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    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
    21.
    发明申请
    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY 审中-公开
    基于互联网一致性的招标选择

    公开(公告)号：US20160370717A1

    公开(公告)日：2016-12-22

    申请号：US15181126

    申请日：2016-06-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Timothy Dugan DAVIS ,  Peter David ENGBLOM ,  Kaustuve BHATTACHARYYA

    IPC: G03F9/00 ,  G01B11/27

    CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

    Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

    Abstract translation: 一种方法，包括：确定多个基板测量配方的一个基板测量配方与多个基板测量配方的每个其它基板测量配方之间的配方一致性; 计算配方一致性的功能; 如果功能满足标准，则从多个基板测量配方中消除一个基板测量配方; 并重申确定，计算和消除，直到满足终止条件。 本文还公开了一种基板测量装置，其包括被配置为存储多个基板测量配方的存储器，以及配置为基于多个基板中的配方一致性从多个基板测量配方中选择一个或多个基板测量配方的处理器 测量食谱。

    Inspection Method and Apparatus and Lithographic Apparatus
    22.
    发明申请
    Inspection Method and Apparatus and Lithographic Apparatus 有权
    检验方法与仪器及光刻设备

    公开(公告)号：US20160320712A1

    公开(公告)日：2016-11-03

    申请号：US15105339

    申请日：2014-11-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Arie Jeffrey DEN BOEF

    IPC: G03F7/20

    CPC classification number: G03F7/70625 ,  G01B2210/56 ,  G01N21/4788 ,  G01N21/956 ,  G01N2021/8845 ,  G03F7/70616

    Abstract: Disclosed are an inspection method and apparatus and an associated lithographic apparatus. The inspection method comprises illuminating a structure with inspection radiation of a selected wavelength, the structure being of a type comprising a plurality of layers (for example a 3D memory structure). The resultant diffraction signal is detected a physical property of a subset of said layers is determined from said diffraction signal. The subset of layers for which said physical property is determined is dependent upon the selected wavelength of the inspection radiation.

    Abstract translation: 公开了一种检查方法和装置以及相关的光刻设备。 检查方法包括用所选波长的检查辐射照射结构，该结构是包括多个层（例如3D存储器结构）的类型。 从所述衍射信号中确定所得到的衍射信号，所述层的子集的物理性质确定。 确定所述物理性质的层子集取决于所选择的检查辐射波长。

    Inspection Method and Apparatus, Substrates for use Therein and Device Manufacturing Method
    23.
    发明申请
    Inspection Method and Apparatus, Substrates for use Therein and Device Manufacturing Method 有权
    检验方法和装置，其使用的基板和装置制造方法

    公开(公告)号：US20160097983A1

    公开(公告)日：2016-04-07

    申请号：US14892880

    申请日：2014-05-02

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Erik Willem BOGAART ,  Franciscus Godefridus Casper BIJNEN ,  Arie Jeffrey DEN BOEF ,  Simon Gijsbert Josephus MATHIJSSEN

    IPC: G03F7/20 ,  G01N21/956 ,  G01N21/95

    CPC classification number: G03F7/70483 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/656 ,  G03F7/70625

    Abstract: A substrate is provided with device structures and metrology structures (800). The device structures include materials exhibiting inelastic scattering of excitation radiation of one or more wavelengths. The device structures include structures small enough in one or more dimensions that the characteristics of the inelastic scattering are influenced significantly by quantum confinement. The metrology structures (800) include device-like structures (800b) similar in composition and dimensions to the device features, and calibration structures (800a). The calibration structures are similar to the device features in composition but different in at least one dimension. Using an inspection apparatus and method implementing Raman spectroscopy, the dimensions of the device-like structures can be measured by comparing spectral features of radiation scattered inelastically from the device-like structure and the calibration structure.

    Abstract translation: 衬底具有器件结构和计量结构（800）。 器件结构包括显示一个或多个波长的激发辐射的非弹性散射的材料。 器件结构包括在一个或多个维度上足够小的结构，非弹性散射的特性受到量子限制的显着影响。 测量结构（800）包括与装置特征相似的组成和尺寸的装置状结构（800b）和校准结构（800a）。 校准结构类似于组合中的器件特征，但至少在一个维度上不同。 通过使用实施拉曼光谱的检查装置和方法，可以通过比较从器件状结构和校准结构中弹性散射的辐射的光谱特征来测量器件状结构的尺寸。

