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    Equipment and method of local streaming potential measurement for monitoring the process of membrane fouling in hollow-fiber membrane filtrations
    23.
    发明授权
    Equipment and method of local streaming potential measurement for monitoring the process of membrane fouling in hollow-fiber membrane filtrations 失效
    局部流动电位测量的设备和方法，用于监测中空纤维膜过滤膜污染过程

    公开(公告)号：US06727099B2

    公开(公告)日：2004-04-27

    申请号：US09906696

    申请日：2001-07-18

    Applicant: Myung-Suk Chun ,  Jae-Jin Kim ,  Sang Yup Lee

    Inventor： Myung-Suk Chun ,  Jae-Jin Kim ,  Sang Yup Lee

    IPC: G01N27416

    CPC classification number: G01N27/60 ,  B01D61/12 ,  B01D61/22 ,  B01D65/08 ,  B01D65/10 ,  B01D2321/22 ,  Y10T436/25375

    Abstract: The present invention relates to an apparatus for monitoring the progress of membrane fouling that occurs on pores as well as on the surface of a membrane by means of variations of zeta potential (&zgr;) of a hollow-fiber membrane according to time passage of filtration of a suspension, wherein colloid particles, biopolymers and other inorganic particles are dispersed, and the method thereof. Moreover, the present invention also relates to a method to identify the effect of concentration polarization layer and cake layer which can vary according to the axial position of a hollow-fiber and the developing progress of a membrane fouling by measuring the position-dependent zeta potential of the hollow-fiber membrane.

    Abstract translation: 本发明涉及一种用于通过中空纤维膜的ζ电位（ζ）的变化来监测在孔和膜的表面上发生的膜污染进程的装置， 其中分散有胶体颗粒，生物聚合物和其它无机颗粒的悬浮液及其方法。 此外，本发明还涉及一种鉴定浓缩偏振层和滤饼层的效果的方法，其可以根据中空纤维的轴向位置而变化，并且通过测量位置依赖性ζ电位来测量膜污染的发展进展 的中空纤维膜。

    Method for laser interference lithography using diffraction grating
    26.
    发明授权
    Method for laser interference lithography using diffraction grating 有权
    使用衍射光栅的激光干涉光刻方法

    公开(公告)号：US08399184B2

    公开(公告)日：2013-03-19

    申请号：US12738598

    申请日：2008-10-08

    Applicant: Tae-Su Kim ,  Jae-Jin Kim ,  Hyun-Woo Shin

    Inventor： Tae-Su Kim ,  Jae-Jin Kim ,  Hyun-Woo Shin

    IPC: G03F7/20

    CPC classification number: G03F7/70408 ,  G02B5/1809 ,  G02B5/1814

    Abstract: A method for laser interference lithography using a diffraction grating includes (a) forming a photoresist layer on a work substrate to which a repeated fine pattern is to be formed; (b) forming a refractive index matching material layer on the photoresist layer; (c) forming on the refractive index matching material layer a diffraction grating layer having a period of diffraction grating within the range from λ/ng to λ/n0 (λ is a wavelength of laser beam, ng is a refractive index of the diffraction grating, and n0 is a refractive index in the air or in vacuum); and (d) exposing the photoresist layer by means of mutual interference of positive and negative diffracted lights with the same absolute value by inputting a laser beam perpendicularly to the diffraction grating layer. This method allows to realize an interference pattern with higher resolution and to use a laser source with lower coherence.

    Abstract translation: 使用衍射光栅的激光干涉光刻方法包括：（a）在要形成重复精细图案的工件基板上形成光致抗蚀剂层; （b）在光致抗蚀剂层上形成折射率匹配材料层; （c）在折射率匹配材料层上形成具有λ/ ng至λ/ n0范围内的衍射光栅周期的衍射光栅层（λ为激光束的波长，ng为衍射光栅的折射率 ，n0是空气中或真空中的折射率）; 和（d）通过垂直于衍射光栅层输入激光束，通过相同绝对值的正和负衍射光的相互干涉来使光致抗蚀剂层曝光。 该方法允许实现具有更高分辨率的干涉图案并且使用具有较低相干性的激光源。

    SUBSTRATE HAVING LOW REFLECTION AND HIGH CONTACT ANGLE, AND PRODUCTION METHOD FOR SAME
    27.
    发明申请
    SUBSTRATE HAVING LOW REFLECTION AND HIGH CONTACT ANGLE, AND PRODUCTION METHOD FOR SAME 有权
    具有低反射和高接触角的基底及其生产方法

    公开(公告)号：US20120212816A1

    公开(公告)日：2012-08-23

    申请号：US13504444

    申请日：2010-10-28

    Applicant: Tae-Su Kim ,  Jae-Jin Kim ,  Bu-Gon Shin ,  Young-Jun Hong ,  Hyeon Choi

    Inventor： Tae-Su Kim ,  Jae-Jin Kim ,  Bu-Gon Shin ,  Young-Jun Hong ,  Hyeon Choi

    IPC: G02B5/30 ,  G03F7/20 ,  B44C1/17 ,  B32B3/14 ,  B05D5/06

    CPC classification number: G02B1/118 ,  G02B1/105 ,  G02B1/11 ,  G02B1/18 ,  Y10T428/24612

    Abstract: Provided are a substrate including a base with a pattern on at least one side thereof, in which a refractive index in a lower region of the pattern and a refractive index in an upper region of the pattern are different from each other according to a shape of the pattern; and a water repellent coating layer provided on at least one side with the pattern of the base, an optical product including the same, and a manufacturing method of the substrate. The substrate according to the present invention has both an excellent anti-reflective property and an excellent water repellent property.

    Abstract translation: 提供了一种基板，其包括在其至少一个侧面上具有图案的基底，其中图案的下部区域中的折射率和图案的上部区域中的折射率彼此不同， 模式; 以及在至少一侧设置有基底的图案的防水涂层，包括该基板的图案的光学产品和基板的制造方法。 根据本发明的基材具有优异的抗反射性和优异的防水性。

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