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50 条记录 (耗时 0.046 秒)

    Exposure apparatus with light shielding portion for plotosensitive elements
    21.
    发明授权
    Exposure apparatus with light shielding portion for plotosensitive elements 失效
    具有光敏元件遮光部分的曝光装置

    公开(公告)号：US5760881A

    公开(公告)日：1998-06-02

    申请号：US540458

    申请日：1995-10-10

    申请人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

    发明人： Seiji Miyazaki ,  Kei Nara ,  Hiroshi Shirasu ,  Tsuyoshi Narabe

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/72

    CPC分类号： G03F7/70066 ,  G03F7/70216 ,  G03F7/70358 ,  G03F9/70

    摘要： An exposure apparatus, having an illumination optical system for radiating a light beam from a light source to a pattern area of a mask for transferring the image of the pattern area onto a photosensitive substrate by the light beam passing through the mask, is provided with plural sets of a first reference mark and a second reference mark arranged on the mask and the photosensitive substrate at positions corresponding to each other, and a light-shielding device for shielding the light beams radiated toward the second reference marks, whereby it is possible to re-use the second reference marks in a post-process by preventing the first reference marks on the mask from being superposed on the second reference marks on the photosensitive substrate or from being transferred onto a part near the second reference marks.

    摘要翻译： 一种曝光装置，具有照明光学系统，用于将来自光源的光束照射到掩模的图案区域，用于通过通过掩模的光束将图案区域的图像转印到感光基板上，具有多个 设置在彼此对应的位置处的掩模和感光基板上的第一参考标记和第二参考标记的集合，以及用于屏蔽朝向第二参考标记辐射的光束的遮光装置，由此可以重新 - 通过防止掩模上的第一参考标记叠加在感光基板上的第二参考标记上或者被转印到靠近第二参考标记的部分上，从而在后处理中使用第二参考标记。

    Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method
    23.
    发明申请
    Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method 审中-公开
    振动控制装置，振动控制方法，曝光装置和装置的制造方法

    公开(公告)号：US20110085152A1

    公开(公告)日：2011-04-14

    申请号：US12775022

    申请日：2010-05-06

    申请人： Hideaki Nishino ,  Hiroshi Shirasu

    发明人： Hideaki Nishino ,  Hiroshi Shirasu

    IPC分类号： G03B27/58 ,  F16F7/00 ,  G03F7/20

    CPC分类号： G03F7/709 ,  F16F15/046

    摘要： A vibration control apparatus suppresses a vibration of a structure which is vibrated. The vibration control apparatus includes: a vibration isolation apparatus that supports the structure and suppresses a transmission of a vibration to the structure, the vibration having an amplitude equal to or less than a first amplitude in a predetermined direction; and a damping apparatus that damps a vibration of the structure vibrating in the predetermined vibration direction with a second amplitude larger than the first amplitude, to thereby reduce the vibration to equal to or less than the first amplitude.

    摘要翻译： 振动控制装置抑制振动的结构的振动。 所述振动控制装置包括：振动隔离装置，其支撑所述结构并抑制对所述结构的振动的传递，所述振动的振幅等于或小于在预定方向上的第一幅度; 以及阻尼装置，其以比第一振幅大的第二振幅来抑制在预定振动方向上振动的结构的振动，从而将振动减小到等于或小于第一振幅。

    Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice
    25.
    发明授权
    Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice 有权
    曝光装置，制造方法，曝光方法以及制造微型装置的方法

    公开(公告)号：US06811953B2

    公开(公告)日：2004-11-02

    申请号：US09861698

    申请日：2001-05-22

    申请人： Hitoshi Hatada ,  Masaki Kato ,  Motoo Koyama ,  Hiroshi Shirasu ,  Masahiro Iguchi

    发明人： Hitoshi Hatada ,  Masaki Kato ,  Motoo Koyama ,  Hiroshi Shirasu ,  Masahiro Iguchi

    IPC分类号： G01B1100

    CPC分类号： G03F9/7026 ,  G03F7/70275 ,  G03F7/70358

    摘要： The memory unit stores the correlation of the positional change in the image planes of the projection optical modules in the focusing direction and the light quantity change. The image plane position determination unit finds the positional change value of the image planes of the projection optical modules based on the correlation information that is stored in the memory unit and the information on changes in the amount of light that is emitted to the projection optical modules. The compensation value calculating unit calculates the compensation value corresponding to the change in the amount of curvature in the image planes of the projection optical modules. The compensating unit compensates the change value in conformity with the compensation value. The focus compensation optical system is driven based on the change value that is compensated.

