Filler used for separating optical isomers and process for separating optical isomers with the filler
    21.
    发明申请
    Filler used for separating optical isomers and process for separating optical isomers with the filler 有权
    用于分离光学异构体的填料和用填料分离光学异构体的方法

    公开(公告)号:US20070084796A1

    公开(公告)日:2007-04-19

    申请号:US11637157

    申请日:2006-12-12

    IPC分类号: B01D15/08

    摘要: The objectives of this invention are to provide a filler for separating optical isomers, capable of efficiently carrying out optical resolution of optical isomer mixtures, and to provide a process for separating optical isomers by a simulated moving bed chromatography utilizing the filler. This invention provides a filler made of a carrier supporting a specific amount of an optically active high molecular weight compound. Separation by the simulated moving bed chromatography using the filler is carried out under the condition that the capacity factors have specific values.

    摘要翻译: 本发明的目的是提供一种用于分离光学异构体的填料,其能够有效地进行光学异构体混合物的光学拆分,并提供通过使用填料的模拟移动床色谱分离光学异构体的方法。 本发明提供了由支持特定量的光学活性高分子量化合物的载体制成的填料。 在容量因子具有特定值的条件下,通过使用填料的模拟移动床层析法进行分离。

    Defect inspection apparatus, program, and manufacturing method of semiconductor device
    22.
    发明授权
    Defect inspection apparatus, program, and manufacturing method of semiconductor device 有权
    半导体器件的缺陷检查装置,程序和制造方法

    公开(公告)号:US07148479B2

    公开(公告)日:2006-12-12

    申请号:US11086212

    申请日:2005-03-23

    IPC分类号: H01J37/256

    摘要: A defect inspection apparatus includes a charged particle beam source which emits a charged particle beam to illuminate the charged particle beam onto a sample as a primary beam; an image pickup which includes an imaging element having a light receiving face receiving at least one of a secondary charged particle, a reflective charged particle, and a back-scattered charged particle generated from the sample by the illumination of the primary beam and which outputs a signal indicating a state of the surface of the sample; a mapping projection system which maps/projects at least one of the secondary charged particle, the reflective charged particle, and the back-scattered charged particle as a secondary beam and which makes the beam to form an image on the light receiving face of the imaging element; a controller which adjusts a beam diameter of the primary beam in such a manner as to apply the beam to the sample with a size smaller than that of an imaging region as a target of review to scan the imaging region and which allows the image pickup to pick up a plurality of frame images; an image processor which processes the plurality of obtained frame images to prepare a review image; and a defect judgment unit which judges a defect of the sample based on the review image.

    摘要翻译: 缺陷检查装置包括:带电粒子束源,其发射带电粒子束,以将带电粒子束照射到样品上作为主光束; 一种图像拾取器,其包括具有光接收面的成像元件,所述光接收面接收通过所述一次光束的照射从所述样品产生的二次带电粒子,反射带电粒子和反向散射带电粒子中的至少一个,并且输出 指示样品表面状态的信号; 映射投影系统,其将二次带电粒子,反射带电粒子和反向散射带电粒子中的至少一个作为次级光束进行映射/投影,并且使得该光束在成像的光接收面上形成图像 元件; 控制器,其以这样的方式调节主光束的光束直径,使得将光束以比成像区域的尺寸小的像素的尺寸施加到作为检查对象的扫描成像区域,并且允许图像拾取 拾取多个帧图像; 处理所述多个获得的帧图像以准备检查图像的图像处理器; 以及缺陷判定单元,其基于检查图像判断样本的缺陷。

    Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus
    23.
    发明申请
    Substrate inspection method, method of manufacturing semiconductor device, and substrate inspection apparatus 有权
    基板检查方法,半导体装置的制造方法以及基板检查装置

    公开(公告)号:US20050263701A1

    公开(公告)日:2005-12-01

    申请号:US11137473

    申请日:2005-05-26

    摘要: A substrate inspection method includes: generating an electron beam and irradiating the electron beam as a primary electron beam to a substrate as a specimen; inducing at least any of a secondary electron, a reflected electron and a backscattering electron which are emitted from the substrate receiving the primary electron beam, and magnifying and projecting the induced electron as a secondary electron beam so as to form an image of the secondary electron beam; a trajectory of the primary electron beam and a trajectory of the secondary electron beam having an overlapping space and space charge effect of the secondary electron beam occurring in the overlapping space, detecting the image of the secondary electron beam to output a signal representing a state of the substrate; and suppressing aberration caused by the space charge effect in the overlapping space.

