公开(公告)号：US20060284259A1

公开(公告)日：2006-12-21

申请号：US11449689

申请日：2006-06-09

Applicant: Jung-Hyeon Lee ,  Si-Hyeung Lee ,  Kwang-Sub Yoon ,  Bong-Cheol Kim

Inventor： Jung-Hyeon Lee ,  Si-Hyeung Lee ,  Kwang-Sub Yoon ,  Bong-Cheol Kim

IPC: H01L29/76

CPC classification number: H01L27/0207 ,  H01L27/10817 ,  H01L27/10885

Abstract: In a semiconductor device having asymmetric bit lines and a method of manufacturing the same, a plurality of active regions are electrically isolated from one another by an isolation layer. Each active region extends in a first direction and has a central portion between end portions. The device includes a plurality of transistors, each including first impurity doped regions formed at the central portions and second impurity doped regions formed at both end portions to extend in a second direction different from the first direction. A plurality of asymmetric bit lines are electrically connected to the first impurity doped regions, each extending in a third direction substantially perpendicular to the second direction. Each asymmetric bit line has a first side surface extending in a straight line along the third direction, and a second side surface including a plurality of protrusions.

Abstract translation: 在具有不对称位线的半导体器件及其制造方法中，多个有源区域通过隔离层彼此电隔离。 每个有源区域在第一方向上延伸并且在端部之间具有中心部分。 该器件包括多个晶体管，每个晶体管包括形成在中心部分的第一杂质掺杂区域和形成在两个端部处的第二杂质掺杂区域，以沿与第一方向不同的第二方向延伸。 多个非对称位线电连接到第一杂质掺杂区域，每个第一杂质掺杂区域在基本上垂直于第二方向的第三方向上延伸。 每个不对称位线具有沿着第三方向在直线上延伸的第一侧表面和包括多个突起的第二侧表面。

公开(公告)号：US07045267B2

公开(公告)日：2006-05-16

申请号：US10349917

申请日：2003-01-24

Applicant: Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

Inventor： Kwang-sub Yoon ,  Dong-won Jung ,  Si-hyeung Lee ,  Hyun-woo Kim ,  Sook Lee ,  Sang-gyun Woo ,  Sang-jun Choi

IPC: G03F7/038 ,  C07D307/00

CPC classification number: G03F7/0395 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106

Abstract: This invention is directed to a coating composition used for original equipment manufacturing or refinishing uses in the automotive industry, which coating composition utilizes an acrylic polymer which contains substituted or unsubstituted exomethylene lactones or lactams as a comonomer.

Abstract translation: 本发明涉及用于汽车工业的原始设备制造或修补用途的涂料组合物，该涂料组合物使用含有取代或未取代的异亚丙基内酯或内酰胺作为共聚单体的丙烯酸类聚合物。

公开(公告)号：US06844134B2

公开(公告)日：2005-01-18

申请号：US10289108

申请日：2002-11-05

Applicant: Sang-Jun Choi ,  Joo-Tae Moon ,  Sang-Gyun Woo ,  Kwang-Sub Yoon ,  Ki-Yong Song

Inventor： Sang-Jun Choi ,  Joo-Tae Moon ,  Sang-Gyun Woo ,  Kwang-Sub Yoon ,  Ki-Yong Song

IPC: C08F20/26 ,  C08F212/14 ,  C08F220/10 ,  C08F220/42 ,  C08F232/04 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  C08F214/18

CPC classification number: G03F7/0046 ,  G03F7/0392 ,  G03F7/0395 ,  Y10S430/111

Abstract: A photosensitive polymer comprises a fluorinated ethylene glycol group and a chemically amplified resist composition including the photosensitive polymer. The photosensitive polymer has a weight average molecular weight of about 3,000-50,000 having a repeating unit as follows: wherein R1 is a hydrogen atom or methyl group, and R2 is a fluorinated ethylene glycol group having 3 to 10 carbon atoms.

Abstract translation: 光敏聚合物包含氟化乙二醇基团和包含光敏聚合物的化学放大抗蚀剂组合物。 感光性聚合物的重均分子量为约3,000〜50,000，具有如下重复单元：其中，R 1为氢原子或甲基，R 2为碳原子数3〜10的氟化乙二醇基。

公开(公告)号：US06696217B2

公开(公告)日：2004-02-24

申请号：US10077856

申请日：2002-02-20

Applicant: Kwang-sub Yoon ,  Sang-gyun Woo

Inventor： Kwang-sub Yoon ,  Sang-gyun Woo

IPC: G03C173

CPC classification number: G03F7/0392 ,  G03F7/0395 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/115 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122 ,  Y10S430/126

Abstract: A photosensitive monomer including a methylene butyrolactone derivative represented by the following formula: wherein R1 is a hydrogen atom or alkyl group, R2 is an acid-labile group, X is a hydrogen atom, or substituted or unsubstituted alkyl group having 1 to 10 carbon atoms, and Y is a substituted or unsubstitued alkyl group or alicyclic hydrocarbon group having 1 to 20 carbon atoms.

