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21.发明授权Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder 有权具有具有流体的热管以冷却衬底和/或衬底保持器的光刻设备和器件制造方法公开(公告)号：US09268236B2
公开(公告)日：2016-02-23
申请号：US12814242
申请日：2010-06-11
申请人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
摘要翻译： 一种光刻设备，其被配置为将图案化的辐射束投影到保持在基板台上的凹槽中的基板保持器上的基板的目标部分上，该设备包括：液体供应系统，其构造成至少部分地填充投影系统和 液体基体; 阻挡结构，其构造成在所述空间内基本上容纳所述液体; 以及在使用中供应有温度调节的流体并被配置为在可能发生局部冷却的位置处对基板和/或基板保持器进行热调节的热管。
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公开(公告)号：US07652746B2
公开(公告)日：2010-01-26
申请号：US11319217
申请日：2005-12-28
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译： 使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。 从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。
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23.发明申请公开(公告)号：US20180284627A1
公开(公告)日：2018-10-04
申请号：US15932215
申请日：2018-02-16
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
IPC分类号： G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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24.发明授权公开(公告)号：US09897928B2
公开(公告)日：2018-02-20
申请号：US13586728
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
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25.发明申请公开(公告)号：US20130045447A1
公开(公告)日：2013-02-21
申请号：US13586728
申请日：2012-08-15
申请人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
发明人： Johan Gertrudis Cornelis Kunnen , Johannes Henricus Wilhelmus Jacobs , Coen Cornelis Wilhelmus Verspaget , Ronald Van Der Ham , Ivo Adam Johannes Thomas , Martijn Houben , Thibault Simon Mathieu Laurent , Gregory Martin Mason Corcoran , Ruud Hendrikus Martinus Johannes Bloks , Gerben Pieterse , Pieter Lein Joseph Gunter , Marinus Jan Remie , Sander Catharina Reinier Derks
CPC分类号： G03F7/70875 , G03F7/70341
摘要： A support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.
摘要翻译： 支撑台，其被配置为支撑基板，所述支撑台具有支撑部分以支撑基板和调节系统以向所述支撑部分提供热能和/或从所述支撑部分移除热能，其中所述调节系统包括多个调节单元 这是独立可控的。
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公开(公告)号：US20110232878A1
公开(公告)日：2011-09-29
申请号：US12891354
申请日：2010-09-27
申请人： Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Joost Jeroen Ottens , Hrishikesh Patel , Gerrit Van Donk , Johannes Van Es
发明人： Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Joost Jeroen Ottens , Hrishikesh Patel , Gerrit Van Donk , Johannes Van Es
IPC分类号： F28D15/04
CPC分类号： F28D15/04 , G03F7/70341 , G03F7/70875
摘要： A heat pipe to maintain an object at a substantially uniform temperature is disclosed. The heat pipe includes a chamber containing a liquid reservoir and a vapor space, part of the chamber being defined by a condensing surface, and a liquid transporter to apply a force additional to gravity to liquid to transport liquid away from the condensing surface towards the reservoir, wherein the condensing surface is shaped such that condensed liquid moves along it towards the liquid transporter.
摘要翻译： 公开了一种用于将物体保持在基本上均匀的温度的热管。 热管包括容纳液体储存器和蒸气空间的腔室，腔室的一部分由冷凝表面限定，以及液体输送器，其将重力附加到液体以将液体从冷凝表面朝向储存器运送 ，其中所述冷凝表面成形为使得冷凝的液体沿着所述冷凝表面朝向所述液体运输器移动。
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公开(公告)号：US09052612B2
公开(公告)日：2015-06-09
申请号：US12466119
申请日：2009-05-14
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens
CPC分类号： G03F7/70691 , G03B27/53 , G03F1/66 , G03F7/707 , G03F7/70716 , G03F7/70733 , G03F7/708
摘要： A support structure for supporting an exchangeable object in a lithographic exposure apparatus includes a first support structure part and a second support structure part, the first support structure part being arranged to support the object, and the second support structure part being arranged to, at least in part, support the first support structure part. At least one of the first support structure part and the second support structure part has an open-box structure. The first support structure part and the second support structure part are configured to be attached to one another in such a way that the first support structure part and the second support structure together form a closed-box structure.
