公开(公告)号：US20100165469A1

公开(公告)日：2010-07-01

申请号：US12639897

申请日：2009-12-16

申请人： Cha-Won Hwang ,  Sang-Mi Lee

发明人： Cha-Won Hwang ,  Sang-Mi Lee

IPC分类号： G02B5/22 ,  H05K9/00 ,  G02B1/11

CPC分类号： H05K9/0054 ,  G02F2001/133334 ,  H01J11/10 ,  H01J11/44 ,  H01J29/867 ,  H01J29/89 ,  H01J2211/444 ,  H01J2211/446 ,  H01J2329/869 ,  H01J2329/892

摘要： An optical filter including: a base film; and a function incorporation layer on the base film and for shielding electromagnetic interference and absorbing external light, the function incorporation layer having a cross mesh pattern, wherein the cross mesh pattern includes a plurality of pattern lines, and wherein at least a part of the cross mesh pattern protrudes from a surface of the function incorporation layer facing toward the reflection prevention layer.

摘要翻译： 一种滤光器，包括：基膜; 以及在所述基底膜上的用于屏蔽电磁干扰并吸收外部光的功能并入层，所述功能结合层具有交叉网格图案，其中所述交叉网格图案包括多个图案线，并且其中所述十字网的至少一部分 网格图案从功能结合层的面向防反射层的表面突出。

公开(公告)号：US20100149637A1

公开(公告)日：2010-06-17

申请号：US12624164

申请日：2009-11-23

申请人： Do-Hyuk Kwon ,  Sung-Yong Lee ,  Cha-Won Hwang ,  Sang-Mi Lee ,  Seung-Goo Baek

发明人： Do-Hyuk Kwon ,  Sung-Yong Lee ,  Cha-Won Hwang ,  Sang-Mi Lee ,  Seung-Goo Baek

IPC分类号： G02B5/28 ,  G02B5/30 ,  G02B1/11

CPC分类号： G02B27/288 ,  H01J11/12 ,  H01J11/44 ,  H01J2211/444

摘要： An optical filter including: a polarizing film; and a plurality of phase delay films laminated on one side of the polarizing film, the optical axes of the phase delay films crossing each other, the plurality of phase delay films phase-delaying light having wavelengths in the visible range incident through the polarizing film and phase-delaying light reflected from a surface, thereby allowing the incident light to be interfered with and offset by the reflected light.

摘要翻译： 一种滤光器，包括：偏光膜; 以及层叠在偏振膜的一侧上的多个相位延迟膜，相位延迟膜的光轴彼此交叉，多个相位延迟膜具有通过偏振膜入射的可见光范围的波长的相位延迟光，以及 相位延迟从表面反射的光，从而使入射光受到反射光的干扰和偏移。

公开(公告)号：US20100142056A1

公开(公告)日：2010-06-10

申请号：US12626580

申请日：2009-11-25

申请人： Seung-Goo Baek ,  Sung-Yong Lee ,  Cha-Won Hwang ,  Sang-Mi Lee ,  Do-Hyuk Kwon

发明人： Seung-Goo Baek ,  Sung-Yong Lee ,  Cha-Won Hwang ,  Sang-Mi Lee ,  Do-Hyuk Kwon

IPC分类号： G02B27/00 ,  B05D5/06 ,  B05D3/14 ,  G02B5/22

CPC分类号： G02B1/14 ,  G02B1/105 ,  G02B1/11 ,  G02B1/111 ,  G02B1/16

摘要： An optical filter wherein a hard coating layer and an electromagnetic shielding layer are integrally formed and a method of manufacturing the optical filter. The optical filter includes a base film, and a hard coating layer formed on one surface of the base film, the hard coating layer having conductive substances positioned in a region adjacent to the base film. The method includes preparing a light-transmissive base film; coating a liquid hard coating raw material on one surface of the base film, the hard coating raw material having conductive substances mixed therewith; and curing the hard coating raw material in the state that the conductive substances are concentrated on a region adjacent to the base film, and the hard coating raw material is formed between and on the conductive substances.

