the reflective shell (25) and a cooling medium (26) flowing through the cooling channel (29) dominates the process of removing heat from the reflective shell (25) with respect to heat conduction, and a cooling circuit (33) is connected to the cooling channel (29); to supply a cooling medium (26) to the cooling channel (29) with a controlled coolant pressure and/or mass flow.

Abstract translation: 用于收集在中央EUV生产地点产生的极紫外辐射或EUV光的光学收集器（15）包括反射壳（25）。 为了应对收集器的热负荷并避免变形，反射壳体（25）安装在支撑结构（24）上，使得在反射壳体（25）的背面和 支撑结构（24），反射壳体（25）的厚度被大大减小，使得反射壳体（25）的背面与流过冷却通道的冷却介质（26）之间的对流热传递 29）支配相对于热传导从反射壳体（25）去除热量的过程，并且冷却回路（33）连接到冷却通道（29）; 以受控的冷却剂压力和/或质量流量将冷却介质（26）供应到冷却通道（29）。

公开(公告)号：US20160143122A1

公开(公告)日：2016-05-19

申请号：US14803920

申请日：2015-07-20

Applicant: Jin-Seok Heo ,  Jin-Hong Park

Inventor： Jin-Seok Heo ,  Jin-Hong Park

IPC: H05G2/00 ,  G03F7/20 ,  B05B12/12 ,  G21K1/06

CPC classification number: H05G2/008 ,  B05B12/12 ,  G03F7/70033 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065 ,  H05G2/005

Abstract: Provided is an apparatus for generating extreme ultraviolet light. The apparatus includes a collector mirror unit, a gas supply unit configured to supply a processing gas to the collector mirror unit, a gas supply nozzle arranged in at least one area of the collector mirror unit and configured to supply the processing gas to a surface of the collector mirror unit, and a controller configured to adjust a shape of a spray hole of the gas supply nozzle. The shape of the spray hole may be changed according to a control operation of the controller.

Abstract translation: 提供一种用于产生极紫外光的装置。 该装置包括收集反射镜单元，被配置为向收集反射镜单元供应处理气体的气体供给单元，设置在收集反射镜单元的至少一个区域中并被配置为将处理气体供应到 收集器反射镜单元和被配置为调节气体供应喷嘴的喷射孔的形状的控制器。 可以根据控制器的控制操作来改变喷孔的形状。

公开(公告)号：US20150028229A1

公开(公告)日：2015-01-29

申请号：US14514277

申请日：2014-10-14

Applicant: Phoseon Technology, Inc.

Inventor： Doug Childers

IPC: G21K5/00 ,  G21K1/06

CPC classification number: G21K5/00 ,  C03C25/12 ,  F26B3/28 ,  F26B13/00 ,  G21K1/067 ,  G21K2201/064 ,  G21K2201/065

Abstract: A device for UV curing a coating or printed ink on a workpiece such as an optical fiber comprises dual elliptical reflectors arranged to have a co-located focus. The workpiece is centered at the co-located focus such that the dual elliptical reflectors are disposed on opposing sides of the workpiece. Two separate light sources are positioned at a second focus of each elliptical reflector, wherein light irradiated from the light sources is substantially concentrated onto the surface of the workpiece at the co-located focus.

Abstract translation: 用于在诸如光纤的工件上UV涂覆或印刷油墨的装置包括布置成具有共同定位焦点的双椭圆形反射器。 工件在同一焦点处居中，使得双椭圆形反射器设置在工件的相对侧上。 两个单独的光源被定位在每个椭圆形反射器的第二焦点处，其中从光源照射的光在共同定位的焦点处基本集中在工件的表面上。

公开(公告)号：US08411815B2

公开(公告)日：2013-04-02

申请号：US12734829

申请日：2009-01-28

Applicant: Ian Wallhead ,  Fabio Zocchi

Inventor： Ian Wallhead ,  Fabio Zocchi

IPC: H05G2/00 ,  G21K5/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.

Abstract translation: 公开了用于极紫外（EUV）和X射线辐射源的掠入射收集器（GIC），例如激光产生的等离子体（LPP）源。 还公开了包括GIC和LPP源的源收集器系统。 激光束沿着收集器轴线引导到燃料靶以形成LPP源，并且收集器被布置成收集辐射并将其反射到中间焦点。 收集器可以包括一个或多个掠入射镜，并且这些反射镜可以被电铸。 使用如本文所公开的源极 - 收集器系统的光刻系统。

公开(公告)号：US20130020511A1

公开(公告)日：2013-01-24

申请号：US13638002

申请日：2011-10-07

Applicant: Hidenobu Kameda ,  Osamu Wakabayashi

Inventor： Hidenobu Kameda ,  Osamu Wakabayashi

IPC: G02B7/182 ,  G21K5/04 ,  H01S3/04

CPC classification number: G02B7/1815 ,  G03F7/70033 ,  G03F7/70891 ,  G21K1/06 ,  G21K2201/065

Abstract: A mirror includes a mirror base provided with a flow channel through which a heat medium passes for cooling the mirror. The flow channel includes a buffer tank portion for adjusting a flow rate of the heat medium in the flow channel. A reflective film is provided on the mirror base.

