公开(公告)号：US09692325B2

公开(公告)日：2017-06-27

申请号：US13818339

申请日：2011-09-08

申请人： David Suuronen ,  Lyudmila Stone ,  Julian Blake ,  Dale K. Stone ,  Richard A. Cooke ,  Steven Donnell ,  Chandra Venkatraman

发明人： David Suuronen ,  Lyudmila Stone ,  Julian Blake ,  Dale K. Stone ,  Richard A. Cooke ,  Steven Donnell ,  Chandra Venkatraman

IPC分类号： H01L21/683 ,  H02N13/00 ,  B23Q3/152

CPC分类号： H02N13/00 ,  B23Q3/152 ,  H01L21/6831 ,  H01L21/6833

摘要： In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising a conductive path covering at least a portion of a workpiece-contacting surface of a gas seal ring of the electrostatic chuck, the conductive path comprising at least a portion of an electrical path to ground; and a main field area of a workpiece-contacting surface of the electrostatic chuck comprising a surface resistivity in the range of from about 108 to about 1012 ohms per square.

公开(公告)号：US09082804B2

公开(公告)日：2015-07-14

申请号：US13021838

申请日：2011-02-07

申请人： Julian Blake ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Shigeo Oshiro

发明人： Julian Blake ,  Dale K. Stone ,  Lyudmila Stone ,  David Suuronen ,  Shigeo Oshiro

IPC分类号： H01L21/683

CPC分类号： H01L21/6831

摘要： An electrostatic clamp which more effectively removes built up charge from a substrate prior to removal is disclosed. Currently, the lift pins and the ground pins are the only mechanism used to remove charge from the substrate after implantation. The present discloses describes an electrostatic chuck in which the top dielectric surface has an embedded conductive region, such as a ring shaped conductive region in the sealing ring. Thus, regardless of the orientation of the substrate during release, at least a portion of the substrate will contain the conductive region on the dielectric layer of the workpiece support. This conductive region may be connected to ground through the use of conductive vias in the dielectric layer. In some embodiments, these conductive vias are the fluid conduits used to supply gas to the back side of the substrate.

摘要翻译： 公开了一种在去除之前更有效地从衬底去除积聚电荷的静电夹。 目前，升降针和接地引脚是用于在植入后从衬底去除电荷的唯一机制。 本公开描述了一种静电卡盘，其中顶部电介质表面具有嵌入的导电区域，例如密封环中的环形导电区域。 因此，无论衬底在释放过程中的取向如何，衬底的至少一部分将在工件支撑体的电介质层上包含导电区域。 该导电区域可以通过使用电介质层中的导电通孔而连接到地。 在一些实施例中，这些导电通孔是用于向衬底的背侧供应气体的流体导管。

公开(公告)号：US20130070384A1

公开(公告)日：2013-03-21

申请号：US13699279

申请日：2011-05-24

申请人： Richard A. Cooke ,  Dale K. Stone ,  Lyudmila Stone ,  Julian Blake ,  David Suuronen

发明人： Richard A. Cooke ,  Dale K. Stone ,  Lyudmila Stone ,  Julian Blake ,  David Suuronen

IPC分类号： H02N13/00 ,  C23F1/00 ,  B05D5/12

CPC分类号： H02N13/00 ,  B05D5/12 ,  B23Q3/152 ,  C04B37/005 ,  C04B37/008 ,  C04B2237/06 ,  C04B2237/062 ,  C04B2237/08 ,  C04B2237/083 ,  C04B2237/086 ,  C04B2237/341 ,  C04B2237/343 ,  C04B2237/365 ,  C04B2237/368 ,  C23F1/00 ,  H01L21/6833

摘要： In accordance with an embodiment of the invention, there is provided an electrostatic chuck. The electrostatic chuck comprises an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck, the surface layer including a charge control layer comprising a surface resistivity of greater than about 1011 ohms per square.

摘要翻译： 根据本发明的实施例，提供了一种静电卡盘。 静电卡盘包括电极和由电极中的电压激活的表面层以形成电荷以将基板静电夹持到静电卡盘，该表面层包括电荷控制层，该电荷控制层包括大于约1011的表面电阻率 欧姆每平方

公开(公告)号：US07173260B2

公开(公告)日：2007-02-06

申请号：US11022060

申请日：2004-12-22

申请人： Maria J. Anc ,  Dale K. Stone ,  Christopher T. Reddy

发明人： Maria J. Anc ,  Dale K. Stone ,  Christopher T. Reddy

IPC分类号： G21G5/00 ,  H01L21/76

CPC分类号： H01J37/3171 ,  H01J37/165 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/31705

摘要： An ion implanter having a source, a workpiece support and a transport system for delivering ions from the source to an ion implantation chamber that contains the workpiece support. The implanter includes one or more removable inserts mounted to an interior of either the transport system or the ion implantation chamber for collecting material entering either the transport system or the ion implantation chamber due to collisions between ions and the workpiece within the ion implantation chamber during ion processing of the workpiece. A temperature control coupled to the one or more removable inserts for maintaining the temperature of the insert at a controlled temperature to promote formation of a film on said insert during ion treatment due to collisions between ions and said workpiece.