Abstract translation: 一种包含下式表示的亚甲基丁内酯衍生物的感光性单体：其中R1是氢原子或烷基，R2是酸不稳定基团，X是氢原子或取代或未取代的碳原子数1〜10的烷基 Y为取代或未取代的碳原子数为1〜20的烷基或脂环族烃基。

公开(公告)号：US20140370672A1

公开(公告)日：2014-12-18

申请号：US14169608

申请日：2014-01-31

Applicant: Ju-Youn Kim ,  Sang-Duk Park ,  Jae-Kyung Seo ,  Kwang-Sub Yoon ,  In-Gu Yoon

Inventor： Ju-Youn Kim ,  Sang-Duk Park ,  Jae-Kyung Seo ,  Kwang-Sub Yoon ,  In-Gu Yoon

IPC: H01L21/8238

CPC classification number: H01L27/1104 ,  H01L21/26513 ,  H01L21/266 ,  H01L21/823807 ,  H01L21/823814 ,  H01L21/823821 ,  H01L21/823828 ,  H01L29/66545

Abstract: In a method for fabricating a semiconductor device, a first gate electrode and a second gate electrode are provided on a substrate, the first gate electrode and the second gate electrode being formed in a first region and a second region of the substrate, respectively. A conductive buffer layer is formed along sidewalls of the first gate electrode and the second gate electrode and on upper surfaces of the first gate electrode and second gate electrode. A first mask pattern covering the first region of the substrate on the buffer layer is formed. A first impurity region is formed in the substrate at sides of the second gate electrode using the first mask pattern as a mask of an ion implantation process.

Abstract translation: 在制造半导体器件的方法中，第一栅电极和第二栅电极分别设置在衬底上，第一栅极电极和第二栅电极分别形成在衬底的第一区域和第二区域中。 导电缓冲层沿着第一栅电极和第二栅电极的侧壁以及第一栅电极和第二栅电极的上表面形成。 形成覆盖缓冲层上的基板的第一区域的第一掩模图案。 使用第一掩模图案作为离子注入工艺的掩模，在第二栅电极的侧面的衬底中形成第一杂质区。

公开(公告)号：US20080214422A1

公开(公告)日：2008-09-04

申请号：US12118778

申请日：2008-05-12

Applicant: Seung-Hyun AHN ,  Eun-Mi BAE ,  Baik-Soon CHOI ,  Sang-Mun CHON ,  Dae-Joung KIM ,  Kwang-sub YOON ,  Sang-Kyu PARK ,  Jae-Ho KIM ,  Shi-Yong YI ,  Kyoung-Mi KIM ,  Yeu-Young YOUN

Inventor： Seung-Hyun AHN ,  Eun-Mi BAE ,  Baik-Soon CHOI ,  Sang-Mun CHON ,  Dae-Joung KIM ,  Kwang-sub YOON ,  Sang-Kyu PARK ,  Jae-Ho KIM ,  Shi-Yong YI ,  Kyoung-Mi KIM ,  Yeu-Young YOUN

IPC: G03F7/42

CPC classification number: C11D7/266 ,  C11D11/0047

Abstract: A thinner composition includes propylene glycol ether acetate, methyl 2-hydroxy-2-methyl propionate, and an ester compound such as ethyl lactate, ethyl 3-ethoxy propionate or a mixture thereof.

Abstract translation: 较薄的组合物包括丙二醇醚乙酸酯，2-羟基-2-甲基丙酸甲酯和酯化合物如乳酸乙酯，3-乙氧基丙酸乙酯或它们的混合物。

公开(公告)号：US07202011B2

公开(公告)日：2007-04-10

申请号：US10423945

申请日：2003-04-28

Applicant: Kwang-Sub Yoon ,  Sang-Gyun Woo ,  Ki-Yong Song ,  Sang-jun Choi

Inventor： Kwang-Sub Yoon ,  Sang-Gyun Woo ,  Ki-Yong Song ,  Sang-jun Choi

IPC: G03C1/73 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30 ,  C08F16/24

CPC classification number: G03F7/0392 ,  G03F7/0046 ,  G03F7/0397 ,  Y10S430/108 ,  Y10S430/122 ,  Y10S430/126

