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公开(公告)号：US20100129526A1
公开(公告)日：2010-05-27
申请号：US12698876
申请日：2010-02-02
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： B05D5/12
CPC分类号： H01L21/67034 , G03F7/38 , H01L21/67028 , H01L21/67051 , H01L21/67178 , H01L21/67207
摘要： A method of processing a substrate in a substrate processing apparatus that is arranged adjacent to an exposure device and includes first, second and third processing units, includes the steps of forming a film made of a photosensitive material on the substrate by said first processing unit before exposure processing by said exposure device. The method also includes applying drying processing to the substrate by said second processing unit after the exposure processing by said exposure device and applying development processing to the substrate by said third processing unit after the drying processing by said second processing unit
摘要翻译： 一种在与曝光装置相邻并且包括第一，第二和第三处理单元的基板处理装置中处理基板的方法，包括以下步骤：在所述基板上由所述第一处理单元形成由感光材料制成的膜， 曝光装置的曝光处理。 该方法还包括在所述曝光装置的曝光处理之后通过所述第二处理单元对所述基板进行干燥处理，并且在所述第二处理单元进行干燥处理之后，通过所述第三处理单元对所述基板施加显影处理
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公开(公告)号：US07604424B2
公开(公告)日：2009-10-20
申请号：US11472780
申请日：2006-06-22
申请人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
发明人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
CPC分类号： H01L21/02087 , G03F7/00 , G03F7/162 , G03F7/168 , G03F7/2041 , H01L21/67034 , H01L21/67051 , H01L21/6708 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.
摘要翻译： 基板处理装置包括分度器块，边缘清洁处理块，防反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块， 清洁/干燥处理块和接口块。 曝光装置被布置成与基板处理装置的界面块相邻。 在曝光装置中，通过液浸法对基板进行曝光处理。 在边缘清洁处理块中的边缘清洁处理组中，清洁曝光处理之前的基板的边缘。
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公开(公告)号：US07497633B2
公开(公告)日：2009-03-03
申请号：US11273440
申请日：2005-11-10
申请人： Koji Kaneyama , Shuji Shibata , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Shuji Shibata , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
CPC分类号： H01L21/67051 , G03F7/70341 , G03F7/70991 , H01L21/67028 , H01L21/67034 , Y10S414/135
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a drying/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying/development processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is cleaned and dried by the drying processing group.
摘要翻译： 基板处理装置包括分度器块，防反射膜处理块，抗蚀剂膜处理块，干燥/显影处理块和界面块。 曝光装置设置在接口块附近。 干燥/显影处理块包括干燥处理组。 接口块包括接口传送机制。 基板经曝光装置进行曝光处理，随后通过界面输送机构输送到干燥处理组。 通过干燥处理组对基材进行清洗干燥。
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公开(公告)号：US20070172234A1
公开(公告)日：2007-07-26
申请号：US11626593
申请日：2007-01-24
IPC分类号： G03D5/00
CPC分类号： G03D3/00 , H01L21/67028 , H01L21/67225
摘要： A stage cleaning substrate for use in the operation of cleaning a substrate stage within an exposure unit compatible with immersion exposure and a dummy substrate for use during the adjustment of an exposure position of a pattern image are held in a cleaning substrate housing part and a dummy substrate housing part, respectively, provided in a substrate processing apparatus. For the operation of cleaning the substrate stage or an alignment operation within the exposure unit, the stage cleaning substrate or the dummy substrate is transported from the substrate processing apparatus to the exposure unit. The process of cleaning the stage cleaning substrate or the dummy substrate is performed in a cleaning processing unit of the substrate processing apparatus immediately before or immediately after the operation of cleaning the substrate stage or the alignment operation.
