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191 条记录 (耗时 0.043 秒)

    Photomask and method for manufacturing the same
    21.
    发明授权
    Photomask and method for manufacturing the same 失效

    公开(公告)号：US06617265B2

    公开(公告)日：2003-09-09

    申请号：US09927318

    申请日：2001-08-13

    申请人： Toshihiko Tanaka ,  Norio Hasegawa

    发明人： Toshihiko Tanaka ,  Norio Hasegawa

    IPC分类号： H01L2131

    CPC分类号： G03F1/56 ,  H01L21/0276

    摘要： A resist mask having a satisfactory resolution effect may be obtained even in the case of use of exposure light having a wavelength of 200 nm or more. An opaque pattern 2a comprising an organic layer for transferring a pattern is constituted by a multi-layer formed by a photo-absorptive organic layer 3a having an light shielding effect or a light attenuating effect even relative to exposure light having a wavelength of 200 nm or more, and a resist layer 4a for chiefly patterning this.

    Phase shift mask and manufacturing the same
    22.
    发明授权
    Phase shift mask and manufacturing the same 有权
    相移面罩和制造相同

    公开(公告)号：US06558855B2

    公开(公告)日：2003-05-06

    申请号：US09800501

    申请日：2001-03-08

    申请人： Toshihiko Tanaka ,  Norio Hasegawa

    发明人： Toshihiko Tanaka ,  Norio Hasegawa

    IPC分类号： G03P900

    CPC分类号： G03F1/32 ,  G03F1/42 ,  G03F1/84

    摘要： The present invention provides a method of manufacturing halftone phase shift masks in less steps to save time and cost and to increase the yield, and a halftone phase shift mask with higher phase- and size controllability. To achieve this, the halftone phase shift mask includes a structure having a shade band of resist film formed on the halftone film delineating fine patterns and around the area of fine pattern.

    摘要翻译： 本发明提供了一种以较少的步骤制造半色调相移掩模以节省时间和成本并提高产量的方法，以及具有较高相位和尺寸可控性的半色调相移掩模。 为了实现这一点，半色调相移掩模包括具有形成在半色调膜上的抗蚀剂膜的阴影带的结构，其描绘细微图案并且围绕精细图案区域。

    Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed
    24.
    发明授权
    Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed 有权
    使用抗反射层的抗蚀剂图案形成方法，形成的抗蚀剂图案，以及形成的抗蚀剂图案和产品的蚀刻方法

    公开(公告)号：US06355400B1

    公开(公告)日：2002-03-12

    申请号：US09849487

    申请日：2001-05-07

    申请人： Toshihiko Tanaka ,  Shoichi Uchino ,  Naoko Asai

    发明人： Toshihiko Tanaka ,  Shoichi Uchino ,  Naoko Asai

    IPC分类号： G03C1825

    CPC分类号： G03F7/091 ,  Y10S430/151

    摘要： Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.

    摘要翻译： 公开了形成抗蚀剂图案的方法，该抗蚀剂图案解决了由于来自基板的反射光引起的由于偏离和干扰现象引起的问题。 在基板和抗蚀剂膜之间形成第一种方法，其中在基板表面侧的曝光光的光吸收性大于在抗蚀剂表面侧上的抗反射膜。 在基板和抗蚀剂膜之间形成由用于曝光光的上部干涉膜构成的两层抗反射膜和具有比上部膜更高的曝光吸光度的下部膜并用作遮光膜的第二种方法。 第三种方法在基板和抗蚀剂膜之间形成由反射曝光光的下膜和作为曝光光的干涉膜的上膜构成的两层抗反射膜。

    Method of making a liquid crystal display including a field effect transistor
    25.
    发明授权
    Method of making a liquid crystal display including a field effect transistor 失效
    制造包括场效应晶体管的液晶显示器的方法

    公开(公告)号：US06060333A

    公开(公告)日：2000-05-09

    申请号：US228937

    申请日：1999-01-12

    申请人： Toshihiko Tanaka ,  Syuji Doi ,  Hiroshi Koezuka ,  Akira Tsumura ,  Hiroyuki Fuchigami

