公开(公告)号：US20220383087A1

公开(公告)日：2022-12-01

申请号：US17885437

申请日：2022-08-10

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Vipin Tiwari ,  Nhan Do

IPC: G06N3/063 ,  G06N3/04 ,  G06F3/06 ,  G06F17/16 ,  G06N3/08 ,  G11C11/56 ,  G11C13/00 ,  G11C16/04 ,  G11C16/28

Abstract: Numerous embodiments are disclosed for compensating for differences in the slope of the current-voltage characteristic curve among reference transistors, reference memory cells, and flash memory cells during a read operation in an analog neural memory in a deep learning artificial neural network. In one embodiment, a method comprises receiving an input voltage, multiplying the input voltage by a coefficient to generate an output voltage, applying the output voltage to a gate of a selected memory cell, performing a sense operating using the selected memory cell and a reference device to determine a value stored in the selected memory cell, wherein a slope of a current-voltage characteristic curve of the reference device and a slope of the current-voltage characteristic curve of the selected memory cell are approximately equal during the sense operation.

公开(公告)号：US20220375952A1

公开(公告)日：2022-11-24

申请号：US17461981

申请日：2021-08-30

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Nhan Do

IPC: H01L27/11526 ,  H01L29/423 ,  G11C16/08 ,  G11C16/14

Abstract: Numerous embodiments are disclosed of a non-volatile memory cell array formed in a p-well, which is formed in a deep n-well, which is formed in a p-substrate. During an erase operation, a negative voltage is applied to the p-well, which reduces the peak positive voltage required to be applied to the cells to cause the cells to erase.

公开(公告)号：US11508442B2

公开(公告)日：2022-11-22

申请号：US17074103

申请日：2020-10-19

Applicant: Silicon Storage Technology, Inc.

Inventor： Leo Xing ,  Chunming Wang ,  Xian Liu ,  Nhan Do ,  Guangming Lin ,  Yaohua Zhu

IPC: G11C16/12 ,  G11C16/26 ,  G11C16/14

Abstract: The present invention relates to a flash memory device that uses strap cells in a memory array of non-volatile memory cells as source line pull down circuits. In one embodiment, the strap cells are erase gate strap cells. In another embodiment, the strap cells are source line strap cells. In another embodiment, the strap cells are control gate strap cells. In another embodiment, the strap cells are word line strap cells.

公开(公告)号：US11488970B2

公开(公告)日：2022-11-01

申请号：US17179057

申请日：2021-02-18

Applicant: Silicon Storage Technology, Inc.

Inventor： Jeng-Wei Yang ,  Man-Tang Wu ,  Boolean Fan ,  Nhan Do

IPC: H01L27/11524 ,  G11C16/04 ,  H01L29/66

Abstract: A method of forming a memory cell includes forming a first polysilicon block over an upper surface of a semiconductor substrate and having top surface and a side surface meeting at a sharp edge, forming an oxide layer with a first portion over the upper surface, a second portion directly on the side surface, and a third portion directly on the sharp edge, performing an etch that thins the oxide layer in a non-uniform manner such that the third portion is thinner than the first and second portions, performing an oxide deposition that thickens the first, second and third portions of the oxide layer, wherein after the oxide deposition, the third portion is thinner than the first and second portions, and forming a second polysilicon block having one portion directly on the first portion of the oxide layer and another portion directly on the third portion of the oxide layer.

公开(公告)号：US11482530B2

公开(公告)日：2022-10-25

申请号：US16919697

申请日：2020-07-02

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Steven Lemke ,  Vipin Tiwari ,  Nhan Do ,  Mark Reiten

IPC: H01L27/11531 ,  G06N3/08 ,  G11C16/04 ,  H01L29/788

Abstract: Numerous embodiments of a precision tuning algorithm and apparatus are disclosed for precisely and quickly depositing the correct amount of charge on the floating gate of a non-volatile memory cell within a vector-by-matrix multiplication (VMM) array in an artificial neural network. Selected cells thereby can be programmed with extreme precision to hold one of N different values.

