公开(公告)号：US20210354236A1

公开(公告)日：2021-11-18

申请号：US17388356

申请日：2021-07-29

Applicant: SEMES Co., Ltd.

Inventor： Duk Hyun Son ,  Hyung Joon Kim

IPC: B23K26/042 ,  B25J9/04 ,  B25J9/08 ,  B25J9/10 ,  G03F9/00

Abstract: A substrate treatment apparatus includes a transport part to transport a transparent rectangular substrate, a substrate support part to support the substrate, light generators to irradiate two different lights onto the moving substrate, and sense the irradiated lights, and a controller to determine a posture of the substrate with reference to the sensed lights and control the transport part such that the substrate is seated on the substrate support part in a default posture that is preset. The controller determines the posture of the transparent rectangular substrate with respect to the default posture using a time difference between a time point at which a first light of the two different lights is not transmitted through an edge of the transparent rectangular substrate and a time point at which a second light of the two different lights is not transmitted through the edge of the transparent rectangular substrate.

公开(公告)号：US20210331466A1

公开(公告)日：2021-10-28

申请号：US17237175

申请日：2021-04-22

Applicant: SEMES CO., LTD.

Inventor： In Seok Ha ,  Jin Hyuck Yang ,  Jae Young Jang

IPC: B41J2/145

Abstract: Provided are a load distribution apparatus capable of efficiently distributing loads for a plurality of inkjet head modules and a substrate treatment system including the same. The load distribution apparatus includes a second support formed to be elongated in one direction and having both side portions higher than a central portion and in which a head module for discharging droplets onto a substrate is installed in the central portion, a first support supporting the second support on at least one side and supporting the second support below the second support, a first support unit supporting the second support on at least one side and supporting the second support above the second support, and a plate installed above the first support unit and connected to the first support unit, wherein a load of the head module is distributed by the first support and the first support unit.

公开(公告)号：US11145534B2

公开(公告)日：2021-10-12

申请号：US16194014

申请日：2018-11-16

Applicant: SEMES CO., LTD.

Inventor： Seung Pyo Lee ,  Hyung Joon Kim

IPC: H01J37/32 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

Abstract: Disclosed are a support unit and a substrate treating apparatus comprising the same. The inventive concept provides a support unit that may prove temperature uniformity between facing areas on a substrate the other areas of the substrate and may solve a problem of not easily separating a substrate by a negative pressure in a pin hole when the substrate is separated from the support unit, and a substrate treating apparatus.

公开(公告)号：US11145520B2

公开(公告)日：2021-10-12

申请号：US16916246

申请日：2020-06-30

Applicant: SEMES CO., LTD.

Inventor： Young Hun Lee ,  Eui Sang Lim

IPC: B08B3/02 ,  H01L21/67

Abstract: Disclosed is a method for liquid-treating a substrate. In a method for treating a substrate, the substrate may be treated by supplying a treatment liquid onto the rotating substrate by using a first nozzle and a second nozzle, the first nozzle supplies the treatment liquid to an area including a central area on the substrate, and the second nozzle supplies the treatment liquid to a peripheral area of the substrate.

公开(公告)号：US11139184B2

公开(公告)日：2021-10-05

申请号：US16158950

申请日：2018-10-12

Applicant: SEMES CO., LTD.

Inventor： Ki Seung Lee ,  Soo Hyun Cho ,  Choongki Min

IPC: H01L21/67 ,  H01L21/687 ,  H01L21/027 ,  F24C15/10

Abstract: The inventive concept provides an apparatus and a method for heat-treating a substrate. The method includes a first treatment operation of spacing a substrate apart from a support plate provided with a heater to a first height in a state in which a treatment space, in which the substrate is treated, is closed and heating the substrate, a second treatment operation of, after the first treatment operation, lowering the substrate such that the substrate is located at a second height and heating the substrate, a third treatment operation of, after the second treatment operation, lifting the substrate such that the substrate is spaced apart from the support plate to be located at a third height and heating the substrate, and a fourth treatment operation of, after the third treatment operation, lowering the substrate such that the substrate is located at a fourth height and heating the substrate.

公开(公告)号：US11121007B2

公开(公告)日：2021-09-14

申请号：US16532986

申请日：2019-08-06

Applicant: Semes Co., Ltd.

