Abstract:
There is provided a semiconductor etching apparatus which removes particles remaining on the upper surface of an electro static chuck (ESC) during an etching process, thereby preventing a chucking force from decreasing and minimizing a leak of helium. To prevent a failure of the etching process due to a wafer chucking failure, by preventing polymers from falling down on the upper part of the ESC when a wafer is dechucked or transferred, the semiconductor etching apparatus comprises: an ESC selectively holding a wafer to be entered and positioned inside a chamber, and including a lower electrode part to which RF power is applied; parts positioned at a stepped portion of the ESC and respectively surrounding a side of the ESC; and a gas flow blocking part blocking a gas flow in a vacuum path formed between the ESC and the parts.
Abstract:
The present invention relates to antibacterial and antifungal compositions having 3-isothiazolone and polyhexamethyleneguanidine phosphate. These new antiseptic compositions demonstrate a superior degree of effectiveness on a wide spectrum of pathogens. The present invention also relates to the use of these new antiseptic compositions to kill and/or restrain the growth of bacteria and fungi in a variety of applications.
Abstract:
The present invention relates to stabilized isothiazolone compositions and methods of stabilization of isothiazolone, more particularly, to stabilized isothiazolone solutions comprising (a) an isothiazolone composition, (b) sulfuric acid, and (c) solvent.
Abstract:
A method of preparing N,N-disubstituted 3,3′-dithiodipropionamide of formula (2) is provided. In the method, 3-mercaptopropi-onamide of formula (4) reacts with an aqueous solution of amine to prepare N-substituted-3-mercaptopropionamide of formula (3) and N-substituted-3-mercaptopropionamide reacts with an aqueous solution of hydrogen peroxide. In addition, a method of preparing substituted 3-isothiazolone is provided. In the method, the produced N,N-disubstituted-3,3′-dithiodipropionamide reacts with a halogenating agent, wherein X and Z are same or different and each selected from the group consisting of hydrogen or a lower alkyl group; Y is selected from the group consisting of hydrogen, an alkyl group of 1 to 18 carbon atoms, a cycloalkyl group of up to 10 carbon atoms, an aralkyl group of up to 10 carbon atoms, an alkyl group of up to 10 carbon atoms, a halogen-, lower alkyl- or lower alkoxy-substituted aryl group, cyano alkyl group, a carboalkoxyalkyl group, a haloalkyl group, an alkoxyalkyl group, an aryloxyalkyl group of up to 12 carbon atoms, an aralkoxyalkyl group of up to 12 carbon atoms, a dialkylaminoalkyl group, an alkylacyl group of up to 8 carbon atoms, a lower alkylsulfonyl group, an arylsulfonyl group of up to 10 carbon atoms, a cyano group and a carbamoyl group.
Abstract:
A method of preparing water free isothiazolone having the steps of obtaining an extract from an aqueous solution containing isothiazolone by using a halogenationed hydrocarbon or nitrated hydrocarbon, removing the halogenationed hydrocarbon or nitrated hydrocarbon from the extract, and adding a organic solvent such as glycol, alcohol and glycol ether provides a water free isothiazolone having a high stability without forming wastes and harmful gas.
Abstract:
In a method, an isolation layer pattern is formed on a substrate to define first and second active fins. An ARC layer is formed on the isolation layer pattern to at least partially cover sidewalls of the first and second active fins. A level of a top surface of the ARC layer is equal to or less than, and equal to or greater than half of, those of the first and second active fins. A photoresist layer is formed on the first and second active fins and the ARC layer. A portion of the photoresist layer is removed to form a photoresist pattern covering the first active fin and exposing the second active fin. A portion of the ARC layer under the removed portion of the photoresist layer is removed to form an ARC layer pattern. Impurities are implanted into the exposed second active fin to form an impurity region.
Abstract:
An adhesive film, an adhesive composition, and a semiconductor device wherein, in the adhesive film, a difference between a storage modulus (A) of the adhesive film after 4 cycles and a storage modulus (B) of the adhesive film after 1 cycle is about 3×106 dyne/cm2 or less, the storage modulus (A) of the adhesive film after 4 cycles is about 7×106 dyne/cm2 or less, and the storage modulus (B) of the adhesive film after 1 cycle is about 2×106 dyne/cm2 or more, when curing at 125° C. for 1 hour and then at 150° C. for 10 minutes is defined as 1 cycle.
Abstract translation:粘合剂膜,粘合剂组合物和半导体器件,其中在粘合剂膜中,4个循环之后的粘合剂膜的储能模量(A)与1个循环后的粘合剂膜的储能模量(B)之间的差为 约3×10 6达因/ cm 2以下,4次循环后的粘合膜的储能模量(A)约为7×10 6达因/ cm 2以下,1次循环后的粘合膜的储能模量(B)约为 2×10 6达因/ cm 2以上,当在125℃下固化1小时,然后在150℃下固化10分钟时,定义为1个循环。
Abstract:
Hinge assemblies that may adjust a tilt angle of an element of a portable electronic device in a user-comfortable position are disclosed. An example hinge assembly includes a first frame, a second frame rotatably coupled to the first frame, wherein a position of the second frame is adjustable between a first position and a second position to change a tilt angle of the second frame with respect to the first frame, a first elastic member connected to the first frame and the second frame and pressing the second frame toward the second position, and a locking member movably coupled to the first frame and capable of moving between a locking position where the locking member is engaged with the second frame to maintain the second frame at the first position, and an unlocking position where the locking member is separated from the second frame.
Abstract:
The present disclosure relates to an apparatus and a method for controlling a function of a communication module in a portable terminal, by which the function of the communication module can be automatically turned on or off in order to reduce the consumption of a battery of the portable terminal based on a connection/disconnection pattern, so that learning pattern the communication module selectively turned on a particular cycle calculated as a learning pattern.
Abstract:
Disclosed herein are a pharmaceutical composition for inhibiting the growth or metastasis of cholangiocarcinoma, comprising a L1CAM activity inhibitor or expression suppressor and a treatment method using the composition. This is based on the finding that L1CAM is overexpressed on cholangiocarcinoma and plays an important role in the growth and metastasis of cholangiocarcinoma and the mortality of cholangiocarcinoma patients increases as the expression rate of L1CAM increases. Also, antibodies inhibitory of the activity of L1CAM, or siRNAs suppressing the expression of L1CAM, are found to reduce the growth and invasion of cholangiocarcinoma cells. Mouse monoclonal antibodies, recognizing the L1CAM protein on the cholangiocarcinoma cell surface and binding specifically to cholangiocarcinoma tissues, or siRNAs, antisense oligonucleotides or shRNAs, may be useful in the treatment of cholangiocarcinoma by inhibiting the growth, invasion and migration of cholangiocarcinoma cell.