公开(公告)号：US20090023095A1

公开(公告)日：2009-01-22

申请号：US12174293

申请日：2008-07-16

Applicant: Hideo Hada ,  Takeshi Iwai ,  Takehiro Seshimo ,  Akiya Kawaue ,  Keita Ishiduka

Inventor： Hideo Hada ,  Takeshi Iwai ,  Takehiro Seshimo ,  Akiya Kawaue ,  Keita Ishiduka

IPC: G03F7/004 ,  C07D333/46 ,  C07D335/02 ,  C07C309/02

CPC classification number: C07D335/02 ,  C07C309/04 ,  C07D333/46 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

Abstract: There are provided a novel compound represented by a general formula (b1-1) shown below, which is useful as an acid generator for a resist composition and a manufacturing method thereof, a compound useful as a precursor of the novel compound and a manufacturing method thereof, an acid generator, a resist composition and a method of forming a resist pattern. (wherein, R1 represents an aryl group or alkyl group which may contain a substituent group; R3 represents a hydrogen atom or an alkyl group; n1 represents an integer of 0 or 1, and in the case that n1 is 1, R1 and R3 may mutually be bonded to form a ring with a 3- to 7-membered ring structure together with the carbon atom with which R1 is bonded and the carbon atom with which R3 is bonded; A represents a bivalent group which forms a ring with 3- to 7-membered ring structure together with the sulfur atom with which A is bonded, and the ring may contain a substituent group; R2 represents an aromatic group which may contain a substituent group, a linear or branched alkyl group of 1 to 10 carbon atoms which may contain a substituent group, or a linear or branched alkenyl group of 2 to 10 carbon atoms which may contain a substituent group; n represents an integer of 0 or 1; and Y1 represents an alkylene group of 1 to 4 carbon atoms in which hydrogen atoms may be substituted with fluorine atoms.).

Abstract translation: 提供了由下述通式（b1-1）表示的新化合物，其可用作抗蚀剂组合物的酸产生剂及其制备方法，可用作新化合物的前体的化合物和制备方法 酸产生剂，抗蚀剂组合物和形成抗蚀剂图案的方法。 （其中，R1表示可以含有取代基的芳基或烷基，R3表示氢原子或烷基，n1表示0或1的整数，在n1为1的情况下，R 1和R 3可以 相互键合形成具有3〜7元环结构的环以及与R 1键合的碳原子和与R3结合的碳原子; A表示与3-至 7元环结构与A键合的硫原子一起形成，环可含有取代基; R2表示可含有取代基的芳香族基团，碳原子数1〜10的直链或支链烷基， 可以含有取代基，或可以含有取代基的2〜10个碳原子的直链或支链烯基; n表示0或1的整数; Y1表示碳原子数为1〜4的亚烷基，其中氢 原子可以被氟取代 oms）。

公开(公告)号：US20080248422A1

公开(公告)日：2008-10-09

申请号：US12060695

申请日：2008-04-01

Applicant: Takeshi Iwai ,  Hideo Hada ,  Masaru Takeshita ,  Akiya Kawaue ,  Keita Ishiduka ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo ,  Kensuke Matsuzawa

Inventor： Takeshi Iwai ,  Hideo Hada ,  Masaru Takeshita ,  Akiya Kawaue ,  Keita Ishiduka ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo ,  Kensuke Matsuzawa

IPC: G03F7/025 ,  C07D333/50

CPC classification number: C07D333/76 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

Abstract: A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein R401 represents an acid dissociable, dissolution inhibiting group; R41 to R43 each independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and X− represents an anion) or an acid generator (B1′) including a compound represented by general formula (b1-9) shown below (wherein R403 and R403 each independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R404 represents an alkyl group or a halogenated alkyl group, wherein R403 and R404 may be bonded to each other to form a ring structure; and X− represents an anion).

Abstract translation: 包含基础组分（A）和酸产生剂组分（B）的抗蚀剂组合物，所述酸产生剂组分（B）包括含有下述通式（b1-8）表示的化合物的酸产生剂（B1）（ 其中R 401表示酸解离的溶解抑制基团; R 41至R 43各自独立地表示卤素原子，卤代烷基， 烷基，乙酰基，烷氧基，羧基或羟烷基; Q表示二价连接基团或单键; X-O - 表示阴离子）或酸发生剂（ B1'），其包含如下所示的由通式（b1-9）表示的化合物（其中R 403和R 403）各自独立地表示氢原子，烷基或 卤代烷基; R 404表示烷基或卤代烷基，其中R 403和R 404可彼此键合至 形成一个戒指 结构; 而X - 代表阴离子）。

公开(公告)号：US20130280497A1

公开(公告)日：2013-10-24

申请号：US13761918

申请日：2013-02-07

Applicant: Carlton Grant Wilson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

