公开(公告)号：US5132604A

公开(公告)日：1992-07-21

申请号：US498050

申请日：1990-03-22

申请人： Iwao Shimane ,  Yoshio Kojima ,  Toshio Yokoyama ,  Sadao Shinohara

发明人： Iwao Shimane ,  Yoshio Kojima ,  Toshio Yokoyama ,  Sadao Shinohara

IPC分类号： F02N11/04

CPC分类号： F02N11/04 ,  F02N15/046

摘要： An engine starter and electric generator system transmits rotative power to a crankshaft to start an engine and generates electric power based on rotative power from the crankshaft after the engine has started. The engine starter and electric generator system includes a starter/generator operable selectively as a starter motor to produce the rotative power and a generator for generating the electric power, and an electric power supply device for supplying electric power to the starter motor. A power transmitting mechanism operatively interconnects the crankshaft and the starter/generator, for bidirectionally transmitting the rotative power between the crankshaft and the starter/generator. A transmission mechanism is disposed in the power transmitting mechanism, for changing the speed of rotation transmitted between the crankshaft and the starter/generator. The system also has a control device for controlling operation of the starter/generator and establishing different speed-reduction ratios for the transmission mechanism when the starter/generator operates as the generator and when the starter/generator operates as the starter motor.

公开(公告)号：US5029067A

公开(公告)日：1991-07-02

申请号：US269834

申请日：1988-11-22

申请人： Kimio Nishida ,  Toshio Yokoyama ,  Yukio Moriya ,  Takeshi Kobayashi

发明人： Kimio Nishida ,  Toshio Yokoyama ,  Yukio Moriya ,  Takeshi Kobayashi

IPC分类号： E02F9/20 ,  E02F9/22 ,  F15B11/16 ,  F15B11/17 ,  F15B21/08 ,  G05B19/40

CPC分类号： E02F9/2242 ,  E02F9/2004 ,  E02F9/2235 ,  E02F9/2292 ,  E02F9/2296 ,  F15B11/165 ,  F15B11/17 ,  F15B21/087 ,  G05B19/40 ,  F15B2211/20553 ,  F15B2211/20576 ,  F15B2211/30505 ,  F15B2211/327 ,  F15B2211/40507 ,  F15B2211/41572 ,  F15B2211/426 ,  F15B2211/428 ,  F15B2211/45 ,  F15B2211/50563 ,  F15B2211/5159 ,  F15B2211/528 ,  F15B2211/6323 ,  F15B2211/6326 ,  F15B2211/633 ,  F15B2211/6333 ,  F15B2211/6346 ,  F15B2211/6652 ,  F15B2211/7135 ,  G05B2219/35438 ,  G05B2219/41309 ,  G05B2219/45012

摘要： An operation control device is disclosed. According to a drive command value generated depending on the manipulated amount of a plurality of operating means (11, 12, 13, 14, 15, 16), the operation control device controls the drive amount of actuators (BMS, AMS, BKS, LDM, RDM, TNM) associated with the operated actuator. In the drive amount control, the operation control device changes a ratio of the manipulated amount and the drive amount command value by work accuracy flow rate data (41), weights the drive command values based on the same manipulated values of said operating means by priority mode weight data (42), and/or controls the timing of supply of the drive energy from at least two separate energy sources (FFP, RP) as a drive energy source for the respective actuators, and the supply amount of the drive energy, under control of pump utilization data (43) and pump swash plate control data (44). Every time the operating means are operated, these pieces of the control data are properly determined through proper operations (including the look-up table processing) according to the operations of the operating means, the selections of the work accuracy mode select switch (21) and the priority mode select switch (22).