    摘要翻译: 基板检查方法包括:产生电子束并将作为一次电子束的电子束照射到作为检体的基板; 诱导从接收一次电子束的基板发射的二次电子,反射电子和后向散射电子中的任一种,并且将感应电子放大并投影为二次电子束,以形成二次电子的图像 光束; 一次电子束的轨迹和二次电子束的轨迹具有在重叠空间中发生的二次电子束的重叠空间和空间电荷效应,检测二次电子束的图像以输出表示二次电子束的状态的信号 基材; 并且抑制由重叠空间中的空间电荷效应引起的像差。

    Pattern matching method, program and semiconductor device manufacturing method
    25.
    发明授权
    Pattern matching method, program and semiconductor device manufacturing method 有权
    模式匹配方法,程序和半导体器件制造方法

    公开(公告)号:US08036445B2

    公开(公告)日:2011-10-11

    申请号:US11255024

    申请日:2005-10-21

    IPC分类号: G06K9/00

    摘要: A pattern matching method includes: detecting an edge of a pattern in a pattern image obtained by imaging the pattern; segmenting the detected pattern edge to generate a first segment set consisting of first segments; segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments; combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments; calculating the compatibility coefficient between every two segment pairs in the defined segment pairs; defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies; determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs; calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector.

    摘要翻译: 模式匹配方法包括:通过对图案进行成像而获得的图案图像中的图案的边缘进行检测; 分割检测到的图案边缘以产生由第一段组成的第一段组; 在作为用于评估图案的基准的参考数据上分割图形边缘以生成由第二段组成的第二段集合; 将第一段组中的任何段与第二段集合中的任何段组合以限定由第一和第二段组成的段对; 计算定义的段对中每两个段对之间的兼容性系数; 通过基于所计算的兼容性系数计算定义的段对的局部一致性并排除具有较低本地一致性的段对来缩小定义的段对,来定义新的段对; 通过重复计算所述兼容性系数和通过缩小所述片段对来限定新的片段对来确定最佳片段对; 计算链接构成最佳段对的第一和第二段的移位向量的特征量; 并且基于所计算的移位矢量的特征量,在图案图像和参考数据之间执行位置匹配。

    Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
    27.
    发明授权
    Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device 有权
    掩模图案检查方法,曝光条件验证方法和半导体器件的制造方法

    公开(公告)号:US07674570B2

    公开(公告)日:2010-03-09

    申请号:US11480382

    申请日:2006-07-05

    IPC分类号: G03F7/20

    CPC分类号: G03F1/84

    摘要: A mask pattern inspection method includes: transferring a mask pattern onto a conductor substrate or a semiconductor substrate; preparing a sample including a substrate surface pattern in an electrically conductive state to the substrate, the substrate surface pattern being constituted of a convex pattern or a concave pattern each having a shape in accordance with the transferred mask pattern, or a surface layer obtained by filling the concave pattern with a material; irradiating the sample with an electron beam to detect at least one of a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample, thereby acquiring an image of the sample surface; and inspecting the mask pattern on the basis of the image.

    摘要翻译: 掩模图案检查方法包括:将掩模图案转印到导体基板或半导体基板上; 将具有导电状态的基板表面图案的样品制备到基板,所述基板表面图案由根据所转印的掩模图案的形状的凸形图案或凹形图案构成,或者通过填充获得的表面层 具有材料的凹形图案; 用电子束照射样品以检测从样品表面产生的二次电子,反射电子和背散射电子中的至少一个,从而获取样品表面的图像; 并基于图像检查掩模图案。

    Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
    28.
    发明授权
    Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method 失效
    基板检查装置,基板检查方法及半导体装置的制造方法

    公开(公告)号:US07608821B2

    公开(公告)日:2009-10-27

    申请号:US11698132

    申请日:2007-01-26

    IPC分类号: H01J37/26 G01N23/04

    摘要: A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a secondary electron, a reflection electron and a back scattering electron generated from a surface of the substrate by the irradiation of the electron beam to output signals constituting an image showing a state of the substrate surface; and a surface potential uniformizing unit which generates ions, and irradiates the ions to the substrate before the irradiation of the electron beam to uniformize a surface potential of the substrate.