    发明人： Toshihiko Tanaka ,  Syuji Doi ,  Hiroshi Koezuka ,  Akira Tsumura ,  Hiroyuki Fuchigami

    IPC分类号： G02F1/1333 ,  G02F1/1368 ,  H01L27/28 ,  H01L51/30 ,  H01L35/24

    CPC分类号： H01L51/0036 ,  G02F1/1368 ,  H01L27/283 ,  H01L51/002 ,  H01L51/0035 ,  H01L51/0038 ,  H01L51/0508 ,  H01L51/0545 ,  H01L51/0558 ,  G02F2001/133302 ,  H01L51/0015 ,  H01L51/0541

    摘要： A method of fabricating a liquid crystal display device including a field effect transistor includes forming a gate electrode on an electrically insulating substrate, the gate electrode being located in a transistor region of the substrate; forming an electrically insulating film on the substrate and covering the gate electrode; forming source and drain electrodes on the electrically insulating film on opposite sides of the gate electrode in the transistor region; forming a display electrode on the electrically insulating substrate in a display region of the substrate, adjacent the transistor region, the drain electrode being electrically connected to the display electrode; and forming, in the transistor region, a semiconductor film of a .pi.-conjugated polymer on the source and drain electrodes and on the electrically insulating film between the source and drain electrodes in the transistor region; arranging a transparent plate, including a transparent electrode, opposite and spaced from the .pi.-conjugated polymer film and the display electrode with the transparent electrode opposite the display electrode; and injecting a liquid crystal material between the transparent and display electrodes and between the transparent plate and the .pi.-conjugated polymer film.

    摘要翻译： 制造包括场效应晶体管的液晶显示装置的方法包括在电绝缘基板上形成栅电极，栅电极位于基板的晶体管区域中; 在基板上形成电绝缘膜并覆盖栅电极; 在晶体管区域中的栅电极的相对侧的电绝缘膜上形成源电极和漏电极; 在所述基板的显示区域中的所述电绝缘基板上形成与所述晶体管区域相邻的显示电极，所述漏极电极与所述显示电极连接; 以及在所述晶体管区域中在所述晶体管区域中在所述源极和漏极以及所述源极和漏极之间的所述电绝缘膜上形成π共轭聚合物的半导体膜; 布置透明板，包括透明电极，与透明电极相对并且与p1共轭聚合物膜和显示电极间隔开，透明电极与显示电极相对; 以及在所述透明显示电极之间以及所述透明板和所述π共轭聚合物膜之间注入液晶材料。

    Resist pattern forming method using anti-reflective layer with variable extinction coefficient
    26.
    发明授权
    Resist pattern forming method using anti-reflective layer with variable extinction coefficient 有权
    使用具有可变消光系数的抗反射层的抗蚀图案形成方法

    公开(公告)号：US5935765A

    公开(公告)日：1999-08-10

    申请号：US159786

    申请日：1998-09-24

    申请人： Toshihiko Tanaka ,  Shoichi Uchino ,  Naoko Asai

    发明人： Toshihiko Tanaka ,  Shoichi Uchino ,  Naoko Asai

    IPC分类号： G03F7/09 ,  G03C1/825

    CPC分类号： G03F7/091 ,  Y10S430/151

    摘要： Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film. With these methods, it is possible to form a fine and highly precise resist pattern. These methods can be used to form patterned resist films to etch object films, e.g., in forming microcircuits and/or gates (and word lines) of semiconductor devices.

