公开(公告)号：US08623172B2

公开(公告)日：2014-01-07

申请号：US12749642

申请日：2010-03-30

申请人： Daisuke Hayashi

发明人： Daisuke Hayashi

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  C23C16/455 ,  C23C16/50 ,  C23C16/503

CPC分类号： H01J37/32568

摘要： A substrate processing apparatus includes: a depressurizable processing chamber 11; a shaft 26 supporting a facing electrode 24 provided within the processing chamber 11 while allowing the facing electrode 24 to be movable with respect to a mounting electrode 12; a first ring-shaped bellows 31 concentrically installed at an outer peripheral portion of the shaft 26; and a second bellows 32 concentrically installed at an outer peripheral portion of the first bellows 31. The first bellows 31 absorbs a displacement of the facing electrode 24 with respect to a wall surface 13 at a penetration portion where the shaft 26 penetrates the wall surface 13 of the processing chamber 11, and seals the inside of the processing chamber 11 against the ambient atmosphere around the shaft 26. A ring-shaped gas flow path 35 is formed by the first bellows 31 and the second bellows 32.

摘要翻译： 基板处理装置包括：可减压处理室11; 轴26，其支撑设置在处理室11内的面对电极24，同时允许面对电极24能够相对于安装电极12移动; 同心地安装在轴26的外周部分的第一环形波纹管31; 以及同心地安装在第一波纹管31的外周部分的第二波纹管32.第一波纹管31在轴26穿透壁表面13的穿透部分吸收面对电极24相对于壁表面13的位移 并且密封处理室11的内部抵靠围绕轴26的环境大气。环形气体流路35由第一波纹管31和第二波纹管32形成。

公开(公告)号：US08459290B2

公开(公告)日：2013-06-11

申请号：US12610019

申请日：2009-10-30

申请人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

发明人： Masakazu Minami ,  Daisuke Hayashi ,  Yuhei Sakaguchi ,  Katsumi Nishimura ,  Masaki Inoue ,  Kotaro Takijiri

IPC分类号： B05C11/00

CPC分类号： G05D11/132 ,  Y10T137/0396 ,  Y10T137/2499 ,  Y10T137/2509 ,  Y10T137/2708

摘要： A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.

摘要翻译： 一种材料气体浓度控制系统，用于保持包含罐的混合气体中的材料气体的浓度恒定以容纳材料，输入用于将所容纳的材料蒸发到罐中的载气的输入管线和输出的出口管线 所述混合气体由在所述罐中的所述原料气体和所述载气组成，还包括配置在所述入口管路中的第一阀，测量所述混合气体中的原料气体的浓度的浓度测定部， 控制第一阀的开度的部分，使得由浓度测量部测量的材料气体的测量浓度变为预先确定的设定浓度。

公开(公告)号：US08398248B2

公开(公告)日：2013-03-19

申请号：US12699449

申请日：2010-02-03

申请人： Masakazu Kawamura ,  Daisuke Hayashi

发明人： Masakazu Kawamura ,  Daisuke Hayashi

IPC分类号： G03B21/14

CPC分类号： G03B21/2053

摘要： A projector includes: an illuminating device including a light source device, a first lens array that comprises first regions located at four corners in the first lens array when viewed along a system optical axis and second regions located between the two first regions, and a second lens array; a light modulating device; a projection optical system; a light control device; and a mode selection device. The light control device blocks part of the plural partial light beams by causing first and second light shields to integrally operate, when the brightness priority mode is selected. The light control device always blocks part of the partial light beams with the first light shields and blocks part of the partial light beams by causing the second light shields to operate independently from the first light shields.