Inventor： Jae-Youl Kim ,  Jeeyong Jung ,  Young Ho Seo ,  Dae Sung Kim ,  Beomjeong Oh ,  Kwangbok Jun ,  Hyungoo Kwon ,  Sanguk Son

IPC: H01L21/67 ,  B05C5/02 ,  B05C11/10

Abstract: An apparatus for supplying chemical liquid may include a chemical liquid discharging member, a reservoir, a chemical liquid supplying member and a chemical liquid circulating member. The chemical liquid discharging member may discharge a chemical liquid onto a substrate. The reservoir may store the chemical liquid supplied to the chemical liquid discharging member. The chemical liquid supplying member may supply the chemical liquid stored in the reservoir. The chemical liquid circulating member may circulate the chemical liquid from the chemical liquid discharging member to the reservoir.

公开(公告)号：US20210210367A1

公开(公告)日：2021-07-08

申请号：US17143265

申请日：2021-01-07

Applicant: SEMES CO., LTD.

Inventor： HYEONGJIN BAK

IPC: H01L21/67 ,  H01L21/677 ,  B65G43/08

Abstract: A conveyor system for moving a plurality of targets is provided. The conveyor system includes at least one input group to input the target, at least one output group to output the target, and at least one bridge group to connect the input group with the output group. Each of the input group, the output group, and the bridge group includes a plurality of nodes having a size corresponding to a size of one target. The conveyor system further includes a control unit to align the target moving on the conveyor system.

公开(公告)号：US11056367B2

公开(公告)日：2021-07-06

申请号：US16546104

申请日：2019-08-20

Applicant: SEMES CO., LTD.

Inventor： Dukhyun Son ,  Sang-Kee Lee

IPC: H01L21/673 ,  H01L21/683

Abstract: Embodiments of the inventive concept provide an apparatus and method for storing a substrate. A buffer unit for storing a substrate includes a housing having an entrance formed at one side and a buffer space inside, a substrate support unit that supports one or more substrates in the buffer space, a pressure adjustment unit that adjusts pressure in the buffer space, and a controller that controls the pressure adjustment unit. The pressure adjustment unit includes a gas supply line that supplies a gas for pressurizing the buffer space and a gas exhaust line that reduces the pressure in the buffer space. At least one of the gas supply line and the gas exhaust line includes a plurality of lines.

公开(公告)号：US11037807B2

公开(公告)日：2021-06-15

申请号：US16505883

申请日：2019-07-09

Applicant: Semes Co., Ltd

Inventor： Jong Gu Lee

IPC: H01L21/67 ,  H01L21/687

Abstract: An apparatus for treating a substrate comprises a process chamber having a processing space inside, a substrate support unit that supports the substrate in the processing space, a heating unit that heats the substrate supported on the substrate support unit, an exhaust unit that evacuates the processing space, and a guide member that guides a gas flow in the processing space. The guide member comprises a blocking plate that is located between an upper wall of the process chamber and the substrate support unit and spaced apart from an inner sidewall of the process chamber and that has a diameter smaller than an inner diameter of the process chamber. The exhaust unit is connected, at a position overlapping the blocking plate, to the upper wall of the process chamber when viewed from above.

公开(公告)号：US11004675B2

公开(公告)日：2021-05-11

申请号：US16129089

申请日：2018-09-12

Applicant: SEMES CO., LTD.

Inventor： Hae-Won Choi ,  Ki-Moon Kang ,  Kihoon Choi ,  Anton Koriakin ,  Chan Young Heo ,  Jaeseong Lee ,  Kwon Taek Lim ,  Yong Hun Kim ,  Sang Ho Lee

IPC: C11D7/36 ,  H01L21/02 ,  B08B3/08 ,  C09K13/08 ,  H01L21/67 ,  C11D7/34 ,  C11D11/00 ,  H01L21/687 ,  C11D7/50

Abstract: Disclosed are an anhydrous substrate cleaning composition, a substrate treating method, and a substrate treating apparatus. The anhydrous substrate cleaning composition includes an etching composite that provides fluorine, a solvent that dissolves the etching composite, and a binder that is a composite including phosphorous.