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    Estimating and eliminating inter-cell process variation inaccuracy
    23.
    发明授权
    Estimating and eliminating inter-cell process variation inaccuracy 有权

    公开(公告)号：US10415963B2

    公开(公告)日：2019-09-17

    申请号：US14727038

    申请日：2015-06-01

    Applicant: KLA-Tencor Corporation

    Inventor： Tal Marciano ,  Eran Amit ,  Barak Bringoltz ,  Nuriel Amir ,  Amit Shaked

    IPC: G06F17/50 ,  G01B11/27

    Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.

    METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINATE INACCURACY IN OVERLAY OPTICAL METROLOGY
    26.
    发明申请
    METHODS OF ANALYZING AND UTILIZING LANDSCAPES TO REDUCE OR ELIMINATE INACCURACY IN OVERLAY OPTICAL METROLOGY 审中-公开
    分析和利用景观以减少或消除在重叠光学计量学中不精确的方法

    公开(公告)号：US20160313658A1

    公开(公告)日：2016-10-27

    申请号：US15198902

    申请日：2016-06-30

    Applicant: KLA-TENCOR CORPORATION

    Inventor： Tal Marciano ,  Barak Bringoltz ,  Evgeni Gurevich ,  Ido Adam ,  Ze'ev Lindenfeld ,  Zeng Zhao ,  Yoel Feler ,  Daniel Kandel ,  Nadav Carmel ,  Amnon Manassen ,  Nuriel Amir ,  Oded Kaminsky ,  Tal Yaziv ,  Ofer Zaharan ,  Moshe Cooper ,  Roee Sulimarski ,  Tom Leviant ,  Noga Sella ,  Boris Efraty ,  Lilach Saltoun ,  Amir Handelman ,  Eltsafon Ashwal ,  Ohad Bachar

    IPC: G03F9/00

    Abstract: Methods are provided for deriving a partially continuous dependency of metrology metric(s) on recipe parameter(s), analyzing the derived dependency, determining a metrology recipe according to the analysis, and conducting metrology measurement(s) according to the determined recipe. The dependency may be analyzed in form of a landscape such as a sensitivity landscape in which regions of low sensitivity and/or points or contours of low or zero inaccuracy are detected, analytically, numerically or experimentally, and used to configure parameters of measurement, hardware and targets to achieve high measurement accuracy. Process variation is analyzed in terms of its effects on the sensitivity landscape, and these effects are used to characterize the process variation further, to optimize the measurements and make the metrology both more robust to inaccuracy sources and more flexible with respect to different targets on the wafer and available measurement conditions.

    Abstract translation: 提供了用于导出计量度量对配方参数的部分连续依赖性的方法，分析衍生依赖性，根据分析确定计量配方，并根据确定的配方进行计量测量。 依赖性可以以景观的形式进行分析，例如灵敏度景观，其中检测到低分辨率或零误差的低灵敏度和/或点或等值线的区域，分析，数字或实验，并用于配置测量参数，硬件 并达到高测量精度。 根据其对灵敏度景观的影响分析过程变化，并且这些效应用于进一步表征过程变化，优化测量结果，使计量学对于不准确性来源更加鲁棒，并且对于不同的目标更灵活 晶圆和可用的测量条件。

    REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY
    27.
    发明申请
    REDUCING ALGORITHMIC INACCURACY IN SCATTEROMETRY OVERLAY METROLOGY 有权
    降低算术计算中的算术不准确度

    公开(公告)号：US20150233705A1

    公开(公告)日：2015-08-20

    申请号：US14184295

    申请日：2014-02-19

    Applicant: KLA-Tencor Corporation

    Inventor： Barak Bringoltz ,  Mark Ghinovker ,  Daniel Kandel ,  Vladimir Levinski ,  Zeev Bomzon

    IPC: G01B11/14 ,  G01B11/24

    CPC classification number: G01B11/14 ,  G01B11/2441 ,  G03F7/70633

    Abstract: Methods and systems for minimizing of algorithmic inaccuracy in scatterometry overlay (SCOL) metrology are provided. SCOL targets are designed to limit the number of oscillation frequencies in a functional dependency of a resulting SCOL signal on the offset and to reduce the effect of higher mode oscillation frequencies. The targets are segmented in a way that prevents constructive interference of high modes with significant amplitudes, and thus avoids the inaccuracy introduced by such terms into the SCOL signal. Computational methods remove residual errors in a semi-empirical iterative process of compensating for the residual errors algorithmically or through changes in target design.

