Abstract:
An integrated circuit (IC) has a number of memory cells, each of which has a diode structure coupled between a bitline and a wordline that are selected when programming that cell. A target memory cell of the IC is programmed while simultaneously floating a number of unselected bitlines and wordlines in the IC.
Abstract:
The invention relates to a phase-change memory device. The device includes a double-trench isolation structure around the diode stack that communicates to the lower electrode. The present invention also relates to a method of making a phase-change memory device. The method includes forming two orthogonal and intersecting isolation trenches around a memory cell structure diode stack.
Abstract:
The present invention relates to pliable capacitive structures such as dielectric elastomers and similar smart materials which can be used for sensing externally applied strains which can be inferred by the determining the capacitance of the structure/material. There is provided an apparatus comprising a pliable capacitive structure for use in detecting shape or strain changes, the pliable capacitive structure having a dielectric material positioned between two electrodes; means for applying a steady-state voltage across the two electrodes; and means for determining changes in capacitance of the pliable capacitive structure using said steady state voltage.
Abstract:
A memory cell may include a phase-change material. Adhesion between the phase-change material and a dielectric or other substrate may be enhanced by using an adhesion enhancing interfacial layer. Conduction past the phase-change material through the interfacial layer may be reduced by providing a discontinuity or other feature that reduces or prevents conduction along said interfacial layer.
Abstract:
A phase-change memory cell may be formed with a carbon-containing interfacial layer that heats a phase-change material. By forming the phase-change material in contact, in one embodiment, with the carbon containing interfacial layer, the amount of heat that may be applied to the phase-change material, at a given current and temperature, may be increased. In some embodiments, the performance of the interfacial layer at high temperatures may be improved by using a wide band gap semiconductor material such as silicon carbide.
Abstract:
A method for manufacturing Flash memory devices includes forming a well region in a substrate, depositing a gate dielectric layer overlying the well region, and depositing a first polysilicon layer overlying the gate dielectric layer. The method also includes depositing a dielectric layer overlying the first polysilicon layer and depositing a second polysilicon layer overlying the dielectric layer to form a stack layer. The method simultaneously patterns the stack layer to form a first flash memory cell, which includes a first portion of the second polysilicon layer overlying a first portion of the dielectric layer overlying a first portion of first polysilicon layer and to form a select device, which includes a second portion of second polysilicon layer overlying a second portion of dielectric layer overlying a second portion of first polysilicon layer. The method further includes forming source/drain regions using ion implant. The select device is activated by applying voltage to the second portion of first polysilicon layer.
Abstract:
A memory cell including a phase-change material may have reduced leakage current. The cell may receive signals through a buried wordline in one embodiment. The buried wordline may include a sandwich of a more lightly doped N type region over a more heavily doped N type region over a less heavily doped N type region. As a result of the configuration of the N type regions forming the buried wordline, the leakage current of the buried wordline to the substrate under reverse bias conditions may be significantly reduced.
Abstract:
A micro-sized power source. A piezoelectric power generator, capable of harvesting energy from environmental vibration with lower level frequency, including a dielectric frame loosely containing a piezoelectric panel. The piezoelectric panel includes an electrode and a piezoelectric layer formed over an electrode and dielectric layer and an end mass formed on the piezoelectric layer. The end mass provides weight to cause the piezoelectric panel to move (vibrate) within the frame and causes the generation of electrical power.
Abstract:
A system and method for adjusting power consumption of a USB-based device. The system includes a power supply configured to generate a first supply voltage, a controller configured to receive the first supply voltage and generate a control signal, and a USB component configured to receive the control signal and in response operate in a first USB mode or a second USB mode. The controller is further configured to process information associated with the first supply voltage and a predetermined threshold voltage. If the first supply voltage is higher than the predetermined threshold voltage, the control signal represents a first logic state. If the first supply voltage is lower than the predetermined threshold voltage, the control signal represents a second logic state.
Abstract:
A memory cell including a phase-change material may have reduced leakage current. The cell may receive signals through a buried wordline in one embodiment. The buried wordline may include a sandwich of a more lightly doped N type region over a more heavily doped N type region over a less heavily doped N type region. As a result of the configuration of the N type regions forming the buried wordline, the leakage current of the buried wordline to the substrate under reverse bias conditions may be significantly reduced.