摘要翻译： 一种形成有硬质被覆层和电磁屏蔽层的滤光器及其制造方法。 光学滤波器包括基膜和形成在基膜的一个表面上的硬涂层，硬涂层具有位于与基膜相邻的区域中的导电物质。 该方法包括制备透光基膜; 在基膜的一个表面上涂布液体硬涂层原料，其中具有与其混合的导电性物质的硬质涂层原料; 并且在导电性物质集中在与基膜相邻的区域的状态下固化硬涂层原料，并且在导电物质上形成硬涂层原料。

公开(公告)号：US20090117499A1

公开(公告)日：2009-05-07

申请号：US12232594

申请日：2008-09-19

申请人： Se-yeon Kim ,  Yong-kyun Ko ,  Sang-mi Lee ,  Yang-koo Lee ,  Hun-jung Yi ,  Kun-tack Lee

发明人： Se-yeon Kim ,  Yong-kyun Ko ,  Sang-mi Lee ,  Yang-koo Lee ,  Hun-jung Yi ,  Kun-tack Lee

IPC分类号： G03F7/20 ,  C11D3/20

CPC分类号： G03F7/70925 ,  G03F7/70341

摘要： A cleaning solution for an immersion photolithography system according to example embodiments may include an ether-based solvent, an alcohol-based solvent, and a semi-aqueous-based solvent. In the immersion photolithography system, a plurality of wafers coated with photoresist films may be exposed pursuant to an immersion photolithography process using an immersion fluid. The area contacted by the immersion fluid during the exposure process may accumulate contaminants. Accordingly, the area contacted by the immersion fluid during the exposure process may be washed with the cleaning solution according to example embodiments so as to reduce or prevent defects in the immersion photolithography system.

摘要翻译： 根据示例性实施方式的用于浸没式光刻系统的清洁溶液可以包括醚类溶剂，醇类溶剂和半水性溶剂。 在浸没式光刻系统中，可以使用浸没流体根据浸没光刻工艺来曝光涂覆有光致抗蚀剂膜的多个晶片。 在曝光过程中浸入液接触的区域可能会积聚污染物。 因此，可以利用根据示例性实施例的清洗溶液洗涤曝光过程中浸入液接触的区域，以便减少或防止浸没光刻系统中的缺陷。

公开(公告)号：US20120134067A1

公开(公告)日：2012-05-31

申请号：US13024706

申请日：2011-02-10

申请人： Tae Sung SI ,  Kyung Nam Hwang ,  Sang Mi Lee ,  Jong Hoon Bae

发明人： Tae Sung SI ,  Kyung Nam Hwang ,  Sang Mi Lee ,  Jong Hoon Bae

IPC分类号： H01G4/06

CPC分类号： H01G4/232 ,  H01G4/012 ,  H01G4/30

摘要： There is provided a multilayered ceramic capacitor capable of being implementing as a micro supercapacitor capable of minimizing a mounting area and increasing a mounting efficiency thereof. The multilayered ceramic capacitor includes a capacitor body in which a plurality of dielectric layers having a size of 1.6 mm in length and 0.8 mm in width are stacked; an internal electrode unit having a plurality of internal electrodes arranged on each of the plurality of dielectric layers; and an external electrode unit, having a plurality of external electrodes horizontally arranged in the capacitor body and electrically connected to the internal electrodes.

摘要翻译： 提供了能够实现为能够最小化安装面积并提高其安装效率的微型超级电容器的多层陶瓷电容器。 多层陶瓷电容器包括电容器主体，其中堆叠具有1.6mm长度和0.8mm宽度尺寸的多个电介质层; 内部电极单元，其具有布置在所述多个电介质层中的每一个上的多个内部电极; 以及外部电极单元，其具有水平地布置在电容器主体中并电连接到内部电极的多个外部电极。

公开(公告)号：US20080297905A1

公开(公告)日：2008-12-04

申请号：US12153316

申请日：2008-05-16

申请人： Cha-Won Hwang ,  Ji-Suk Kim ,  Sang-Mi Lee

发明人： Cha-Won Hwang ,  Ji-Suk Kim ,  Sang-Mi Lee

IPC分类号： G02B5/28

CPC分类号： G02B1/111

摘要： An optical filter includes a base film and at least two conductive layers stacked on the base film, a first conductive layer of the two conductive layers having a first thickness and a first refractive index, and a second conductive layer of the two conductive layers having a second thickness and a second refractive index, the first and second refractive indices and the first and second thicknesses being configured to generate a destructive interference of external light reflected from the first and second conductive layers.