    摘要翻译： 公开了形成抗蚀剂图案的方法，其解决了由于来自基板的反射光引起的由于偏光和干涉现象引起的问题（尺寸精度降低），即使具有高反射率的基板或具有透明度的基板也是精细且具有高精度 膜或具有不平坦表面的基底。 在基板和抗蚀剂膜之间形成第一种方法，其中在基板表面侧的曝光光的光吸收性大于在抗蚀剂表面侧上的抗反射膜。 在基板和抗蚀剂膜之间形成由作为曝光用的干涉膜的上层膜构成的双层抗反射膜的第二种方法和具有比上层的曝光吸光度高的下层膜 并且用作遮光膜。 在基板和抗蚀剂膜之间形成由反射曝光光的下层膜构成的两层抗反射膜和作为曝光用光的干涉膜的上层膜的第三种方法。 在形成抗反射膜的过程中可以获得非常高的抗反射效果，而不受包括具有透明膜的基板的种类的影响。 利用这些方法，可以形成精细且高精度的抗蚀剂图案。 这些方法可以用于形成图案化的抗蚀剂膜以蚀刻对象膜，例如在形成半导体器件的微电路和/或栅极（和字线）中。

    Inflatable seatbelt system
    27.
    发明授权
    Inflatable seatbelt system 失效
    充气安全带系统

    公开(公告)号：US5385367A

    公开(公告)日：1995-01-31

    申请号：US99479

    申请日：1993-07-30

    申请人： Toshihiko Tanaka ,  Tsuneo Chikaraishi

    发明人： Toshihiko Tanaka ,  Tsuneo Chikaraishi

    IPC分类号： B60R22/12 ,  A44B11/25 ,  B60R21/18 ,  B60R22/28 ,  D04B1/22

    CPC分类号： B60R21/18 ,  D04B1/16 ,  D04B21/16 ,  D10B2403/02411 ,  D10B2403/0312 ,  D10B2505/122

    摘要： An inflatable seatbelt system designed so that the thickness of the webbing, when maintained in a strap-like configuration, is minimized, and it is possible to eliminate the webbing folding process and to reduce the amount of base fabric used and yet possible to reliably inflate the webbing when an emergency situation occurs. A shoulder belt (2) is formed from a tubular webbing (17), a tube (16) inserted in the webbing (17), and a cover (15) covering the webbing (17). The tube (16) is made of an elastic material which can be formed relatively thin and which has heat resistance and relatively high strength, e.g., urethane rubber or silicone rubber. The cover (15) is made of a resin material, e.g., polyester. The webbing (17) is made of a knitted fabric formed into a tubular configuration by weft knitting. By the use of the knitted fabric, the webbing (17) is stretchable to a large extent in the lateral direction but does not practically stretch in the longitudinal direction.

    摘要翻译： 一种充气安全带系统，其设计使得当保持条带状构造时，织带的厚度最小化，并且可以消除织带折叠过程并减少使用的基底织物的量并且可能可靠地膨胀 发生紧急情况时的安全带。 肩带（2）由管状织带（17），插入织带（17）中的管（16）和覆盖织带（17）的盖（15）形成。 管（16）由弹性材料制成，其可以形成得相对较薄，并且具有耐热性和相对高的强度，例如聚氨酯橡胶或硅橡胶。 盖（15）由树脂材料例如聚酯制成。 织带（17）由通过纬编形成为管状构造的针织物制成。 通过使用针织物，织带17可以在横向方向上很大程度地拉伸，但实际上在纵向上几乎不拉伸。

    Color picture tube device with static convergence adjuster
    29.
    发明授权
    Color picture tube device with static convergence adjuster 失效
    带静态会聚调节器的彩色显像管装置

    公开(公告)号：US5157302A

    公开(公告)日：1992-10-20

    申请号：US439837

    申请日：1989-11-21

    申请人： Toshihiko Tanaka

    发明人： Toshihiko Tanaka

    IPC分类号： H01J29/54 ,  H01J29/70

    CPC分类号： H01J29/703

    摘要： A color picture tube device equipped with a static convergence adjuster for outer electron beams. The magnetic lines of force of the quadrupole field produced by the adjuster have substantially straight vertical portions. The device is capable of suppressing broadening of the vertical diameters of the spots of the outer beams. Deterioration in the resolution concomitant with adjustment of the convergence of the outer beams can be suppressed.

    摘要翻译： 配有外电子束静态会聚调节器的彩色显像管装置。 由调节器产生的四极场的磁力线具有基本上直的垂直部分。 该装置能够抑制外光束的光斑的垂直直径的变宽。 可以抑制伴随着外束的会聚的调整而导致的分辨率的恶化。