Abstract: Disclosed is a photosensitive polymer comprising pentafluoromethylvinyl ether derivative monomer having the formula: wherein R may be an alkoxy carbonyl, alkylsilane, a fluorine-substituted or unsubstituted C3–C20 alkyl carbonyl, a fluorine-substituted or unsubstituted C3–C20 cycloalkylcarbonyl or a fluorine-substituted or unsubstituted benzoyl substituent group. The photosensitive polymer is the polymerization product of the pentafluoromethylvinyl ether derivative monomer and at least one additional monomer selected from the group consisting of (meth)acrylic acid, (meth)acrylate, styrene, norbornene, tetrafluoroethylene and maleic anhydride monomers. The photosensitive polymer may be used in photoresist compositions for exposure light sources having a predominant wavelength of less than 157 nm.

Abstract translation: 公开了一种光敏聚合物，其包含具有下式的五氟甲基乙烯基醚衍生物单体：

公开(公告)号：US20060291077A1

公开(公告)日：2006-12-28

申请号：US11451580

申请日：2006-06-13

Applicant: Woo-Seok Shim ,  Jung-Hyeon Lee ,  Young-Koog Han ,  Kwang-Sub Yoon ,  Si-Hyeung Lee

Inventor： Woo-Seok Shim ,  Jung-Hyeon Lee ,  Young-Koog Han ,  Kwang-Sub Yoon ,  Si-Hyeung Lee

IPC: G02B7/02

CPC classification number: G02B7/00 ,  G03F7/701 ,  G03F7/70825

Abstract: In an optical member holder and a projection exposure apparatus having the same, a light beam radiated from a light source may be formed into light having a desired shape by selecting one of a plurality of optical elements. An optical element holder may include a support member to support the plurality of optical elements, a first driving section to move or rotate the support member to select one of the optical elements, and a second driving section to rotate the selected optical element to adjust an arrangement direction thereof. The light formed by the selected optical element may be directed through a reticle.

Abstract translation: 在具有该光学构件保持器和投影曝光设备的光学构件保持器和投影曝光设备中，从光源辐射的光束可以通过选择多个光学元件之一形成具有所需形状的光。 光学元件保持器可以包括用于支撑多个光学元件的支撑构件，用于移动或旋转支撑构件以选择一个光学元件的第一驱动部分和第二驱动部分，以旋转所选择的光学元件以调整 排列方向。 由所选择的光学元件形成的光可以被引导通过掩模版。

公开(公告)号：US06596459B1

公开(公告)日：2003-07-22

申请号：US09716269

申请日：2000-11-21

Applicant: Hyun-woo Kim ,  Ki-young Kwon ,  Si-hyeung Lee ,  Dong-won Jung ,  Sook Lee ,  Kwang-sub Yoon ,  Sang-jun Choi ,  Sang-gyun Woo

Inventor： Hyun-woo Kim ,  Ki-young Kwon ,  Si-hyeung Lee ,  Dong-won Jung ,  Sook Lee ,  Kwang-sub Yoon ,  Sang-jun Choi ,  Sang-gyun Woo

IPC: G03F7004

CPC classification number: G03F7/0395 ,  G03F7/0397

Abstract: There are provided a photosensitive polymer and a photoresist compositing containing the same. The photosensitive polymer is represented by the following formula: wherein R1 is an acid-labile tertiary alkyl ester group, R2 is hydrogen atom, methyl, ethyl, carboxyl, &ggr;-butyrolactone-2-yl ester, &ggr;-butyrolactone-3-yl ester, pantolactone-2-yl ester, mevalonic lactone ester, 3-tetrahydrofuranyl ester, 2,3-propylenecarbonate-1-yl ester, 3-methyl-&ggr;-butyrolactone-3-yl ester or C3 to C20 alicyclic hydrocarbon, a/(a+b+c) is 0.1˜0.7, b/(a+b+c) is 0.1˜0.8, c/(a+b+c) is 0.0˜0.8, and n is an integer in the range of 0 to 2.

Abstract translation: 提供光敏聚合物和含有它的光致抗蚀剂复合物。 光敏聚合物由下式表示：其中R1是酸不稳定的叔烷基酯基，R2是氢原子，甲基，乙基，羧基，γ-丁内酯-2-基酯，γ-丁内酯-3-基酯 ，泛酸内酯-2-基酯，甲羟戊酸内酯，3-四氢呋喃基酯，2,3-亚丙基碳酸酯-1-基酯，3-甲基-γ-丁内酯-3-基酯或C 3至C 20脂环族烃，a /（ a + b + c）为0.1〜0.7，b /（a + b + c）为0.1〜0.8，c /（a + b + c）为0.0〜0.8，n为0〜 2。