Inventor： Carlton Grant Wilson ,  Christopher John Ellison ,  Takehiro Seshimo ,  Julia Cushen ,  Christopher M. Bates ,  Leon Dean ,  Logan J. Santos ,  Erica L. Rausch

IPC: C09D137/00

CPC classification number: G03F1/50 ,  B05D1/005 ,  B05D5/00 ,  B05D7/52 ,  B05D7/56 ,  B05D2252/02 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  C09D137/00 ,  C09D167/00 ,  G03F7/0002 ,  Y10T428/24802 ,  Y10T428/31663 ,  Y10T428/31855

Abstract: The present invention involves the use of random copolymer top coats that can be spin coated onto block copolymer thin films and used to control the interfacial energy of the top coat-block copolymer interface. The top coats are soluble in aqueous weak base and can change surface energy once they are deposited onto the block copolymer thin film. The use of self-assembled block copolymers to produce advanced lithographic patterns relies on their orientation control in thin films. Top coats potentially allow for the facile orientation control of block copolymers which would otherwise be quite challenging.

公开(公告)号：US08415085B2

公开(公告)日：2013-04-09

申请号：US13478291

申请日：2012-05-23

Applicant: Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

Inventor： Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC classification number: G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

公开(公告)号：US20120264061A1

公开(公告)日：2012-10-18

申请号：US13478291

申请日：2012-05-23

Applicant: Hideo HADA ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

Inventor： Hideo HADA ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

IPC: C07C69/753 ,  G03F7/20 ,  G03F7/027

CPC classification number: G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

Abstract translation: 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被 由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-; Y11表示C1-C10烷基或氟化烷基 ：Q2表示单键或亚烷基; W表示C2-C10亚烷基）。

公开(公告)号：US20120058430A1

公开(公告)日：2012-03-08

申请号：US13223595

申请日：2011-09-01

Applicant: Yoshiyuki Utsumi ,  Takehiro Seshimo

Inventor： Yoshiyuki Utsumi ,  Takehiro Seshimo

IPC: G03F7/20 ,  C07D307/00 ,  G03F7/027

CPC classification number: C07D327/04 ,  C07D493/08 ,  C07D493/18 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A positive resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) containing a compound represented by general formula (b1-1) shown below (wherein Z+ represents an organic cation).

Abstract translation: 一种正型抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和曝光时产生酸的酸发生剂成分（B），其中，所述酸发生剂成分（B）含有 含有下述通式（b1-1）表示的化合物（其中Z +表示有机阳离子）的酸发生剂（B1）。

公开(公告)号：US20110117491A1

公开(公告)日：2011-05-19

申请号：US12861474

申请日：2010-08-23

Applicant: Yoshiyuki UTSUMI ,  Takehiro SESHIMO ,  Hiroaki SHIMIZU ,  Naoto MOTOIKE

Inventor： Yoshiyuki UTSUMI ,  Takehiro SESHIMO ,  Hiroaki SHIMIZU ,  Naoto MOTOIKE

IPC: G03F7/004 ,  G03F7/20

CPC classification number: C08F20/18 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: A resist composition including a base material component (A) that exhibits changed solubility in an alkali developing solution under the action of acid, an acid generator component (B) that generates acid upon exposure, and an nitrogen-containing organic compound (D), wherein the nitrogen-containing organic compound (D) includes a compound represented by general formula (d1) shown below: wherein R20 represents a methylene group, an ethylene group, an oxygen atom or —C(CH3)2—; R21 represents a hydrogen atom or an organic group; and R22 represents an alkoxy group, an alkoxycarbonyloxy group, a hydroxyl group, a halogen atom, —C(═O)—O—R23, —C(═O)—NH—R23 or a carboxyl group, wherein R23 represents a linear or branched alkyl group of 1 to 15 carbon atoms, an unsaturated hydrocarbon group, an aliphatic cyclic group, or an aromatic hydrocarbon group, and a represents an integer of 0 to 2.

Abstract translation: 一种抗蚀剂组合物，其包含在酸作用下在碱显影液中溶解度变化的基材成分（A），曝光时产生酸的酸产生剂成分（B）和含氮有机化合物（D）， 其中所述含氮有机化合物（D）包括由下述通式（d1）表示的化合物：其中R 20表示亚甲基，亚乙基，氧原子或-C（CH 3）2 - ; R 21表示氢原子或有机基团; R 22表示烷氧基，烷氧基羰基氧基，羟基，卤素原子，-C（= O）-O-R 23，-C（= O）-NH-R 23或羧基，其中R 23表示直链状 或具有1至15个碳原子的支链烷基，不饱和烃基，脂族环基或芳族烃基，并且表示0至2的整数。

公开(公告)号：US07776510B2

公开(公告)日：2010-08-17

申请号：US12135680

申请日：2008-06-09

Applicant: Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

Inventor： Takeshi Iwai ,  Hideo Hada ,  Keita Ishiduka ,  Akiya Kawaue ,  Hiroaki Shimizu ,  Kyoko Ohshita ,  Tsuyoshi Nakamura ,  Komei Hirahara ,  Yuichi Suzuki ,  Takehiro Seshimo