摘要翻译： 投影仪包括：照明装置，包括光源装置，第一透镜阵列，其包括当沿着系统光轴观察时位于第一透镜阵列中的四个角处的第一区域和位于两个第一区域之间的第二区域;以及第二透镜阵列 镜头阵列 光调制装置; 投影光学系统; 光控装置; 和模式选择装置。 当选择亮度优先模式时，光控制装置通过使第一和第二光屏蔽一体地操作来阻挡多个部分光束的一部分。 光控制装置总是通过使第二光屏独立于第一遮光罩来操作，通过第一遮光罩来阻挡部分光束并阻挡部分光束的一部分。

公开(公告)号：US08319141B2

公开(公告)日：2012-11-27

申请号：US12876597

申请日：2010-09-07

申请人： Toshifumi Ishida ,  Daisuke Hayashi

发明人： Toshifumi Ishida ,  Daisuke Hayashi

IPC分类号： B23K9/00 ,  F02M3/10 ,  F28F7/00

CPC分类号： H05H1/46 ,  H01J37/32009 ,  H01J37/32724

摘要： The present invention is a cooling block that forms an electrode for generating a plasma for use in a plasma process, and includes a channel for a cooling liquid, the cooling block comprising: a first base material and a second base material respectively made of aluminum, at least one of the first and second base materials having a recess for forming a channel for a cooling liquid; and a diffusion bonding layer, in which zinc is diffused in aluminum, and an anti-corrosion layer of a zinc oxide film, the layers being formed by interposing zinc between the first and second base materials, and by bonding the first and second base materials with zinc interposed therebetween in a heating atmosphere containing oxygen.

摘要翻译： 本发明是一种冷却块，其形成用于产生用于等离子体处理的等离子体的电极，并且包括用于冷却液体的通道，所述冷却块包括：分别由铝制成的第一基材和第二基材， 所述第一和第二基底材料中的至少一个具有用于形成用于冷却液体的通道的凹部; 以及锌在铝中扩散的扩散接合层和氧化锌膜的防腐蚀层，所述层通过在第一和第二基底材料之间插入锌而形成，并且通过将第一和第二基底材料 在含有氧的加热气氛中夹有锌。

公开(公告)号：US20120250014A1

公开(公告)日：2012-10-04

申请号：US13431718

申请日：2012-03-27

申请人： Daisuke Hayashi ,  Katsumi Nishimura

发明人： Daisuke Hayashi ,  Katsumi Nishimura

IPC分类号： G01J3/40

CPC分类号： G01J3/42 ,  G01J3/28 ,  G01N21/274 ,  G01N21/276 ,  G01N21/3504

摘要： The disclosure provides a spectrophotometer, including a light source for irradiating light into a sample gas, a photodetector for detecting light transmitted through the sample gas, an optical filter, and an operation device for calculating a concentration of an actual gas to be measured, contained in the sample gas based on a detection signal value obtained from the photodetector. The operation device calculates the concentration of the actual gas based on function a for associating a concentration of a substitute gas with the actual gas obtained from a reference instrument, function β for associating a relation between a light absorption of the actual gas and the substitute gas in the reference instrument, with a relation between a light absorption of the actual gas the substitute gas in a calibration instrument, and a function indicating a relation between the concentration of the substitute gas and the detection signal value.

摘要翻译： 本发明提供了一种分光光度计，包括用于将光照射到样气中的光源，用于检测透过样气的光检测器，滤光器和用于计算待测实际气体浓度的操作装置， 基于从光电检测器获得的检测信号值在样品气体中。 操作装置基于将替代气体的浓度与从参考仪器获得的实际气体相关联的函数a来计算实际气体的浓度，函数＆bgr; 用于将实际气体的光吸收与参考仪器中的替代气体之间的关系与校准仪器中的替代气体的实际气体的吸光率和表示浓度之间的关系的函数相关联 替代气体和检测信号值。

公开(公告)号：US08274624B2

公开(公告)日：2012-09-25

申请号：US12602604

申请日：2008-05-27

申请人： Takeharu Kitagawa ,  Daisuke Hayashi ,  Hideki Ishida ,  Takeshi Nishibe ,  Nao Murakami