    摘要翻译： 存储单元存储投影光学模块在聚焦方向上的图像平面中的位置变化与光量变化的相关性。 图像平面位置确定单元基于存储在存储单元中的相关信息和关于发射到投影光学模块的光量变化的信息，找出投影光学模块的图像平面的位置变化值 。 补偿值计算单元计算与投影光学模块的图像平面中的曲率量的变化相对应的补偿值。 补偿单元根据补偿值补偿变化值。 基于补偿的变化值驱动聚焦补偿光学系统。

    Exposure apparatus
    27.
    发明授权
    Exposure apparatus 有权
    曝光装置

    公开(公告)号：US06266131B1

    公开(公告)日：2001-07-24

    申请号：US09309709

    申请日：1999-05-11

    申请人： Tomohide Hamada ,  Hiroshi Shirasu

    发明人： Tomohide Hamada ,  Hiroshi Shirasu

    IPC分类号： G03B2742

    CPC分类号： G03F7/70691 ,  G02F1/1303 ,  G03B27/58 ,  G03F7/70358

    摘要： A method of transferring a pattern of a mask onto an object through a projection system, includes the steps of providing a carriage having a mask holder surface adapted to hold the mask in a position which is angularly displaced from a horizontal position by a predetermined angle and an object holder surface adapted to the object in a position which is angularly displaced from the horizontal position by the predetermined angle, the carriage being movable in a first direction; transferring the pattern onto the object, the projection system being located between the mask and the object during the transfer operation; moving the carriage so that the projection system comes to a position out of a place between the mask holder surface and the object holder surface; and conveying the object from the object holder surface.

    摘要翻译： 通过投影系统将掩模图案转印到物体上的方法包括以下步骤：提供具有掩模保持器表面的托架，所述托架表面适于将掩模保持在与水平位置成角度地移位预定角度的位置，以及 所述物体保持器表面适于在与所述水平位置成角度地移位预定角度的位置处，所述托架能够沿第一方向移动; 将图案转移到物体上，投影系统在转印操作期间位于掩模和物体之间; 移动滑架使得投影系统进入位于掩模保持器表面和物体保持器表面之间的位置; 并从物体保持器表面传送物体。

    Scanning exposure apparatus
    29.
    发明授权
    Scanning exposure apparatus 失效
    扫描曝光装置

    公开(公告)号：US5715037A

    公开(公告)日：1998-02-03

    申请号：US615853

    申请日：1996-03-12

    申请人： Kazuaki Saiki ,  Susumu Mori ,  Hiroshi Shirasu

    发明人： Kazuaki Saiki ,  Susumu Mori ,  Hiroshi Shirasu

    IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/00 ,  G03F9/70

    摘要： The present invention provides a scanning exposure apparatus for projecting an image of a pattern area of a mask having a first alignment mark onto a photosensitive substrate disposed on a substrate stage. A second alignment mark is provided on at least one of the photosensitive substrate and the substrate stage. The scanning exposure apparatus includes a plurality of projection optical systems disposed along a predetermined direction and adapted to receive the luminous fluxes passed through the mask and to project elected images of unchanged dimension of the plurality of illuminated regions of the mask onto the substrate. There is provided a mark detection system for detecting the first alignment mark on the mask and the second alignment mark, and at least one of the projection optical systems constitutes a part of the mark detection system.

    摘要翻译： 本发明提供了一种用于将具有第一对准标记的掩模的图案区域的图像投影到设置在基板台上的感光基板上的扫描曝光装置。 在感光基板和基板台的至少一个上设置第二对准标记。 扫描曝光装置包括沿着预定方向设置的多个投影光学系统，其适于接收通过掩模的光通量，并将掩模的多个照明区域的未改变尺寸的选定图像投影到基板上。 提供了一种用于检测掩模上的第一对准标记和第二对准标记的标记检测系统，并且至少一个投影光学系统构成标记检测系统的一部分。

    Exposure method and apparatus using holographic techniques
    30.
    发明授权
    Exposure method and apparatus using holographic techniques 失效
    使用全息技术的曝光方法和装置

    公开(公告)号：US5504596A

    公开(公告)日：1996-04-02

    申请号：US169055

    申请日：1993-12-20

    申请人： Akihiro Goto ,  Takashi Gemma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Hiroshi Shirasu ,  Toshio Matsuura

    发明人： Akihiro Goto ,  Takashi Gemma ,  Yutaka Ichihara ,  Nobutaka Magome ,  Naomasa Shiraishi ,  Hiroshi Shirasu ,  Toshio Matsuura

    IPC分类号： G03F7/20 ,  G03H1/00 ,  G03H1/26

    CPC分类号： G03F7/70558 ,  G03F7/70625 ,  G03H1/00

    摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.

    摘要翻译： 使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。 全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。 图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。 在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。 测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。 根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。