公开(公告)号：US08178858B2

公开(公告)日：2012-05-15

申请号：US12293756

申请日：2007-03-20

申请人： Rainer Bartel ,  Volker Kirchhoff ,  Goesta Mattausch ,  Olaf Roeder ,  Joerg Kubusch

发明人： Rainer Bartel ,  Volker Kirchhoff ,  Goesta Mattausch ,  Olaf Roeder ,  Joerg Kubusch

IPC分类号： A61N5/00

CPC分类号： H01J33/00 ,  A61L2/087 ,  A61L2202/14 ,  A61L2202/23 ,  A61L2202/24

摘要： The invention relates to a device and a method for altering the characteristics of a three-dimensional article by means of electrons, including at least one electron accelerator for generating accelerated electrons and two electron exit windows, wherein the two electron exit windows are arranged opposite one another, wherein the two electron exit windows and at least one reflector delimit a process chamber in which the surface or surface layer of the article are bombarded with electrons, wherein an energy density distribution inside the process chamber can be detected at least over one spatial dimension by means of a sensor system.

摘要翻译： 本发明涉及一种通过电子来改变三维制品的特性的装置和方法，该电子包括至少一个用于产生加速电子的电子加速器和两个电子出射窗，其中两个电子出射窗口相对地布置 另一个，其中两个电子出射窗口和至少一个反射器限定处理室，其中制品的表面或表面层用电子轰击，其中可以至少在一个空间维度上检测处理室内部的能量密度分布 通过传感器系统。

公开(公告)号：US20130162134A1

公开(公告)日：2013-06-27

申请号：US13821887

申请日：2011-09-08

申请人： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

发明人： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

IPC分类号： H01J29/56 ,  H01J29/00

CPC分类号： H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

摘要： The invention relates to a device for producing an electron beam, comprising a housing (12), which delimits a space (13) that can be evacuated and has an electron beam outlet opening; an inlet (16) for feeding a process gas into the space (13) that can be evacuated; a planar cathode (14) and an anode (15), which are arranged in the space (13) that can be evacuated and between which a glow-discharge plasma can be produced by means of an applied electrical voltage, wherein ions can be accelerated from the glow-discharge plasma onto the surface of the cathode (14). The cathode has a first part (14a) made of a first material, which forms a centrally arranged first surface region of the cathode (14), and a second part (14b) made of a second material, which forms a second surface region of the cathode (14) that encloses the first surface region. The first material can be heated by the impingement with accelerated ions to a temperature at which electrons escape the first material predominantly due to thermionic emission.

摘要翻译： 本发明涉及一种用于制造电子束的装置，包括：外壳（12），其限定可抽真空并具有电子束出口的空间（13）; 用于将处理气体进料到可以抽空的空间（13）中的入口（16）; 平面阴极（14）和阳极（15），其布置在可以抽真空的空间（13）中，并且可以通过施加的电压产生辉光放电等离子体，其中可以加速离子 从辉光放电等离子体到阴极（14）的表面。 阴极具有由第一材料制成的第一部分（14a），其形成阴极（14）的居中布置的第一表面区域和由第二材料制成的第二部分（14b），第二部分形成第二表面区域 封闭第一表面区域的阴极（14）。 主要由于热离子发射，第一种材料可以通过加速离子的冲击加热至电子逸出第一种材料的温度。

公开(公告)号：US20090184262A1

公开(公告)日：2009-07-23

申请号：US12293756

申请日：2007-03-20

申请人： Rainer Bartel ,  Volker Kirchhoff ,  Goesta Mattausch ,  Olaf Roeder ,  Joerg Kubusch

发明人： Rainer Bartel ,  Volker Kirchhoff ,  Goesta Mattausch ,  Olaf Roeder ,  Joerg Kubusch

IPC分类号： A61N5/00

CPC分类号： H01J33/00 ,  A61L2/087 ,  A61L2202/14 ,  A61L2202/23 ,  A61L2202/24

摘要： The invention relates to a device and a method for altering the characteristics of a three-dimensional molded part by means of electrons, including at least one electron accelerator for generating accelerated electrons and two electron exit windows, wherein the two electron exit windows are arranged opposite one another, wherein the two electron exit windows and at least one reflector delimit a process chamber in which the surface or an edge layer of the molded part are bombarded with electrons, wherein an energy density distribution inside the process chamber can be detected at least over one spatial dimension by means of a sensor system.

摘要翻译： 本发明涉及一种用于通过电子改变三维模制部件的特性的装置和方法，包括用于产生加速电子的至少一个电子加速器和两个电子出射窗，其中两个电子出射窗口相对布置 另一方面，其中两个电子出射窗和至少一个反射器限定处理室，其中模制部件的表面或边缘层用电子轰击，其中可以至少检测处理室内的能量密度分布 一个通过传感器系统的空间尺寸。

公开(公告)号：US09640369B2

公开(公告)日：2017-05-02

申请号：US13202828

申请日：2010-02-24

申请人： Haydn N. G. Wadley ,  Goesta Mattausch ,  Henry Morgner ,  Frank-Holm Roegner

发明人： Haydn N. G. Wadley ,  Goesta Mattausch ,  Henry Morgner ,  Frank-Holm Roegner

IPC分类号： C23C16/00 ,  H01J37/32 ,  C23C14/22 ,  C23C14/24 ,  C23C14/30 ,  C23C14/32 ,  H01J37/305 ,  H01J37/34

CPC分类号： H01J37/32596 ,  C23C14/228 ,  C23C14/246 ,  C23C14/30 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/32055 ,  H01J37/3233 ,  H01J37/32339 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/34 ,  H01J2237/332

摘要： A plasma generation process that is more optimized for vapor deposition processes in general, and particularly for directed vapor deposition processing. The features of such an approach enables a robust and reliable coaxial plasma capability in which the plasma jet is coaxial with the vapor plume, rather than the orthogonal configuration creating the previous disadvantages. In this way, the previous deformation of the vapor gas jet by the work gas stream of the hollow cathode pipe can be avoided and the carrier gas consumption needed for shaping the vapor plume can be significantly decreased.

