公开(公告)号：US5410411A

公开(公告)日：1995-04-25

申请号：US3807

申请日：1993-01-13

Applicant: Shinji Uchida ,  Tsuguhiro Korenaga ,  Akito Sawada ,  Hideo Kurokawa

Inventor： Shinji Uchida ,  Tsuguhiro Korenaga ,  Akito Sawada ,  Hideo Kurokawa

IPC: C23C14/54 ,  G01B11/06 ,  H01J37/32 ,  G01B11/02

CPC classification number: H01J37/32935 ,  C23C14/547 ,  G01B11/0683 ,  H01J2237/30455 ,  H01J2237/3132

Abstract: A method of and an apparatus for forming a multi-layer film, includes: a thickness control device for controlling an optical film thickness or a thickness of each of the layers of the multi-layer film; a multi-layer film monitoring substrate on which the multi-layer film is formed; a measurement device for measuring the optical characteristics of the multi-layer film formed on the multi-layer film monitoring substrate; and a processing device which processes the results obtained by the measurement device so as to feed the processed results back to the thickness control device.

Abstract translation: 一种用于形成多层膜的方法和装置，包括：用于控制多层膜的每个层的光学膜厚度或厚度的厚度控制装置; 形成有多层膜的多层膜监视基板; 用于测量形成在所述多层膜监视基板上的多层膜的光学特性的测量装置; 以及处理装置，其处理由测量装置获得的结果，以便将处理结果送回厚度控制装置。

公开(公告)号：US5346554A

公开(公告)日：1994-09-13

申请号：US684062

申请日：1991-04-11

Applicant: Mizuaki Suzuki ,  Matsuo Kishi

Inventor： Mizuaki Suzuki ,  Matsuo Kishi

IPC: C23C14/30 ,  H01J37/147 ,  H01J37/305

CPC classification number: H01J37/1475 ,  C23C14/30 ,  H01J37/3053 ,  H01J2237/30483 ,  H01J2237/3132

Abstract: An apparatus for forming a thin film irradiates an electron beam on a vaporizable substance held in a crucible. A pair of electromagnets are disposed in coplanar relation and at right angles to each other to generate a magnetic field which deflects the electron beam. An alternating current is applied to the electromagnets to generate the magnetic field, and the magnitude and frequency of the current are controlled so as to scan the electron beam in a circular pattern on the vaporizable substance.

Abstract translation: 用于形成薄膜的装置将电子束照射在保持在坩埚中的可汽化物质上。 一对电磁体以共面关系并且彼此成直角地设置，以产生使电子束偏转的磁场。 向电磁铁施加交流电以产生磁场，并且控制电流的大小和频率，以便以可蒸发物质上的圆形图案扫描电子束。

公开(公告)号：US09028923B2

公开(公告)日：2015-05-12

申请号：US13365692

申请日：2012-02-03

Applicant: Jaewon Park ,  Chang-Kue Park ,  Jonghwa Chang ,  Byungho Choi ,  Yongwan Kim

Inventor： Jaewon Park ,  Chang-Kue Park ,  Jonghwa Chang ,  Byungho Choi ,  Yongwan Kim

IPC: C23C14/16 ,  C23C14/30 ,  C23C14/48 ,  C23C14/58 ,  C23C14/06 ,  C23C14/50 ,  H01J37/317 ,  H01J37/32

CPC classification number: C23C14/5833 ,  C23C14/0635 ,  C23C14/30 ,  C23C14/48 ,  C23C14/505 ,  C23C14/5893 ,  H01J37/317 ,  H01J37/3233 ,  H01J2237/3132 ,  H01J2237/316 ,  H01J2237/3165 ,  H01J2237/31701

Abstract: The present invention relates to a ceramic coating and ion beam mixing apparatus for improving corrosion resistance, and a method of reforming an interface between a coating material and a base material. In samples fabricated using the coating and ion beam mixing apparatus, adhesiveness is improved, and the base material is reinforced, thereby improving resistance to thermal stress at high temperatures and high-temperature corrosion resistance of a material to be used in a sulfuric acid decomposition apparatus for producing hydrogen.