    Device Manufacturing Method and Associated Lithographic Apparatus, Inspection Apparatus, and Lithographic Processing Cell
    24.
    发明申请
    Device Manufacturing Method and Associated Lithographic Apparatus, Inspection Apparatus, and Lithographic Processing Cell 有权
    装置制造方法及相关平版印刷装置，检验装置及平版印刷加工单元

    公开(公告)号：US20130148121A1

    公开(公告)日：2013-06-13

    申请号：US13687569

    申请日：2012-11-28

    Applicant: ASML Netherlands B.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Kaustuve BHATTACHARYYA ,  Martin Jacobus Johan JAK ,  Michael KUBIS

    IPC: G01B11/00

    CPC classification number: G01B11/24 ,  G01B11/14 ,  G03F7/70633 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7088 ,  G03F9/7092

    Abstract: Disclosed is a device manufacturing method, and accompanying inspection and lithographic apparatuses. The method comprises measuring on the substrate a property such as asymmetry of a first overlay marker and measuring on the substrate a property such as asymmetry of an alignment marker. In both cases the asymmetry is determined. The position of the alignment marker on the substrate is then determined using an alignment system and the asymmetry information of the alignment marker and the substrate aligned using this measured position. A second overlay marker is then printed on the substrate; and a lateral overlay measured on the substrate of the second overlay marker with respect to the first overlay marker using the determined asymmetry information of the first overlay marker.

    Abstract translation: 公开了一种器件制造方法，以及伴随的检查和光刻设备。 该方法包括在衬底上测量诸如第一覆盖标记的不对称性和在衬底上测量诸如对准标记的不对称性的特性。 在这两种情况下，确定不对称性。 然后使用对准系统确定对准标记在衬底上的位置，并使用该测量位置对准对准标记和衬底的不对称信息。 然后将第二覆盖标记印刷在基底上; 以及使用所确定的所述第一覆盖标记的不对称信息相对于所述第一覆盖标记在所述第二覆盖标记的基板上测量的横向覆盖。

    INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD
    28.
    发明公开
    INSPECTION METHOD AND APPARATUS, LITHOGRAPHIC APPARATUS, LITHOGRAPHIC PROCESSING CELL AND DEVICE MANUFACTURING METHOD 审中-公开

    公开(公告)号：US20240044639A1

    公开(公告)日：2024-02-08

    申请号：US18486811

    申请日：2023-10-13

    Applicant: ASML Netherlands B.V.

    Inventor： Henricus Petrus Maria PELLEMANS ,  Arie Jeffrey DEN BOEF

    IPC: G01B11/24 ,  G03F7/00

    CPC classification number: G01B11/24 ,  G03F7/70633 ,  G03F7/7085 ,  G03F7/70191

    Abstract: A scatterometer for measuring a property of a target on a substrate includes a radiation source, a detector, and a processor. The radiation source produces a radiated spot on the target. The scatterometer adjusts a position of the radiated spot along a first direction across the target and along a second direction that is at an angle with respect to the first direction. The detector receives radiation scattered by the target. The received radiation is associated with positions of the radiated spot on the target along at least the first direction. The detector generates measurement signals based on the positions of the radiated spot on the target. The processor outputs, based on the measurement signals, a single value that is representative of the property of the target. The processor also combines the measurement signals to output a combined signal and derives, based on the combined signal, the single value.

    DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
    29.
    发明申请
    DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD 有权

    公开(公告)号：US20230044632A1

    公开(公告)日：2023-02-09

    申请号：US17787244

    申请日：2020-10-21

    Applicant: ASML Netherlands B.V.

    Inventor： Willem Marie Julia Marcel COENE ,  Arie Jeffrey DEN BOEF ,  Vasco Tomas TENNER ,  Nitesh PANDEY ,  Christos MESSINIS ,  Johannes Fitzgerald DE BOER

    IPC: G03H1/08 ,  G03H1/26

    Abstract: A dark field digital holographic microscope is disclosed which is configured to determine a characteristic of interest of a structure. The dark field digital holographic microscope comprises an illumination device configured to provide at least: a first beam pair comprising a first illumination beam of radiation (1010) and a first reference beam of radiation (1030) and a second beam pair comprising a second illumination beam of radiation (1020) and a second reference beam of radiation (1040); and one or more optical elements (1070) operable to capture a first scattered radiation and to capture a second scattered radiation scattered by the structure resultant from the first and second illumination beams respectively. The beams of the first beam pair are mutually coherent and the beams of the second beam pair are mutually coherent. The illumination device is configured to impose incoherence (ADI) between the first beam pair and second beam pair.

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