    Abstract translation: 提供了用于最小化散点映射覆盖（SCOL）计量学中算法不准确性的方法和系统。 SCOL目标被设计为将所得到的SCOL信号的功能依赖性的振荡频率的数量限制在偏移上并且降低更高模式振荡频率的影响。 目标被分段，以防止具有显着幅度的高模式的建构性干扰，从而避免了由这些术语引入到SCOL信号中的不准确性。 计算方法在半经验迭代过程中，通过算法或通过目标设计的变化来补偿残差，从而消除残差。

    REFLECTION SYMMETRIC SCATTEROMETRY OVERLAY TARGETS AND METHODS
    28.
    发明申请
    REFLECTION SYMMETRIC SCATTEROMETRY OVERLAY TARGETS AND METHODS 审中-公开
    反射对称散射目标和方法

    公开(公告)号：US20150219449A1

    公开(公告)日：2015-08-06

    申请号：US14687074

    申请日：2015-04-15

    Applicant: KLA-Tencor Corporation

    Inventor： Barak Bringoltz ,  Daniel Kandel

    IPC: G01B11/27

    CPC classification number: G01B11/272 ,  G03F7/70633

    Abstract: A method for target measurement is provided which comprises designing a reflection-symmetric target and measuring overlays of the target along at least one reflection symmetry direction of the target. Also, a tool calibration method comprising calibrating a scatterometry measurement tool with respect to a reflection symmetry of a reflection symmetric target. Further provided are methods of measuring scatterometry overlay using first order and zeroth order scatterometry measurements of a reflection-symmetric scatterometry targets. Also, a scatterometry target comprising a reflection-symmetric target having two cells in each of at least two measurement directions, wherein respective cells have different offsets along one measurement direction and similar offsets along other measurement directions. Further, a scatterometry measurement system comprising a reflection symmetric illumination and calibrated to measure reflection symmetric targets. Also, metrology tool comprising an illumination path and a collection path of the tool which are symmetric to reflection symmetries of a target.

    Abstract translation: 提供了一种用于目标测量的方法，其包括设计反射对称目标并沿目标的至少一个反射对称方向测量目标的覆盖层。 此外，工具校准方法包括相对于反射对称目标的反射对称性来校准散射测量测量工具。 还提供了使用反射对称散射测量目标的一阶和零级散射测量来测量散射测绘覆盖的方法。 此外，散射测量目标包括在至少两个测量方向中的每一个中具有两个单元的反射对称目标，其中各个单元沿着一个测量方向具有不同的偏移并且沿着其它测量方向具有相似的偏移。 此外，散射测量系统包括反射对称照明并被校准以测量反射对称目标。 此外，计量工具包括与目标的反射对称性对称的工具的照明路径和收集路径。

    Apodization for Pupil Imaging Scatterometry
    29.
    发明申请
    Apodization for Pupil Imaging Scatterometry 有权
    瞳孔影像散斑测量法

    公开(公告)号：US20140146322A1

    公开(公告)日：2014-05-29

    申请号：US13936529

    申请日：2013-07-08

    Applicant: KLA-Tencor Corporation

    Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

    IPC: G01N21/47 ,  G01N21/55

    CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

    Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

    Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

    PHASE CHARACTERIZATION OF TARGETS
    30.
    发明申请
    PHASE CHARACTERIZATION OF TARGETS 有权
    目标相位特征

    公开(公告)号：US20140111791A1

    公开(公告)日：2014-04-24

    申请号：US14057827

    申请日：2013-10-18

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Ohad Bachar ,  Daria Negri ,  Boris Golovanevsky ,  Barak Bringoltz ,  Daniel Kandel ,  Yoel Feler ,  Noam Sapiens ,  Paykin Irina ,  Alexander Svizher ,  Meir Aloni ,  Guy Ben Dov ,  Hadar Shalmoni ,  Vladimir Levinski

    IPC: G01B9/02

    CPC classification number: G01B9/0209 ,  G01B9/02027 ,  G01B9/02043 ,  G01B9/02087 ,  G01N21/45

    Abstract: Systems and methods are provided which derive target characteristics from interferometry images taken at multiple phase differences between target beams and reference beams yielding the interferometry images. The illumination of the target and the reference has a coherence length of less than 30 microns to enable scanning the phase through the coherence length of the illumination. The interferometry images are taken at the pupil plane and/or in the field plane to combine angular and spectroscopic scatterometry data that characterize and correct target topography and enhance the performance of metrology systems.

    Abstract translation: 提供了系统和方法，其从在目标光束和参考光束之间的多个相位差处拍摄的产生干涉测量图像的干涉测量图像中导出目标特征。 目标和参考物的照明具有小于30微米的相干长度，以使得能够通过照明的相干长度扫描相位。 在瞳孔平面和/或场平面中拍摄干涉测量图像，以组合表征和校正目标地形的角度和光谱散射数据，并增强计量系统的性能。

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