公开(公告)号：US20220319619A1

公开(公告)日：2022-10-06

申请号：US17839294

申请日：2022-06-13

Applicant: Silicon Storage Technology, Inc,

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stephen Trinh ,  Stanley Hong ,  Anh Ly ,  Steven Lemke ,  Nha Nguyen ,  Vipin Tiwari ,  Nhan Do

IPC: G11C16/34 ,  G11C16/10 ,  G06N3/063 ,  G06F3/06 ,  G06N3/08 ,  G11C16/26 ,  G11C29/10

Abstract: Circuitry and methods are disclosed for compensating for leakage in analog neural memory in deep learning artificial neural networks. In one example, a method is disclosed of compensating for leakage in an array of analog neural non-volatile memory cells, wherein the array is arranged in rows and columns, wherein each row is coupled to a word line and each column is coupled to a bitline, the method comprising measuring leakage for a column of analog neural non-volatile memory cells coupled to a bitline; storing the measured leakage value; and applying the measured leakage value during a read operation of the column of analog neural non-volatile memory cells to compensate for the leakage.

公开(公告)号：US11449741B2

公开(公告)日：2022-09-20

申请号：US16569647

申请日：2019-09-12

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stephen Trinh ,  Stanley Hong ,  Anh Ly ,  Steven Lemke ,  Nha Nguyen ,  Vipin Tiwari ,  Nhan Do

IPC: G06N3/063 ,  G06N3/04 ,  G11C16/04 ,  G11C16/10 ,  G11C16/34 ,  G11C16/08

Abstract: Testing circuitry and methods are disclosed for use with analog neural memory in deep learning artificial neural networks. The analog neural memory comprises one or more arrays of non-volatile memory cells. The testing circuitry and methods can be utilized during sort tests, qualification tests, and other tests to verify programming operations of one or more cells.

公开(公告)号：US20220278119A1

公开(公告)日：2022-09-01

申请号：US17339880

申请日：2021-06-04

Applicant: Silicon Storage Technology, Inc.

Inventor： Guo Xiang Song ,  Chunming Wang ,  Leo Xing ,  Xian Liu ,  Nhan Do

IPC: H01L27/11529

Abstract: A method of forming a semiconductor device by recessing the upper surface of a semiconductor substrate in first and second areas but not a third area, forming a first conductive layer in the three areas, forming a second conductive layer in all three areas, removing the first and second conductive layers from the second area and portions thereof from the first area resulting in pairs of stack structures each with a control gate over a floating gate, forming a third conductive layer in all three areas, forming a protective layer in the first and second areas and then removing the third conductive layer from the third area, then forming blocks of dummy conductive material in the third area, then etching in the first and second areas to form select and HV gates, and then replacing the blocks of dummy conductive material with blocks of metal material.

公开(公告)号：US11409352B2

公开(公告)日：2022-08-09

申请号：US16354040

申请日：2019-03-14

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Vipin Tiwari ,  Mark Reiten ,  Nhan Do

IPC: G06F1/26 ,  G06F1/32 ,  G06F1/3234 ,  G11C16/04 ,  G06N3/08 ,  G06F17/16 ,  G11C11/54 ,  G06N3/04

Abstract: Numerous embodiments of power management techniques are disclosed for various operations involving one or more vector-by-matrix multiplication (VMM) arrays within an artificial neural network.

公开(公告)号：US20220216316A1

公开(公告)日：2022-07-07

申请号：US17701840

申请日：2022-03-23

Applicant: Silicon Storage Technology, Inc.

Inventor： Chunming Wang ,  Xian Liu ,  Guo Xiang Song ,  Leo Xing ,  Nhan Do

IPC: H01L29/423 ,  H01L29/66 ,  G11C16/04 ,  H01L29/788

Abstract: A memory device, and method of making the same, that includes a substrate of semiconductor material of a first conductivity type, first and second regions spaced apart in the substrate and having a second conductivity type different than the first conductivity type, with a first channel region in the substrate extending between the first and second regions, a first floating gate disposed over and insulated from a first portion of the first channel region adjacent to the second region, a first coupling gate disposed over and insulated from the first floating gate, a first word line gate disposed over and insulated from a second portion of the first channel region adjacent the first region, and a first erase gate disposed over and insulated from the first word line gate.