摘要翻译： 用于在与浸没曝光相容的曝光单元内的基板台的清洗操作中使用的平台清洁基板和在调整图案图像的曝光位置期间使用的虚设基板被保持在清洁基板收纳部分和虚拟 基板壳体部分，分别设置在基板处理装置中。 为了清洁基板台或曝光单元内的对准操作，将台架清洁基板或虚设基板从基板处理装置输送到曝光单元。 在清洗基板台或对准操作之前或之后，在基板处理装置的清洗处理单元中执行清洁载物台清洁基板或虚设基板的过程。
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公开(公告)号：US20070147831A1
公开(公告)日：2007-06-28
申请号：US11615404
申请日：2006-12-22
IPC分类号： G03D5/00
CPC分类号： H01L21/67028 , G03F7/70341 , G03F7/70925 , G03F7/70991 , H01L21/67051 , H01L21/67225
摘要： A substrate processing apparatus for performing an exposure process by printing a pattern on a substrate coated with a photosensitive material includes an exposure part for performing an immersion exposure process, a cleaning part and a transport mechanism which are provided within an exposure chamber. After the exposure part performs the immersion exposure process on the substrate, the substrate is transported to the cleaning part and is cleaned therein. If the liquid used during the immersion exposure process remains on the substrate after the exposure process, the substrate is cleaned in the cleaning part immediately after the exposure process. This prevents the remaining liquid from adhering to and contaminating mechanisms within the substrate processing apparatus. Also, the cleaning part is able to clean a dummy substrate for use in an alignment process in the exposure part.
摘要翻译： 用于通过在涂覆有感光材料的基板上印刷图案来进行曝光处理的基板处理装置包括设置在曝光室内的用于进行浸没曝光处理的曝光部分，清洁部分和传送机构。 在曝光部分对基板进行浸渍曝光处理之后，将基板输送到清洁部件并将其清洁。 如果在浸渍曝光过程中使用的液体在曝光处理之后保留在基板上，则在曝光处理之后立即在清洁部分中清洁基板。 这防止了剩余的液体粘附到衬底处理设备内的污染机构。 此外，清洁部件能够清洁用于曝光部分中的对准处理的虚拟基板。
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公开(公告)号：US20070071439A1
公开(公告)日：2007-03-29
申请号：US11534293
申请日：2006-09-22
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , H01L21/67051 , H01L21/67173 , H01L21/67178
摘要： The transporting process from cleaning and drying processing of a substrate in a cleaning/drying processing unit in a cleaning/drying processing group to post-exposure bake (PEB) of the substrate in a thermal processing group for post-exposure bake in a cleaning/drying processing block is described below. First, after the substrate after exposure processing is subjected to the cleaning and drying processing in the cleaning/drying processing group, a sixth central robot takes out the substrate from the cleaning/drying processing group and carries that substrate into the thermal processing group for post-exposure bake in the cleaning/drying processing block.
摘要翻译： 在清洁/干燥处理组中的清洁/干燥处理单元中的基板的清洁和干燥处理到在热处理组中的曝光后烘烤（PEB）的后处理组中的曝光后烘烤处理的传送过程， 干燥处理块如下所述。 首先，在清洗/干燥处理组中对曝光处理后的基板进行清洗干燥处理后，第六中央机器人从清洗/干燥处理组中取出基板，将该基板搬送到热处理组中 - 在清洁/干燥处理块中进行曝光烘烤。
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公开(公告)号：US20060291855A1
公开(公告)日：2006-12-28
申请号：US11472780
申请日：2006-06-22
申请人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
发明人： Kazuhito Shigemori , Koji Kaneyama , Akiko Harumoto , Tadashi Miyagi , Masashi Kanaoka , Shuichi Yasuda
IPC分类号： G03D5/00
CPC分类号： H01L21/02087 , G03F7/00 , G03F7/162 , G03F7/168 , G03F7/2041 , H01L21/67034 , H01L21/67051 , H01L21/6708 , H01L21/67173 , H01L21/67178 , H01L21/67225 , H01L21/67742 , Y10S134/902
摘要： A substrate processing apparatus comprises an indexer block, an edge-cleaning processing block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, a cleaning/drying processing block and an interface block. An exposure device is arranged adjacent to the interface block of the substrate processing apparatus. In the exposure device, exposure processing is applied to a substrate by a liquid immersion method. In the edge-cleaning processing group in the edge-cleaning processing block, an edge of the substrate before exposure processing is cleaned.