发明人： Takeharu Kitagawa ,  Daisuke Hayashi ,  Hideki Ishida ,  Takeshi Nishibe ,  Nao Murakami

IPC分类号： G02F1/1335

CPC分类号： G02F1/133528 ,  G02B5/3083 ,  G02B27/28 ,  G02F1/133634 ,  G02F2001/133531 ,  G02F2001/133607 ,  G02F2201/50 ,  G02F2202/40 ,  G02F2413/02 ,  G02F2413/07 ,  G02F2413/11 ,  G02F2413/12

摘要： The present invention provides a liquid crystal panel that can provide a neutral display that is free from coloring in every direction. The liquid crystal panel includes a first polarizer 14a, a second polarizer 14b, and a liquid crystal cell 13. The first polarizer 14a is arranged on the visible side of the liquid crystal cell 13 and the second polarizer 14b is arranged on the backlight side of the liquid crystal cell 13. The liquid crystal panel further includes a first retardation layer 11 and a second retardation layer 12. A refractive index ellipsoid of the first retardation layer 11 has a relationship of nx=ny>nz, and a refractive index ellipsoid of the second retardation layer 12 has a relationship of nx>ny≧nz. The first retardation layer 11 and the second retardation layer 12 are arranged between the liquid crystal cell 13 and the second polarizer 14b.

摘要翻译： 本发明提供一种能够提供在各个方向上不着色的中性显示器的液晶面板。 液晶面板包括第一偏振片14a，第二偏振片14b和液晶单元13.第一偏振片14a配置在液晶单元13的可视侧，第二偏振片14b配置在 液晶面板还包括第一延迟层11和第二延迟层12.第一延迟层11的折射率椭圆体的关系为nx = ny> nz，折射率椭圆体的折射率椭圆体 第二延迟层12具有nx>ny≥nz的关系。 第一延迟层11和第二延迟层12布置在液晶单元13和第二偏振器14b之间。

公开(公告)号：US08211232B2

公开(公告)日：2012-07-03

申请号：US12019911

申请日：2008-01-25

申请人： Daisuke Hayashi

发明人： Daisuke Hayashi

IPC分类号： C23C16/00 ,  C23C16/455 ,  C23C16/46

CPC分类号： C23C16/54 ,  C23C16/4401 ,  C23C16/4411

摘要： A substrate processing apparatus that can reduce the number of parts. A first gas introduction hole through which the hydrogen fluoride gas is introduced into a GDP is formed in an upper lid. A second gas introduction hole through which hydrogen fluoride gas is introduced from a hydrogen fluoride gas source is formed in a processing vessel. When the upper lid engages the upper portion of the processing vessel, one end of the first gas introduction hole is joined with one end of the second gas introduction hole to form an introduction path through which the hydrogen fluoride gas is introduced into a chamber.

摘要翻译： 可以减少部件数量的基板处理装置。 在上盖中形成有将氟化氢气体引入到GDP中的第一气体导入孔。 在处理容器中形成有从氟化氢气体源引入氟化氢气体的第二气体导入孔。 当上盖接合处理容器的上部时，第一气体导入孔的一端与第二气体导入孔的一端接合，形成引入路径，通过该导入路径将氟化氢气体引入到室内。

公开(公告)号：US20110226420A1

公开(公告)日：2011-09-22

申请号：US13046900

申请日：2011-03-14

申请人： Daisuke Hayashi ,  Shoichiro Matsuyama ,  Koichi Murakami

发明人： Daisuke Hayashi ,  Shoichiro Matsuyama ,  Koichi Murakami

IPC分类号： C23F1/08 ,  C23C16/455 ,  C23C16/50

CPC分类号： H01J37/3266 ,  H01J37/32091 ,  H01J37/32541

摘要： There is provided a plasma processing apparatus including a processing chamber 100 configured to perform a plasma process on a wafer W; an upper electrode 105 and a lower electrode 110 arranged to face each other in the processing chamber 100 and configured to form a processing space therebetween; and a high frequency power supply 150 connected with at least one of the upper electrode 105 and the lower electrode 110 and configured to output a high frequency power into the processing chamber 100. The upper electrode 105 includes an upper base 105a made of a dielectric material, and a plurality of fine holes A having a diameter equal to or less than twice a thickness of a sheath are formed in the upper base 105a.