公开(公告)号：US4810967A

公开(公告)日：1989-03-07

申请号：US27833

申请日：1987-03-19

申请人： Toshio Yokoyama ,  Iwao Shimane ,  Tsuneo Konno

发明人： Toshio Yokoyama ,  Iwao Shimane ,  Tsuneo Konno

IPC分类号： F02D41/34 ,  F02P7/067 ,  G01D5/249 ,  H03M1/06 ,  H03M1/24 ,  H03M1/26 ,  G01B7/30

CPC分类号： G01D5/2497 ,  F02D41/009 ,  F02P7/067 ,  H03M1/245

摘要： A light, compact angle-of-rotation sensor is provided that is comprised of a magnetic ring bonded to a shaft by means of resin. The magnetic ring is provided around its periphery with a number of magnetized zones, with each such magnetized zone having a different number of magnetic poles, and magnetic interference between magnetized zones is prevented by leaving non-magnetized spaces between the magnetized zones. The prevention of magnetic interference can be further enhanced by the provision of non-magnetized portions between the magnetic poles of the magnetized zones.

摘要翻译： 提供了一种轻巧，紧凑的旋转旋转传感器，其包括通过树脂粘合到轴上的磁环。 磁环围绕其周边设置有多个磁化区域，每个这样的磁化区域具有不同数量的磁极，并且通过在磁化区域之间留下非磁化空间来防止磁化区域之间的磁干扰。 通过在磁化区的磁极之间设置非磁化部分，能够进一步提高防止磁干扰。

公开(公告)号：US20110203518A1

公开(公告)日：2011-08-25

申请号：US13100484

申请日：2011-05-04

申请人： Seiji KATSUOKA ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

发明人： Seiji KATSUOKA ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

IPC分类号： B05C11/00

CPC分类号： H01L21/68721 ,  C23C18/163 ,  C23C18/1632 ,  C23C18/1886 ,  C25D7/123 ,  C25D17/001 ,  H01L21/67126 ,  H01L21/67766 ,  Y10S134/901

摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

摘要翻译： 基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。 基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。 在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

公开(公告)号：US20100221432A1

公开(公告)日：2010-09-02

申请号：US12771176

申请日：2010-04-30

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima

IPC分类号： B05D3/10

CPC分类号： H01L21/68721 ,  C23C18/163 ,  C23C18/1632 ,  C23C18/1886 ,  C25D7/123 ,  C25D17/001 ,  H01L21/67126 ,  H01L21/67766 ,  Y10S134/901

摘要： A substrate processing method and apparatus can securely carry out a pre-plating treatment that enables uniform plating in the necessary area of the surface of a substrate. The substrate processing method carries out a cleaning treatment and a catalyst-imparting treatment of a surface of a substrate as pre-plating treatments and then electroless plates a metal film on the catalyst-imparted surface of the substrate. The cleaning treatment is carried out in a wider area of the surface of the substrate than that area to which a catalyst is imparted by the catalyst-imparting treatment.

摘要翻译： 基板处理方法和装置可以可靠地执行能够在基板的表面的必要区域中均匀镀覆的预镀处理。 基板处理方法对作为预镀处理的基板的表面进行清洗处理和催化剂赋予处理，然后在基板的赋予催化剂的表面上化学镀金属膜。 在通过催化剂赋予处理赋予催化剂的区域的基板的表面的更宽的区域中进行清洗处理。

公开(公告)号：US20090092469A1

公开(公告)日：2009-04-09

申请号：US11996432

申请日：2006-08-25

申请人： Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Ryo Kato

发明人： Masahiko Sekimoto ,  Toshio Yokoyama ,  Teruyuki Watanabe ,  Kenichi Suzuki ,  Kenichi Kobayashi ,  Ryo Kato

IPC分类号： H01L21/677 ,  B08B7/00 ,  C25D17/06

CPC分类号： H01L21/68707 ,  H01L21/6723 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/68728

摘要： To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit 10 includes a substrate holding mechanism 10 for holding the substrate 11 in a specified holding position, and a processing mechanism 32 for applying a specified process to the substrate held with the substrate holding mechanism in which a substrate guide mechanism 20 is provided with a guide pin 15 for guiding the substrate to vicinity of a holding position. The substrate holding mechanism has a plural number of rollers 14 on an outer periphery of the holding position of the substrate, with the plural number of rollers adapted to hold the substrate by supporting the periphery of the substrate from sides thereof in the vicinity of the holding position, and the roller has an integral structure made up of a large diameter portion and a small diameter portion formed above the large diameter portion, with an upper portion of the large diameter portion having a shoulder portion for the substrate in transfer to be temporarily placed on, and with the shoulder portion formed with a sloped surface sloping down toward its periphery.