公开(公告)号：US20110318498A1

公开(公告)日：2011-12-29

申请号：US13202828

申请日：2010-02-24

申请人： Haydn N.G. Wadley ,  Goesta Mattausch ,  Henry Morgner ,  Frank-Holm Roegner

发明人： Haydn N.G. Wadley ,  Goesta Mattausch ,  Henry Morgner ,  Frank-Holm Roegner

IPC分类号： C23C16/50 ,  C23C16/52 ,  C23C16/515 ,  C23C16/503 ,  C23C16/48

CPC分类号： H01J37/32596 ,  C23C14/228 ,  C23C14/246 ,  C23C14/30 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/32055 ,  H01J37/3233 ,  H01J37/32339 ,  H01J37/32357 ,  H01J37/3244 ,  H01J37/32449 ,  H01J37/32568 ,  H01J37/34 ,  H01J2237/332

摘要： A plasma generation process that is more optimized for vapor deposition processes in general, and particularly for directed vapor deposition processing. The features of such an approach enables a robust and reliable coaxial plasma capability in which the plasma jet is coaxial with the vapor plume, rather than the orthogonal configuration creating the previous disadvantages. In this way, the previous deformation of the vapor gas jet by the work gas stream of the hollow cathode pipe can be avoided and the carrier gas consumption needed for shaping the vapor plume can be significantly decreased.

摘要翻译： 通常对气相沉积方法进行更优化的等离子体生成方法，特别是用于定向气相沉积处理。 这种方法的特征使得能够稳定和可靠地同轴等离子体能力，其中等离子体射流与蒸气羽流同轴，而不是产生先前缺点的正交构造。 以这种方式，可以避免先前由空心阴极管的工作气体流引起的蒸汽气体射流的变形，并且可以显着地减少用于成形蒸气羽流所需的载气消耗。

公开(公告)号：US08878422B2

公开(公告)日：2014-11-04

申请号：US13821887

申请日：2011-09-08

申请人： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

发明人： Goesta Mattausch ,  Peter Feinaeugle ,  Volker Kirchhoff ,  Dieter Weiske ,  Henrik Flaske ,  Rainer Zeibe

IPC分类号： H01J1/02 ,  F03H1/00 ,  H01J27/26 ,  H01J37/075

CPC分类号： H01J37/075 ,  H01J3/025 ,  H01J37/077 ,  H01J2237/3104 ,  H01J2237/3128 ,  H01J2237/3132

摘要： Device for producing an electron beam includes a housing, which delimits a space that is evacuatable and has an electron beam outlet opening; an inlet structured and arranged for feeding process gas into the space; and a planar cathode and an anode, which are arranged in the space, and between which, a glow discharge plasma is producible by an applied electrical voltage. Ions are accelerateable from the glow discharge plasma onto a surface of the cathode and electrons emitted by the cathode are accelerateable into the glow discharge plasma. The cathode includes a first part made of a first material at least on an emission side, which forms a centrally arranged first surface region of the cathode, and a second part made of a second material, which forms a second surface region of the cathode that encloses the first surface region.

摘要翻译： 用于制造电子束的装置包括壳体，其限定可抽空并具有电子束出口的空间; 一个构造和布置成用于将工艺气体供给到空间中的入口; 以及布置在该空间中的平面阴极和阳极之间，其中通过所施加的电压产生辉光放电等离子体。 离子可以从辉光放电等离子体加速到阴极的表面上，由阴极发射的电子可加速到辉光放电等离子体中。 阴极包括由至少在发射侧的第一材料制成的第一部分，其形成中心布置的阴极的第一表面区域，以及由第二材料制成的第二部分，其形成阴极的第二表面区域， 封闭第一表面区域。

公开(公告)号：US07014889B2

公开(公告)日：2006-03-21

申请号：US10297347

申请日：2001-05-23

申请人： James F. Groves ,  Derek D. Hass ,  Haydn N. G. Wadley ,  Goesta Mattausch ,  Henry Morgner ,  Siegfried Schiller

发明人： James F. Groves ,  Derek D. Hass ,  Haydn N. G. Wadley ,  Goesta Mattausch ,  Henry Morgner ,  Siegfried Schiller

IPC分类号： H05H1/24

CPC分类号： C23C14/228 ,  C23C14/30 ,  C23C14/32 ,  H01J37/3053 ,  H01J37/32055 ,  H01J2237/3137 ,  Y02T50/67

摘要： Plasma deposition apparatus (1) and method that allows metal or nonmetal vapor (6) to be generated by electron-beam evaporation, guides that vapor using a noble gas stream (containing reactive gases in cases of reactive evaporation), ionizes the dense directed gas and vapor stream at working pressures above about 0.0001 mbar using a hollow cathode plasma arc discharge (11), and conveys the ionized vapor and/or gas stream towards the substrate (4) for impact on the surface at energies varying from thermal levels (as low as about 0.05 eV) up to about 300 eV.

摘要翻译： 等离子体沉积装置（1）和允许通过电子束蒸发产生金属或非金属蒸汽（6）的方法引导使用惰性气体流（在反应蒸发的情况下含有反应气体）的蒸气将致密导向气体 和使用空心阴极等离子体电弧放电（11）的工作压力高于约0.0001毫巴的蒸汽流，并将离子化的蒸汽和/或气流输送到衬底（4），以在从热水平变化的能量（如 低至约0.05eV）至多约300eV。