摘要翻译： 滤光器包括基膜和层叠在基膜上的至少两个导电层，两个导电层的第一导电层具有第一厚度和第一折射率，并且两个导电层的第二导电层具有 第二厚度和第二折射率，第一和第二折射率以及第一和第二厚度被配置为产生从第一和第二导电层反射的外部光的相消干涉。

公开(公告)号：US07311857B2

公开(公告)日：2007-12-25

申请号：US10962508

申请日：2004-10-13

申请人： Yong-Kyun Ko ,  Sang-Mun Chon ,  In-Hoi Doh ,  Pil-Kwon Jun ,  Sang-Mi Lee ,  Kwang-shin Lim ,  Myoung-Ok Han

发明人： Yong-Kyun Ko ,  Sang-Mun Chon ,  In-Hoi Doh ,  Pil-Kwon Jun ,  Sang-Mi Lee ,  Kwang-shin Lim ,  Myoung-Ok Han

IPC分类号： C09K13/04

CPC分类号： C09K13/08 ,  C11D1/008 ,  C11D1/72 ,  C11D3/042 ,  C11D3/046 ,  C11D11/0047 ,  H01L21/31111

摘要： An exemplary etching composition includes about 0.1 to 8% by weight of hydrogen fluoride, about 10 to 25% by weight of ammonium fluoride, about 0.0001 to 3% by weight of a non-ionic polymer surfactant, and water. Using the composition in a wet etching process, an oxide layer may be selectively removed while a pattern or storage electrode including polysilicon may be effectively passivated. The oxide layer may be removed with a high etching selectivity, while at the same time minimizing damage to the polysilicon layer.

摘要翻译： 示例性的蚀刻组合物包括约0.1至8重量％的氟化氢，约10至25重量％的氟化铵，约0.0001至3重量％的非离子聚合物表面活性剂和水。 在湿蚀刻工艺中使用组合物，可以选择性地除去氧化物层，同时可以有效地钝化包括多晶硅的图案或存储电极。 可以以高蚀刻选择性去除氧化物层，同时最小化对多晶硅层的损伤。

公开(公告)号：US20050081883A1

公开(公告)日：2005-04-21

申请号：US10962508

申请日：2004-10-13

申请人： Yong-Kyun Ko ,  Sang-Mun Chon ,  In-Hoi Doh ,  Pil-Kwon Jun ,  Sang-Mi Lee ,  Kwang-shin Lim ,  Myoung-Ok Han

发明人： Yong-Kyun Ko ,  Sang-Mun Chon ,  In-Hoi Doh ,  Pil-Kwon Jun ,  Sang-Mi Lee ,  Kwang-shin Lim ,  Myoung-Ok Han

IPC分类号： C08K13/08 ,  B08B3/08 ,  C09K13/08 ,  C11D1/00 ,  C11D1/72 ,  C11D3/02 ,  C11D11/00 ,  C23F1/16 ,  C23F1/24 ,  H01L21/308 ,  H01L21/311 ,  H01L21/8242 ,  H01L27/108

CPC分类号： C09K13/08 ,  C11D1/008 ,  C11D1/72 ,  C11D3/042 ,  C11D3/046 ,  C11D11/0047 ,  H01L21/31111

摘要： An exemplary etching composition includes about 0.1 to 8% by weight of hydrogen fluoride, about 10 to 25% by weight of ammonium fluoride, about 0.0001 to 3% by weight of a non-ionic polymer surfactant, and water. Using the composition in a wet etching process, an oxide layer may be selectively removed while a pattern or storage electrode including polysilicon may be effectively passivated. The oxide layer may be removed with a high etching selectivity, while at the same time minimizing damage to the polysilicon layer.

摘要翻译： 示例性的蚀刻组合物包括约0.1至8重量％的氟化氢，约10至25重量％的氟化铵，约0.0001至3重量％的非离子聚合物表面活性剂和水。 在湿蚀刻工艺中使用组合物，可以选择性地除去氧化物层，同时可以有效地钝化包括多晶硅的图案或存储电极。 可以以高蚀刻选择性去除氧化物层，同时最小化对多晶硅层的损伤。