摘要翻译： 用于在光刻曝光设备中支撑可交换物体的支撑结构包括第一支撑结构部分和第二支撑结构部分，第一支撑结构部分被布置成支撑物体，第二支撑结构部分至少布置成 部分地支撑第一支撑结构部分。 第一支撑结构部分和第二支撑结构部分中的至少一个具有开放式框架结构。 第一支撑结构部分和第二支撑结构部分被构造成彼此附接，使得第一支撑结构部分和第二支撑结构一起形成闭合箱结构。
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公开(公告)号：US09013682B2
公开(公告)日：2015-04-21
申请号：US12451749
申请日：2008-06-20
申请人： Rene Theodorus Petrus Compen , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Martin Frans Pierre Smeets
发明人： Rene Theodorus Petrus Compen , Johannes Henricus Wilhelmus Jacobs , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens , Martin Frans Pierre Smeets
IPC分类号： G03F7/20 , H01L21/683 , H01L21/687
CPC分类号： G03F7/70783 , G03F7/707 , H01L21/6838 , H01L21/68742 , H01L21/6875
摘要： The present invention relates to a clamping device configured to clamp an object (20, 120) on a support (1, 101). The clamping device comprises: a first device configured to force the object and the support away from each other using a first force, and a second device configured to force the object and the support towards each other using a second force. The first device and second device are configured to simultaneously exert the first force and the second force respectively to shape the object to a desired shape before completing the clamping of the object on the support.
摘要翻译： 夹紧装置技术领域本发明涉及一种构造成将物体（20,120）夹持在支撑件（1,101）上的夹持装置。 夹紧装置包括：第一装置，其被配置为使用第一力将物体和支撑件彼此远离;以及第二装置，其被配置为使用第二力将物体和支撑件朝向彼此强制。 第一装置和第二装置构造成在完成将物体夹持在支撑件上之前分别同时施加第一力和第二力以将物体成形为期望的形状。
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公开(公告)号：US08988651B2
公开(公告)日：2015-03-24
申请号：US13242125
申请日：2011-09-23
申请人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
发明人： Marcel Beckers , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Ferdy Migchelbrink , Elmar Evers
CPC分类号： G03F7/70716 , G03F7/70341 , G03F7/70808
摘要： A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.
摘要翻译： 用于浸没式光刻设备的液体供应系统在投影系统的最终元件和基底之间提供浸液的层流。 控制系统使溢出的机会最小化，并且提取器包括被配置为使振动最小化的出口阵列。
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公开(公告)号：US08902404B2
公开(公告)日：2014-12-02
申请号：US13198379
申请日：2011-08-04
申请人： Marco Koert Stavenga , Martinus Cornelis Maria Verhagen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen
发明人： Marco Koert Stavenga , Martinus Cornelis Maria Verhagen , Johannes Henricus Wilhelmus Jacobs , Hans Jansen
CPC分类号： G03F7/70341 , G03F7/709
摘要： Various types of pressure regulating devices are disclosed to reduce a pressure gradient in a liquid supply system of a lithographic apparatus, the liquid supply system having a liquid confinement structure configured to at least partially confine a liquid between a projection system and a substrate table of the lithographic apparatus. A high pressure gradient may cause particulate contamination in the liquid supply system and/or liquid confinement structure. A pressure gradient can be reduced by, for example, the use of slow switching in one or more valves, a bleed flow around or through one or more valves, diversion of liquid to a drain rather than or in addition to switching a valve off, a pressure regulator or flow restrictor to prevent shock waves, and a buffer volume/damper to compensate for pressure fluctuation.
摘要翻译： 公开了各种类型的压力调节装置，以减少光刻设备的液体供应系统中的压力梯度，液体供应系统具有液体限制结构，其被配置为至少部分地限制液体在投影系统和基板台之间的液体 光刻设备 高压梯度可能导致液体供应系统和/或液体限制结构中的颗粒污染。 压力梯度可以通过例如在一个或多个阀门中使用缓慢的切换，绕过或通过一个或多个阀门的泄放流量来减少，而不是或者除了切换阀门之外将液体转移到排水管， 用于防止冲击波的压力调节器或限流器，以及用于补偿压力波动的缓冲体积/阻尼器。
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