中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

7 records (took 0.017 seconds)

    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
    1.
    发明申请
    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY 审中-公开
    基于互联网一致性的招标选择

    公开(公告)号：US20160370717A1

    公开(公告)日：2016-12-22

    申请号：US15181126

    申请日：2016-06-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Timothy Dugan DAVIS ,  Peter David ENGBLOM ,  Kaustuve BHATTACHARYYA

    IPC: G03F9/00 ,  G01B11/27

    CPC classification number: G03F9/7069 ,  G01B11/272 ,  G03F7/70633

    Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

    Abstract translation: 一种方法，包括：确定多个基板测量配方的一个基板测量配方与多个基板测量配方的每个其它基板测量配方之间的配方一致性; 计算配方一致性的功能; 如果功能满足标准，则从多个基板测量配方中消除一个基板测量配方; 并重申确定，计算和消除，直到满足终止条件。 本文还公开了一种基板测量装置，其包括被配置为存储多个基板测量配方的存储器，以及配置为基于多个基板中的配方一致性从多个基板测量配方中选择一个或多个基板测量配方的处理器 测量食谱。

    INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
    2.
    发明申请
    INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE 有权
    检验方法，光刻设备，掩模和基板

    公开(公告)号：US20160313656A1

    公开(公告)日：2016-10-27

    申请号：US15104212

    申请日：2014-11-20

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Youri Johannes Laurentius Maria VAN DOMMELEN ,  Peter David ENGBLOM ,  Lambertus Gerardus Maria KESSELS ,  Arie Jeffrey DEN BOEF ,  Kaustuve BHATTACHARYYA ,  Paul Christiaan HINNEN ,  Marco Johannes Annemarie PIETERS

    IPC: G03F7/20

    CPC classification number: G03F7/70641 ,  G03F7/70683

    Abstract: A method and apparatus for obtaining focus information relating to a lithographic process. The method includes illuminating a target, the target having alternating first and second structures, wherein the form of the second structures is focus dependent, while the form of the first structures does not have the same focus dependence as that of the second structures, and detecting radiation redirected by the target to obtain for that target an asymmetry measurement representing an overall asymmetry of the target, wherein the asymmetry measurement is indicative of focus of the beam forming the target. An associated mask for forming such a target, and a substrate having such a target.

    Abstract translation: 一种用于获得与光刻工艺相关的焦点信息的方法和装置。 该方法包括照亮目标，目标具有交替的第一和第二结构，其中第二结构的形式是聚焦依赖的，而第一结构的形式不具有与第二结构相同的焦点依赖性，并且检测 由目标重定向的辐射以为该目标获得表示目标的总体不对称性的不对称测量，其中不对称测量指示形成目标的波束的焦点。 用于形成这种靶的相关掩模和具有这种靶的基片。

    GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTORTIONS
    4.
    发明公开
    GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTORTIONS 审中-公开

    公开(公告)号：US20230176494A1

    公开(公告)日：2023-06-08

    申请号：US17922922

    申请日：2021-04-22

    Applicant: ASML HOLDING N.V. ,  ASML NETHERLANDS B.V.

    Inventor： Zahrasadat DASTOURI ,  Igor Matheus Petronella AARTS ,  Simon Gijsbert Josephus MATHIJISSEN ,  Peter David ENGBLOM

    IPC: G03F9/00 ,  G03F7/20

    CPC classification number: G03F9/7088 ,  G03F9/7092 ,  G03F9/7049 ,  G03F7/70633

    Abstract: A method for generating an alignment signal that includes detecting local dimensional distortions of an alignment mark and generating the alignment signal based on the alignment mark. The alignment signal is weighted based on the local dimensional distortions of the alignment mark. Detecting the local dimensional distortions can include irradiating the alignment mark with radiation, the alignment mark including a geometric feature, and detecting one or more phase and/or amplitude shifts in reflected radiation from the geometric feature. The one or more phase and/or amplitude shifts correspond to the local dimensional distortions of the geometric feature. A parameter of the radiation, an alignment inspection location within the geometric feature, an alignment inspection location on a layer of a structure, and/or a radiation beam trajectory across the geometric feature may be determined based on the one or more detected phase and/or amplitude shifts.

    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY
    7.
    发明申请
    RECIPE SELECTION BASED ON INTER-RECIPE CONSISTENCY 有权

    公开(公告)号：US20210103227A1

    公开(公告)日：2021-04-08

    申请号：US17124758

    申请日：2020-12-17

    Applicant: ASML NETHERLANDS B.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Timothy Dugan DAVIS ,  Peter David ENGBLOM ,  Kaustuve BHATTACHARYYA

    IPC: G03F9/00 ,  G03F7/20 ,  G01B11/27

    Abstract: A method including: determining recipe consistencies between one substrate measurement recipe of a plurality of substrate measurement recipes and each other substrate measurement recipe of the plurality of substrate measurement recipes; calculating a function of the recipe consistencies; eliminating the one substrate measurement recipe from the plurality of substrate measurement recipes if the function meets a criterion; and reiterating the determining, calculating and eliminating until a termination condition is met. Also disclosed herein is a substrate measurement apparatus, including a storage configured to store a plurality of substrate measurement recipes, and a processor configured to select one or more substrate measurement recipes from the plurality of substrate measurement recipes based on recipe consistencies among the plurality of substrate measurement recipes.

Patent Agency Ranking