IPC: G03F7/004 ,  G03F7/30 ,  C07C381/12

CPC classification number: C07C309/06 ,  C07C309/04 ,  C07C309/10 ,  C07C381/12 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0397 ,  Y10S430/111 ,  Y10S430/123

Abstract: A compound represented by general formula (b-14); and acid generator consisting of the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) consisting of a compound represented by general formula (b1-14): wherein R7″ to R9″ each independently represents an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group in which a portion or all of the hydrogen atoms are substituted with an alkoxyalkyloxy group or an alkoxycarbonylalkyloxy group; and X− represents an anion.

Abstract translation: 由通式（b-14）表示的化合物; 和由该化合物组成的酸发生剂; 以及抗蚀剂组合物，其包含在酸的作用下在碱性显影液中溶解度变化的碱成分（A）和暴露时产生酸的酸发生剂成分（B），所述酸发生剂成分（B）含有酸 由通式（b1-14）表示的化合物构成的发光体（B1）：其中，R7“〜R9”各自独立地表示芳基或烷基，其中，R7“〜R9”中的2个可以相互键合而成 与硫原子形成环，并且R 7“至R 9”中的至少一个表示其中一部分或全部氢原子被烷氧基烷氧基或烷氧基羰基烷氧基取代的取代芳基; X-表示阴离子。

公开(公告)号：US20100119974A1

公开(公告)日：2010-05-13

申请号：US12591152

申请日：2009-11-10

Applicant: Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

Inventor： Hideo Hada ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Akiya Kawaue

IPC: G03F7/20 ,  G03F7/004 ,  C07C309/19 ,  C07C313/06

CPC classification number: G03F7/027 ,  C07C309/12 ,  C07C311/46 ,  C07C311/48 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/30 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/122 ,  Y10S430/124 ,  Y10S430/126

Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1′) and/or a compound represented by (b1-1″) (R1″-R3″ represents an aryl group or an alkyl group, provided that at least one of R1″-R3″ represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1″-R3″ may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(═O)— or —SO2—; represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).

Abstract translation: 一种抗蚀剂组合物，其包含在酸性作用下在碱性显影液中具有改变的溶解性的碱成分（A）和包含（b1-1）表示的化合物的酸产生剂成分（B），由（b1- 1'）和/或（b1-1“）表示的化合物（R1”-R3“表示芳基或烷基，条件是R1”-R3“中的至少一个表示被 由（b1-1-0）表示的基团和R1“-R3”中的两个可以相互键合形成与硫原子的环; X表示C3-C30烃基; Q1表示含羰基的二价 连接基团; X10表示C1-C30烃基; Q3表示单键或二价连接基团; Y10表示-C（= O） - 或-SO2-;表示C1-C10烷基或氟化烷基： Q2表示单键或亚烷基; W表示C2-C10亚烷基）。

公开(公告)号：US20100015552A1

公开(公告)日：2010-01-21

申请号：US12499610

申请日：2009-07-08

Applicant: Akiya Kawaue ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Tsuyoshi Nakamura ,  Naoto Motoike ,  Hiroaki Shimizu ,  Kensuke Matsuzawa ,  Hideo Hada

Inventor： Akiya Kawaue ,  Yoshiyuki Utsumi ,  Takehiro Seshimo ,  Tsuyoshi Nakamura ,  Naoto Motoike ,  Hiroaki Shimizu ,  Kensuke Matsuzawa ,  Hideo Hada

IPC: G03F7/20 ,  G03F7/004

CPC classification number: G03F7/0045 ,  C07C309/09 ,  C07C309/10 ,  C07C309/17 ,  C07C311/48 ,  C07C311/51 ,  C07C317/04 ,  C07C317/10 ,  C07C381/12 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C07D307/92 ,  C07D307/94 ,  C07D493/18 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/122

Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below:wherein R7″ to R9″ each independently represent an aryl group or an alkyl group, wherein two of R7″ to R9″ may be bonded to each other to form a ring with the sulfur atom, and at least one of R7″ to R9″ represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X− represents an anion; and Rf represents a fluorinated alkyl group.

Abstract translation: 一种抗蚀剂组合物，其包含：在酸的作用下在碱性显影液中表现出改变的溶解度的碱成分（A） 以及在暴露时产生酸的酸发生剂组分（B），其中所述酸发生剂组分（B）包含酸产生剂（B1），其包含如下所示的由通式（b1-11）表示的化合物：其中R7“ R 9“各自独立地表示芳基或烷基，其中R 7”至R 9“中的两个可以彼此键合以形成具有硫原子的环，并且R 7”至R 9“中的至少一个 “表示具有下述通式（I）表示的基团的取代芳基作为取代基; X-表示阴离子; Rf表示氟化烷基。