    摘要翻译: 基板检查装置包括:电子枪,其产生电子束以将电子束照射到基板; 电子检测单元,其通过电子束的照射检测从基板的表面产生的二次电子,反射电子和背散射电子中的至少一个,以输出构成表示基板表面的状态的图像的信号; 以及产生离子的表面电位均匀化单元,并且在照射电子束之前将离子照射到衬底上以使衬底的表面电位均匀化。

    Method of producing ethyl (3R, 5S, 6E)-7-[2 cyclopropyl-4-(fluorophenyl) quinoline-3-yl]-3, 5-dihydroxy-6-heptenoate
    29.
    发明授权
    Method of producing ethyl (3R, 5S, 6E)-7-[2 cyclopropyl-4-(fluorophenyl) quinoline-3-yl]-3, 5-dihydroxy-6-heptenoate 失效
    制备(3R,5S,6E)-7- [2-环丙基-4-(氟苯基)喹啉-3-基] -3,5-二羟基-6-庚烯酸乙酯的方法

    公开(公告)号:US07550596B2

    公开(公告)日:2009-06-23

    申请号:US11254864

    申请日:2005-10-21

    IPC分类号: C07D215/38

    CPC分类号: C07D215/14 C07B2200/07

    摘要: A method of producing Ethyl(3R,5S,6E)-7-[2-cyclopropyl-4-(4-fluorophenyl)quinoline-3-yl]-3,5-dihydroxy-6-heptenoate by means of liquid chromatography using a packing material comprising a carrier and, carried thereon, a polysaccharide derivative, wherein a part or all of the hydrogen atoms of hydroxyl and amino groups of the polysaccharide derivative are substituted with one or more substituents, such as a carbamoyl group wherein one hydrogen atom is substituted with an aromatic group having a specific alkyl group. The method allows the production of the above (3R,5S,6E) isomer with enhanced productivity to a conventional method.

    摘要翻译: 通过液相色谱法使用(3R,5S,6E)-7- [2-环丙基-4-(4-氟苯基)喹啉-3-基] -3,5-二羟基-6-庚烯酸乙酯 包含载体的载体和载体上的多糖衍生物,其中多糖衍生物的羟基和氨基的一部分或全部氢原子被一个或多个取代基取代,例如氨基甲酰基,其中一个氢原子是 被具有特定烷基的芳基取代。 该方法允许以常规方法以高生产率生产上述(3R,5S,6E)异构体。

    Pattern matching method, program and semiconductor device manufacturing method
    30.
    发明申请
    Pattern matching method, program and semiconductor device manufacturing method 有权
    模式匹配方法,程序和半导体器件制造方法

    公开(公告)号:US20060110042A1

    公开(公告)日:2006-05-25

    申请号:US11255024

    申请日:2005-10-21

    IPC分类号: G06K9/48 G06K9/00

    摘要: A pattern matching method includes: detecting an edge of a pattern in a pattern image obtained by imaging the pattern; segmenting the detected pattern edge to generate a first segment set consisting of first segments; segmenting a pattern edge on reference data which serves as a reference for evaluating the pattern to generate a second segment set consisting of second segments; combining any of the segments in the first segment set with any of the segments in the second segment set to define a segment pair consisting of first and second segments; calculating the compatibility coefficient between every two segment pairs in the defined segment pairs; defining new segment pairs by narrowing down the defined segment pairs by calculating local consistencies of the defined segment pairs on the basis of the calculated compatibility coefficients and by excluding segment pairs having lower local consistencies; determining an optimum segment pair by repeating the calculating the compatibility coefficient and the defining new segment pairs by narrowing down the segment pairs; calculating a feature quantity of a shift vector that links the first and second segments making up the optimum segment pair; and performing position matching between the pattern image and the reference data on the basis of the calculated feature quantity of the shift vector.

    摘要翻译: 模式匹配方法包括:通过对图案进行成像而获得的图案图像中的图案的边缘进行检测; 分割检测到的图案边缘以产生由第一段组成的第一段组; 在作为用于评估图案的基准的参考数据上分割图形边缘以生成由第二段组成的第二段集合; 将第一段组中的任何段与第二段集合中的任何段组合以限定由第一和第二段组成的段对; 计算定义的段对中每两个段对之间的兼容性系数; 通过基于所计算的兼容性系数计算定义的段对的局部一致性并排除具有较低本地一致性的段对来缩小定义的段对,来定义新的段对; 通过重复计算所述兼容性系数和通过缩小所述片段对来限定新的片段对来确定最佳片段对; 计算链接构成最佳段对的第一和第二段的移位向量的特征量; 并且基于所计算的移位矢量的特征量,在图案图像和参考数据之间执行位置匹配。