Silicon carbide semiconductor device and method of manufacturing the same
    21.
    发明授权
    Silicon carbide semiconductor device and method of manufacturing the same 有权
    碳化硅半导体器件及其制造方法

    公开(公告)号:US07855412B2

    公开(公告)日:2010-12-21

    申请号:US12453520

    申请日:2009-05-14

    IPC分类号: H01L27/108 H01L29/76

    摘要: An SiC semiconductor device includes a substrate, a drift layer disposed on a first surface of the substrate, a base region disposed above the drift layer, a source region disposed above the base region, a trench penetrating the source region and the base region to the drift layer, a gate insulating layer disposed on a surface of the trench, a gate electrode disposed on a surface of the gate insulating layer, a first electrode electrically coupled with the source region and the base region, a second electrode disposed on the second surface of the substrate, and a second conductivity-type layer disposed at a portion of the base region located under the source region. The second conductivity-type layer has the second conductivity type and has an impurity concentration higher than the base region.

    摘要翻译: SiC半导体器件包括衬底,设置在衬底的第一表面上的漂移层,设置在漂移层上方的基极区域,设置在基极区域上方的源极区域,穿透源极区域和基极区域的沟槽 漂移层,设置在沟槽表面上的栅极绝缘层,设置在栅极绝缘层的表面上的栅极电极,与源极区域和基极区域电耦合的第一电极,设置在第二表面上的第二电极 以及设置在位于源极区域下方的基极区域的一部分的第二导电型层。 第二导电型层具有第二导电类型并且具有高于基极区的杂质浓度。

    Mobile station, mobile communication system, and cell selection method
    22.
    发明授权
    Mobile station, mobile communication system, and cell selection method 有权
    移动台,移动通信系统和小区选择方法

    公开(公告)号:US07634272B2

    公开(公告)日:2009-12-15

    申请号:US10686609

    申请日:2003-10-17

    IPC分类号: H04W36/00

    CPC分类号: H04W36/04 H04W36/30

    摘要: In mobile communication system 100 according to the present invention, mobile station 1 is camped on cell C10 established by base station B10. In the cell C10, there exist indoor cells C11-C13 and outdoor cells C21, C22 as neighboring cells. Mobile station 1 measures received levels of cells C10-C13, C21, C22 and determines cell types of the respective cells, i.e., whether each cell is an indoor cell or not, based on broadcast information M1. Mobile station 1 selects a cell as a reselection target on the basis of the received levels and cell types.

    摘要翻译: 在根据本发明的移动通信系统100中,移动台1驻留在由基站B10建立的小区C10上。 在单元格C10中,存在室内单元C11-C13和室外单元C21,C22作为相邻单元。 移动站1基于广播信息M1来测量小区C10-C13,C21,C22的接收电平,并且确定各个小区的小区类型,即每个小区是否是室内小区。 移动站1基于所接收的等级和小区类型来选择小区作为重选目标。

    Silicon carbide semiconductor device and method of manufacturing the same
    23.
    发明申请
    Silicon carbide semiconductor device and method of manufacturing the same 有权
    碳化硅半导体器件及其制造方法

    公开(公告)号:US20090289264A1

    公开(公告)日:2009-11-26

    申请号:US12453520

    申请日:2009-05-14

    摘要: An SiC semiconductor device includes a substrate, a drift layer disposed on a first surface of the substrate, a base region disposed above the drift layer, a source region disposed above the base region, a trench penetrating the source region and the base region to the drift layer, a gate insulating layer disposed on a surface of the trench, a gate electrode disposed on a surface of the gate insulating layer, a first electrode electrically coupled with the source region and the base region, a second electrode disposed on the second surface of the substrate, and a second conductivity-type layer disposed at a portion of the base region located under the source region. The second conductivity-type layer has the second conductivity type and has an impurity concentration higher than the base region.

    摘要翻译: SiC半导体器件包括衬底,设置在衬底的第一表面上的漂移层,设置在漂移层上方的基极区域,设置在基极区域上方的源极区域,穿透源极区域和基极区域的沟槽 漂移层,设置在沟槽表面上的栅极绝缘层,设置在栅极绝缘层的表面上的栅极电极,与源极区域和基极区域电耦合的第一电极,设置在第二表面上的第二电极 以及设置在位于源极区域下方的基极区域的一部分的第二导电型层。 第二导电型层具有第二导电类型并且具有高于基极区的杂质浓度。

    Silicon carbide semiconductor device
    24.
    发明申请
    Silicon carbide semiconductor device 有权
    碳化硅半导体器件

    公开(公告)号:US20070281173A1

    公开(公告)日:2007-12-06

    申请号:US11882137

    申请日:2007-07-31

    IPC分类号: B32B9/04

    摘要: A silicon carbide semiconductor device includes: a semiconductor substrate having a principal surface and a backside surface; a drift layer disposed on the principal surface; a base region disposed on the drift layer; a source region disposed on the base region; a surface channel layer disposed on both of the drift layer and the base region for connecting between the source region and the drift layer; a gate insulation film disposed on the surface channel layer and including a high dielectric constant film; a gate electrode disposed on the gate insulation film; a source electrode disposed on the source region; and a backside electrode disposed on the backside surface.

    摘要翻译: 碳化硅半导体器件包括:具有主表面和背面的半导体衬底; 设置在主表面上的漂移层; 设置在漂移层上的基极区域; 设置在所述基底区域上的源极区域; 设置在所述漂移层和所述基极区域两者上的表面沟道层,用于在所述源极区域和所述漂移层之间连接; 栅极绝缘膜,设置在所述表面沟道层上并且包括高介电常数膜; 设置在所述栅极绝缘膜上的栅电极; 源电极,其设置在所述源极区域上; 以及设置在所述背面上的背面电极。

    Mobile communication system and method of estimating location of mobile station

    公开(公告)号:US07003325B2

    公开(公告)日:2006-02-21

    申请号:US10317058

    申请日:2002-12-12

    IPC分类号: H04Q7/20

    摘要: Signals received from mobile station by respective slave units each are attenuated by a combination of attenuation factors set for the respective slave units, the attenuated signals thereafter are combined into a resultant signal in master unit, and the combination of attenuation factors is changed based on a predetermined rule. Then information about magnitudes of powers of signals received from the mobile station by the respective slave units is acquired based on change of information about a power of the resultant signal occurring with change in the combination of attenuation factors. At this time, the signal received from the mobile station by each slave unit increases its power with decreasing distance of the slave unit to the mobile station; therefore, distances from the mobile station to the respective slave units are estimated based on the information about the magnitudes of the powers, and the location of the mobile station is suitably estimated thereby.