Abstract translation: 本发明涉及一种用于提高耐腐蚀性的陶瓷涂层和离子束混合装置，以及重整涂料和基材之间的界面的方法。 在使用涂布和离子束混合装置制造的样品中，提高了粘合性，并且增强了基材，从而提高了在硫酸分解装置中使用的材料在高温下的耐热应力和高温耐腐蚀性 用于生产氢气。

公开(公告)号：US20130209706A1

公开(公告)日：2013-08-15

申请号：US13642088

申请日：2011-04-20

Applicant: Juergen Hotz ,  Pavel Seserko ,  Joerg Wittich ,  Gerhard Schuhmann ,  Johannes Schwagmann ,  Juergen Lemke

Inventor： Juergen Hotz ,  Pavel Seserko ,  Joerg Wittich ,  Gerhard Schuhmann ,  Johannes Schwagmann ,  Juergen Lemke

IPC: C23C16/48

CPC classification number: C23C16/487 ,  C23C14/246 ,  C23C14/30 ,  H01J2237/3132

Abstract: An apparatus for coating substrates with a coating material is disclosed. The apparatus includes a frame and a crucible arrangement including a first crucible and a second crucible disposed on the frame. Only one first shaft is associated with the first crucible and only one second shaft is associated with the second crucible, where the only one first and second shafts are disposed in the frame beneath the first and second crucibles, respectively. Only one first lifting device is associated with the only one first shaft and only one second lifting device is associated with the only one second shaft, where the only one first and second lifting devices are disposed in the frame. The only one first and second shafts and the only one first and second lifting devices are laterally displaceable with the frame.

Abstract translation: 公开了一种用涂料涂覆基材的设备。 该装置包括框架和坩埚装置，其包括设置在框架上的第一坩埚和第二坩埚。 只有一个第一轴与第一坩埚相关联，并且仅一个第二轴与第二坩埚相关联，其中仅一个第一和第二轴分别设置在第一和第二坩埚下方的框架中。 只有一个第一提升装置与仅一个第一轴相关联，并且仅一个第二提升装置与仅一个第二轴相关联，其中仅一个第一和第二提升装置设置在框架中。 只有一个第一和第二轴以及唯一的一个第一和第二提升装置可与框架横向移动。

公开(公告)号：US20130162134A1

公开(公告)日：2013-06-27

申请号：US13821887

申请日：2011-09-08

Applicant: Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

Inventor： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

IPC: H01J29/56 ,  H01J29/00

CPC classification number: H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

Abstract: The invention relates to a device for producing an electron beam, comprising a housing (12), which delimits a space (13) that can be evacuated and has an electron beam outlet opening; an inlet (16) for feeding a process gas into the space (13) that can be evacuated; a planar cathode (14) and an anode (15), which are arranged in the space (13) that can be evacuated and between which a glow-discharge plasma can be produced by means of an applied electrical voltage, wherein ions can be accelerated from the glow-discharge plasma onto the surface of the cathode (14). The cathode has a first part (14a) made of a first material, which forms a centrally arranged first surface region of the cathode (14), and a second part (14b) made of a second material, which forms a second surface region of the cathode (14) that encloses the first surface region. The first material can be heated by the impingement with accelerated ions to a temperature at which electrons escape the first material predominantly due to thermionic emission.

Abstract translation: 本发明涉及一种用于制造电子束的装置，包括：外壳（12），其限定可抽真空并具有电子束出口的空间（13）; 用于将处理气体进料到可以抽空的空间（13）中的入口（16）; 平面阴极（14）和阳极（15），其布置在可以抽真空的空间（13）中，并且可以通过施加的电压产生辉光放电等离子体，其中可以加速离子 从辉光放电等离子体到阴极（14）的表面。 阴极具有由第一材料制成的第一部分（14a），其形成阴极（14）的居中布置的第一表面区域和由第二材料制成的第二部分（14b），第二部分形成第二表面区域 封闭第一表面区域的阴极（14）。 主要由于热离子发射，第一种材料可以通过加速离子的冲击加热至电子逸出第一种材料的温度。

