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    APPARATUS FOR GENERATING A PLURALITY OF BEAMLETS
    222.
    发明申请
    APPARATUS FOR GENERATING A PLURALITY OF BEAMLETS 有权
    用于产生大量光束的装置

    公开(公告)号：US20080073547A1

    公开(公告)日：2008-03-27

    申请号：US11545975

    申请日：2006-10-10

    Applicant: Pieter Kruit

    Inventor： Pieter Kruit

    IPC: H01J3/14

    CPC classification number: H01J3/07 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/063 ,  H01J37/12 ,  H01J37/153 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/151 ,  H01J2237/1536 ,  H01J2237/26 ,  H01J2237/31774

    Abstract: The invention relates to an apparatus for generating a plurality of charged particle beamlets, comprising a charged particle source for generating a diverging charged particle beam, a converging means for refracting said diverging charged particle beam and a lens array comprising a plurality of lenses, wherein said lens array is located between said charged particle source and said converging means.In this way, it is possible to reduce aberrations of the converging means.

    Abstract translation: 本发明涉及一种用于产生多个带电粒子束的装置，包括用于产生发散带电粒子束的带电粒子源，用于折射所述发散带电粒子束的会聚装置和包括多个透镜的透镜阵列，其中所述 透镜阵列位于所述带电粒子源和所述会聚装置之间。 以这种方式，可以减小会聚装置的像差。

    Lens array for electron beam lithography tool
    223.
    发明授权
    Lens array for electron beam lithography tool 有权
    用于电子束光刻工具的透镜阵列

    公开(公告)号：US07345290B2

    公开(公告)日：2008-03-18

    申请号：US09414004

    申请日：1999-10-07

    Applicant: Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren Kazmir Waskiewicz

    Inventor： Victor Katsap ,  Pieter Kruit ,  Daniel Moonen ,  Warren Kazmir Waskiewicz

    IPC: G21K5/10

    CPC classification number: H01J37/065 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/31774

    Abstract: A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

    Abstract translation: 一种通过将透镜阵列放置在照明系统部件的漂移空间中来控制光束发射的方法和装置。 照明系统部件可以是可附接到电子枪的电子枪或衬管或漂移管。 透镜阵列可以是一个或多个网状网格或网格和连续箔片的组合。 透镜阵列形成大量类似于光学“飞眼”透镜的微透镜。 透镜阵列将输入的固体电子束分裂成多个子束，使得输出光束发射不同于入射光束发射，而光束总电流保持不变。 该方法和装置允许对束电流和光束发射的独立控制，这在SCALPEL照明系统中是有益的。

    Multiple beam charged particle optical system
    224.
    发明申请
    Multiple beam charged particle optical system 有权
    多光束带电粒子光学系统

    公开(公告)号：US20080023643A1

    公开(公告)日：2008-01-31

    申请号：US11880872

    申请日：2007-07-23

    Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn Van Bruggen ,  Stijn Willem Steenbrink

    Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn Van Bruggen ,  Stijn Willem Steenbrink

    IPC: G21K1/08

    CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

    Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same
    226.
    发明申请
    Method for manufacturing a lens assembly of microcolumn and lens assembly of microcolumn manufactured by the same 有权
    用于制造由其制造的微柱的透镜组件和微柱的透镜组件的方法

    公开(公告)号：US20060255286A1

    公开(公告)日：2006-11-16

    申请号：US10565373

    申请日：2004-07-24

    Applicant: Ho Kim

    Inventor： Ho Kim

    IPC: H01J1/50

    CPC classification number: H01J37/12 ,  H01J9/18 ,  H01J37/28 ,  H01J2237/1205 ,  H01J2237/31774

    Abstract: The present invention provides a method for manufacturing a lens assembly of a microcolumn having a plurality of microlenses and a plurality of insulating layers alternately interposed between the microlenses. The method includes forming at least one first microlens assembly set (set—1) by anodic-bonding an insulating layer (101) and a microlens (102) together; layering a second microlens assembly set (set—2) on the first microlens assembly set (set—1); and scanning a laser beam, thus welding the first microlens assembly set (set—1) to the microlens of the second microlens assembly set (set—2). The method of the present invention further includes anodic-bonding the microlens assembly sets together.

    Abstract translation: 本发明提供了一种用于制造具有交替置于微透镜之间的多个微透镜和多个绝缘层的微柱的透镜组件的方法。 该方法包括：通过将绝缘层（101）和微透镜（102）阳极结合在一起来形成至少一个第一微透镜组件组（组合<！ - SIPO 2）。 并扫描激光束，从而将第一微透镜组件组（组合 - 1）焊接到第二微透镜组件组（组合 - 2）的微透镜。 本发明的方法还包括将微透镜组件组件阳极接合在一起。

    Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate
    230.
    发明申请
    Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate 失效
    微柱电子束装置形成于低温共烧陶瓷基片中

    公开(公告)号：US20060131752A1

    公开(公告)日：2006-06-22

    申请号：US11260025

    申请日：2005-10-24

    Applicant: Dae Kim ,  Jin Jeong ,  Sang Choi ,  Dae Kim ,  Ho Kim

    Inventor： Dae Kim ,  Jin Jeong ,  Sang Choi ,  Dae Kim ,  Ho Kim

    IPC: H01L23/52

    CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1477 ,  H01J2237/03 ,  H01J2237/1205

    Abstract: A micro column electron beam apparatus having a reduced number of interconnections is provided. The micro column electron beam apparatus includes: a low temperature co-fired ceramic (LTCC) substrate; a plurality of deflector electrodes attached to a predetermined top portion of the LTCC substrate; a pad electrode placed at a top edge of the LTCC substrate and transmitting an external signal to the deflector electrodes; and a connection unit placed in the LTCC substrate and electrically connecting the deflector electrode and the pad electrode.

    Abstract translation: 提供了具有减少数量的互连的微型列电子束装置。 微柱电子束装置包括：低温共烧陶瓷（LTCC）基板; 多个偏转器电极，附着到LTCC衬底的预定顶部; 放置在LTCC衬底的顶部边缘处并将外部信号传输到偏转器电极的焊盘电极; 以及连接单元，其放置在LTCC基板中并电连接偏转器电极和焊盘电极。

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