摘要翻译： 为了提供一种基板处理单元，基板转印方法，基板清洁处理单元和基板电镀设备，其使得诸如机器人臂之类的基板输入机构可以在携带该基板处理单元之后快速地释放保持在基板上 以缩短保持基板的时间并提高生产量。 基板处理单元10包括用于将基板11保持在指定的保持位置的基板保持机构10和用于对被设置有基板引导机构20的基板保持机构保持的基板进行规定处理的处理机构32 具有用于将基板引导到保持位置附近的引导销15。 基板保持机构在基板的保持位置的外周具有多个辊14，多个辊适于通过从保持基板附近的侧面支撑基板的周边来保持基板 并且所述辊具有由形成在所述大直径部分上方的大直径部分和小直径部分构成的整体结构，所述大直径部分的上部具有用于传送的基板的肩部临时放置 并且肩部形成有朝向其周边倾斜的倾斜表面。

公开(公告)号：US07466337B2

公开(公告)日：2008-12-16

申请号：US10170231

申请日：2002-06-13

申请人： Hiroshi Sawada ,  Hajime Katou ,  Seiya Haga ,  Toshio Yokoyama

发明人： Hiroshi Sawada ,  Hajime Katou ,  Seiya Haga ,  Toshio Yokoyama

IPC分类号： H04N7/18

CPC分类号： H04N7/183 ,  E02F9/0858 ,  E02F9/261

摘要： A construction machine comprises a lower traveling body and an upper revolving body rotatably attached to the lower traveling body via a revolving mechanism 2, wherein a rear surveillance camera is arranged on a back surface side of the upper revolving body between a counter weight of the upper revolving body and a swing circle of the revolving mechanism, and right and left crawler end portions of the lower traveling body 1 can be simultaneously visually checked by means of the rear surveillance camera.

摘要翻译： 一种施工机械，包括下行进体和经由旋转机构2可旋转地安装在下行走体上的上旋转体，其中后监视摄像机设置在上旋转体的背面侧， 旋转体的旋转体和摆动圆环，并且可以通过后部监视摄像机同时目视检查下行进体1的左右履带端部。

公开(公告)号：US07368016B2

公开(公告)日：2008-05-06

申请号：US11115214

申请日：2005-04-27

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Ryo Kato ,  Toshio Yokoyama ,  Kenichi Suzuki ,  Kenichi Kobayashi

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Ryo Kato ,  Toshio Yokoyama ,  Kenichi Suzuki ,  Kenichi Kobayashi

IPC分类号： B05B15/04 ,  B05B7/06 ,  B05C3/00 ,  B05C13/02 ,  B08B3/00 ,  B08B3/02

CPC分类号： H01L21/288 ,  C23C2/003 ,  C23C18/1619 ,  C23C18/163 ,  C23C18/1642 ,  H01L21/6708 ,  H01L21/67742 ,  H01L21/6838 ,  H01L21/76849

摘要： A substrate processing unit includes: a vertically-movable substrate holder for holding a substrate; a pan surrounding a periphery of the substrate holder; a cell, located below the substrate holder and within the pan, having in its interior a chemical processing section; and a cell cover, capable of closing a top opening of the cell, having a plurality of spray nozzles for separately spraying at least two types of processing liquids, wherein the pan and the cell each have an individual liquid discharge line.