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公开(公告)号：US20060147202A1
公开(公告)日：2006-07-06
申请号：US11295240
申请日：2005-12-06
申请人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
发明人： Shuichi Yasuda , Masashi Kanaoka , Koji Kaneyama , Tadashi Miyagi , Kazuhito Shigemori , Toru Asano , Yukio Toriyama , Takashi Taguchi , Tsuyoshi Mitsuhashi , Tsuyoshi Okumura
IPC分类号： G03D5/00
CPC分类号： G03F7/70991 , G03F7/70341
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a washing/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate by the resist film processing block. The substrate is washed and dried by the washing processing unit in the washing/development processing block before the substrate is subjected to the exposure processing by the exposure device.
摘要翻译： 基板处理装置包括分度器块，防反射膜处理块，抗蚀剂膜处理块，洗涤/显影处理块和界面块。 曝光装置设置在接口块附近。 通过抗蚀剂膜处理块在基板上形成抗蚀剂膜。 在通过曝光装置对基板进行曝光处理之前，通过洗涤处理单元在洗涤/显影处理块中洗涤和干燥基板。
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公开(公告)号：US20060108068A1
公开(公告)日：2006-05-25
申请号：US11273440
申请日：2005-11-10
申请人： Koji Kaneyama , Shuji Shibata , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
发明人： Koji Kaneyama , Shuji Shibata , Tsuyoshi Okumura , Shuichi Yasuda , Masashi Kanaoka , Tadashi Miyagi , Kazuhito Shigemori
IPC分类号： C23F1/00 , B08B7/00 , C23C16/00 , H01L21/677
CPC分类号： H01L21/67051 , G03F7/70341 , G03F7/70991 , H01L21/67028 , H01L21/67034 , Y10S414/135
摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a drying/development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The drying/development processing block comprises a drying processing group. The interface block comprises an interface transport mechanism. A substrate is subjected to exposure processing by the exposure device, and subsequently transported to the drying processing group by the interface transport mechanism. The substrate is cleaned and dried by the drying processing group.
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30.发明申请公开(公告)号：US20090071940A1
公开(公告)日：2009-03-19
申请号：US12208992
申请日：2008-09-11
CPC分类号： H01L21/67034 , B05C11/08 , B05C13/02 , B05D3/0406 , G03F7/3028 , H01L21/67028 , H01L21/67051 , Y10S134/902
摘要： After a development liquid on a substrate is washed away with a rinse liquid, the rotational speed of the substrate is reduced, so that a liquid layer of the rinse liquid is formed over a top surface of the substrate. Thereafter, the rotational speed of the substrate is increased. The increase in the rotational speed of the substrate causes a centrifugal force to be slightly greater than tension, thereby causing the liquid layer to be held on the substrate with the thickness thereof in its peripheral portion increased and the thickness thereof at the center thereof decreased. Then, gas is discharged toward the center of the liquid layer from a gas supply nozzle, so that a hole is formed at the center of the liquid layer. This causes tension that is balanced with a centrifugal force exerted on the peripheral portion of the liquid layer to disappear. Furthermore, the rotational speed of the substrate is further increased while the gas is discharged. Thus, the liquid layer moves outward from the substrate.
摘要翻译： 在用冲洗液冲洗衬底上的显影液后，减小基片的旋转速度，从而在衬底的顶表面上形成漂洗液体的液体层。 此后，基板的旋转速度增加。 基板的旋转速度的增加使离心力略大于张力，从而使液体层保持在基板的周边部分的厚度增加，其中心部的厚度减小。 然后，气体从气体供给喷嘴向液体中心排出，从而在液体层的中心形成有孔。 这导致张力被平衡，施加在液体层的周边部分上的离心力消失。 此外，在排出气体的同时，基板的旋转速度进一步提高。 因此，液体层从基板向外移动。
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