公开(公告)号：US08404047B2

公开(公告)日：2013-03-26

申请号：US12211404

申请日：2008-09-16

Applicant: James W. Neal ,  Michael J. Maloney ,  David A. Litton ,  Christopher Masucci

Inventor： James W. Neal ,  Michael J. Maloney ,  David A. Litton ,  Christopher Masucci

IPC: C23C16/00

CPC classification number: C23C14/30 ,  H01J37/16 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/006 ,  H01J2237/3132

Abstract: An electron beam vapor deposition apparatus includes a coating chamber having a first chamber section with a first coating zone for depositing a first coating and a second chamber section with a second coating zone for depositing a second coating. At least one electron beam source is associated with the first chamber section and the second chamber section. A first crucible is adjacent to the first coating zone for presenting a first source coating material, and a second crucible is adjacent to the second coating zone for presenting a second source coating material. A transport is operative to move a work piece between the first coating zone of the first chamber section and the second coating zone of the second chamber section.

Abstract translation: 电子束气相沉积设备包括具有第一室部分的涂覆室，第一室部分具有用于沉积第一涂层的第一涂覆区域和具有用于沉积第二涂层的第二涂覆区域的第二室部分。 至少一个电子束源与第一室部分和第二室部分相关联。 第一坩埚与第一涂层区相邻，用于呈现第一源涂层材料，第二坩埚与第二涂层区相邻，用于呈现第二源涂层材料。 传送装置用于在第一室部分的第一涂布区域和第二室部分的第二涂布区域之间移动工件。

公开(公告)号：US20120298041A1

公开(公告)日：2012-11-29

申请号：US13514230

申请日：2010-12-10

Applicant: Juergen Zinsstag ,  Cristian Jans

Inventor： Juergen Zinsstag ,  Cristian Jans

IPC: H01J29/76 ,  C23C16/448

CPC classification number: H01J37/1475 ,  C23C14/30 ,  C23C14/542 ,  H01J37/1472 ,  H01J37/3053 ,  H01J2237/1523 ,  H01J2237/3132

Abstract: A vaporizing device is provided, wherein an elongated pot having material to be vaporized is impinged upon by an electron beam, preferably via several electron guns. Each electron gun is responsible for a certain section of the pot. The electron beam is guided over the melt in a pendular manner. For this purpose, a first magnetic deflecting unit is provided, which produces a variable parallel displacement of the electron beam. In order to achieve this, two magnetic fields are provided, the magnetic field boundaries of which form a type of lens system, wherein the outlet side of the first magnetic field is convex and the inlet side of the second magnetic field is concave. In order to deflect the electron beam into the pot, a second magnetic deflecting unit is provided, the magnetic field of which can be moved synchronously with the beam displacement parallel to the pot.

Abstract translation: 提供了一种蒸发装置，其中具有待蒸发的材料的细长的罐优选通过几个电子枪被电子束撞击。 每个电子枪负责锅的某一部分。 电子束以圆柱形的方式引导到熔体上。 为此，提供了第一磁偏转单元，其产生电子束的可变的平行位移。 为了实现这一点，提供了两个磁场，其磁场边界形成一种透镜系统，其中第一磁场的出口侧是凸的，并且第二磁场的入口侧是凹的。 为了将电子束偏转到电池中，提供了第二磁偏转单元，其磁场可以与平行于电位器的光束位移同步地移动。

公开(公告)号：US08133528B2

公开(公告)日：2012-03-13

申请号：US12438452

申请日：2008-01-29

Applicant: Masato Nakayama

Inventor： Masato Nakayama

IPC: B05C11/10

CPC classification number: C23C14/30 ,  C23C14/544 ,  H01J37/304 ,  H01J37/3053 ,  H01J2237/30466 ,  H01J2237/30483 ,  H01J2237/3132

Abstract: An electron gun evaporation apparatus capable of efficiently using an evaporation source includes an electron beam position controller which determines, as an applicable range, a range within which the distribution of the film thickness growth rate is almost constant in each scanning direction of an electron beam to be applied to an evaporation source in a crucible for the irradiation position of the electron beam, on the basis of information pertaining to the electron beam irradiation position and the film thickness growth rate in the electron beam irradiation position.