Abstract translation: 反射镜包括设置有流动通道的反射镜基座，热介质通过该流动通道用于冷却反射镜。 流路包括用于调节流路中的热介质的流量的缓冲罐部。 反射膜设在镜底座上。

公开(公告)号：US08345223B2

公开(公告)日：2013-01-01

申请号：US12919741

申请日：2009-02-24

Applicant: Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

Inventor： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC: G03B27/54 ,  G03B27/42 ,  G02B27/14

CPC classification number: G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

Abstract translation: 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：US08264665B2

公开(公告)日：2012-09-11

申请号：US12657650

申请日：2010-01-25

Applicant: John E. Hill ,  Robert J. Munns

Inventor： John E. Hill ,  Robert J. Munns

IPC: G03B27/52 ,  G02B7/02

CPC classification number: G21K1/067 ,  G02B7/1815 ,  G02B7/182 ,  G02B19/0019 ,  G02B19/0095 ,  G03F7/70166 ,  G03F7/70891 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A cooled spider for grazing-incidence collectors includes an outer ring, an inner ring and spokes that mechanically and fluidly connect the inner and outer rings. Cooling channels in the outer and inner rings and in the spokes define a general cooling-fluid flow path through the spider. The general cooling-fluid flow path has input and output points located substantially 180° apart so that the flow path diverges at the input point into two branch flow paths that flow in opposite directions through the spider, and then converge at the output point. Input and output cooling fluid manifolds are fluidly connected to the outer ring at the input and output points and serve to flow cooling fluid over the cooling-fluid flow path.

Abstract translation: 用于放牧收集器的冷却的蜘蛛包括机械地和流体地连接内圈和外圈的外圈，内圈和轮辐。 外环和内环和轮辐中的冷却通道限定通过该蜘蛛的通用冷却液流动路径。 一般的冷却流体流动路径具有大致相距180°的输入和输出点，使得流动路径在输入点处分叉成两个分支流动路径，该分支流动路径沿相反方向流过蜘蛛，然后在输出点处会聚。 输入和输出冷却流体歧管在输入和输出点处流体地连接到外环，并用于使冷却流体流过冷却流体流动路径。

公开(公告)号：US07964858B2

公开(公告)日：2011-06-21

申请号：US12255609

申请日：2008-10-21

Applicant: Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

Inventor： Yao-Hung Yang ,  Tuan Anh Nguyen ,  Sanjeev Baluja ,  Andrzej Kaszuba ,  Juan Carlos Rocha ,  Thomas Nowak ,  Dustin W. Ho

IPC: G01N21/33 ,  B01J19/08 ,  B29C35/08

CPC classification number: G21K1/062 ,  B82Y10/00 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

Abstract: A reflector for an ultraviolet lamp can be used in a substrate processing apparatus. The reflector comprises a longitudinal strip extending the length of the ultraviolet lamp. The longitudinal strip has a curved reflective surface and comprises a plurality of through holes to direct a coolant gas toward the ultraviolet lamp. A chamber that uses an ultraviolet lamp module with the reflector, and a method of ultraviolet treatment are also described.

Abstract translation: 用于紫外灯的反射器可用于基板处理装置。 反射器包括延伸紫外灯长度的纵向条。 纵向条具有弯曲的反射表面，并且包括多个通孔以将冷却剂气体引向紫外线灯。 还描述了使用具有反射器的紫外线灯模块的室以及紫外线处理方法。

公开(公告)号：US20100303199A1

公开(公告)日：2010-12-02

申请号：US12734829

申请日：2009-01-28

Applicant: Ian Wallhead ,  Fabio Zocchi

Inventor： Ian Wallhead ,  Fabio Zocchi

IPC: H05G2/00 ,  G21K5/00

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003

Abstract: Grazing incidence collectors (GICs) for extreme ultraviolet (EUV) and X-ray radiation sources, such as laser produced plasma (LPP) sources, are disclosed. Source-collector systems comprising GICs and LPP sources are also disclosed. A laser beam is directed along the collector axis to a fuel target to form the LPP source, and the collector is arranged to collect the radiation and reflect it to an intermediate focus. The collector may include one or more grazing-incidence mirrors, and these mirrors may be electroformed. lithography systems that employ the source-collector systems as disclosed herein.

Abstract translation: 公开了用于极紫外（EUV）和X射线辐射源的掠入射收集器（GIC），例如激光产生的等离子体（LPP）源。 还公开了包括GIC和LPP源的源收集器系统。 激光束沿着收集器轴线引导到燃料靶以形成LPP源，并且收集器被布置成收集辐射并将其反射到中间焦点。 收集器可以包括一个或多个掠入射镜，并且这些反射镜可以被电铸。 使用如本文所公开的源极 - 收集器系统的光刻系统。