摘要:
The present invention relates to applying an existing carbon nanotube X-ray tube for a dental X-ray imaging system that can replace a carbon nanotube electron emission source installed in a cathode portion. An X-ray tube system formed in a pen according to the present invention can be inserted in the oral cavity due to its thin thickness, thereby displaying an accurate image of an inner location of the oral cavity needing a diagnosis. For therapy of oral cancer requiring an appropriate amount of radiation therapy, since radiation can be directly irradiated to a diseased part, brachytherapy is enabled without concern of exposure dose of normal tissues. Therefore, when the system is commercialized, a great amount of distribution effect may be expected. The X-ray tube system that can be used for medical services such as a dental service includes an X-ray emission module emitting X-rays using a chipped nano-structured material, for example, carbon nanotube. The X-ray emission module is separable from a body in order to replace a cathode portion that is included in the X-ray emission module and is based on the nano-structured material.
摘要:
An x-ray tube includes a stationary base and a passage therein. The x-ray tube includes an anode frame having an anode positioned adjacent to a first end and having a neck at a second end, the neck extends into the passage, wherein the anode frame is configured to rotate about a longitudinal axis of the passage. A hermetic seal is positioned about the neck between the neck and the stationary base.
摘要:
A source material dispenser for an EUV light source is disclosed that comprises a source material reservoir, e.g. tube, that has a wall and is formed with an orifice. The dispenser may comprise an electro-actuatable element, e.g. PZT material, that is spaced from the wall and operable to deform the wall and modulate a release of source material from the dispenser. A heat source heating a source material in the reservoir may be provided. Also, the dispenser may comprise an insulator reducing the flow of heat from the heat source to the electro-actuatable element. A method of dispensing a source material for an EUV light source is also described. In one method, a first signal may be provided to actuate the electro-actuatable elements to modulate a release of source material and a second signal, different from the first, may be provided to actuate the electro-actuatable elements to unclog the orifice.
摘要:
In an expansion device for an x-ray apparatus, in particular with a rotary piston x-ray tube with a sealed coolant and/or insulation volume under a minimum pressure and pressing with this minimum pressure against an elastic pressure element, an elastic pressure element with a linear force-displacement characteristic curve (in particular in the form of a gas pressure spring with a linear elastic characteristic curve) is provided to prevent an excessive pressure load given a temperature rise.
摘要:
The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.
摘要:
An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.
摘要:
A method for preventing contamination, oxidation and gas absorption of reactive materials, and articles formed thereby. The method generally entails depositing a first layer of a reactive material and a second layer of a substantially nonreactive material so that the second layer protects the first layer from a surrounding atmosphere. For example, the first and second layers may be deposited to form a film on a surface within a chamber that is desired to be maintained in a vacuum during use of the article. The second layer is sufficiently thin such that appropriately heating the first and second layers causes the reactive material of the first layer to become interdiffused with the nonreactive material of the second layer, to the extent that at least a portion of the reactive material is able to react and getter gases from the surrounding atmosphere.
摘要:
A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. A working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharge between the electrodes to produce very high temperature, high density plasma pinch in the working gas providing radiation at the spectral line of the active gas. An external reflection radiation collector-director collects radiation produced in the plasma pinches and directs the radiation in a desired direction. In a preferred embodiment the active gas is lithium and the buffer gas is helium and the radiation-collector is coated with the material used for the electrodes. A good choice for the material is tungsten. In a second preferred embodiment the buffer gas is argon and lithium gas is produced by vaporization of solid lithium located in a hole along the axis of the central electrode of a coaxial electrode configuration.
摘要:
An x-ray tube includes an anode, a cathode, and an electrode disposed in an evacuated envelope. The electrode is positioned such that the electrode is remote from an area in immediate proximity to the envelope. An electric field defined by electrode is of sufficient strength such that arcing preferentially occurs between the electrode and the anode as opposed to occurring between the cathode and anode. The electrode is further situated such that metal sputtered from the electrode substantially falls in a define region on the anode and serves as an active getter for pumping gas from the envelope. The electrode is composed of an active metal which, upon being passively heated by the anode, also acts as a getter material to aid in pumping gas from the envelope.
摘要:
Capillary discharge extreme ultraviolet lamp sources for EUV microlithography and other applications. The invention covers operating conditions for a pulsed capillary discharge lamp for EUVL and other applications such as resist exposure tools, microscopy, interferometry, metrology, biology and pathology. Techniques and processes are described to mitigate against capillary bore erosion, pressure pulse generation, and debris formation in capillary discharge-powered lamps operating in the EUV. Additional materials are described for constructing capillary discharge devices fore EUVL and related applications. Further, lamp designs and configurations are described for lamps using gasses and metal vapors as the radiating species.