摘要:
The invention concerns an apparatus for optically characterising a thin-layer material by backscattering Raman spectometry comprising a frame, a monochromatic excitation laser source (21), optical means (23, 24) directing a light flux emitted by the source towards the material to be characterised, provided with means (22) homogenising the distribution of energy per surface unit, over a minimum surface of some tens of square micrometers, and means for collecting (24) and selecting (27, 28) the light diffused by Raman effect. The apparatus further comprises reflectometric measuring means (3-14) integral with the Raman measuring means, including reflectometric excitation means (3-9) directed on the same sample zone as the Raman excitation means.
摘要:
An optical component for modulation of polarization, a Mueller polarimeter and ellipsometer containing such an optical component. The optical component modulates a linearly polarized incident beam and returns a modulated beam. It includes a coupled phase modulator which modulates the incident beam twice in succession, the two modulations having the same frequency of &ohgr;/2&pgr;, and a coupling system modifying the polarization state of the light between the two modulations. The ellipsometer includes the means for detection of a measurement beam returned by a sample, which receives the modulated beam, in addition to a processing unit. The means of detection include a polarimeter producing n measured quantities representing the polarization states of the beam, and the processing unit produces m values for each of these quantities by Fourier transform, with n×m≧16 and m≧4, providing simultaneous access to the sixteen components of the Mueller matrix of the sample.
摘要:
This invention relates to a method and a device for the ellipsometric measurement of physical parameters representative of a sample.The measured values I.sub.om, I.sub.sm and I.sub.cm are calculated (51, 52) from the signal (50) which represents the measured intensity I(t).In a first step (55, 57), initial theoretical values I.sub.st /I.sub.ot and I.sub.ct /I.sub.ot are produced from initial estimations (56) of the physical parameters. In a second step (58, 59) subsequent estimations (59) of physical parameters are determined from which subsequent theoretical values I.sub.st /I.sub.ot and I.sub.ct /I.sub.ot are deduced (55, 57). The second step is reiterated to an Nth estimation (59) of the physical parameters, so as to minimise the difference between the theoretical values and those measured.The physical parameters are evaluated (54) in the course of the Nth estimation.
摘要:
The invention relates to an infrared ellipsometer intended to take measurements of a sample (1). An exciter group (3) of the ellipsometer includes a source (101), a Michelson interferometer (103), a polarizer (105), and an optical device (107) to align the source (101) and the sample (1). An analysis group (7) has a polarizer-analyzer (701), a detector (703), and an optical device (705) for aligning the sample (1) and the detector (703). This infrared ellipsometer also incorporates a phase modulator (8). An electronic devices (9) controls the modulator (8) and the Michelson interferometer (103), and receives the signal produced by the detector (703).
摘要:
Method and a polarimetric measurement device of a planar object carrying patterns repeated regularly and forming the lines of a grid. A first measurement is carried out at zero order, under an angle of incidence θ1 and for a first azimuthal angle φ1, a second measurement at least is carried out at zero order, under an angle of incidence θ2 and for a second azimuthal angle φ2, the polarization of the incident beam is modulated and the polarization of the reflected beam is analyzed for each measurement, theoretical polarimetric data is calculated for a model object of the real object, the model object including parameters adjustable using a formalism of electromagnetism. An iterative comparison of the measurements is conducted with the theoretical polarimetric data for different values of the adjustable parameters.
摘要:
A Raman method and system for analysing a sample including an excitation source emitting an incident light beam, a sample holder for mounting the sample, elements for focusing the incident light beam onto the sample surface to generate a Raman scattered light having an intensity, elements for collecting the Raman scattered light to form a Raman scattered light beam, a detection system measuring intensity of the Raman scattered light beam as a function of time. The system includes at least a polarization state generator able to generate four independent polarization states or a polarization state analyzer able to analyze four independent polarization states to detect the intensity of the Raman scattered light beam and calculate a partial or complete Mueller-Stokes matrix of the sample.
摘要:
The invention relates to an electronic polarimetric imaging system use in a colposcopy device for in vivo monitoring a cervix, which is provided with a light source for illuminating the observable cervix and at least visual means for monitoring said cervix, wherein the illumination optical path directed to the cervix and the image optical path coming back from the cervix are separated from each other on at least a portion of the paths thereof. The inventive system comprises a polarimetric adapter housing which is removable in the separated portion of the illumination and image optical paths and comprises a polarization state generator (PSG) positioned on the illumination optical path and a polarization analyser (PSA) positioned on the image optical path, wherein said polarization state generator (PSG) and polarization analyser (PSA) are designed in such a way that they are controllable. Said invention makes it possible to obtain several polarimetric characterisation levels. The adapter housing is also disclosed.
摘要:
A broadband ellipsometer/polarimeter system for analyzing a sample includes an illumination source emitting a polychromatic light beam, a polarization state generator (PSG) including a fixed linear polarizer and a substantially achromatic retarder mounted on a rotating holder, a sample holder, a polarization state analyser (PSA) including a fixed linear polarizer and a substantially achromatic retarder mounted on a rotating holder, a primary detection system measuring the intensities at each wavelength of the light beam transmitted through the PSA, optics to collimate the beam into the PSG and into the PSA and to focus the beam into the sample surface and the detector. The linear polarizer and achromatic retarder in the PSA are identical to those of the PSG but mounted in a reverse order.
摘要:
The invention concerns a method for treating a surface for the protection and functionalisation of polymers (4) by gas plasma deposit in a confined chamber (10) of one or several silicon alloy layers (43). The silicon alloy is selected among silicon and its oxides, nitrides, oxynitrides; the deposit is performed at a temperature less than the degradation temperature of the polymer, and a physico—chemical surface pre-treatment by plasma is performed in the same chamber before the silicon alloy is deposited; the pre-treatment consisting in a surface treatment comprising etching a surface zone of the polymer and step which consists in depositing a polymeric carbon compound.
摘要:
A polarimeter includes a prism (32) for separating the incident light beam (21) having a Stokes vector (S) into a reflected beam (22) and a transmitted beam (23), the prism not inducing any interferential effect and the transmitted beam being subjected to at least a reflection internal to the prism. The polarimeter also include two final separators (3, 4) for separating respectively each of the reflected beam and the transmitted beam into at least two final beams (25-28), detecting means (5-8) for measuring the intensity levels of the final beams and a processing unit (9) producing the Stokes vector of the light to be measured. Preferably, the reflections internal to the prism (32) are either total reflections, or reflections on a thick absorbing layer. The invention also includes a method for measuring light beam polarization states.