摘要翻译： 基板处理单元包括：用于保持基板的可垂直移动的基板保持器; 围绕衬底保持器的周边的平底锅; 位于基板保持器下方并在锅内的电池，在其内部具有化学处理部分; 以及能够封闭电池的顶部开口的电池盖，具有用于分别喷射至少两种类型的处理液体的多个喷嘴，其中锅和电池单元各自具有单独的液体排出管线。

公开(公告)号：US20050158478A1

公开(公告)日：2005-07-21

申请号：US10514030

申请日：2003-05-30

申请人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima ,  Toshio Yokoyama

发明人： Seiji Katsuoka ,  Masahiko Sekimoto ,  Teruyuki Watanabe ,  Takahiro Ogawa ,  Kenichi Kobayashi ,  Mitsuru Miyazaki ,  Yasuyuki Motojima ,  Toshio Yokoyama

IPC分类号： C23C18/16 ,  C25D7/12 ,  C25D17/00 ,  C25D17/02 ,  H01L21/00 ,  B05D1/18 ,  B05C3/00

CPC分类号： H01L21/67051 ,  C23C18/1619 ,  C25D7/123 ,  C25D17/001 ,  C25D17/02

摘要： A substrate processing apparatus has a processing tank (10) for plating a substrate (W) in a plating solution (Q) holds therein, a cover (40) for selectively opening and closing an opening (11) of the processing tank (10), a spraying nozzle (60) mounted on an upper surface of the cover (40), and a substrate head (80) for attracting a reverse side of the substrate (W) to hold the substrate (W). With the cover (40) removed from the opening (11) of the processing tank (10), the substrate head (80) is lowered to dip the substrate (W) in the plating solution (Q) for thereby plating the substrate (W). When the substrate head (80) is lifted and the opening (11) of the processing tank (10) is closed by the cover (40), the substrate (W) is cleaned by the spraying nozzle (60).

摘要翻译： 基板处理装置具有用于对电镀液（Q）中保持的基板（W）进行电镀的处理槽（10），用于选择性地打开和关闭处理槽（10）的开口（11）的盖（40） ，安装在所述盖（40）的上表面上的喷嘴（60），以及用于吸引所述基板（W）的背面以保持所述基板（W）的基板头（80）。 在从处理槽（10）的开口（11）移除盖（40）的同时，将基板头（80）下降以将基板（W）浸入电镀液（Q）中，从而对基板（W ）。 当基板头（80）抬起并且处理槽（10）的开口（11）被盖（40）封闭时，基板（W）被喷嘴（60）清洁。

公开(公告)号：US6071943A

公开(公告)日：2000-06-06

申请号：US200750

申请日：1998-11-30

申请人： Noriaki Shioiri ,  Tadashi Mikami ,  Shinichi Morimoto ,  Kazuo Yamazaki ,  Hiroyuki Naito ,  Junji Okawa ,  Noriyuki Kawamoto ,  Hiroshi Hasegawa ,  Koichi Tachibana ,  Susumu Sato ,  Toshio Yokoyama

发明人： Noriaki Shioiri ,  Tadashi Mikami ,  Shinichi Morimoto ,  Kazuo Yamazaki ,  Hiroyuki Naito ,  Junji Okawa ,  Noriyuki Kawamoto ,  Hiroshi Hasegawa ,  Koichi Tachibana ,  Susumu Sato ,  Toshio Yokoyama

IPC分类号： C07D233/54 ,  C07D233/64 ,  C07D233/70 ,  C07D405/12 ,  A01N43/50

CPC分类号： C07D233/64 ,  C07D405/12

摘要： Disclosed herein are an imidazole derivative represented by the following general formula (1): ##STR1## wherein R.sup.1 is a hydrogen atom, or an alkyl, alkoxy or alkoxycarbonyl group, and R.sup.2, R.sup.3 and R.sup.4 are the same or different from one another and are independently a hydrogen or halogen atom, an alkyl, halogenoalkyl, hydroxyl or alkoxy group, or the like, or a salt thereof, and a medicine comprising such a compound. The compound specifically suppresses the production of particular cytokine and is hence useful as an active ingredient for immune function modulators and the like.

摘要翻译： 本文公开了由以下通式（1）表示的咪唑衍生物：其中R1是氢原子或烷基，烷氧基或烷氧基羰基，R2，R3和R4彼此相同或不同，独立地为 氢或卤素原子，烷基，卤代烷基，羟基或烷氧基等，或其盐，以及包含这种化合物的药物。 该化合物特别抑制特定细胞因子的产生，因此可用作免疫功能调节剂等的活性成分。