Abstract translation: 能够有效地使用蒸发源的电子枪蒸发装置包括电子束位置控制器，该电子束位置控制器将电子束的每个扫描方向上的膜厚增长率的分布几乎恒定的范围确定为适用范围， 基于与电子束照射位置和电子束照射位置的膜厚度生长速度有关的信息，施加到用于电子束的照射位置的坩埚中的蒸发源。

公开(公告)号：US20100068417A1

公开(公告)日：2010-03-18

申请号：US12211404

申请日：2008-09-16

Applicant: James W. Neal ,  Michael J. Maloney ,  David A. Litton ,  Christopher Masucci

Inventor： James W. Neal ,  Michael J. Maloney ,  David A. Litton ,  Christopher Masucci

IPC: C23C14/30

CPC classification number: C23C14/30 ,  H01J37/16 ,  H01J37/3053 ,  H01J37/3178 ,  H01J2237/006 ,  H01J2237/3132

Abstract: An electron beam vapor deposition apparatus includes a coating chamber having a first chamber section with a first coating zone for depositing a first coating and a second chamber section with a second coating zone for depositing a second coating. At least one electron beam source is associated with the first chamber section and the second chamber section. A first crucible is adjacent to the first coating zone for presenting a first source coating material, and a second crucible is adjacent to the second coating zone for presenting a second source coating material. A transport is operative to move a work piece between the first coating zone of the first chamber section and the second coating zone of the second chamber section.

Abstract translation: 电子束气相沉积设备包括具有第一室部分的涂覆室，第一室部分具有用于沉积第一涂层的第一涂覆区域和具有用于沉积第二涂层的第二涂覆区域的第二室部分。 至少一个电子束源与第一室部分和第二室部分相关联。 第一坩埚与第一涂层区相邻，用于呈现第一源涂层材料，第二坩埚与第二涂层区相邻，用于呈现第二源涂层材料。 传送装置用于在第一室部分的第一涂布区域和第二室部分的第二涂布区域之间移动工件。

公开(公告)号：US20040018303A1

公开(公告)日：2004-01-29

申请号：US10299646

申请日：2002-11-19

Inventor： Robert William Bruce ,  Antonio Frank Maricocchi ,  Christopher Lee Lagemann ,  John Douglas Evans SR. ,  Keith Humphries Betscher ,  Rudolfo Viguie ,  David Vincent Rigney ,  David John Wortman ,  William Seth Willen

IPC: C23C014/30

CPC classification number: C23C14/246 ,  C23C14/30 ,  C23C14/52 ,  C23C14/541 ,  C23C14/56 ,  H01J37/3053 ,  H01J2237/3132

Abstract: An electron beam physical vapor deposition (EBPVD) apparatus and a method for using the apparatus to produce a coating material (e.g., a ceramic thermal barrier coating) on an article. The EBPVD apparatus generally includes a coating chamber that is operable at elevated temperatures and subatmospheric pressures. An electron beam gun projects an electron beam into the coating chamber and onto a coating material within the chamber, causing the coating material to melt and evaporate. An article is supported within the coating chamber so that vapors of the coating material deposit on the article. The operation of the EBPVD apparatus is enhanced by the inclusion or adaptation of one or more mechanical and/or process modifications, including those necessary or beneficial when operating the apparatus at coating pressures above 0.010 mbar.

Abstract translation: 电子束物理气相沉积（EBPVD）装置和使用该装置在制品上制备涂层材料（例如，陶瓷热障涂层）的方法。 EBPVD设备通常包括可在升高的温度和低于大气压的压力下操作的涂覆室。 电子束枪将电子束投射到涂层室中并且涂覆在腔室内的涂层材料上，导致涂层材料熔化和蒸发。 在涂层室内支撑制品，使得涂层材料的蒸气沉积在制品上。 EBPVD装置的操作通过包含或适应一种或多种机械和/或工艺改进而得到增强，包括在涂覆压力高于0.010mbar的条件下操作设备时必需或有益的修改。