摘要翻译： 一种离子注入机，其具有源，工件支撑和用于将离子从源输送到包含工件支撑件的离子注入室的输送系统。 注入机包括一个或多个可拆卸的插入件，其安装到输送系统或离子注入室的内部，用于收集进入输送系统或离子注入室的材料，这是由于离子和离子注入室内的工件之间的离子在离子 加工工件。 耦合到一个或多个可移除插入件的温度控制器，用于将插入件的温度保持在受控温度，以促进在离子处理期间由于离子和所述工件之间的碰撞而在所述插入件上形成膜。

公开(公告)号：US20120017938A1

公开(公告)日：2012-01-26

申请号：US13187078

申请日：2011-07-20

申请人： William T. Weaver ,  Kevin M. Daniels ,  Dale K. Stone ,  Russell J. Low ,  Benjamin B. Riordon ,  Jeffrey Blahnik

发明人： William T. Weaver ,  Kevin M. Daniels ,  Dale K. Stone ,  Russell J. Low ,  Benjamin B. Riordon ,  Jeffrey Blahnik

IPC分类号： B08B1/00

CPC分类号： H01L21/67028 ,  B08B1/008 ,  H01J2237/31711 ,  H01L21/67046

摘要： To achieve cost efficiency, solar cells must be processed at a high throughput. Breakages, which may leave debris on the clamping surface of the platen, adversely affect this throughput. A plurality of embodiments are disclosed which may be used to remove debris from the clamping surface without breaking the vacuum condition within the processing station. In some embodiments, a brush is used to sweep the debris from the surface of the platen. In other embodiments, an adhesive material is used to collect the debris. In some embodiments, the automation equipment used to handle masks may also be used to handle the platen cleaning mechanisms. In still other embodiments, stream of gas or ion beams are used to clean debris from the clamping surface of the platen.

摘要翻译： 为了实现成本效益，必须以高产量处理太阳能电池。 碎片可能会使碎片在压板的夹紧表面上产生不利影响。 公开了多个实施例，其可以用于从夹紧表面去除碎屑而不破坏处理站内的真空状况。 在一些实施例中，刷子用于从压板的表面扫掠碎屑。 在其他实施例中，使用粘合剂材料来收集碎屑。 在一些实施例中，用于处理掩模的自动化设备也可用于处理压板清洁机构。 在其它实施例中，气流或离子束用于从压板的夹紧表面清洁碎屑。

公开(公告)号：US07151658B2

公开(公告)日：2006-12-19

申请号：US10420329

申请日：2003-04-22

申请人： Peter L. Kellerman ,  Victor Benveniste ,  Michel Pharand ,  Dale K. Stone

发明人： Peter L. Kellerman ,  Victor Benveniste ,  Michel Pharand ,  Dale K. Stone

IPC分类号： H02N13/00

CPC分类号： H01L21/6833 ,  H02N13/00

摘要： An electrostatic clamp for securing a semiconductor wafer during processing. The electrostatic clamp includes a base member, a first dielectric layer, a second dielectric layer having a gas pressure distribution micro-groove network formed therein, a gas gap positioned between a backside of a semiconductor wafer and the second dielectric layer, and a pair of high voltage electrodes positioned between the first dielectric layer and the second dielectric layer.

摘要翻译： 一种用于在加工过程中固定半导体晶片的静电夹。 静电夹具包括：基座部件，第一电介质层，形成有气体压力分布微槽网络的第二电介质层，位于半导体晶片的背面和第二电介质层之间的气隙，以及一对 位于第一介电层和第二介电层之间的高压电极。

公开(公告)号：US06583428B1

公开(公告)日：2003-06-24

申请号：US09670241

申请日：2000-09-26

申请人： David J. Chipman ,  Bryan C. Lagos ,  Robert J. Mitchell ,  Gary Rosen ,  Dale K. Stone

发明人： David J. Chipman ,  Bryan C. Lagos ,  Robert J. Mitchell ,  Gary Rosen ,  Dale K. Stone

IPC分类号： H01J3717

CPC分类号： H01J37/20 ,  H01J37/3171 ,  H01J2237/2001

摘要： The invention provides apparatus by which a cooling gas is supplied from a stationary source to the back side of batch ion implanter workpieces being implanted in a rotating or spinning batch implanter process disk. The cooling gas provides improved heat transfer from the workpieces to the process disk, which may be advantageously combined with circulation of cooling fluid through passages in the process disk to remove heat therefrom. The invention further includes a rotary feedthrough employed to transfer the cooling gas from a stationary housing to a gas chamber in a rotating shaft which spins the batch implanter process disk. In addition, a seal apparatus is provided which seals the cooling gas applied to the back sides of the workpieces from the vacuum in which the front sides of the workpieces are implanted.

摘要翻译： 本发明提供了一种装置，通过该装置将冷却气体从固定源供给到植入在旋转或旋转批量注入器处理盘中的批量离子注入机工件的背面。 冷却气体提供从工件到处理盘的改进的热传递，其可以有利地与通过处理盘中的通道的冷却流体循环组合以从其中除去热量。 本发明还包括用于将冷却气体从固定壳体转移到旋转轴中的气室的旋转馈通，其旋转批量注入器处理盘。 此外，提供一种密封装置，其从被植入工件的前侧的真空中密封施加到工件的背面的冷却气体。