摘要翻译： 提供了一种等离子体处理装置，其包括：处理室100，被配置为对晶片W执行等离子体处理; 上部电极105和下部电极110，其配置成在处理室100中彼此面对，并且构成为在其间形成处理空间; 以及与上部电极105和下部电极110中的至少一个连接并构成为向处理室100输出高频电力的高频电源150.上部电极105包括由介电材料制成的上部基座105a 并且在上部基座105a中形成具有等于或小于鞘的厚度的两倍的多个细孔A.

公开(公告)号：US07991058B2

公开(公告)日：2011-08-02

申请号：US11793527

申请日：2005-12-21

申请人： Koji Setoh ,  Ippei Kanno ,  Akira Kisoda ,  Daisuke Hayashi ,  Ryosuke Mori ,  Tetsuya Yagi ,  Noritaka Iguchi

发明人： Koji Setoh ,  Ippei Kanno ,  Akira Kisoda ,  Daisuke Hayashi ,  Ryosuke Mori ,  Tetsuya Yagi ,  Noritaka Iguchi

IPC分类号： H04L27/28

CPC分类号： H04L27/2662 ,  H04L27/2678

摘要： An OFDM reception device detects a time at which impulse noise occurs in a received OFDM signal, and specifies a start position candidate period that does not have intersymbol interference and is estimated to have a guard interval signal in a symbol. When setting a FFT window of an effective symbol length in a symbol duration of each symbol, if the impulse noise occurrence time is included in the symbol, the OFDM reception device determines a start position of the FFT window within a range of the start position candidate period so as to exclude the impulse noise occurrence time as much as possible.

摘要翻译： OFDM接收装置检测接收的OFDM信号中出现脉冲噪声的时间，并指定不具有码间干扰的开始位置候补周期，并且估计出具有符号中的保护间隔信号。 当在每个符号的符号持续时间中设置有效符号长度的FFT窗口时，如果脉冲噪声发生时间包括在符号中，则OFDM接收装置在开始位置候选的范围内确定FFT窗口的开始位置 以便尽可能地排除脉冲噪声发生时间。

公开(公告)号：US20110155322A1

公开(公告)日：2011-06-30

申请号：US12979875

申请日：2010-12-28

申请人： Shinji HIMORI ,  Daisuke Hayashi ,  Akitaka Shimizu

发明人： Shinji HIMORI ,  Daisuke Hayashi ,  Akitaka Shimizu

IPC分类号： C23F1/08

CPC分类号： H01L21/67069 ,  H01J37/32091 ,  H01J37/32541 ,  H01J37/3255 ,  H01J37/32577 ,  H01J37/32605

摘要： A plasma processing apparatus includes a processing chamber in which a target substrate is processed; an application electrode and a facing electrode provided to face each other in the processing chamber, a plasma generation space being formed between the application electrode and the facing electrode; and an RF power supply connected to the application electrode, an RF power being supplied from the RF power supply to the application electrode. At least one of the application electrode and the facing electrode includes a base formed of a metal, and a dielectric body inserted into the base, one or more metal plate electrodes being buried in the dielectric body.

摘要翻译： 等离子体处理装置包括：处理室，其中处理目标基板; 在处理室中设置成面对的施加电极和对置电极，在施加电极和对置电极之间形成等离子体产生空间; 以及连接到施加电极的RF电源，RF电力从RF电源提供给施加电极。 施加电极和对置电极中的至少一个包括由金属形成的基底和插入到基底中的电介质体，一个或多个金属板电极被埋在电介质体内。